CN205959992U - Heterojunction solar cell - Google Patents

Heterojunction solar cell Download PDF

Info

Publication number
CN205959992U
CN205959992U CN201620919526.4U CN201620919526U CN205959992U CN 205959992 U CN205959992 U CN 205959992U CN 201620919526 U CN201620919526 U CN 201620919526U CN 205959992 U CN205959992 U CN 205959992U
Authority
CN
China
Prior art keywords
film layer
amorphous silicon
thin film
layer
establish
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201620919526.4U
Other languages
Chinese (zh)
Inventor
杨与胜
王树林
张超华
庄辉虎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Goldstone Fujian Energy Co Ltd
Original Assignee
Goldstone Fujian Energy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Goldstone Fujian Energy Co Ltd filed Critical Goldstone Fujian Energy Co Ltd
Priority to CN201620919526.4U priority Critical patent/CN205959992U/en
Application granted granted Critical
Publication of CN205959992U publication Critical patent/CN205959992U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

The utility model discloses a heterojunction solar cell, it includes: N type monocrystalline silicon piece, establish on the positive first intrinsic amorphous silicon thin film layer of n type monocrystalline silicon piece, establish the first doping amorphous silicon thin film layer on first intrinsic amorphous silicon thin film layer, establish the first transparent conduction film layer on an amorphous -silicon -doped thin film layer, establish electrode before the metal gate line on first transparent conduction film layer, establish the second intrinsic amorphous silicon thin film layer at the n type monocrystalline silicon piece back, establish the second doping amorphous silicon thin film layer on second intrinsic amorphous silicon thin film layer, establish the 2nd conduction film layer on the 2nd amorphous -silicon -doped thin film layer, establish the two -sided conductive metal foil belt layer on the 2nd conduction film layer. Resistance is low, with low costs through adopting for its back electrode, high reflectivity's two -sided conductive metal foil belt replaces dear low temperature silver thick liquid grid line and as the battery back electrode, has reduced battery electrode manufacturing cost by a wide margin, promotes battery conversion efficiency.

Description

A kind of heterojunction solar battery
Technical field
This utility model is related to area of solar cell, more particularly, to a kind of heterojunction solar battery.
Background technology
Solaode is a kind of semiconductor device that can convert solar energy into electric energy, solar-electricity under illumination condition Photogenerated current can be produced inside pond, by electrode, electric energy be exported.In recent years, manufacture of solar cells technology constantly improves, raw Produce cost constantly to reduce, conversion efficiency improves constantly, the application of solar cell power generation is increasingly extensive and becomes supply of electric power Important energy source.
Heterojunction solar battery is the new and effective battery technology of one of which, and it combines monocrystaline silicon solar cell With the advantage of non-crystal silicon solar cell, there is the features such as preparation technology temperature is low, conversion efficiency is higher, hot properties is good, therefore There is very big market potential.
Existing heterojunction solar battery basic structure is as follows:Intrinsic non-in one layer of N-shaped monocrystalline silicon piece front and back deposition Crystal silicon layer;Intrinsic amorphous silicon layer surface at positive back side depositing p-type amorphous silicon layer and N-shaped amorphous silicon layer respectively;In battery just Backside deposition nesa coating;Make silver-colored gate electrode in battery both sides, whole preparation process is all to enter at less than 220 DEG C Row.
Can be seen that heterojunction solar battery preparation process from existing heterojunction solar battery basic structure all to exist Carry out under 220 degree, typically adopt low temperature silver paste as gate line electrode in the market, low temperature silver paste is used with current crystal silicon battery The contrast of high temperature silver paste, printing width is wider, and consumption is bigger, and the market price is very expensive, the silver that in addition cell backside adopts Slurry consumption is typically 2~3 times of front, and therefore back side silver paste grid line is added significantly to the production cost of battery.
Utility model content
The purpose of this utility model is to overcome defect of the prior art, provides a kind of efficient heterojunction solar electricity Pond is so as to have the characteristics that low cost, high conversion efficiency.
For achieving the above object, this utility model adopts following design:A kind of heterojunction solar battery, including:n Type monocrystalline silicon piece;It is located at the first intrinsic amorphous silicon film layer in N-shaped monocrystalline silicon piece front;It is located at first intrinsic amorphous silicon film layer On the first doped amorphous silicon film layer;It is located at the first transparent conductive film layer on the first doped amorphous silicon film layer;It is located at Electrode before metal grid lines in first transparent conductive film layer;It is located at the second intrinsic amorphous silicon thin film at the N-shaped monocrystalline silicon piece back side Layer;It is located at the second doped amorphous silicon film layer on the second intrinsic amorphous silicon thin layer;It is located at the second doped amorphous silicon film layer On the second conductive membrane layer;It is located at the double-side conductive metal foil adhesive tape layer on the second conductive membrane layer.
Preferably, when described first doped amorphous silicon film layer is N-shaped amorphous thin Film layers, described second doped amorphous silicon Thin layer is then p-type amorphous thin Film layers;When described first doped amorphous silicon film layer is p-type amorphous thin Film layers, described the Two doped amorphous silicon film layers are then N-shaped amorphous thin Film layers.
Preferably, the thickness of described first transparent conductive film layer be 0.1~150nm, the thickness of the second conductive membrane layer For 0.1~800nm, described first intrinsic amorphous silicon film thickness degree is 4~10nm, N-shaped amorphous thin Film layers thickness is 4~ 10nm, the second intrinsic amorphous silicon thin film layer thickness are 4~10nm, and p-type amorphous thin Film layers thickness is 5~15nm.
Preferably, described double-side conductive metal foil adhesive tape is aluminum foil and adhesive tape, copper foil tape or tin plating copper foil tape.
Preferably, described double-side conductive metal foil adhesive tape one-side band glue, its glue-line is conductive adhesive layer.
Preferably, the thickness of described double-side conductive metal is 10~500um.
Preferably, the sheet resistance of described double-side conductive metal foil adhesive tape metal covering is less than 0.02 Ω/.
Preferably, before described metal grid lines, the pattern of electrode is many main grids pattern gate line electrode or transverse and longitudinal intersection is latticed Dereliction gate pattern gate line electrode.
This utility model adopts above design, and backplate is passed through low, low cost, high reflectance double using resistance Face conducting metal foil belt substitutes expensive low temperature silver paste grid line as cell backside electrode, significantly reduces battery electrode and produces Cost, significantly reduces cell series resistance, increased the reflected light of cell backside light, thus improve the fill factor, curve factor of battery And short circuit current, and then lifting battery conversion efficiency, this utility model technological process of production is simple simultaneously, simple operation, very Suitable high-volume automated production.
Brief description
The accompanying drawing constituting the part of the application is used for providing further understanding to of the present utility model, this reality
It is used for explaining this utility model with new schematic description and description, do not constitute new to this practicality
The improper restriction of type.In the accompanying drawings:
Fig. 1 is a kind of structural representation of heterojunction solar battery of this utility model;
Fig. 2 is the schematic diagram of electrode many main grids pattern before this utility model metal grid lines;
Fig. 3 is the schematic diagram of electrode dereliction gate pattern before this utility model metal grid lines.
Specific embodiment
The purpose of this utility model is to provide a kind of heterojunction solar battery, and it optimizes cell backside electrode, greatly Width reduces production cost, improves battery performance.
Embodiment 1
As shown in figure 1, this utility model provides a kind of heterojunction solar battery, it includes:N-shaped monocrystalline silicon piece 1, if In the first intrinsic amorphous silicon film layer 2 in N-shaped monocrystalline silicon piece 1 front, first being located on first intrinsic amorphous silicon film layer 2 is mixed Miscellaneous amorphous thin Film layers 4, are located at the first transparent conductive film layer 6 on the first doped amorphous silicon film layer 4, are located at first transparent Electrode 8 before metal grid lines on conductive membrane layer 6;It is located at the second intrinsic amorphous silicon thin layer 3 at N-shaped monocrystalline silicon piece 1 back side;If The second doped amorphous silicon film layer 5 on the second intrinsic amorphous silicon thin layer 3, is located on the second doped amorphous silicon film layer 5 The second conductive membrane layer 7, be located at the double-side conductive metal foil adhesive tape layer 9 on the second conductive membrane layer 7.
Wherein, when described first doped amorphous silicon film layer 4 is N-shaped amorphous thin Film layers, described second doped amorphous silicon Thin layer 5 is then p-type amorphous thin Film layers;When described first doped amorphous silicon film layer 4 is p-type amorphous thin Film layers, described Second doped amorphous silicon film layer 5 is then N-shaped amorphous thin Film layers.Described first transparent conductive film layer 6 is tin indium oxide, mixes At least one in aluminum zinc oxide, Graphene.Described second conductive membrane layer 7 is tin indium oxide, Al-Doped ZnO, Graphene, At least one in CU, AG, AL, nickel alloy, TI.Described first transparent conductive film layer 6, the second conductive membrane layer 7 are with thing The mode of physical vapor deposition is formed.The thickness of described first transparent conductive film layer 6 is 0.1~150nm, the second conductive membrane layer 7 thickness is 0.1~800nm.
Described double-side conductive metal foil adhesive tape 9 is monoblock or does hollow processing.Described double-side conductive metal foil adhesive tape 9 is adopted Paste formation with the mode rolling or be laminated.Described double-side conductive metal foil adhesive tape 9 is aluminum foil and adhesive tape, copper foil tape, tin-coated copper One of which in foil belt.Described double-side conductive metal foil adhesive tape 9 is one-side band glue, and glue-line is conductive adhesive layer.Described double Face conducting metal foil belt 9 thickness is 5~500um.The sheet resistance of described double-side conductive metal foil adhesive tape 9 metal covering is less than 0.02 Ω/□.
Described first intrinsic amorphous silicon film thickness degree is 4~10nm, and N-shaped amorphous thin Film layers thickness is 4~10nm, the Two intrinsic amorphous silicon thin film layer thickness are 4~10nm, and p-type amorphous thin Film layers thickness is 5~15nm.Described first intrinsic amorphous Silicon membrane layer, N-shaped amorphous thin Film layers, the second intrinsic amorphous silicon thin layer, p-type amorphous thin Film layers are with plasmaassisted The mode of type chemical vapor deposition is formed.
As shown in Fig. 2 the pattern of electrode 8 is many main grids pattern gate line electrode before described metal grid lines.
Embodiment 2
As shown in figure 3, as different from Example 1, in the present embodiment, before described metal grid lines, the pattern of electrode 8 is horizontal stroke Crossed longitudinally latticed dereliction gate pattern gate line electrode.
In this utility model, cell backside adopts that resistance is low, low cost, high reflectance double-side conductive metal foil adhesive tape Substitute expensive low temperature silver paste grid line as cell backside electrode, significantly reduce battery electrode production cost, significantly reduce Cell series resistance, increased the reflected light of cell backside, thus improve fill factor, curve factor and the short circuit current of battery, Jin Erti Rise battery conversion efficiency, this utility model technological process of production is simple, simple operation simultaneously, be especially suitable for high-volume metaplasia automatically Produce.
The foregoing is only preferred embodiment of the present utility model, not in order to limit this utility model, all this Any modification, equivalent and improvement made within the spirit of utility model and principle etc., should be included in this utility model Protection domain within.

Claims (8)

1. a kind of heterojunction solar battery is it is characterised in that include:
N-shaped monocrystalline silicon piece;
It is located at the first intrinsic amorphous silicon film layer in N-shaped monocrystalline silicon piece front;
It is located at the first doped amorphous silicon film layer on first intrinsic amorphous silicon film layer;
It is located at the first transparent conductive film layer on the first doped amorphous silicon film layer;
It is located at electrode before the metal grid lines in the first transparent conductive film layer;
It is located at the second intrinsic amorphous silicon thin layer at the N-shaped monocrystalline silicon piece back side;
It is located at the second doped amorphous silicon film layer on the second intrinsic amorphous silicon thin layer;
It is located at the second conductive membrane layer on the second doped amorphous silicon film layer;
It is located at the double-side conductive metal foil adhesive tape layer on the second conductive membrane layer.
2. solaode according to claim 1 it is characterised in that:Described first doped amorphous silicon film layer is N-shaped During amorphous thin Film layers, described second doped amorphous silicon film layer is then p-type amorphous thin Film layers;Described first doped amorphous silicon When thin layer is p-type amorphous thin Film layers, described second doped amorphous silicon film layer is then N-shaped amorphous thin Film layers.
3. solaode according to claim 1 it is characterised in that:The thickness of described first transparent conductive film layer is 0.1~150nm, the second conductive membrane layer thickness be 0.1~800nm, described first intrinsic amorphous silicon film thickness degree be 4~ 10nm, N-shaped amorphous thin Film layers thickness is 4~10nm, the second intrinsic amorphous silicon thin film layer thickness is 4~10nm, p-type non-crystalline silicon Thin film layer thickness is 5~15nm.
4. solaode according to claim 1 it is characterised in that:Described double-side conductive metal foil adhesive tape is aluminium foil glue Band, copper foil tape or tin plating copper foil tape.
5. solaode according to claim 1 it is characterised in that:Described double-side conductive metal foil adhesive tape one-side band Glue, its glue-line is conductive adhesive layer.
6. solaode according to claim 1 it is characterised in that:The thickness of described double-side conductive metal be 10~ 500um.
7. solaode according to claim 1 it is characterised in that:Described double-side conductive metal foil adhesive tape metal covering Sheet resistance is less than 0.02 Ω/.
8. solaode according to claim 1 it is characterised in that:Before described metal grid lines, the pattern of electrode is to lead more Gate pattern gate line electrode or transverse and longitudinal intersect latticed dereliction gate pattern gate line electrode.
CN201620919526.4U 2016-08-23 2016-08-23 Heterojunction solar cell Active CN205959992U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620919526.4U CN205959992U (en) 2016-08-23 2016-08-23 Heterojunction solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620919526.4U CN205959992U (en) 2016-08-23 2016-08-23 Heterojunction solar cell

Publications (1)

Publication Number Publication Date
CN205959992U true CN205959992U (en) 2017-02-15

Family

ID=57976642

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620919526.4U Active CN205959992U (en) 2016-08-23 2016-08-23 Heterojunction solar cell

Country Status (1)

Country Link
CN (1) CN205959992U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114530525A (en) * 2022-01-27 2022-05-24 江苏日托光伏科技股份有限公司 Preparation method and application of non-silver metallized structure
CN114843373A (en) * 2022-01-27 2022-08-02 江苏日托光伏科技股份有限公司 Preparation method of HTJ battery

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114530525A (en) * 2022-01-27 2022-05-24 江苏日托光伏科技股份有限公司 Preparation method and application of non-silver metallized structure
CN114843373A (en) * 2022-01-27 2022-08-02 江苏日托光伏科技股份有限公司 Preparation method of HTJ battery

Similar Documents

Publication Publication Date Title
CN205863192U (en) A kind of silicon based hetero-junction solaode using double TCO film layer
CN106601855A (en) Preparation method of double-side power generation heterojunction solar cell
CN205231076U (en) Heterojunction solar cell
CN206098402U (en) Heterojunction solar cell and module thereof
CN101447518A (en) Ant-apex contact heterojunction solar battery and preparation method thereof
CN207409506U (en) A kind of band intrinsic sheet hetero-junction solar cell of generating electricity on two sides
CN208548372U (en) A kind of double-junction solar battery
CN103426943A (en) Laminated structure of copper-zinc-tin-sulfur film solar cell and preparation method thereof
WO2020237697A1 (en) Thin film photovoltaic cell series structure and preparation process for thin film photovoltaic cell series connection
CN203503678U (en) HIT solar cell
CN111129179A (en) Heterojunction battery and preparation method thereof
CN201936901U (en) Composition structure of thin-film solar battery
CN205960004U (en) High -efficient heterojunction solar cell
CN205959992U (en) Heterojunction solar cell
CN108615775B (en) Interdigital back contact heterojunction monocrystalline silicon battery
CN201051503Y (en) Single-side electrode solar battery
CN201323204Y (en) Antapex contact heterojunction solar battery
CN205960005U (en) Heterojunction solar cell
CN103367514B (en) A kind of arcuate bottom electrode film solar cell
CN205645828U (en) Heterojunction solar cell
CN103227228A (en) P-type silicon substrate heterojunction cell
CN206098421U (en) Heterojunction solar cell and module thereof
CN206460967U (en) A kind of cadmium telluride diaphragm solar battery
CN207602581U (en) A kind of heterojunction solar battery
CN206194749U (en) Silicon heterojunction solar cell and photovoltaic module

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant