CN1882881A - 感光聚合物印刷版前体 - Google Patents

感光聚合物印刷版前体 Download PDF

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Publication number
CN1882881A
CN1882881A CNA2004800341710A CN200480034171A CN1882881A CN 1882881 A CN1882881 A CN 1882881A CN A2004800341710 A CNA2004800341710 A CN A2004800341710A CN 200480034171 A CN200480034171 A CN 200480034171A CN 1882881 A CN1882881 A CN 1882881A
Authority
CN
China
Prior art keywords
printing plate
plate precursor
poly
photopolymer printing
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800341710A
Other languages
English (en)
Chinese (zh)
Inventor
W·-K·格里斯
M·范达默
F·万盖弗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert AG
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of CN1882881A publication Critical patent/CN1882881A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
CNA2004800341710A 2003-09-22 2004-09-01 感光聚合物印刷版前体 Pending CN1882881A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03103498.6 2003-09-22
EP03103498 2003-09-22

Publications (1)

Publication Number Publication Date
CN1882881A true CN1882881A (zh) 2006-12-20

Family

ID=34354563

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800341710A Pending CN1882881A (zh) 2003-09-22 2004-09-01 感光聚合物印刷版前体

Country Status (6)

Country Link
US (1) US20080160447A1 (https=)
EP (1) EP1668418A1 (https=)
JP (1) JP2007506125A (https=)
CN (1) CN1882881A (https=)
DE (1) DE04766666T1 (https=)
WO (1) WO2005029190A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102165374B (zh) * 2008-09-24 2013-07-31 富士胶片株式会社 制备平版印刷版的方法
CN104136996A (zh) * 2012-02-29 2014-11-05 富士胶片株式会社 平版印刷版原版及平版印刷版的制造方法
CN105452960A (zh) * 2013-06-14 2016-03-30 富林特集团德国有限公司 可数字成像且具有极性超薄屏障层的柔版印刷元件

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PL1749240T3 (pl) * 2004-05-06 2012-09-28 Agfa Nv Prekursor fotopolimerowej płyty drukarskiej
JP4701042B2 (ja) * 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
JP4613115B2 (ja) * 2005-08-30 2011-01-12 富士フイルム株式会社 光重合型感光性平版印刷版
JP2007171407A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版原版及びその製版方法
WO2008145528A1 (en) 2007-05-25 2008-12-04 Agfa Graphics Nv A lithographic printing plate precursor
US20090014716A1 (en) * 2007-07-11 2009-01-15 Takumi Yamaga Organic thin-film transistor and method of manufacturing the same
ES2378413T3 (es) 2008-03-26 2012-04-12 Agfa Graphics N.V. Método de fabricación de planchas de impresión litográficas
US8354216B2 (en) 2008-07-15 2013-01-15 Eastman Kodak Company Negative-working imaging elements and methods of use
JP2010097175A (ja) 2008-09-22 2010-04-30 Fujifilm Corp 平版印刷版の作製方法及び平版印刷版原版
ES2382371T3 (es) 2008-10-23 2012-06-07 Agfa Graphics N.V. Plancha de impresión litográfica
JP5586333B2 (ja) 2009-06-09 2014-09-10 富士フイルム株式会社 平版印刷版の作製方法
EP2290447A1 (en) 2009-08-25 2011-03-02 Agfa Graphics N.V. A set for developing a lithographic printing plate
JP2011090295A (ja) 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
JP2011090294A (ja) 2009-09-24 2011-05-06 Fujifilm Corp 平版印刷版の作製方法
JP5346755B2 (ja) 2009-09-24 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法
CN102548769B (zh) 2009-09-24 2015-08-12 富士胶片株式会社 平版印刷版原版
JP5541913B2 (ja) 2009-12-25 2014-07-09 富士フイルム株式会社 平版印刷版の作製方法
JP5588887B2 (ja) 2010-01-29 2014-09-10 富士フイルム株式会社 平版印刷版の作製方法
JP5346845B2 (ja) 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
JP2011221522A (ja) 2010-03-26 2011-11-04 Fujifilm Corp 平版印刷版の作製方法
WO2011125913A1 (ja) 2010-03-31 2011-10-13 富士フイルム株式会社 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法
JP2012073595A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP2012073594A (ja) 2010-08-31 2012-04-12 Fujifilm Corp 平版印刷版の作製方法
JP5604398B2 (ja) 2011-09-30 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5463346B2 (ja) 2011-12-26 2014-04-09 富士フイルム株式会社 平版印刷版の製版方法
CN104115069B (zh) 2012-02-20 2018-11-02 富士胶片株式会社 制版处理废液的浓缩方法及再循环方法
JP5711168B2 (ja) 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
EP2855152B1 (en) 2012-06-05 2016-03-16 AGFA Graphics NV A lithographic printing plate precursor
BR112015030811A2 (pt) 2013-06-14 2017-07-25 Agfa Graphics Nv precursor de placa de impressão litográfica
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
EP2916171B1 (en) 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3474073B1 (en) 2017-10-17 2022-12-07 Agfa Offset Bv A method for making a printing plate
EP3495891B1 (en) 2017-12-08 2021-06-16 Agfa Nv A method for making a lithographic printing plate
CN111867839A (zh) 2018-03-22 2020-10-30 爱克发有限公司 平版印刷版前体
EP3587113B1 (en) 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3587112B1 (en) 2018-06-21 2024-04-03 Eco3 Bv A lithographic printing plate precursor
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3650938A1 (en) 2018-11-09 2020-05-13 Agfa Nv A lithographic printing plate precursor
CN113168096B (zh) 2018-12-10 2024-05-24 易客发有限公司 Uv或紫色敏化的平版印刷版的在机加工
EP3686011A1 (en) 2019-01-23 2020-07-29 Agfa Nv A lithographic printing plate precursor
EP3875271B1 (en) 2020-03-04 2025-10-15 Eco3 Bv A lithographic printing plate precursor
EP3892469B1 (en) 2020-04-10 2023-11-08 Eco3 Bv Lithographic printing plate precursor
EP3922462B1 (en) 2020-06-08 2023-03-01 Agfa Offset Bv Lithographic photopolymer printing plate precursor with improved daylight stability
US20240100820A1 (en) 2020-12-16 2024-03-28 Agfa Offset Bv Lithographic Printing Press Make-Ready Method
EP4035897A1 (en) 2021-01-28 2022-08-03 Agfa Offset Bv A lithographic printing plate precursor
EP4382306A1 (en) 2022-12-08 2024-06-12 Eco3 Bv Lithographic printing press make-ready method

Family Cites Families (19)

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US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US4088498A (en) * 1970-12-28 1978-05-09 Hoechst Aktiengesellschaft Photopolymerizable copying composition
US3784577A (en) * 1971-10-26 1974-01-08 Sumitomo Chemical Co Fatty acid amide derivatives
US4109524A (en) * 1975-06-30 1978-08-29 S & F Associates Method and apparatus for mass flow rate measurement
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
US4459349A (en) * 1981-03-27 1984-07-10 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
US4410621A (en) * 1981-04-03 1983-10-18 Toyo Boseki Kabushiki Kaisha Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan
DE3738864A1 (de) * 1987-11-16 1989-05-24 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
DE3824903A1 (de) * 1988-07-22 1990-02-01 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
CA2045493A1 (en) * 1989-11-20 1991-05-21 Kazuyuki Watanabe Polyvinyl alcohol copolymer resin composition and multi-layer laminate
US5234790A (en) * 1991-03-04 1993-08-10 E. I. Du Pont De Nemours And Company Peel-apart photosensitive element
JP3717000B2 (ja) * 1995-04-19 2005-11-16 コダックポリクロームグラフィックス株式会社 光重合性感光材料
TW558559B (en) * 1998-06-30 2003-10-21 Ind Tech Res Inst An oxygen atom-containing heterocyclic dione polymer and photosensitive composition comprising the same
DE19933139A1 (de) * 1999-07-19 2001-01-25 Agfa Gevaert Ag Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial
DE06121351T1 (de) * 2000-04-19 2009-01-29 Agfa Graphics N.V. Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte
JP4199942B2 (ja) * 2001-07-09 2008-12-24 富士フイルム株式会社 平版印刷版の製版方法
US6756183B2 (en) * 2001-08-24 2004-06-29 Fuji Photo Film Co., Ltd. Method for preparing lithographic printing plate
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
EP1349006B1 (en) * 2002-03-28 2013-09-25 Agfa Graphics N.V. Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102165374B (zh) * 2008-09-24 2013-07-31 富士胶片株式会社 制备平版印刷版的方法
CN104136996A (zh) * 2012-02-29 2014-11-05 富士胶片株式会社 平版印刷版原版及平版印刷版的制造方法
CN105452960A (zh) * 2013-06-14 2016-03-30 富林特集团德国有限公司 可数字成像且具有极性超薄屏障层的柔版印刷元件
CN105452960B (zh) * 2013-06-14 2019-11-01 富林特集团德国有限公司 可数字成像且具有极性超薄屏障层的柔版印刷元件

Also Published As

Publication number Publication date
EP1668418A1 (en) 2006-06-14
US20080160447A1 (en) 2008-07-03
WO2005029190A1 (en) 2005-03-31
JP2007506125A (ja) 2007-03-15
DE04766666T1 (de) 2009-02-05

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: AGFA GEVAERT

Free format text: FORMER OWNER: AGFA GEVAERT

Effective date: 20070511

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20070511

Address after: Belgian Mo

Applicant after: Agfa Gevaert

Address before: Belgian Mo

Applicant before: Agfa Gevaert N. V.

C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20061220