DE102008026144B4 - Kristallzüchtungsofen mit Konvektionskühlungsstruktur - Google Patents
Kristallzüchtungsofen mit Konvektionskühlungsstruktur Download PDFInfo
- Publication number
- DE102008026144B4 DE102008026144B4 DE102008026144A DE102008026144A DE102008026144B4 DE 102008026144 B4 DE102008026144 B4 DE 102008026144B4 DE 102008026144 A DE102008026144 A DE 102008026144A DE 102008026144 A DE102008026144 A DE 102008026144A DE 102008026144 B4 DE102008026144 B4 DE 102008026144B4
- Authority
- DE
- Germany
- Prior art keywords
- heating element
- boiler room
- crystal growing
- growing furnace
- furnace according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
- Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1016—Apparatus with means for treating single-crystal [e.g., heat treating]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1092—Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
- Furnace Charging Or Discharging (AREA)
- Furnace Details (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW096149221 | 2007-12-21 | ||
| TW096149221A TW200928018A (en) | 2007-12-21 | 2007-12-21 | Crystal-growing furnace with convectional cooling structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102008026144A1 DE102008026144A1 (de) | 2009-06-25 |
| DE102008026144B4 true DE102008026144B4 (de) | 2013-02-14 |
Family
ID=40690082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102008026144A Expired - Fee Related DE102008026144B4 (de) | 2007-12-21 | 2008-05-30 | Kristallzüchtungsofen mit Konvektionskühlungsstruktur |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8062423B2 (https=) |
| JP (1) | JP4986964B2 (https=) |
| DE (1) | DE102008026144B4 (https=) |
| TW (1) | TW200928018A (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200928018A (en) * | 2007-12-21 | 2009-07-01 | Green Energy Technology Inc | Crystal-growing furnace with convectional cooling structure |
| TW200932963A (en) * | 2008-01-29 | 2009-08-01 | Green Energy Technology Inc | Crystal growing furnace with heating improvement structure |
| KR100902859B1 (ko) * | 2009-02-17 | 2009-06-16 | (주) 썸백엔지니어링 | 태양전지용 실리콘 제조용 캐스팅 장치 |
| IT1396761B1 (it) * | 2009-10-21 | 2012-12-14 | Saet Spa | Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio |
| CN101949056B (zh) * | 2010-09-25 | 2013-01-30 | 王敬 | 在坩埚侧壁底端设置有保温部件的定向凝固炉 |
| US8562740B2 (en) * | 2010-11-17 | 2013-10-22 | Silicor Materials Inc. | Apparatus for directional solidification of silicon including a refractory material |
| US9352389B2 (en) * | 2011-09-16 | 2016-05-31 | Silicor Materials, Inc. | Directional solidification system and method |
| TWI539039B (zh) * | 2012-01-26 | 2016-06-21 | 希利柯爾材料股份有限公司 | 矽的純化方法 |
| CN104583464A (zh) * | 2012-06-25 | 2015-04-29 | 希利柯尔材料股份有限公司 | 用于纯化硅的耐火坩埚的表面的衬里以及使用该坩埚进行熔化和进一步定向凝固以纯化硅熔融体的方法 |
| CN103014851B (zh) * | 2012-12-25 | 2016-01-27 | 南昌大学 | 一种生产定向凝固多晶硅锭的方法 |
| TWI643983B (zh) | 2013-03-14 | 2018-12-11 | 美商希利柯爾材料股份有限公司 | 定向凝固系統及方法 |
| GB201319671D0 (en) | 2013-11-07 | 2013-12-25 | Ebner Ind Ofenbau | Controlling a temperature of a crucible inside an oven |
| CN103615891B (zh) * | 2013-11-20 | 2016-10-05 | 合肥日新高温技术有限公司 | 一种真空气氛高压碳板炉 |
| TWM485251U (zh) * | 2014-04-03 | 2014-09-01 | Globalwafers Co Ltd | 晶體生長裝置及其保溫罩 |
| CN105648525B (zh) * | 2014-11-17 | 2018-07-10 | 镇江荣德新能源科技有限公司 | 用于多晶硅定向凝固工艺的多晶炉 |
| TWI614473B (zh) * | 2015-07-20 | 2018-02-11 | 茂迪股份有限公司 | 長晶爐設備 |
| US20180347071A1 (en) * | 2015-07-27 | 2018-12-06 | Corner Star Limited | Systems and methods for low-oxygen crystal growth using a double-layer continuous czochralski process |
| CN105088338A (zh) * | 2015-08-14 | 2015-11-25 | 晶科能源有限公司 | 一种多晶铸锭炉及排气装置 |
| CN105671633A (zh) * | 2016-02-03 | 2016-06-15 | 陈鸽 | 一种改变载气流向的引流装置 |
| US10689010B2 (en) * | 2016-12-22 | 2020-06-23 | Etran, Inc. | Elevated transportation system |
| CN107523865A (zh) * | 2017-09-28 | 2017-12-29 | 浙江晶盛机电股份有限公司 | 一种定向水冷散热的节能型高效多晶硅铸锭炉 |
| JP7186534B2 (ja) | 2018-07-25 | 2022-12-09 | 昭和電工株式会社 | 結晶成長装置 |
| CN108842180A (zh) * | 2018-08-24 | 2018-11-20 | 常州四杰机械科技有限公司 | 一种准单晶铸锭炉下炉体机构 |
| CN109295495B (zh) * | 2018-11-19 | 2020-08-04 | 江苏斯力康科技有限公司 | 利于控制定向凝固平直液固界面的温场调控机构 |
| CN110184651A (zh) * | 2019-07-17 | 2019-08-30 | 晶科能源有限公司 | 一种多晶铸锭炉 |
| CN112857039B (zh) * | 2021-03-06 | 2023-08-15 | 陕西万豪钛金特材科技有限公司 | 一种基于合金熔炼的烧结炉及冷却方法 |
| CN114455591B (zh) * | 2022-01-18 | 2023-08-18 | 山西宏晟利隆科技有限公司 | 一种工业制造二氧化硅设备 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000319094A (ja) * | 1999-04-30 | 2000-11-21 | Mitsubishi Materials Corp | 結晶シリコン製造装置 |
| JP2001048696A (ja) * | 1999-08-06 | 2001-02-20 | Mitsubishi Materials Corp | 結晶シリコン製造装置 |
| US6299682B1 (en) * | 1998-02-25 | 2001-10-09 | Mitsubishi Materials Corporation | Method for producing silicon ingot having directional solidification structure and apparatus for producing the same |
| US20070044707A1 (en) * | 2005-08-25 | 2007-03-01 | Frederick Schmid | System and method for crystal growing |
| US20070283882A1 (en) * | 2006-06-13 | 2007-12-13 | Young Sang Cho | Manufacturing equipment for polysilicon ingot |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56129696A (en) * | 1980-03-12 | 1981-10-09 | Toshiba Corp | Crystal growing apparatus |
| JPH0672744B2 (ja) * | 1986-08-15 | 1994-09-14 | 石川島播磨重工業株式会社 | 焼結炉 |
| US5312600A (en) * | 1990-03-20 | 1994-05-17 | Toshiba Ceramics Co. | Silicon single crystal manufacturing apparatus |
| JP3263104B2 (ja) * | 1991-11-27 | 2002-03-04 | 川崎製鉄株式会社 | 金属シリコンの精製方法 |
| JP3388664B2 (ja) * | 1995-12-28 | 2003-03-24 | シャープ株式会社 | 多結晶半導体の製造方法および製造装置 |
| JPH09263491A (ja) * | 1996-03-27 | 1997-10-07 | Shin Etsu Handotai Co Ltd | シリコン単結晶の製造装置 |
| JP3000923B2 (ja) * | 1996-03-28 | 2000-01-17 | 住友金属工業株式会社 | 単結晶引き上げ方法 |
| JP3892496B2 (ja) * | 1996-04-22 | 2007-03-14 | Sumco Techxiv株式会社 | 半導体単結晶製造方法 |
| DE19628851A1 (de) * | 1996-07-17 | 1998-01-22 | Wacker Siltronic Halbleitermat | Verfahren und Vorrichtung zur Herstellung eines Einkristalls |
| JP3988217B2 (ja) * | 1997-09-09 | 2007-10-10 | 株式会社ニコン | 大口径蛍石の製造装置および製造方法 |
| JP3992800B2 (ja) * | 1997-09-22 | 2007-10-17 | Sumco Techxiv株式会社 | 単結晶製造装置および単結晶の製造方法 |
| JP4357068B2 (ja) * | 1999-05-11 | 2009-11-04 | Sumco Techxiv株式会社 | 単結晶インゴット製造装置及び方法 |
| JP3846285B2 (ja) * | 2001-11-26 | 2006-11-15 | 三菱マテリアル株式会社 | 結晶製造装置及び結晶製造方法 |
| KR20040044146A (ko) * | 2002-11-19 | 2004-05-27 | 가부시끼가이샤 도꾸야마 | 플루오르화 금속용 단결정 인출 장치 |
| JP4573290B2 (ja) * | 2003-10-17 | 2010-11-04 | 株式会社Ihi | 高圧熱処理炉 |
| TWI263713B (en) * | 2004-11-04 | 2006-10-11 | Univ Nat Central | Heat shield and crystal growth equipment |
| JP2007261846A (ja) * | 2006-03-28 | 2007-10-11 | Sumco Techxiv株式会社 | 無欠陥のシリコン単結晶を製造する方法 |
| TW200928018A (en) * | 2007-12-21 | 2009-07-01 | Green Energy Technology Inc | Crystal-growing furnace with convectional cooling structure |
| TW200932963A (en) * | 2008-01-29 | 2009-08-01 | Green Energy Technology Inc | Crystal growing furnace with heating improvement structure |
| TW200936823A (en) * | 2008-02-21 | 2009-09-01 | Green Energy Technology Inc | Heating electrode and fastening structure for crystal-growing furnace |
-
2007
- 2007-12-21 TW TW096149221A patent/TW200928018A/zh not_active IP Right Cessation
-
2008
- 2008-05-21 US US12/153,545 patent/US8062423B2/en not_active Expired - Fee Related
- 2008-05-30 DE DE102008026144A patent/DE102008026144B4/de not_active Expired - Fee Related
- 2008-09-29 JP JP2008250165A patent/JP4986964B2/ja not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6299682B1 (en) * | 1998-02-25 | 2001-10-09 | Mitsubishi Materials Corporation | Method for producing silicon ingot having directional solidification structure and apparatus for producing the same |
| JP2000319094A (ja) * | 1999-04-30 | 2000-11-21 | Mitsubishi Materials Corp | 結晶シリコン製造装置 |
| JP2001048696A (ja) * | 1999-08-06 | 2001-02-20 | Mitsubishi Materials Corp | 結晶シリコン製造装置 |
| US20070044707A1 (en) * | 2005-08-25 | 2007-03-01 | Frederick Schmid | System and method for crystal growing |
| US20070283882A1 (en) * | 2006-06-13 | 2007-12-13 | Young Sang Cho | Manufacturing equipment for polysilicon ingot |
Non-Patent Citations (2)
| Title |
|---|
| JP 2000319094 A in Form der elektronischen Übersetzung * |
| JP 2001048696 A in Form der elektronischen Übersetzung * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009150637A (ja) | 2009-07-09 |
| US8062423B2 (en) | 2011-11-22 |
| JP4986964B2 (ja) | 2012-07-25 |
| US20090158995A1 (en) | 2009-06-25 |
| DE102008026144A1 (de) | 2009-06-25 |
| TWI363109B (https=) | 2012-05-01 |
| TW200928018A (en) | 2009-07-01 |
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| OP8 | Request for examination as to paragraph 44 patent law | ||
| 8125 | Change of the main classification |
Ipc: C30B 35/00 AFI20080912BHDE |
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| R016 | Response to examination communication | ||
| R016 | Response to examination communication | ||
| R018 | Grant decision by examination section/examining division | ||
| R020 | Patent grant now final |
Effective date: 20130515 |
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| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |