CN1945338B - 对样品进行显微处理的组合设备工具 - Google Patents

对样品进行显微处理的组合设备工具 Download PDF

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Publication number
CN1945338B
CN1945338B CN200610143158.XA CN200610143158A CN1945338B CN 1945338 B CN1945338 B CN 1945338B CN 200610143158 A CN200610143158 A CN 200610143158A CN 1945338 B CN1945338 B CN 1945338B
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CN
China
Prior art keywords
sample
instrument
vacuum
perform region
instruments
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200610143158.XA
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English (en)
Chinese (zh)
Other versions
CN1945338A (zh
Inventor
B·比杰斯
M·T·穆维塞
B·J·M·波曼斯
H·N·斯凌格兰
H·G·塔派尔
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FEI Co
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FEI Co
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Publication of CN1945338A publication Critical patent/CN1945338A/zh
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Publication of CN1945338B publication Critical patent/CN1945338B/zh
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202Movement
    • H01J2237/20214Rotation

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN200610143158.XA 2005-09-28 2006-09-28 对样品进行显微处理的组合设备工具 Expired - Fee Related CN1945338B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/237,475 US7301157B2 (en) 2005-09-28 2005-09-28 Cluster tool for microscopic processing of samples
US11/237475 2005-09-28
US11/237,475 2005-09-28

Publications (2)

Publication Number Publication Date
CN1945338A CN1945338A (zh) 2007-04-11
CN1945338B true CN1945338B (zh) 2014-06-04

Family

ID=37692515

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200610143158.XA Expired - Fee Related CN1945338B (zh) 2005-09-28 2006-09-28 对样品进行显微处理的组合设备工具

Country Status (4)

Country Link
US (1) US7301157B2 (enExample)
EP (1) EP1770751B1 (enExample)
JP (1) JP5046365B2 (enExample)
CN (1) CN1945338B (enExample)

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EP1816668A2 (en) * 2006-02-01 2007-08-08 FEI Company Particle-optical apparatus with a predetermined final vacuum pressure
CN101461026B (zh) 2006-06-07 2012-01-18 Fei公司 与包含真空室的装置一起使用的滑动轴承
ATE512457T1 (de) 2006-06-07 2011-06-15 Fei Co Gleitlager zur verwendung mit einer eine vakuumkammer umfassenden vorrichtung
US9040942B1 (en) * 2008-01-11 2015-05-26 Kla-Tencor Corporation Electron beam lithography with linear column array and rotary stage
CN102519996B (zh) * 2011-11-18 2014-05-07 烟台东方分析仪器有限公司 X射线荧光光谱仪自动送样装置
KR101214985B1 (ko) * 2011-11-21 2012-12-24 한국기초과학지원연구원 Tem 관찰용 그리드 시료 로딩보조기구
US10121637B2 (en) * 2013-03-13 2018-11-06 Taiwan Semiconductor Manufacturing Co., Ltd. Multi-platen ion implanter and method for implanting multiple substrates simultaneously
EP2919325B1 (de) 2014-03-11 2017-02-22 Nexans Endenabschluß für ein supraleitfähiges elektrisches Kabel
CN105115926A (zh) * 2015-08-12 2015-12-02 苏州优谱德精密仪器科技有限公司 一种化工原料转盘式检测装置
JP6522764B2 (ja) * 2015-08-21 2019-05-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置および試料ステージのアライメント調整方法
TWI600890B (zh) * 2016-03-01 2017-10-01 閤康生物科技股份有限公司 穿透式電子顯微鏡的樣品固定治具及其操作方法
CN106872246B (zh) * 2017-01-19 2019-06-21 中国石油大学(北京) 一种用于裂变径迹化学蚀刻的设备及方法
CN109406829B (zh) * 2017-08-17 2021-02-19 中国科学院物理研究所 扫描探针显微镜的扫描头
DE102018203096B9 (de) * 2018-03-01 2020-02-27 Carl Zeiss Microscopy Gmbh Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens
US11183365B2 (en) * 2019-04-16 2021-11-23 Axcelis Technologies, Inc. Multiple arc chamber source
US10998209B2 (en) 2019-05-31 2021-05-04 Applied Materials, Inc. Substrate processing platforms including multiple processing chambers
CN110993475B (zh) * 2019-12-05 2020-08-28 山东省分析测试中心 一种用于断口分析的扫描电镜万向转动样品台及扫描电镜
CN111724338B (zh) * 2020-03-05 2023-04-18 中冶赛迪信息技术(重庆)有限公司 一种转盘异常识别方法、系统、电子设备及介质

Citations (3)

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US4162391A (en) * 1977-12-19 1979-07-24 Sciaky Bros., Inc. Sliding vacuum seal means
US5852298A (en) * 1995-03-30 1998-12-22 Ebara Corporation Micro-processing apparatus and method therefor
CN1672234A (zh) * 2002-07-29 2005-09-21 艾克塞利斯技术公司 用于离子束注入机的可调注入角的工件支撑结构

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NL89188C (enExample) * 1948-10-01
JPS5523746Y2 (enExample) 1976-02-05 1980-06-06
US5103102A (en) 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
JPH067094B2 (ja) * 1989-12-18 1994-01-26 株式会社島津製作所 蛍光x線分析装置
JPH0596467A (ja) * 1991-10-02 1993-04-20 Seiko Epson Corp 断面研磨用試料台および断面研磨用重石
JPH07208964A (ja) * 1994-01-13 1995-08-11 Fujitsu Ltd 回路パターン検査装置及び方法並びにこの方法に適した回路パターン配置
JPH08273572A (ja) * 1995-03-30 1996-10-18 Jeol Ltd 試料搬送装置
JPH08267257A (ja) * 1995-03-30 1996-10-15 Ebara Corp 微細被加工物の作業装置及び作業方法
US5608224A (en) * 1995-08-15 1997-03-04 Alvord; C. William Target changer for an accelerator
JPH11304699A (ja) * 1998-04-16 1999-11-05 Kett Electric Lab 近赤外成分分析装置
JP3855517B2 (ja) * 1999-01-27 2006-12-13 東ソー株式会社 多サンプル対応のスキャナー型蛍光検出装置
JP3652912B2 (ja) * 1999-03-08 2005-05-25 日本電子株式会社 欠陥検査装置
JP3597729B2 (ja) * 1999-05-11 2004-12-08 日立ソフトウエアエンジニアリング株式会社 蛍光測光方法及び蛍光測光装置
JP3886777B2 (ja) * 2001-11-02 2007-02-28 日本電子株式会社 電子線照射装置および方法
US6710354B1 (en) 2001-12-11 2004-03-23 Kla-Tencor Corporation Scanning electron microscope architecture and related material handling system
JP4427271B2 (ja) * 2003-04-30 2010-03-03 株式会社神戸製鋼所 アルミナ保護膜およびその製造方法
US6872955B1 (en) * 2003-12-04 2005-03-29 International Business Machines Corporation SEM sample holder apparatus for implementing enhanced examination of multiple samples
US20050173380A1 (en) * 2004-02-09 2005-08-11 Carbone Frank L. Directed energy net shape method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162391A (en) * 1977-12-19 1979-07-24 Sciaky Bros., Inc. Sliding vacuum seal means
US5852298A (en) * 1995-03-30 1998-12-22 Ebara Corporation Micro-processing apparatus and method therefor
CN1672234A (zh) * 2002-07-29 2005-09-21 艾克塞利斯技术公司 用于离子束注入机的可调注入角的工件支撑结构

Also Published As

Publication number Publication date
EP1770751A2 (en) 2007-04-04
JP5046365B2 (ja) 2012-10-10
US20070080291A1 (en) 2007-04-12
CN1945338A (zh) 2007-04-11
JP2007093599A (ja) 2007-04-12
EP1770751A3 (en) 2011-08-17
EP1770751B1 (en) 2015-11-18
US7301157B2 (en) 2007-11-27

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Granted publication date: 20140604

Termination date: 20190928