IT1396761B1 - Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio - Google Patents
Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicioInfo
- Publication number
- IT1396761B1 IT1396761B1 ITTO2009A000793A ITTO20090793A IT1396761B1 IT 1396761 B1 IT1396761 B1 IT 1396761B1 IT TO2009A000793 A ITTO2009A000793 A IT TO2009A000793A IT TO20090793 A ITTO20090793 A IT TO20090793A IT 1396761 B1 IT1396761 B1 IT 1396761B1
- Authority
- IT
- Italy
- Prior art keywords
- obtaining
- semiconductor material
- crystalline semiconductor
- particular silicon
- silicon
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D27/00—Treating the metal in the mould while it is molten or ductile ; Pressure or vacuum casting
- B22D27/04—Influencing the temperature of the metal, e.g. by heating or cooling the mould
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D27/00—Treating the metal in the mould while it is molten or ductile ; Pressure or vacuum casting
- B22D27/04—Influencing the temperature of the metal, e.g. by heating or cooling the mould
- B22D27/045—Directionally solidified castings
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details peculiar to crucible or pot furnaces
- F27B14/14—Arrangements of heating devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/24—Crucible furnaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/36—Coil arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/36—Coil arrangements
- H05B6/367—Coil arrangements for melting furnaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/36—Coil arrangements
- H05B6/44—Coil arrangements having more than one coil or coil segment
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITTO2009A000793A IT1396761B1 (it) | 2009-10-21 | 2009-10-21 | Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio |
US13/503,272 US20120297580A1 (en) | 2009-10-21 | 2010-10-10 | Method and device for obtaining a multicrystalline semiconductor material, in particular silicon |
CN201080057315XA CN102741461A (zh) | 2009-10-21 | 2010-10-20 | 用于获取多晶半导体材料,特别是硅的方法和设备 |
KR1020127012944A KR20120093968A (ko) | 2009-10-21 | 2010-10-20 | 실리콘으로부터 다결정 반도체 물질을 얻기 위한 방법 및 장치 |
JP2012534787A JP5694341B2 (ja) | 2009-10-21 | 2010-10-20 | 多結晶半導体材料、特にシリコンを取得する方法及び装置 |
EP10788128.6A EP2491169B1 (en) | 2009-10-21 | 2010-10-20 | Method and device for obtaining a multicrystalline semiconductor material, in particular silicon |
PCT/IB2010/002685 WO2011048473A1 (en) | 2009-10-21 | 2010-10-20 | Method and device for obtaining a multicrystalline semiconductor material, in particular silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ITTO2009A000793A IT1396761B1 (it) | 2009-10-21 | 2009-10-21 | Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio |
Publications (2)
Publication Number | Publication Date |
---|---|
ITTO20090793A1 ITTO20090793A1 (it) | 2011-04-22 |
IT1396761B1 true IT1396761B1 (it) | 2012-12-14 |
Family
ID=41809193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ITTO2009A000793A IT1396761B1 (it) | 2009-10-21 | 2009-10-21 | Metodo e dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio |
Country Status (7)
Country | Link |
---|---|
US (1) | US20120297580A1 (it) |
EP (1) | EP2491169B1 (it) |
JP (1) | JP5694341B2 (it) |
KR (1) | KR20120093968A (it) |
CN (1) | CN102741461A (it) |
IT (1) | IT1396761B1 (it) |
WO (1) | WO2011048473A1 (it) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1396762B1 (it) * | 2009-10-21 | 2012-12-14 | Saet Spa | Dispositivo per l'ottenimento di un materiale semiconduttore multicristallino, in particolare silicio, e metodo per il controllo della temperatura nello stesso |
US20120248286A1 (en) * | 2011-03-31 | 2012-10-04 | Memc Singapore Pte. Ltd. (Uen200614794D) | Systems For Insulating Directional Solidification Furnaces |
US9982361B2 (en) | 2011-08-01 | 2018-05-29 | Gtat Corporation | Liquid-cooled heat exchanger |
US9254589B2 (en) | 2011-08-19 | 2016-02-09 | Lg Innotek Co., Ltd. | Reaction container and vacuum heat treatment apparatus having the same |
FR2979357B1 (fr) * | 2011-08-31 | 2015-04-24 | Commissariat Energie Atomique | Systeme de fabrication d'un materiau cristallin par cristallisation dirigee muni d'une source de chaleur additionnelle laterale |
TWI627131B (zh) * | 2012-02-01 | 2018-06-21 | 美商希利柯爾材料股份有限公司 | 矽純化之模具及方法 |
ITTO20120571A1 (it) * | 2012-06-27 | 2013-12-28 | Alessandro Crescenzi | Elemento di avvolgimento, e avvolgimento per un forno elettrico ad induzione |
KR101411275B1 (ko) * | 2012-09-06 | 2014-06-25 | 주식회사수성기술 | 태양전지용 다결정 실리콘 제조장치 및 그 제조방법 |
ES2499140B1 (es) * | 2013-03-26 | 2015-08-05 | Universidad Autónoma de Madrid | Aparato y método para la producción de lingotes de silicio porsolidificación direccional |
ITTO20130258A1 (it) * | 2013-03-28 | 2014-09-29 | Saet Spa | Dispositivo e metodo per produrre un blocco di materiale multicristallino, in particolare silicio, mediante solidificazione direzionale |
US20150023866A1 (en) * | 2013-07-22 | 2015-01-22 | Rubicon Technology, Inc. | Method and system of producing large oxide crystals from a melt |
CN103614772A (zh) * | 2013-12-13 | 2014-03-05 | 光为绿色新能源股份有限公司 | 一种多晶硅铸锭加热方法及应用该方法的多晶硅铸锭炉 |
CN103696002B (zh) * | 2013-12-16 | 2016-06-15 | 英利集团有限公司 | 电磁与电阻混合加热的铸锭炉热场结构及使用方法 |
CN103966657B (zh) * | 2014-04-17 | 2017-04-19 | 江苏盎华光伏工程技术研究中心有限公司 | 一种多晶硅和准单晶硅铸锭炉及其使用方法 |
CN104131342A (zh) * | 2014-07-17 | 2014-11-05 | 大连理工大学 | 电磁扰动多晶硅除杂装置及其方法 |
CN104674342A (zh) * | 2015-03-20 | 2015-06-03 | 重庆大全新能源有限公司 | 一种铸锭炉 |
TWI614473B (zh) * | 2015-07-20 | 2018-02-11 | 茂迪股份有限公司 | 長晶爐設備 |
US9988740B1 (en) * | 2016-08-16 | 2018-06-05 | Northrop Grumman Systems Corporation | Shaped induction field crystal printer |
DE102017005532A1 (de) | 2017-06-10 | 2018-12-13 | copperING GmbH | Verfahren und Vorrichtung zum induktiven Erwärmen eines Stators oder Ankers einer Elektromaschine |
US10589351B2 (en) * | 2017-10-30 | 2020-03-17 | United Technologies Corporation | Method for magnetic flux compensation in a directional solidification furnace utilizing an actuated secondary coil |
US10711367B2 (en) | 2017-10-30 | 2020-07-14 | Raytheon Technoiogies Corporation | Multi-layer susceptor design for magnetic flux shielding in directional solidification furnaces |
US10337121B2 (en) * | 2017-10-30 | 2019-07-02 | United Technologies Corporation | Separate vessel metal shielding method for magnetic flux in directional solidification furnace |
US10760179B2 (en) * | 2017-10-30 | 2020-09-01 | Raytheon Technologies Corporation | Method for magnetic flux compensation in a directional solidification furnace utilizing a stationary secondary coil |
FR3075672B1 (fr) * | 2017-12-21 | 2019-12-27 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Creuset pour solidification dirigee |
CN108441939A (zh) * | 2018-03-23 | 2018-08-24 | 孟静 | 稳态晶体生长方法 |
CN110803705A (zh) * | 2018-08-06 | 2020-02-18 | 贵州中水材料科技有限公司 | 一种硅粉的回收方法及其制备的硅锭 |
CN109379797B (zh) * | 2018-12-07 | 2021-05-25 | 安徽金月节能科技有限公司 | 一种节能控温型加热台 |
KR102583211B1 (ko) * | 2021-07-27 | 2023-09-25 | 윤승환 | 가열막대를 포함하는 유도전기 가열장치 |
CN116440533B (zh) * | 2023-06-19 | 2023-08-29 | 东莞市瑞辉新材料技术有限公司 | 一种附带循环控温功能的双酚芴重结晶分离装置 |
Family Cites Families (13)
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US3335084A (en) * | 1964-03-16 | 1967-08-08 | Gen Electric | Method for producing homogeneous crystals of mixed semiconductive materials |
US3669178A (en) * | 1969-06-09 | 1972-06-13 | Continental Ore Corp | Direct reduction process and simultaneous continuous casting of metallic materials in a crucible to form rods |
JP2630417B2 (ja) * | 1988-04-15 | 1997-07-16 | 住友シチックス株式会社 | シリコン鋳造装置 |
JP2002080215A (ja) * | 2000-09-04 | 2002-03-19 | Sharp Corp | 多結晶半導体インゴットの製造方法 |
US7197061B1 (en) * | 2003-04-19 | 2007-03-27 | Inductotherm Corp. | Directional solidification of a metal |
JP2004342450A (ja) * | 2003-05-15 | 2004-12-02 | Kokusai Electric Semiconductor Service Inc | 高周波誘導加熱装置及び半導体製造装置 |
FR2909990B1 (fr) * | 2006-12-13 | 2009-03-13 | Efd Induction Sa Sa | Procede et installation de fabrication de blocs d'un materiau semiconducteur |
CN100464149C (zh) * | 2007-08-23 | 2009-02-25 | 浙江精工科技股份有限公司 | 多晶硅铸锭炉的热场结构 |
KR100955221B1 (ko) * | 2007-10-05 | 2010-04-29 | 주식회사 글로실 | 힌지를 이용한 도어 개폐장치가 구비된 태양전지용 다결정실리콘 주괴 제조 장치 |
JP5490707B2 (ja) * | 2007-11-03 | 2014-05-14 | インダクトサーム・コーポレイション | サセプタ容器内の材料を誘電加熱及び溶融するための電力システム |
TW200928018A (en) * | 2007-12-21 | 2009-07-01 | Green Energy Technology Inc | Crystal-growing furnace with convectional cooling structure |
CN101323972B (zh) * | 2008-07-14 | 2010-06-02 | 大连理工大学 | 一种多晶硅定向凝固设备 |
WO2010025397A2 (en) * | 2008-08-31 | 2010-03-04 | Inductotherm Corp. | Directional solidification of silicon by electric induction susceptor heating in a controlled environment |
-
2009
- 2009-10-21 IT ITTO2009A000793A patent/IT1396761B1/it active
-
2010
- 2010-10-10 US US13/503,272 patent/US20120297580A1/en not_active Abandoned
- 2010-10-20 WO PCT/IB2010/002685 patent/WO2011048473A1/en active Application Filing
- 2010-10-20 JP JP2012534787A patent/JP5694341B2/ja not_active Expired - Fee Related
- 2010-10-20 CN CN201080057315XA patent/CN102741461A/zh active Pending
- 2010-10-20 KR KR1020127012944A patent/KR20120093968A/ko active IP Right Grant
- 2010-10-20 EP EP10788128.6A patent/EP2491169B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2013508251A (ja) | 2013-03-07 |
EP2491169A1 (en) | 2012-08-29 |
KR20120093968A (ko) | 2012-08-23 |
ITTO20090793A1 (it) | 2011-04-22 |
EP2491169B1 (en) | 2015-03-25 |
CN102741461A (zh) | 2012-10-17 |
JP5694341B2 (ja) | 2015-04-01 |
WO2011048473A1 (en) | 2011-04-28 |
US20120297580A1 (en) | 2012-11-29 |
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