CN207800597U - 半导体装置 - Google Patents
半导体装置 Download PDFInfo
- Publication number
- CN207800597U CN207800597U CN201820270365.XU CN201820270365U CN207800597U CN 207800597 U CN207800597 U CN 207800597U CN 201820270365 U CN201820270365 U CN 201820270365U CN 207800597 U CN207800597 U CN 207800597U
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- wiring
- insulating film
- opening
- pad
- film
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
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- H—ELECTRICITY
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- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
- H10W20/427—Power or ground buses
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- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
- H10W20/43—Layouts of interconnections
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- H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
- H10W20/41—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their conductive parts
- H10W20/435—Cross-sectional shapes or dispositions of interconnections
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- H10W20/49—Adaptable interconnections, e.g. fuses or antifuses
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- H10W20/495—Capacitive arrangements or effects of, or between wiring layers
- H10W20/496—Capacitor integral with wiring layers
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- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
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- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
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- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
- H10W70/65—Shapes or dispositions of interconnections
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- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
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- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
- H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
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- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01221—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using local deposition
- H10W72/01223—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using local deposition in liquid form, e.g. by dispensing droplets or by screen printing
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- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01231—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition
- H10W72/01233—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating
- H10W72/01235—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps using blanket deposition in liquid form, e.g. spin coating, spray coating or immersion coating by plating, e.g. electroless plating or electroplating
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- H10W72/012—Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
- H10W72/01251—Changing the shapes of bumps
- H10W72/01257—Changing the shapes of bumps by reflowing
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- H10W72/01—Manufacture or treatment
- H10W72/019—Manufacture or treatment of bond pads
- H10W72/01951—Changing the shapes of bond pads
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- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
- H10W72/242—Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
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- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/241—Dispositions, e.g. layouts
- H10W72/244—Dispositions, e.g. layouts relative to underlying supporting features, e.g. bond pads, RDLs or vias
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- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/251—Materials
- H10W72/252—Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
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- H10W72/00—Interconnections or connectors in packages
- H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
- H10W72/29—Bond pads specially adapted therefor
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- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/321—Structures or relative sizes of die-attach connectors
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- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
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- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
- H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
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- H10W72/941—Dispositions of bond pads
- H10W72/942—Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
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- H10W72/951—Materials of bond pads
- H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
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- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
- H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
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- H—ELECTRICITY
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- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-035049 | 2017-02-27 | ||
| JP2017035049A JP6836418B2 (ja) | 2017-02-27 | 2017-02-27 | 半導体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207800597U true CN207800597U (zh) | 2018-08-31 |
Family
ID=63246992
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820270365.XU Active CN207800597U (zh) | 2017-02-27 | 2018-02-26 | 半导体装置 |
| CN201810158631.4A Active CN108511410B (zh) | 2017-02-27 | 2018-02-26 | 半导体装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810158631.4A Active CN108511410B (zh) | 2017-02-27 | 2018-02-26 | 半导体装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10297547B2 (https=) |
| JP (1) | JP6836418B2 (https=) |
| CN (2) | CN207800597U (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108511410A (zh) * | 2017-02-27 | 2018-09-07 | 瑞萨电子株式会社 | 半导体装置 |
| CN111445935A (zh) * | 2019-01-16 | 2020-07-24 | 爱思开海力士有限公司 | 半导体装置 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE112018002118T5 (de) * | 2017-09-19 | 2020-01-02 | Murata Manufacturing Co., Ltd. | Kondensator |
| US20210020455A1 (en) * | 2019-07-17 | 2021-01-21 | Nanya Technology Corporation | Conductive via structure |
| CN115714161A (zh) * | 2022-02-25 | 2023-02-24 | 友达光电股份有限公司 | 用于显示装置的电路板结构 |
| US12399210B2 (en) * | 2023-03-31 | 2025-08-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer test pad |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2838933B2 (ja) | 1991-01-22 | 1998-12-16 | 日本電気株式会社 | 樹脂封止型半導体集積回路 |
| JP3416545B2 (ja) | 1998-12-10 | 2003-06-16 | 三洋電機株式会社 | チップサイズパッケージ及びその製造方法 |
| JP2003264256A (ja) | 2002-03-08 | 2003-09-19 | Hitachi Ltd | 半導体装置 |
| US7241636B2 (en) * | 2005-01-11 | 2007-07-10 | Freescale Semiconductor, Inc. | Method and apparatus for providing structural support for interconnect pad while allowing signal conductance |
| US9653396B2 (en) * | 2013-03-25 | 2017-05-16 | Renesas Electronics Corporation | Semiconductor device and method of manufacturing the same |
| JP6836418B2 (ja) * | 2017-02-27 | 2021-03-03 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
-
2017
- 2017-02-27 JP JP2017035049A patent/JP6836418B2/ja active Active
-
2018
- 2018-01-03 US US15/861,261 patent/US10297547B2/en active Active
- 2018-02-26 CN CN201820270365.XU patent/CN207800597U/zh active Active
- 2018-02-26 CN CN201810158631.4A patent/CN108511410B/zh active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108511410A (zh) * | 2017-02-27 | 2018-09-07 | 瑞萨电子株式会社 | 半导体装置 |
| CN108511410B (zh) * | 2017-02-27 | 2025-07-01 | 瑞萨电子株式会社 | 半导体装置 |
| CN111445935A (zh) * | 2019-01-16 | 2020-07-24 | 爱思开海力士有限公司 | 半导体装置 |
| CN111445935B (zh) * | 2019-01-16 | 2023-04-11 | 爱思开海力士有限公司 | 半导体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018142586A (ja) | 2018-09-13 |
| JP6836418B2 (ja) | 2021-03-03 |
| US20180247893A1 (en) | 2018-08-30 |
| CN108511410B (zh) | 2025-07-01 |
| CN108511410A (zh) | 2018-09-07 |
| US10297547B2 (en) | 2019-05-21 |
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