JP2020508492A5 - - Google Patents

Info

Publication number
JP2020508492A5
JP2020508492A5 JP2019545266A JP2019545266A JP2020508492A5 JP 2020508492 A5 JP2020508492 A5 JP 2020508492A5 JP 2019545266 A JP2019545266 A JP 2019545266A JP 2019545266 A JP2019545266 A JP 2019545266A JP 2020508492 A5 JP2020508492 A5 JP 2020508492A5
Authority
JP
Japan
Prior art keywords
reflective
refractive lens
lens according
optical
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019545266A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020508492A (ja
JP7275035B2 (ja
Filing date
Publication date
Priority claimed from DE102017202802.5A external-priority patent/DE102017202802A1/de
Application filed filed Critical
Publication of JP2020508492A publication Critical patent/JP2020508492A/ja
Publication of JP2020508492A5 publication Critical patent/JP2020508492A5/ja
Application granted granted Critical
Publication of JP7275035B2 publication Critical patent/JP7275035B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2019545266A 2017-02-21 2018-02-13 反射屈折レンズと、そのようなレンズを含む光学システム Active JP7275035B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017202802.5 2017-02-21
DE102017202802.5A DE102017202802A1 (de) 2017-02-21 2017-02-21 Objektiv und optisches System mit einem solchen Objektiv
PCT/EP2018/053552 WO2018153729A1 (de) 2017-02-21 2018-02-13 Katadioptrisches objektiv und optisches system mit einem solchen objektiv

Publications (3)

Publication Number Publication Date
JP2020508492A JP2020508492A (ja) 2020-03-19
JP2020508492A5 true JP2020508492A5 (https=) 2023-02-07
JP7275035B2 JP7275035B2 (ja) 2023-05-17

Family

ID=61622498

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019545266A Active JP7275035B2 (ja) 2017-02-21 2018-02-13 反射屈折レンズと、そのようなレンズを含む光学システム

Country Status (5)

Country Link
US (1) US11561381B2 (https=)
JP (1) JP7275035B2 (https=)
KR (1) KR102542986B1 (https=)
DE (1) DE102017202802A1 (https=)
WO (1) WO2018153729A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019219177A1 (de) 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element mit einer Schutzbeschichtung, Verfahren zu dessen Herstellung und optische Anordnung
CN110927940B (zh) * 2019-12-19 2022-02-08 浙江舜宇光学有限公司 摄像装置
KR102788875B1 (ko) 2020-05-25 2025-03-31 삼성전자주식회사 입사광의 입사각, 입사각 스프레드, 및 방위각을 조절할 수 있는 계측 시스템
KR102919195B1 (ko) 2020-07-06 2026-01-27 삼성전자 주식회사 경사 조명을 이용한 회절 기반 계측 장치 및 방법, 그 방법을 이용한 반도체 소자 제조방법
CN113946041B (zh) * 2021-10-22 2022-09-20 中国科学院长春光学精密机械与物理研究所 一种折反式卡塞格林望远镜系统及其偏振像差校正方法
TWI847291B (zh) * 2022-09-30 2024-07-01 大立光電股份有限公司 折反射光學膜、成像光學鏡頭、取像裝置及電子裝置
US12455453B2 (en) 2023-04-25 2025-10-28 Apple Inc. Lens assembly with a supplemental mirror

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283692A (en) * 1989-07-21 1994-02-01 Spectra Physics Lasers, Inc. Multi-layer graded reflectivity mirror
US5646976A (en) * 1994-08-01 1997-07-08 Osmic, Inc. Optical element of multilayered thin film for X-rays and neutrons
US5717518A (en) * 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5911858A (en) * 1997-02-18 1999-06-15 Sandia Corporation Method for high-precision multi-layered thin film deposition for deep and extreme ultraviolet mirrors
DE19833524B4 (de) * 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
JP4345232B2 (ja) 1998-12-25 2009-10-14 株式会社ニコン 反射屈折結像光学系および該光学系を備えた投影露光装置
US6421417B1 (en) * 1999-08-02 2002-07-16 Osmic, Inc. Multilayer optics with adjustable working wavelength
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
JP2002162566A (ja) 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
EP1282011B1 (de) * 2001-08-01 2006-11-22 Carl Zeiss SMT AG Reflektives Projektionsobjektiv für EUV-Photolithographie
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
JP2003233009A (ja) * 2002-12-25 2003-08-22 Nikon Corp 反射屈折投影光学系、反射屈折光学系、投影露光装置、及び投影露光方法
US7554649B2 (en) * 2003-09-02 2009-06-30 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method
KR101248328B1 (ko) * 2004-06-04 2013-04-01 칼 짜이스 에스엠티 게엠베하 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
US7333271B2 (en) 2005-07-05 2008-02-19 Northrop Grumman Corporation Dichroic mangin mirror
EP1930771A1 (en) * 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings
CN101836163B (zh) * 2007-08-20 2012-06-27 卡尔蔡司Smt有限责任公司 包括具有反射涂层的镜元件的投射物镜
WO2009046137A1 (en) 2007-10-02 2009-04-09 Kla-Tencor Corporation Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths
US20090252977A1 (en) * 2008-04-07 2009-10-08 Canon Kabushiki Kaisha Multilayer film reflector
EP2177934B1 (en) * 2008-10-17 2011-09-07 Carl Zeiss SMT GmbH High transmission, high aperture catadioptric projection objective and projection exposure apparatus
DE102010004827A1 (de) 2009-01-21 2010-09-30 Carl Zeiss Smt Ag Katadioptrische Pupillen-Relaysysteme
DE102009048553A1 (de) 2009-09-29 2011-03-31 Carl Zeiss Smt Gmbh Katadioptrisches Projektionsobjektiv mit Umlenkspiegeln und Projektionsbelichtungsverfahren
DE102009047179B8 (de) 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
US9436103B2 (en) * 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage

Similar Documents

Publication Publication Date Title
JP2020508492A5 (https=)
KR101248328B1 (ko) 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
US11835852B2 (en) Reflective mask blank for EUV exposure, and reflective mask
US8848167B2 (en) Optical element for UV or EUV lithography with coatings having optimized stress and thickness
KR102542986B1 (ko) 반사 굴절 렌즈 및 이러한 렌즈를 포함하는 광학 시스템
KR101411164B1 (ko) 마이크로리소그래피용 조명 광학 유닛
US10101569B2 (en) Mirror, in particular collector mirror for microlithography
TW533322B (en) Catadioptric objective with physical beam splitter
US20190285989A1 (en) Intensity adaptation filter for euv microlithography, method for producing same, and illumination system having a corresponding filter
WO2009013230A1 (en) Optical system of a microlithographic projection exposure apparatus
US9921483B2 (en) Surface correction of mirrors with decoupling coating
JP6309535B2 (ja) Ｅｕｖリソグラフィー用反射性光学素子及びその製造方法
US20160313482A1 (en) Polarization system
KR102113143B1 (ko) 광의 스침각 입사를 성취하기 위한 빔 스플리터
US7522335B2 (en) Broad-angle multilayer mirror design
CN110692016A (zh) 图案化装置
JP2009507366A (ja) マイクロリソグラフィック投影露光装置
JP2007059743A (ja) 多層膜反射鏡および露光装置
EP1530737A1 (en) Catadioptric reduction lens having a polarization beamsplitter
JP2024104628A (ja) 投影光学系、露光装置、および物品製造方法
JP2007088237A (ja) 多層膜反射鏡及びｅｕｖ露光装置
JP2016539368A (ja) 反射光学素子及びマイクロリソグラフィ投影露光装置の光学系
Bal et al. Designing extreme ultraviolet projection systems without obstruction and with multilayers
JP2010272595A (ja) 光学素子、投影光学系、露光装置及びデバイスの製造方法