DE04766666T1 - Fotopolymer-druckplatten-vorläufer - Google Patents
Fotopolymer-druckplatten-vorläufer Download PDFInfo
- Publication number
- DE04766666T1 DE04766666T1 DE04766666T DE04766666T DE04766666T1 DE 04766666 T1 DE04766666 T1 DE 04766666T1 DE 04766666 T DE04766666 T DE 04766666T DE 04766666 T DE04766666 T DE 04766666T DE 04766666 T1 DE04766666 T1 DE 04766666T1
- Authority
- DE
- Germany
- Prior art keywords
- printing plate
- plate precursor
- group
- protective layer
- photopolymer printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920000642 polymer Polymers 0.000 title 1
- 239000002243 precursor Substances 0.000 claims abstract 14
- 239000011241 protective layer Substances 0.000 claims abstract 9
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract 6
- 150000001875 compounds Chemical class 0.000 claims abstract 5
- 239000011248 coating agent Substances 0.000 claims abstract 4
- 238000000576 coating method Methods 0.000 claims abstract 4
- 230000005855 radiation Effects 0.000 claims abstract 4
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 claims abstract 3
- 239000011230 binding agent Substances 0.000 claims abstract 3
- 230000031700 light absorption Effects 0.000 claims abstract 2
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims abstract 2
- 238000007127 saponification reaction Methods 0.000 claims abstract 2
- 229920003169 water-soluble polymer Polymers 0.000 claims abstract 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 239000000178 monomer Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- -1 acrylate compound Chemical class 0.000 claims 1
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 1
- 125000003277 amino group Chemical group 0.000 claims 1
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims 1
- 238000005282 brightening Methods 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 239000012986 chain transfer agent Substances 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 150000001991 dicarboxylic acids Chemical class 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002560 nitrile group Chemical group 0.000 claims 1
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 claims 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03103498 | 2003-09-22 | ||
| EP03103498 | 2003-09-22 | ||
| PCT/EP2004/051986 WO2005029190A1 (en) | 2003-09-22 | 2004-09-01 | Photopolymer printing plate precursor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE04766666T1 true DE04766666T1 (de) | 2009-02-05 |
Family
ID=34354563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE04766666T Pending DE04766666T1 (de) | 2003-09-22 | 2004-09-01 | Fotopolymer-druckplatten-vorläufer |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080160447A1 (https=) |
| EP (1) | EP1668418A1 (https=) |
| JP (1) | JP2007506125A (https=) |
| CN (1) | CN1882881A (https=) |
| DE (1) | DE04766666T1 (https=) |
| WO (1) | WO2005029190A1 (https=) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PL1749240T3 (pl) * | 2004-05-06 | 2012-09-28 | Agfa Nv | Prekursor fotopolimerowej płyty drukarskiej |
| JP4701042B2 (ja) * | 2005-08-22 | 2011-06-15 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP4613115B2 (ja) * | 2005-08-30 | 2011-01-12 | 富士フイルム株式会社 | 光重合型感光性平版印刷版 |
| JP2007171407A (ja) * | 2005-12-20 | 2007-07-05 | Fujifilm Corp | 平版印刷版原版及びその製版方法 |
| WO2008145528A1 (en) | 2007-05-25 | 2008-12-04 | Agfa Graphics Nv | A lithographic printing plate precursor |
| US20090014716A1 (en) * | 2007-07-11 | 2009-01-15 | Takumi Yamaga | Organic thin-film transistor and method of manufacturing the same |
| ES2378413T3 (es) | 2008-03-26 | 2012-04-12 | Agfa Graphics N.V. | Método de fabricación de planchas de impresión litográficas |
| US8354216B2 (en) | 2008-07-15 | 2013-01-15 | Eastman Kodak Company | Negative-working imaging elements and methods of use |
| JP2010097175A (ja) | 2008-09-22 | 2010-04-30 | Fujifilm Corp | 平版印刷版の作製方法及び平版印刷版原版 |
| WO2010035697A1 (ja) * | 2008-09-24 | 2010-04-01 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| ES2382371T3 (es) | 2008-10-23 | 2012-06-07 | Agfa Graphics N.V. | Plancha de impresión litográfica |
| JP5586333B2 (ja) | 2009-06-09 | 2014-09-10 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| EP2290447A1 (en) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | A set for developing a lithographic printing plate |
| JP2011090295A (ja) | 2009-09-24 | 2011-05-06 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP2011090294A (ja) | 2009-09-24 | 2011-05-06 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP5346755B2 (ja) | 2009-09-24 | 2013-11-20 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| CN102548769B (zh) | 2009-09-24 | 2015-08-12 | 富士胶片株式会社 | 平版印刷版原版 |
| JP5541913B2 (ja) | 2009-12-25 | 2014-07-09 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5588887B2 (ja) | 2010-01-29 | 2014-09-10 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP5346845B2 (ja) | 2010-02-26 | 2013-11-20 | 富士フイルム株式会社 | 平版印刷版の作製方法及び平版印刷版原版用現像液 |
| JP2011221522A (ja) | 2010-03-26 | 2011-11-04 | Fujifilm Corp | 平版印刷版の作製方法 |
| WO2011125913A1 (ja) | 2010-03-31 | 2011-10-13 | 富士フイルム株式会社 | 平版印刷版原版処理用の現像液、該現像液を用いた平版印刷版の作製方法、及び、印刷方法 |
| JP2012073595A (ja) | 2010-08-31 | 2012-04-12 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP2012073594A (ja) | 2010-08-31 | 2012-04-12 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP5604398B2 (ja) | 2011-09-30 | 2014-10-08 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
| JP5463346B2 (ja) | 2011-12-26 | 2014-04-09 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| CN104115069B (zh) | 2012-02-20 | 2018-11-02 | 富士胶片株式会社 | 制版处理废液的浓缩方法及再循环方法 |
| JP5711168B2 (ja) | 2012-02-27 | 2015-04-30 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷版の作製方法 |
| JP5715975B2 (ja) * | 2012-02-29 | 2015-05-13 | 富士フイルム株式会社 | 平版印刷版原版および平版印刷版の製造方法 |
| EP2855152B1 (en) | 2012-06-05 | 2016-03-16 | AGFA Graphics NV | A lithographic printing plate precursor |
| CA2914134A1 (en) * | 2013-06-14 | 2014-12-18 | Flint Group Germany Gmbh | Flexographic printing element which can be digitally imaged and has a polar, ultra-thin barrier layer |
| BR112015030811A2 (pt) | 2013-06-14 | 2017-07-25 | Agfa Graphics Nv | precursor de placa de impressão litográfica |
| EP2883699B1 (en) | 2013-12-11 | 2017-05-03 | Agfa Graphics Nv | A lithographic printing plate precursor and monomer |
| EP2916171B1 (en) | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | A method for making a lithographic printing plate precursor |
| EP3392709A1 (en) | 2017-04-21 | 2018-10-24 | Agfa Nv | A lithographic printing plate precursor |
| EP3431290B1 (en) | 2017-07-20 | 2021-09-08 | Agfa Nv | A lithographic printing plate precursor |
| EP3474073B1 (en) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | A method for making a printing plate |
| EP3495891B1 (en) | 2017-12-08 | 2021-06-16 | Agfa Nv | A method for making a lithographic printing plate |
| CN111867839A (zh) | 2018-03-22 | 2020-10-30 | 爱克发有限公司 | 平版印刷版前体 |
| EP3587113B1 (en) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP3587112B1 (en) | 2018-06-21 | 2024-04-03 | Eco3 Bv | A lithographic printing plate precursor |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| EP3650938A1 (en) | 2018-11-09 | 2020-05-13 | Agfa Nv | A lithographic printing plate precursor |
| CN113168096B (zh) | 2018-12-10 | 2024-05-24 | 易客发有限公司 | Uv或紫色敏化的平版印刷版的在机加工 |
| EP3686011A1 (en) | 2019-01-23 | 2020-07-29 | Agfa Nv | A lithographic printing plate precursor |
| EP3875271B1 (en) | 2020-03-04 | 2025-10-15 | Eco3 Bv | A lithographic printing plate precursor |
| EP3892469B1 (en) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographic printing plate precursor |
| EP3922462B1 (en) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithographic photopolymer printing plate precursor with improved daylight stability |
| US20240100820A1 (en) | 2020-12-16 | 2024-03-28 | Agfa Offset Bv | Lithographic Printing Press Make-Ready Method |
| EP4035897A1 (en) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
| US4088498A (en) * | 1970-12-28 | 1978-05-09 | Hoechst Aktiengesellschaft | Photopolymerizable copying composition |
| US3784577A (en) * | 1971-10-26 | 1974-01-08 | Sumitomo Chemical Co | Fatty acid amide derivatives |
| US4109524A (en) * | 1975-06-30 | 1978-08-29 | S & F Associates | Method and apparatus for mass flow rate measurement |
| DE2822190A1 (de) * | 1978-05-20 | 1979-11-22 | Hoechst Ag | Photopolymerisierbares gemisch |
| US4459349A (en) * | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US4410621A (en) * | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
| DE3738864A1 (de) * | 1987-11-16 | 1989-05-24 | Hoechst Ag | Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch |
| DE3824903A1 (de) * | 1988-07-22 | 1990-02-01 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| CA2045493A1 (en) * | 1989-11-20 | 1991-05-21 | Kazuyuki Watanabe | Polyvinyl alcohol copolymer resin composition and multi-layer laminate |
| US5234790A (en) * | 1991-03-04 | 1993-08-10 | E. I. Du Pont De Nemours And Company | Peel-apart photosensitive element |
| JP3717000B2 (ja) * | 1995-04-19 | 2005-11-16 | コダックポリクロームグラフィックス株式会社 | 光重合性感光材料 |
| TW558559B (en) * | 1998-06-30 | 2003-10-21 | Ind Tech Res Inst | An oxygen atom-containing heterocyclic dione polymer and photosensitive composition comprising the same |
| DE19933139A1 (de) * | 1999-07-19 | 2001-01-25 | Agfa Gevaert Ag | Stabile Pigmentdispersion und damit hergestelltes strahlungsempfindliches Aufzeichnungsmaterial |
| DE06121351T1 (de) * | 2000-04-19 | 2009-01-29 | Agfa Graphics N.V. | Lichtempfindliche lithografische Druckplatte und Verfahren zur Herstellung einer Druckplatte |
| JP4199942B2 (ja) * | 2001-07-09 | 2008-12-24 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| US6756183B2 (en) * | 2001-08-24 | 2004-06-29 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
| US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
| EP1349006B1 (en) * | 2002-03-28 | 2013-09-25 | Agfa Graphics N.V. | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm. |
-
2004
- 2004-09-01 EP EP04766666A patent/EP1668418A1/en not_active Withdrawn
- 2004-09-01 DE DE04766666T patent/DE04766666T1/de active Pending
- 2004-09-01 WO PCT/EP2004/051986 patent/WO2005029190A1/en not_active Ceased
- 2004-09-01 US US10/573,233 patent/US20080160447A1/en not_active Abandoned
- 2004-09-01 CN CNA2004800341710A patent/CN1882881A/zh active Pending
- 2004-09-01 JP JP2006526628A patent/JP2007506125A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| CN1882881A (zh) | 2006-12-20 |
| EP1668418A1 (en) | 2006-06-14 |
| US20080160447A1 (en) | 2008-07-03 |
| WO2005029190A1 (en) | 2005-03-31 |
| JP2007506125A (ja) | 2007-03-15 |
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