DE10124566A1 - Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür - Google Patents

Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür

Info

Publication number
DE10124566A1
DE10124566A1 DE10124566A DE10124566A DE10124566A1 DE 10124566 A1 DE10124566 A1 DE 10124566A1 DE 10124566 A DE10124566 A DE 10124566A DE 10124566 A DE10124566 A DE 10124566A DE 10124566 A1 DE10124566 A1 DE 10124566A1
Authority
DE
Germany
Prior art keywords
polarization
optical
imaging system
imaging
optical imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE10124566A
Other languages
German (de)
English (en)
Inventor
Michael Gerhard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss AG filed Critical Carl Zeiss AG
Priority to DE10124566A priority Critical patent/DE10124566A1/de
Priority to EP02008789A priority patent/EP1258780B1/de
Priority to DE50204916T priority patent/DE50204916D1/de
Priority to JP2002131456A priority patent/JP2003059821A/ja
Priority to KR1020020026332A priority patent/KR20020087353A/ko
Priority to US10/145,138 priority patent/US6774984B2/en
Priority to TW091110145A priority patent/TWI243966B/zh
Publication of DE10124566A1 publication Critical patent/DE10124566A1/de
Priority to US10/883,849 priority patent/US20040240073A1/en
Priority to US11/336,945 priority patent/US7199864B2/en
Priority to US11/707,041 priority patent/US20070139636A1/en
Priority to US12/099,533 priority patent/US7961298B2/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
DE10124566A 2001-05-15 2001-05-15 Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür Withdrawn DE10124566A1 (de)

Priority Applications (11)

Application Number Priority Date Filing Date Title
DE10124566A DE10124566A1 (de) 2001-05-15 2001-05-15 Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür
EP02008789A EP1258780B1 (de) 2001-05-15 2002-04-19 Optisches Abbildungssystem mit Polarisationsmitteln
DE50204916T DE50204916D1 (de) 2001-05-15 2002-04-19 Optisches Abbildungssystem mit Polarisationsmitteln
JP2002131456A JP2003059821A (ja) 2001-05-15 2002-05-07 偏光器を備えた光学結像システムと、それに使用する水晶板
KR1020020026332A KR20020087353A (ko) 2001-05-15 2002-05-14 편광자와 그 사용을 위한 수정판을 가지는 광학 이미지시스템
US10/145,138 US6774984B2 (en) 2001-05-15 2002-05-15 Optical imaging system with polarizer and a crystalline-quartz plate for use therewith
TW091110145A TWI243966B (en) 2001-05-15 2002-05-15 Optical imaging system with polarizers and a crystalline-quartz plate for use thereon
US10/883,849 US20040240073A1 (en) 2001-05-15 2004-07-06 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
US11/336,945 US7199864B2 (en) 2001-05-15 2006-01-23 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
US11/707,041 US20070139636A1 (en) 2001-05-15 2007-02-16 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system
US12/099,533 US7961298B2 (en) 2001-05-15 2008-04-08 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10124566A DE10124566A1 (de) 2001-05-15 2001-05-15 Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür

Publications (1)

Publication Number Publication Date
DE10124566A1 true DE10124566A1 (de) 2002-11-21

Family

ID=7685481

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10124566A Withdrawn DE10124566A1 (de) 2001-05-15 2001-05-15 Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür
DE50204916T Expired - Fee Related DE50204916D1 (de) 2001-05-15 2002-04-19 Optisches Abbildungssystem mit Polarisationsmitteln

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE50204916T Expired - Fee Related DE50204916D1 (de) 2001-05-15 2002-04-19 Optisches Abbildungssystem mit Polarisationsmitteln

Country Status (6)

Country Link
US (5) US6774984B2 (https=)
EP (1) EP1258780B1 (https=)
JP (1) JP2003059821A (https=)
KR (1) KR20020087353A (https=)
DE (2) DE10124566A1 (https=)
TW (1) TWI243966B (https=)

Cited By (4)

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DE102004037346A1 (de) * 2004-08-02 2006-03-16 Infineon Technologies Ag Lithographie-Anordnung und Verfahren zum Herstellen einer Lithographie-Anordnung
DE102011079548A1 (de) 2011-07-21 2012-07-19 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102012200368A1 (de) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102012212864A1 (de) 2012-07-23 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage

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US6417168B1 (en) 1998-03-04 2002-07-09 The Trustees Of The University Of Pennsylvania Compositions and methods of treating tumors
DE10124566A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür
DE10302765A1 (de) * 2003-01-24 2004-07-29 Carl Zeiss Smt Ag Optische Anordnung mit Linse aus einachsig doppelbrechendem Material
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
TWI385414B (zh) * 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
CN101799587B (zh) 2004-01-16 2012-05-30 卡尔蔡司Smt有限责任公司 光学系统、投影系统及微结构半导体部件的制造方法
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
JP4748015B2 (ja) * 2004-02-06 2011-08-17 株式会社ニコン 照明光学装置、露光装置、露光方法、およびマイクロデバイスの製造方法
CN101078812B (zh) * 2004-02-06 2013-11-27 株式会社尼康 偏光变换元件、光学照明装置、曝光装置以及曝光方法
JP4752702B2 (ja) * 2004-02-06 2011-08-17 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
WO2005091077A2 (de) * 2004-02-20 2005-09-29 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
US7304719B2 (en) * 2004-03-31 2007-12-04 Asml Holding N.V. Patterned grid element polarizer
EP1586946A3 (en) * 2004-04-14 2007-01-17 Carl Zeiss SMT AG Optical system of a microlithographic projection exposure apparatus
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
DE102005030543A1 (de) * 2004-07-08 2006-02-02 Carl Zeiss Smt Ag Polarisatoreinrichtung zur Erzeugung einer definierten Ortsverteilung von Polarisationszuständen
US7271874B2 (en) * 2004-11-02 2007-09-18 Asml Holding N.V. Method and apparatus for variable polarization control in a lithography system
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20140140648A (ko) 2005-05-12 2014-12-09 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2007258575A (ja) * 2006-03-24 2007-10-04 Canon Inc 照明装置、当該照明装置を有する露光装置及びデバイス製造方法
JP4827181B2 (ja) * 2006-08-29 2011-11-30 オリンパス株式会社 撮像装置
DE102007027985A1 (de) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102007031691A1 (de) 2007-07-06 2009-01-08 Carl Zeiss Smt Ag Verfahren zum Betreiben einer Mikrolithographischen Projektionsbelichtunganlagen
US7817250B2 (en) * 2007-07-18 2010-10-19 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
DE102008043321A1 (de) 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
US8284506B2 (en) 2008-10-21 2012-10-09 Gentex Corporation Apparatus and method for making and assembling a multi-lens optical device
JP6080349B2 (ja) * 2010-11-26 2017-02-15 キヤノン株式会社 光学部材および撮像装置
TWI758891B (zh) * 2020-09-30 2022-03-21 國立成功大學 濃度感測系統與方法

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US5365371A (en) * 1992-02-10 1994-11-15 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion

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US3719415A (en) * 1971-09-22 1973-03-06 Bell Telephone Labor Inc Radial and tangential polarizers
US5365371A (en) * 1992-02-10 1994-11-15 Mitsubishi Denki Kabushiki Kaisha Projection exposure apparatus
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004037346A1 (de) * 2004-08-02 2006-03-16 Infineon Technologies Ag Lithographie-Anordnung und Verfahren zum Herstellen einer Lithographie-Anordnung
DE102004037346B4 (de) * 2004-08-02 2006-11-23 Infineon Technologies Ag Lithographie-Anordnung und Verfahren zum Herstellen einer Lithographie-Anordnung
US7355679B2 (en) 2004-08-02 2008-04-08 Infineon Technologies Ag Lithography arrangement and procedure that produces a lithography
DE102011079548A1 (de) 2011-07-21 2012-07-19 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102012200368A1 (de) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
WO2013104744A1 (en) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
US9411245B2 (en) 2012-01-12 2016-08-09 Carl Zeiss Smt Gmbh Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
DE102012212864A1 (de) 2012-07-23 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
EP1258780A2 (de) 2002-11-20
DE50204916D1 (de) 2005-12-22
KR20020087353A (ko) 2002-11-22
JP2003059821A (ja) 2003-02-28
US20060119826A1 (en) 2006-06-08
TWI243966B (en) 2005-11-21
US7199864B2 (en) 2007-04-03
US20070139636A1 (en) 2007-06-21
US20020186462A1 (en) 2002-12-12
US7961298B2 (en) 2011-06-14
EP1258780B1 (de) 2005-11-16
US20040240073A1 (en) 2004-12-02
EP1258780A3 (de) 2004-02-04
US20080186469A1 (en) 2008-08-07
US6774984B2 (en) 2004-08-10

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