CN211149181U - 光掩模板贴膜压合用模具头及蒙贴装置 - Google Patents
光掩模板贴膜压合用模具头及蒙贴装置 Download PDFInfo
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- CN211149181U CN211149181U CN201922346890.2U CN201922346890U CN211149181U CN 211149181 U CN211149181 U CN 211149181U CN 201922346890 U CN201922346890 U CN 201922346890U CN 211149181 U CN211149181 U CN 211149181U
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- mask
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- 238000003825 pressing Methods 0.000 claims description 59
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- 238000000034 method Methods 0.000 abstract description 15
- 230000003287 optical effect Effects 0.000 description 12
- 230000005484 gravity Effects 0.000 description 10
- 239000000428 dust Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000003475 lamination Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
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- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
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- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
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- 238000005516 engineering process Methods 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
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- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
标号 | 名称 |
1 | 第一压力组件 |
11 | 第一压件 |
2 | 第二压力组件 |
21 | 第二压件 |
3 | 压板 |
4 | 掩模板保护膜支架 |
5 | 支撑件 |
6 | 掩模板保护膜 |
7 | 掩模板保护膜框架 |
8 | 光掩模板 |
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201922346890.2U CN211149181U (zh) | 2019-12-24 | 2019-12-24 | 光掩模板贴膜压合用模具头及蒙贴装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201922346890.2U CN211149181U (zh) | 2019-12-24 | 2019-12-24 | 光掩模板贴膜压合用模具头及蒙贴装置 |
Publications (1)
Publication Number | Publication Date |
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CN211149181U true CN211149181U (zh) | 2020-07-31 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201922346890.2U Active CN211149181U (zh) | 2019-12-24 | 2019-12-24 | 光掩模板贴膜压合用模具头及蒙贴装置 |
Country Status (1)
Country | Link |
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CN (1) | CN211149181U (zh) |
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2019
- 2019-12-24 CN CN201922346890.2U patent/CN211149181U/zh active Active
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Effective date of registration: 20240123 Address after: Room 6270, Sino German Ecological Park Innovation Center, No. 172 Taibai Mountain Road, Qingdao Area, Qingdao Free Trade Zone, Shandong Province, 266426 Patentee after: Qingfang Technology (Qingdao) Co.,Ltd. Country or region after: China Address before: 266555 4th floor, ICIC office building, 2877 Tuanjie Road, Zhongde ecological park, Huangdao District, Qingdao City, Shandong Province Patentee before: SIEN (QINGDAO) INTEGRATED CIRCUIT Co.,Ltd. Country or region before: China |
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Effective date of registration: 20240423 Address after: Room 6671, Sino German Ecological Park Innovation Center, No. 172 Taibai Mountain Road, Qingdao Area, Qingdao Free Trade Zone, Shandong Province, 266426 Patentee after: Qingdao Fangyi Technology Co.,Ltd. Country or region after: China Address before: Room 6270, Sino German Ecological Park Innovation Center, No. 172 Taibai Mountain Road, Qingdao Area, Qingdao Free Trade Zone, Shandong Province, 266426 Patentee before: Qingfang Technology (Qingdao) Co.,Ltd. Country or region before: China |