CN1945338B - 对样品进行显微处理的组合设备工具 - Google Patents
对样品进行显微处理的组合设备工具 Download PDFInfo
- Publication number
- CN1945338B CN1945338B CN200610143158.XA CN200610143158A CN1945338B CN 1945338 B CN1945338 B CN 1945338B CN 200610143158 A CN200610143158 A CN 200610143158A CN 1945338 B CN1945338 B CN 1945338B
- Authority
- CN
- China
- Prior art keywords
- sample
- instrument
- vacuum
- perform region
- instruments
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012545 processing Methods 0.000 title claims abstract description 30
- 239000000523 sample Substances 0.000 claims description 192
- 238000000034 method Methods 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 11
- 238000007514 turning Methods 0.000 claims description 4
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims 5
- 238000011282 treatment Methods 0.000 description 10
- 238000005498 polishing Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 238000002389 environmental scanning electron microscopy Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- -1 and in step 432 Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000005007 materials handling Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20214—Rotation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/237,475 US7301157B2 (en) | 2005-09-28 | 2005-09-28 | Cluster tool for microscopic processing of samples |
| US11/237475 | 2005-09-28 | ||
| US11/237,475 | 2005-09-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1945338A CN1945338A (zh) | 2007-04-11 |
| CN1945338B true CN1945338B (zh) | 2014-06-04 |
Family
ID=37692515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200610143158.XA Expired - Fee Related CN1945338B (zh) | 2005-09-28 | 2006-09-28 | 对样品进行显微处理的组合设备工具 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7301157B2 (enExample) |
| EP (1) | EP1770751B1 (enExample) |
| JP (1) | JP5046365B2 (enExample) |
| CN (1) | CN1945338B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1816668A2 (en) * | 2006-02-01 | 2007-08-08 | FEI Company | Particle-optical apparatus with a predetermined final vacuum pressure |
| CN101461026B (zh) | 2006-06-07 | 2012-01-18 | Fei公司 | 与包含真空室的装置一起使用的滑动轴承 |
| ATE512457T1 (de) | 2006-06-07 | 2011-06-15 | Fei Co | Gleitlager zur verwendung mit einer eine vakuumkammer umfassenden vorrichtung |
| US9040942B1 (en) * | 2008-01-11 | 2015-05-26 | Kla-Tencor Corporation | Electron beam lithography with linear column array and rotary stage |
| CN102519996B (zh) * | 2011-11-18 | 2014-05-07 | 烟台东方分析仪器有限公司 | X射线荧光光谱仪自动送样装置 |
| KR101214985B1 (ko) * | 2011-11-21 | 2012-12-24 | 한국기초과학지원연구원 | Tem 관찰용 그리드 시료 로딩보조기구 |
| US10121637B2 (en) * | 2013-03-13 | 2018-11-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multi-platen ion implanter and method for implanting multiple substrates simultaneously |
| EP2919325B1 (de) | 2014-03-11 | 2017-02-22 | Nexans | Endenabschluß für ein supraleitfähiges elektrisches Kabel |
| CN105115926A (zh) * | 2015-08-12 | 2015-12-02 | 苏州优谱德精密仪器科技有限公司 | 一种化工原料转盘式检测装置 |
| JP6522764B2 (ja) * | 2015-08-21 | 2019-05-29 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および試料ステージのアライメント調整方法 |
| TWI600890B (zh) * | 2016-03-01 | 2017-10-01 | 閤康生物科技股份有限公司 | 穿透式電子顯微鏡的樣品固定治具及其操作方法 |
| CN106872246B (zh) * | 2017-01-19 | 2019-06-21 | 中国石油大学(北京) | 一种用于裂变径迹化学蚀刻的设备及方法 |
| CN109406829B (zh) * | 2017-08-17 | 2021-02-19 | 中国科学院物理研究所 | 扫描探针显微镜的扫描头 |
| DE102018203096B9 (de) * | 2018-03-01 | 2020-02-27 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Drucksystems für eine Vorrichtung zum Abbilden, Analysieren und/oder Bearbeiten eines Objekts und Vorrichtung zum Ausführen des Verfahrens |
| US11183365B2 (en) * | 2019-04-16 | 2021-11-23 | Axcelis Technologies, Inc. | Multiple arc chamber source |
| US10998209B2 (en) | 2019-05-31 | 2021-05-04 | Applied Materials, Inc. | Substrate processing platforms including multiple processing chambers |
| CN110993475B (zh) * | 2019-12-05 | 2020-08-28 | 山东省分析测试中心 | 一种用于断口分析的扫描电镜万向转动样品台及扫描电镜 |
| CN111724338B (zh) * | 2020-03-05 | 2023-04-18 | 中冶赛迪信息技术(重庆)有限公司 | 一种转盘异常识别方法、系统、电子设备及介质 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4162391A (en) * | 1977-12-19 | 1979-07-24 | Sciaky Bros., Inc. | Sliding vacuum seal means |
| US5852298A (en) * | 1995-03-30 | 1998-12-22 | Ebara Corporation | Micro-processing apparatus and method therefor |
| CN1672234A (zh) * | 2002-07-29 | 2005-09-21 | 艾克塞利斯技术公司 | 用于离子束注入机的可调注入角的工件支撑结构 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL89188C (enExample) * | 1948-10-01 | |||
| JPS5523746Y2 (enExample) | 1976-02-05 | 1980-06-06 | ||
| US5103102A (en) | 1989-02-24 | 1992-04-07 | Micrion Corporation | Localized vacuum apparatus and method |
| JPH067094B2 (ja) * | 1989-12-18 | 1994-01-26 | 株式会社島津製作所 | 蛍光x線分析装置 |
| JPH0596467A (ja) * | 1991-10-02 | 1993-04-20 | Seiko Epson Corp | 断面研磨用試料台および断面研磨用重石 |
| JPH07208964A (ja) * | 1994-01-13 | 1995-08-11 | Fujitsu Ltd | 回路パターン検査装置及び方法並びにこの方法に適した回路パターン配置 |
| JPH08273572A (ja) * | 1995-03-30 | 1996-10-18 | Jeol Ltd | 試料搬送装置 |
| JPH08267257A (ja) * | 1995-03-30 | 1996-10-15 | Ebara Corp | 微細被加工物の作業装置及び作業方法 |
| US5608224A (en) * | 1995-08-15 | 1997-03-04 | Alvord; C. William | Target changer for an accelerator |
| JPH11304699A (ja) * | 1998-04-16 | 1999-11-05 | Kett Electric Lab | 近赤外成分分析装置 |
| JP3855517B2 (ja) * | 1999-01-27 | 2006-12-13 | 東ソー株式会社 | 多サンプル対応のスキャナー型蛍光検出装置 |
| JP3652912B2 (ja) * | 1999-03-08 | 2005-05-25 | 日本電子株式会社 | 欠陥検査装置 |
| JP3597729B2 (ja) * | 1999-05-11 | 2004-12-08 | 日立ソフトウエアエンジニアリング株式会社 | 蛍光測光方法及び蛍光測光装置 |
| JP3886777B2 (ja) * | 2001-11-02 | 2007-02-28 | 日本電子株式会社 | 電子線照射装置および方法 |
| US6710354B1 (en) | 2001-12-11 | 2004-03-23 | Kla-Tencor Corporation | Scanning electron microscope architecture and related material handling system |
| JP4427271B2 (ja) * | 2003-04-30 | 2010-03-03 | 株式会社神戸製鋼所 | アルミナ保護膜およびその製造方法 |
| US6872955B1 (en) * | 2003-12-04 | 2005-03-29 | International Business Machines Corporation | SEM sample holder apparatus for implementing enhanced examination of multiple samples |
| US20050173380A1 (en) * | 2004-02-09 | 2005-08-11 | Carbone Frank L. | Directed energy net shape method and apparatus |
-
2005
- 2005-09-28 US US11/237,475 patent/US7301157B2/en not_active Expired - Fee Related
-
2006
- 2006-09-25 JP JP2006258508A patent/JP5046365B2/ja not_active Expired - Fee Related
- 2006-09-27 EP EP06121304.7A patent/EP1770751B1/en not_active Ceased
- 2006-09-28 CN CN200610143158.XA patent/CN1945338B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4162391A (en) * | 1977-12-19 | 1979-07-24 | Sciaky Bros., Inc. | Sliding vacuum seal means |
| US5852298A (en) * | 1995-03-30 | 1998-12-22 | Ebara Corporation | Micro-processing apparatus and method therefor |
| CN1672234A (zh) * | 2002-07-29 | 2005-09-21 | 艾克塞利斯技术公司 | 用于离子束注入机的可调注入角的工件支撑结构 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1770751A2 (en) | 2007-04-04 |
| JP5046365B2 (ja) | 2012-10-10 |
| US20070080291A1 (en) | 2007-04-12 |
| CN1945338A (zh) | 2007-04-11 |
| JP2007093599A (ja) | 2007-04-12 |
| EP1770751A3 (en) | 2011-08-17 |
| EP1770751B1 (en) | 2015-11-18 |
| US7301157B2 (en) | 2007-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140604 Termination date: 20190928 |