DE102009037077B3 - Katadioptrisches Projektionsobjektiv - Google Patents

Katadioptrisches Projektionsobjektiv Download PDF

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Publication number
DE102009037077B3
DE102009037077B3 DE102009037077A DE102009037077A DE102009037077B3 DE 102009037077 B3 DE102009037077 B3 DE 102009037077B3 DE 102009037077 A DE102009037077 A DE 102009037077A DE 102009037077 A DE102009037077 A DE 102009037077A DE 102009037077 B3 DE102009037077 B3 DE 102009037077B3
Authority
DE
Germany
Prior art keywords
lens
image
plane
objective
partial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102009037077A
Other languages
German (de)
English (en)
Inventor
Vladimir Dr. Kamenov
Alexander Dr. Epple
Toralf Dr. Gruner
Thomas Schicketanz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE102009037077A priority Critical patent/DE102009037077B3/de
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to US12/562,693 priority patent/US8446665B2/en
Priority to TW099126310A priority patent/TWI372263B/zh
Priority to KR1020100077848A priority patent/KR20110017344A/ko
Priority to JP2010194864A priority patent/JP2011039526A/ja
Priority to CN201010254294.2A priority patent/CN101995591B/zh
Publication of DE102009037077B3 publication Critical patent/DE102009037077B3/de
Application granted granted Critical
Priority to JP2012091857A priority patent/JP2012185503A/ja
Priority to JP2012219282A priority patent/JP2013042155A/ja
Priority to US13/871,366 priority patent/US8873137B2/en
Priority to US14/510,454 priority patent/US9279969B2/en
Priority to US15/002,492 priority patent/US9726870B2/en
Priority to US15/654,766 priority patent/US10042146B2/en
Priority to KR1020180035923A priority patent/KR20180034378A/ko
Priority to US16/021,239 priority patent/US20180373006A1/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
    • G02B13/0015—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras characterised by the lens design
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0896—Catadioptric systems with variable magnification or multiple imaging planes, including multispectral systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
DE102009037077A 2009-08-13 2009-08-13 Katadioptrisches Projektionsobjektiv Expired - Fee Related DE102009037077B3 (de)

Priority Applications (14)

Application Number Priority Date Filing Date Title
DE102009037077A DE102009037077B3 (de) 2009-08-13 2009-08-13 Katadioptrisches Projektionsobjektiv
US12/562,693 US8446665B2 (en) 2009-08-13 2009-09-18 Catadioptric projection objective
TW099126310A TWI372263B (en) 2009-08-13 2010-08-06 Catadioptric projection objective
KR1020100077848A KR20110017344A (ko) 2009-08-13 2010-08-12 반사굴절식 투영 대물렌즈
JP2010194864A JP2011039526A (ja) 2009-08-13 2010-08-13 反射屈折投影対物系
CN201010254294.2A CN101995591B (zh) 2009-08-13 2010-08-13 折反射投射物镜
JP2012091857A JP2012185503A (ja) 2009-08-13 2012-04-13 反射屈折投影対物系
JP2012219282A JP2013042155A (ja) 2009-08-13 2012-10-01 反射屈折投影対物系
US13/871,366 US8873137B2 (en) 2009-08-13 2013-04-26 Catadioptric projection objective
US14/510,454 US9279969B2 (en) 2009-08-13 2014-10-09 Catadioptric projection objective
US15/002,492 US9726870B2 (en) 2009-08-13 2016-01-21 Catadioptric projection objective
US15/654,766 US10042146B2 (en) 2009-08-13 2017-07-20 Catadioptric projection objective
KR1020180035923A KR20180034378A (ko) 2009-08-13 2018-03-28 반사굴절식 투영 대물렌즈
US16/021,239 US20180373006A1 (en) 2009-08-13 2018-06-28 Catadioptric projection objective

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009037077A DE102009037077B3 (de) 2009-08-13 2009-08-13 Katadioptrisches Projektionsobjektiv

Publications (1)

Publication Number Publication Date
DE102009037077B3 true DE102009037077B3 (de) 2011-02-17

Family

ID=43448492

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102009037077A Expired - Fee Related DE102009037077B3 (de) 2009-08-13 2009-08-13 Katadioptrisches Projektionsobjektiv

Country Status (6)

Country Link
US (6) US8446665B2 (enExample)
JP (3) JP2011039526A (enExample)
KR (2) KR20110017344A (enExample)
CN (1) CN101995591B (enExample)
DE (1) DE102009037077B3 (enExample)
TW (1) TWI372263B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022207068A1 (de) * 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Linse für eine zum Betrieb im DUV ausgelegte mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren und Anordnung zum Ausbilden einer Antireflexschicht

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US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
CN102436058B (zh) * 2011-12-14 2013-08-21 北京理工大学 一种用于深紫外波段的全球面折反式准直物镜
CN104871091B (zh) * 2012-12-18 2017-06-30 株式会社尼康 基板处理装置、器件制造系统及器件制造方法
US9274344B2 (en) * 2013-07-15 2016-03-01 The Boeing Company Method for extracting optical energy from an optical beam
KR20160091085A (ko) * 2015-01-23 2016-08-02 삼성전자주식회사 반사 굴절 광학계 및 이미지 촬영 장치

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022207068A1 (de) * 2022-07-11 2024-01-11 Carl Zeiss Smt Gmbh Linse für eine zum Betrieb im DUV ausgelegte mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren und Anordnung zum Ausbilden einer Antireflexschicht

Also Published As

Publication number Publication date
JP2012185503A (ja) 2012-09-27
US8446665B2 (en) 2013-05-21
US8873137B2 (en) 2014-10-28
TWI372263B (en) 2012-09-11
CN101995591B (zh) 2015-03-25
TW201131198A (en) 2011-09-16
US10042146B2 (en) 2018-08-07
CN101995591A (zh) 2011-03-30
KR20110017344A (ko) 2011-02-21
KR20180034378A (ko) 2018-04-04
US20130242279A1 (en) 2013-09-19
JP2011039526A (ja) 2011-02-24
US20180095258A1 (en) 2018-04-05
US20160231546A1 (en) 2016-08-11
US9726870B2 (en) 2017-08-08
US20180373006A1 (en) 2018-12-27
JP2013042155A (ja) 2013-02-28
US20150055212A1 (en) 2015-02-26
US20110038061A1 (en) 2011-02-17
US9279969B2 (en) 2016-03-08

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