DE10195253T1 - Verfahren und Vorrichtung zur Verarbeitung von isolierenden Substraten - Google Patents

Verfahren und Vorrichtung zur Verarbeitung von isolierenden Substraten

Info

Publication number
DE10195253T1
DE10195253T1 DE10195253T DE10195253T DE10195253T1 DE 10195253 T1 DE10195253 T1 DE 10195253T1 DE 10195253 T DE10195253 T DE 10195253T DE 10195253 T DE10195253 T DE 10195253T DE 10195253 T1 DE10195253 T1 DE 10195253T1
Authority
DE
Germany
Prior art keywords
insulating substrates
processing insulating
processing
substrates
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10195253T
Other languages
English (en)
Inventor
Terry Bluck
Jun Xie
James H Rogers
Eric C Lawson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intevac Inc
Original Assignee
Intevac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intevac Inc filed Critical Intevac Inc
Publication of DE10195253T1 publication Critical patent/DE10195253T1/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/145—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Plasma Technology (AREA)
DE10195253T 2000-02-01 2001-01-23 Verfahren und Vorrichtung zur Verarbeitung von isolierenden Substraten Ceased DE10195253T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/495,545 US6228429B1 (en) 2000-02-01 2000-02-01 Methods and apparatus for processing insulating substrates
PCT/US2001/002441 WO2001056708A1 (en) 2000-02-01 2001-01-23 Methods and apparatus for processing insulating substrates

Publications (1)

Publication Number Publication Date
DE10195253T1 true DE10195253T1 (de) 2003-05-08

Family

ID=23969024

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10195253T Ceased DE10195253T1 (de) 2000-02-01 2001-01-23 Verfahren und Vorrichtung zur Verarbeitung von isolierenden Substraten

Country Status (7)

Country Link
US (1) US6228429B1 (de)
JP (1) JP2003521792A (de)
KR (1) KR100493875B1 (de)
CN (1) CN1179327C (de)
AU (1) AU2001232960A1 (de)
DE (1) DE10195253T1 (de)
WO (1) WO2001056708A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003016633A (ja) * 2001-06-28 2003-01-17 Asahi Glass Co Ltd 磁気ディスク用ガラス基板及びその製造方法
JP2006216216A (ja) * 2005-01-07 2006-08-17 Fujitsu Ltd 磁気ディスク、その製造方法および磁気記憶装置
US20060154111A1 (en) * 2005-01-07 2006-07-13 Fujitsu Limited Magnetic disk, manufacturing method therefor and magnetic recording device
JP4657959B2 (ja) * 2006-03-20 2011-03-23 ダブリュディ・メディア・シンガポール・プライベートリミテッド 成膜装置及び磁気ディスクの製造方法
JP4961157B2 (ja) * 2006-03-30 2012-06-27 ダブリュディ・メディア・シンガポール・プライベートリミテッド 成膜装置及び磁気ディスクの製造方法
JP4358905B2 (ja) 2007-12-26 2009-11-04 キヤノンアネルバ株式会社 基板ホルダー、基板ホルダーを用いた成膜方法、ハードディスクの製造方法、成膜装置、プログラム
US8089055B2 (en) * 2008-02-05 2012-01-03 Adam Alexander Brailove Ion beam processing apparatus
JPWO2009153856A1 (ja) * 2008-06-17 2011-11-24 キヤノンアネルバ株式会社 防着カバー付きキャリアおよび防着カバー着脱装置
CN101828259B (zh) * 2008-09-30 2012-06-27 佳能安内华股份有限公司 基板保持件收纳室
US8573579B2 (en) * 2010-03-01 2013-11-05 Seagate Technology Llc Biasing a pre-metalized non-conductive substrate
US8517364B1 (en) * 2010-10-07 2013-08-27 WD Media, LLC Disk holder with replaceable inserts to retain springs
US8746666B2 (en) 2011-05-05 2014-06-10 Varian Semiconductor Equipment Associates, Inc. Media carrier
KR20230048568A (ko) 2014-11-10 2023-04-11 브룩스 오토메이션 인코퍼레이티드 툴 자동-교시 방법 및 장치
CN107385408A (zh) * 2017-07-24 2017-11-24 京东方科技集团股份有限公司 膜厚测试装置及方法、蒸镀设备
CN112795896A (zh) * 2021-04-15 2021-05-14 苏州迈为科技股份有限公司 真空镀膜装置
US11664050B2 (en) 2021-10-05 2023-05-30 Western Digital Technologies, Inc. Tuned edge profile of a disk substrate for use in magnetic recording media

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5126971A (en) * 1989-12-22 1992-06-30 Magnex Corporation Thin film magnetic core memory and method of making same
JPH04361559A (ja) * 1991-06-10 1992-12-15 Ngk Spark Plug Co Ltd 集積回路用パッケージ
US5215420A (en) 1991-09-20 1993-06-01 Intevac, Inc. Substrate handling and processing system
US5563095A (en) * 1994-12-01 1996-10-08 Frey; Jeffrey Method for manufacturing semiconductor devices
US5543022A (en) * 1995-01-17 1996-08-06 Hmt Technology Corporation Disc-handling apparatus

Also Published As

Publication number Publication date
KR20020092361A (ko) 2002-12-11
JP2003521792A (ja) 2003-07-15
WO2001056708A1 (en) 2001-08-09
CN1179327C (zh) 2004-12-08
KR100493875B1 (ko) 2005-06-10
CN1396844A (zh) 2003-02-12
AU2001232960A1 (en) 2001-08-14
US6228429B1 (en) 2001-05-08

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