DE102008026144B4 - Kristallzüchtungsofen mit Konvektionskühlungsstruktur - Google Patents

Kristallzüchtungsofen mit Konvektionskühlungsstruktur Download PDF

Info

Publication number
DE102008026144B4
DE102008026144B4 DE102008026144A DE102008026144A DE102008026144B4 DE 102008026144 B4 DE102008026144 B4 DE 102008026144B4 DE 102008026144 A DE102008026144 A DE 102008026144A DE 102008026144 A DE102008026144 A DE 102008026144A DE 102008026144 B4 DE102008026144 B4 DE 102008026144B4
Authority
DE
Germany
Prior art keywords
heating element
boiler room
crystal growing
growing furnace
furnace according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102008026144A
Other languages
German (de)
English (en)
Other versions
DE102008026144A1 (de
Inventor
Shiow-Jeng Lew
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Green Energy Technology Inc
Original Assignee
Green Energy Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Green Energy Technology Inc filed Critical Green Energy Technology Inc
Publication of DE102008026144A1 publication Critical patent/DE102008026144A1/de
Application granted granted Critical
Publication of DE102008026144B4 publication Critical patent/DE102008026144B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/003Heating or cooling of the melt or the crystallised material
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1004Apparatus with means for measuring, testing, or sensing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1004Apparatus with means for measuring, testing, or sensing
    • Y10T117/1008Apparatus with means for measuring, testing, or sensing with responsive control means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1016Apparatus with means for treating single-crystal [e.g., heat treating]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1092Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Furnace Details (AREA)
DE102008026144A 2007-12-21 2008-05-30 Kristallzüchtungsofen mit Konvektionskühlungsstruktur Expired - Fee Related DE102008026144B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW096149221 2007-12-21
TW096149221A TW200928018A (en) 2007-12-21 2007-12-21 Crystal-growing furnace with convectional cooling structure

Publications (2)

Publication Number Publication Date
DE102008026144A1 DE102008026144A1 (de) 2009-06-25
DE102008026144B4 true DE102008026144B4 (de) 2013-02-14

Family

ID=40690082

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102008026144A Expired - Fee Related DE102008026144B4 (de) 2007-12-21 2008-05-30 Kristallzüchtungsofen mit Konvektionskühlungsstruktur

Country Status (4)

Country Link
US (1) US8062423B2 (https=)
JP (1) JP4986964B2 (https=)
DE (1) DE102008026144B4 (https=)
TW (1) TW200928018A (https=)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200928018A (en) * 2007-12-21 2009-07-01 Green Energy Technology Inc Crystal-growing furnace with convectional cooling structure
TW200932963A (en) * 2008-01-29 2009-08-01 Green Energy Technology Inc Crystal growing furnace with heating improvement structure
KR100902859B1 (ko) * 2009-02-17 2009-06-16 (주) 썸백엔지니어링 태양전지용 실리콘 제조용 캐스팅 장치
IT1396761B1 (it) * 2009-10-21 2012-12-14 Saet Spa Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio
CN101949056B (zh) * 2010-09-25 2013-01-30 王敬 在坩埚侧壁底端设置有保温部件的定向凝固炉
US8562740B2 (en) * 2010-11-17 2013-10-22 Silicor Materials Inc. Apparatus for directional solidification of silicon including a refractory material
US9352389B2 (en) * 2011-09-16 2016-05-31 Silicor Materials, Inc. Directional solidification system and method
TWI539039B (zh) * 2012-01-26 2016-06-21 希利柯爾材料股份有限公司 矽的純化方法
CN104583464A (zh) * 2012-06-25 2015-04-29 希利柯尔材料股份有限公司 用于纯化硅的耐火坩埚的表面的衬里以及使用该坩埚进行熔化和进一步定向凝固以纯化硅熔融体的方法
CN103014851B (zh) * 2012-12-25 2016-01-27 南昌大学 一种生产定向凝固多晶硅锭的方法
TWI643983B (zh) 2013-03-14 2018-12-11 美商希利柯爾材料股份有限公司 定向凝固系統及方法
GB201319671D0 (en) 2013-11-07 2013-12-25 Ebner Ind Ofenbau Controlling a temperature of a crucible inside an oven
CN103615891B (zh) * 2013-11-20 2016-10-05 合肥日新高温技术有限公司 一种真空气氛高压碳板炉
TWM485251U (zh) * 2014-04-03 2014-09-01 Globalwafers Co Ltd 晶體生長裝置及其保溫罩
CN105648525B (zh) * 2014-11-17 2018-07-10 镇江荣德新能源科技有限公司 用于多晶硅定向凝固工艺的多晶炉
TWI614473B (zh) * 2015-07-20 2018-02-11 茂迪股份有限公司 長晶爐設備
US20180347071A1 (en) * 2015-07-27 2018-12-06 Corner Star Limited Systems and methods for low-oxygen crystal growth using a double-layer continuous czochralski process
CN105088338A (zh) * 2015-08-14 2015-11-25 晶科能源有限公司 一种多晶铸锭炉及排气装置
CN105671633A (zh) * 2016-02-03 2016-06-15 陈鸽 一种改变载气流向的引流装置
US10689010B2 (en) * 2016-12-22 2020-06-23 Etran, Inc. Elevated transportation system
CN107523865A (zh) * 2017-09-28 2017-12-29 浙江晶盛机电股份有限公司 一种定向水冷散热的节能型高效多晶硅铸锭炉
JP7186534B2 (ja) 2018-07-25 2022-12-09 昭和電工株式会社 結晶成長装置
CN108842180A (zh) * 2018-08-24 2018-11-20 常州四杰机械科技有限公司 一种准单晶铸锭炉下炉体机构
CN109295495B (zh) * 2018-11-19 2020-08-04 江苏斯力康科技有限公司 利于控制定向凝固平直液固界面的温场调控机构
CN110184651A (zh) * 2019-07-17 2019-08-30 晶科能源有限公司 一种多晶铸锭炉
CN112857039B (zh) * 2021-03-06 2023-08-15 陕西万豪钛金特材科技有限公司 一种基于合金熔炼的烧结炉及冷却方法
CN114455591B (zh) * 2022-01-18 2023-08-18 山西宏晟利隆科技有限公司 一种工业制造二氧化硅设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000319094A (ja) * 1999-04-30 2000-11-21 Mitsubishi Materials Corp 結晶シリコン製造装置
JP2001048696A (ja) * 1999-08-06 2001-02-20 Mitsubishi Materials Corp 結晶シリコン製造装置
US6299682B1 (en) * 1998-02-25 2001-10-09 Mitsubishi Materials Corporation Method for producing silicon ingot having directional solidification structure and apparatus for producing the same
US20070044707A1 (en) * 2005-08-25 2007-03-01 Frederick Schmid System and method for crystal growing
US20070283882A1 (en) * 2006-06-13 2007-12-13 Young Sang Cho Manufacturing equipment for polysilicon ingot

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56129696A (en) * 1980-03-12 1981-10-09 Toshiba Corp Crystal growing apparatus
JPH0672744B2 (ja) * 1986-08-15 1994-09-14 石川島播磨重工業株式会社 焼結炉
US5312600A (en) * 1990-03-20 1994-05-17 Toshiba Ceramics Co. Silicon single crystal manufacturing apparatus
JP3263104B2 (ja) * 1991-11-27 2002-03-04 川崎製鉄株式会社 金属シリコンの精製方法
JP3388664B2 (ja) * 1995-12-28 2003-03-24 シャープ株式会社 多結晶半導体の製造方法および製造装置
JPH09263491A (ja) * 1996-03-27 1997-10-07 Shin Etsu Handotai Co Ltd シリコン単結晶の製造装置
JP3000923B2 (ja) * 1996-03-28 2000-01-17 住友金属工業株式会社 単結晶引き上げ方法
JP3892496B2 (ja) * 1996-04-22 2007-03-14 Sumco Techxiv株式会社 半導体単結晶製造方法
DE19628851A1 (de) * 1996-07-17 1998-01-22 Wacker Siltronic Halbleitermat Verfahren und Vorrichtung zur Herstellung eines Einkristalls
JP3988217B2 (ja) * 1997-09-09 2007-10-10 株式会社ニコン 大口径蛍石の製造装置および製造方法
JP3992800B2 (ja) * 1997-09-22 2007-10-17 Sumco Techxiv株式会社 単結晶製造装置および単結晶の製造方法
JP4357068B2 (ja) * 1999-05-11 2009-11-04 Sumco Techxiv株式会社 単結晶インゴット製造装置及び方法
JP3846285B2 (ja) * 2001-11-26 2006-11-15 三菱マテリアル株式会社 結晶製造装置及び結晶製造方法
KR20040044146A (ko) * 2002-11-19 2004-05-27 가부시끼가이샤 도꾸야마 플루오르화 금속용 단결정 인출 장치
JP4573290B2 (ja) * 2003-10-17 2010-11-04 株式会社Ihi 高圧熱処理炉
TWI263713B (en) * 2004-11-04 2006-10-11 Univ Nat Central Heat shield and crystal growth equipment
JP2007261846A (ja) * 2006-03-28 2007-10-11 Sumco Techxiv株式会社 無欠陥のシリコン単結晶を製造する方法
TW200928018A (en) * 2007-12-21 2009-07-01 Green Energy Technology Inc Crystal-growing furnace with convectional cooling structure
TW200932963A (en) * 2008-01-29 2009-08-01 Green Energy Technology Inc Crystal growing furnace with heating improvement structure
TW200936823A (en) * 2008-02-21 2009-09-01 Green Energy Technology Inc Heating electrode and fastening structure for crystal-growing furnace

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6299682B1 (en) * 1998-02-25 2001-10-09 Mitsubishi Materials Corporation Method for producing silicon ingot having directional solidification structure and apparatus for producing the same
JP2000319094A (ja) * 1999-04-30 2000-11-21 Mitsubishi Materials Corp 結晶シリコン製造装置
JP2001048696A (ja) * 1999-08-06 2001-02-20 Mitsubishi Materials Corp 結晶シリコン製造装置
US20070044707A1 (en) * 2005-08-25 2007-03-01 Frederick Schmid System and method for crystal growing
US20070283882A1 (en) * 2006-06-13 2007-12-13 Young Sang Cho Manufacturing equipment for polysilicon ingot

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP 2000319094 A in Form der elektronischen Übersetzung *
JP 2001048696 A in Form der elektronischen Übersetzung *

Also Published As

Publication number Publication date
JP2009150637A (ja) 2009-07-09
US8062423B2 (en) 2011-11-22
JP4986964B2 (ja) 2012-07-25
US20090158995A1 (en) 2009-06-25
DE102008026144A1 (de) 2009-06-25
TWI363109B (https=) 2012-05-01
TW200928018A (en) 2009-07-01

Similar Documents

Publication Publication Date Title
DE102008026144B4 (de) Kristallzüchtungsofen mit Konvektionskühlungsstruktur
DE2461553C2 (de) Verfahren zum Züchten eines Einkristalls im Tiegel
DE102006017621B4 (de) Vorrichtung und Verfahren zur Herstellung von multikristallinem Silizium
EP2028292B1 (de) Verfahren zur Herstellung von monokristallinen Metall- oder Halbmetallkörpern
DE112009000526B4 (de) Einkristallherstellungsvorrichtung und Verfahren zur Herstellung eines Einkristalls
DE102010024010B4 (de) Verfahren und Vorrichtung zum Herstellen von polykristallinen Siliziumblöcken
DE19622659C2 (de) Vertikalofen zur Züchtung von Einkristallen
DE102006017622A1 (de) Verfahren und Vorrichtung zur Herstellung von multikristallinem Silizium
EP1866247B1 (de) Vorrichtung und verfahren zum kristallisieren von nichteisenmetallen
DE102014113806B4 (de) Verfahren und Vorrichtung zur Herstellung von DS/SC Gusskörpern
DE602004004095T2 (de) Tiegel für eine vorrichtung zur herstellung eines kristallinen blockes, und verfahren zu seiner herstellung
DE2059713A1 (de) Verfahren und Vorrichtung zum Herstellen von Halbleiter-Einkristallen nach der Czochralski-Methode
DE4018967A1 (de) Verfahren und vorrichtung zum giessen von siliciumbloecken mit kolumnarstruktur als grundmaterial fuer solarzellen
DE19934940C2 (de) Vorrichtung zum Herstellen von gerichtet erstarrten Blöcken und Betriebsverfahren hierfür
DE102020127337B4 (de) Halbleiterkristallwachstumsvorrichtung
DE112011102485B4 (de) Vorrichtung und Verfahren zum Herstellen eines Halbleiter-Einkristalls
DE112012003423T5 (de) Vorrichtung zum Fertigen eines Halbleiter- oder Metalloxidblocks
DE102020127336A1 (de) Halbleiterkristallwachstumsvorrichtung
DE102010031819B4 (de) Verfahren und Vorrichtung zum Herstellen von polykristallinen Siliziumblöcken
DE102009044893B4 (de) Herstellungsverfahren zur Herstellung eines Kristallkörpers aus einem Halbleitermaterial
DE60307578T2 (de) Kristallziehvorrichtung für Metallfluoride
DE3226440A1 (de) Giessform und verfahren fuer den guss von siliziumbarren, die als material fuer solarzellen verwendbar sind
EP0096298A1 (de) Verfahren zum Herstellen polykristalliner, für nachfolgendes Zonenschmelzen geeigneter Siliciumstäbe
DE102005037393B4 (de) Verfahren sowie Vorrichtung zur Züchtung von grossvolumigen Einkristallen unter Ausbildung einer konvexen Phasengrenzfläche während des Kristallisationsprozesses
DE2038690C3 (de) Verfahren zur Herstellung von Formstücken aus Saphireinkristallen

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: C30B 35/00 AFI20080912BHDE

R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20130515

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee