CN1879058A - 可固化组合物和利用它的快速成型方法 - Google Patents
可固化组合物和利用它的快速成型方法 Download PDFInfo
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- CN1879058A CN1879058A CNA2004800326621A CN200480032662A CN1879058A CN 1879058 A CN1879058 A CN 1879058A CN A2004800326621 A CNA2004800326621 A CN A2004800326621A CN 200480032662 A CN200480032662 A CN 200480032662A CN 1879058 A CN1879058 A CN 1879058A
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- CDNGYFJXHJQTJJ-UHFFFAOYSA-N diphenylphosphorylformaldehyde 1,3,5-trimethylbenzene Chemical compound C(=O)P(C1=CC=CC=C1)(C1=CC=CC=C1)=O.CC1=CC(=CC(=C1)C)C CDNGYFJXHJQTJJ-UHFFFAOYSA-N 0.000 description 1
- PZSDXITWLHVYLM-UHFFFAOYSA-L disodium;toluene;sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O.CC1=CC=CC=C1 PZSDXITWLHVYLM-UHFFFAOYSA-L 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- RPHYLOMQFAGWCD-UHFFFAOYSA-N ethane;phenol Chemical compound CC.OC1=CC=CC=C1 RPHYLOMQFAGWCD-UHFFFAOYSA-N 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 1
- 125000004672 ethylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 235000019387 fatty acid methyl ester Nutrition 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- VDRUPBBEDDAWMR-UHFFFAOYSA-N hexane-1,1,3-triol Chemical compound CCCC(O)CC(O)O VDRUPBBEDDAWMR-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002596 lactones Chemical class 0.000 description 1
- 239000000787 lecithin Substances 0.000 description 1
- 235000010445 lecithin Nutrition 0.000 description 1
- 229940067606 lecithin Drugs 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910001463 metal phosphate Inorganic materials 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- HRDXJKGNWSUIBT-UHFFFAOYSA-N methoxybenzene Chemical group [CH2]OC1=CC=CC=C1 HRDXJKGNWSUIBT-UHFFFAOYSA-N 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical class C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- GOCLJAKNIYYTMF-UHFFFAOYSA-N n,n-dimethyl-4-[2-(2-octoxyphenyl)-6-phenylpyridin-4-yl]aniline Chemical compound CCCCCCCCOC1=CC=CC=C1C1=CC(C=2C=CC(=CC=2)N(C)C)=CC(C=2C=CC=CC=2)=N1 GOCLJAKNIYYTMF-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000847 nonoxynol Polymers 0.000 description 1
- 230000000269 nucleophilic effect Effects 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 1
- UWJJYHHHVWZFEP-UHFFFAOYSA-N pentane-1,1-diol Chemical compound CCCCC(O)O UWJJYHHHVWZFEP-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- CGIHFIDULQUVJG-UHFFFAOYSA-N phytantriol Chemical compound CC(C)CCCC(C)CCCC(C)CCCC(C)(O)C(O)CO CGIHFIDULQUVJG-UHFFFAOYSA-N 0.000 description 1
- CGIHFIDULQUVJG-VNTMZGSJSA-N phytantriol Natural products CC(C)CCC[C@H](C)CCC[C@H](C)CCC[C@@](C)(O)[C@H](O)CO CGIHFIDULQUVJG-VNTMZGSJSA-N 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000004742 propyloxycarbonyl group Chemical group 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- WPFGFHJALYCVMO-UHFFFAOYSA-L rubidium carbonate Chemical compound [Rb+].[Rb+].[O-]C([O-])=O WPFGFHJALYCVMO-UHFFFAOYSA-L 0.000 description 1
- 229910000026 rubidium carbonate Inorganic materials 0.000 description 1
- 239000011833 salt mixture Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- OVWIMAGMCQIYBC-UHFFFAOYSA-N sodium butanedioic acid 3-(sulfinatooxymethyl)heptane Chemical compound CCCCC(CC)CO[S-](=O)=O.OC(CCC(O)=O)=O.[Na+] OVWIMAGMCQIYBC-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2/00—Addition polymers of aldehydes or cyclic oligomers thereof or of ketones; Addition copolymers thereof with less than 50 molar percent of other substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Ceramic Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
Description
商品名(供应商) | 描述 |
EPON825(Resolution Performance Products) | 双酚A二缩水甘油醚(芳族环氧) |
EPICLON N-740(Dainippon Ink & Chemical) | 苯酚环氧酚醛清漆(芳族环氧) |
HELOXY 64(Resolution PerformanceProducts) | 壬基苯基缩水甘油基醚(芳族环氧) |
UVACURE 1500(UCB Radcure) | 3,4-环氧环己基甲基-3,4-环氧环己基羧酸酯(脂族环氧) |
UVR 6000(Dow Chemical) | 3-乙基-3-羟基甲基-氧杂环丁烷(氧杂环丁烷类) |
SR-399(Sartomer) | 单羟基二季戊四醇五丙烯酸酯 |
IRGACURE 184(Ciba Geigy) | 1-羟基环己基苯基甲酮 |
DAROCURE 1173(Ciba Geigy) | 2-羟基-2-甲基-1-苯基-1-丙酮 |
CPI-6976(Aceto) | 六氟合锑酸三芳基锍盐混合物 |
SILWET L-7600(OSI Specialities) | 表面活性剂 |
BYK-A-501(BYK-Chemie) | 消泡剂 |
PVP(Aldrich) | 稳定剂(聚乙烯基吡咯烷酮,Mw约10000) |
Ebecryl 3700(UCB Chemicals) | 双酚A基环氧丙烯酸酯 |
DPHA(Sartomer) | 二季戊四醇和丙烯酸的反应产物(二季戊四醇六丙烯酸酯) |
Grilonit F713(EMS-PRIMID) | 聚四氢呋喃二缩水甘油醚 |
SR 9003(Sartomer) | 丙氧基化新戊二醇二丙烯酸酯 |
Heloxy 67(Resolution Performance Products) | 1,4-丁二醇二缩水甘油醚 |
SR 295(Sartomer) | 季戊四醇四丙烯酸酯 |
SR 351(Sartomer) | 三羟甲基丙烷三丙烯酸酯 |
Oxt 211(Toagosei Co.,Ltd.) | 3-乙基-3-苯氧基甲基-氧杂环丁烷 |
OXT 212(Toagosei Co.,Ltd.) | 3-乙基-3-[(2-乙基己氧基)甲基]氧杂环丁烷 |
Nanopox XP 22/0543(hanse chemie) | 50%硅土纳米颗粒填充的双酚A二缩水甘油醚(芳族环氧) |
Nanopox XP 22/0316(hanse chemie) | 50%纳米颗粒填充的硅土的3,4-环氧环己基甲基-3,4-环氧环己基羧酸酯(脂族环氧) |
Nanopox XP 22/0540(hanse chemie) | 60%硅土纳米颗粒填充的双酚F二缩水甘油醚(芳族环氧) |
Nanopox XP 22/0531(hanse chemie) | 50%硅土纳米颗粒填充的双酚F二缩水甘油醚(芳族环氧) |
Triton X-100(Dow Chemicals) | 聚氧乙烯辛基苯基醚 |
Airvol 305(Air Products,Inc.) | 聚乙烯醇 |
Pluronic L35(BASF) | 环氧乙烷环氧丙烷共聚物 |
Pluronic 10R-5(BASF) | 环氧乙烷环氧丙烷共聚物 |
Igapol AL CO-630(Rhodia) | 壬基苯酚乙氧化物 |
对甲氧基苯酚(Aldrich) | 对甲氧基苯酚 |
乙烯基三甲氧基硅烷(Gelest Inc.) | 乙烯基三甲氧基硅烷 |
组分 | 1,1 | 1,2 | 1,4 | 1,5 | 1,6 | 1,7 | 1,8 | 1,9 |
(Wt.%) | (Wt.%) | (Wt.%) | (Wt.%) | (Wt.%) | (Wt.%) | (Wt.%) | (Wt.%) | |
UVC 1500 | 18.33 | 16.17 | 18.33 | 16.17 | 14.11 | 14.24 | 11.97 | 10.68 |
Ebecryl 3700 | 12.14 | 10.71 | 12.14 | 10.71 | 9.35 | |||
DPHA | 9.43 | 7.93 | 7.08 | |||||
Grilonit F713 | 13.07 | 11.54 | 13.07 | 11.54 | 10.07 | 10.16 | 8.54 | 7.62 |
Irgacure 184 | 1.66 | 1.75 | 1.66 | 1.75 | 1.72 | 1.45 | 1.68 | 1.09 |
CPI-6976 | 4.80 | 4.83 | 4.80 | 4.83 | 4.75 | 4.72 | 4.88 | 3.54 |
Nanopox XP 22/0543 | 50.00 | 55.00 | ||||||
Nanopox XP 22/0531 | 50.00 | 55.00 | 60.00 | |||||
Nanopox XP 22/0540 | 60.00 | 65.00 | 70.00 | |||||
填料% | 25 | 27.5 | 25 | 27.5 | 30 | 36 | 39 | 42 |
杨氏模量Mpa | 2273 | 2305 | 2162 | 2198 | 2324 | 2542 | 2556 | 2275 |
屈服伸长率% | 4,8 | 4,3 | 3,4 | 4,4 | 3,7 | 3,9 | 4,0 | 1,8 |
抗张强度Mpa | 62 | 55 | 48 | 55 | 56 | 57 | 62 | 31 |
断裂伸长率% | 4,9 | 4,6 | 3,5 | 4,7 | 3,7 | 4,3 | 4,2 | 1,8 |
Ec(mJ/cm2) | 5.20 | 5.35 | 27.64 | 19.19 | 15.22 | 7.36 | 5.77 | 7.67 |
Dp(密耳) | 3.17 | 3.56 | 5.33 | 4.23 | 3.59 | 3.62 | 2.88 | 3.84 |
E5(mJ/cm2) | 25.2 | 21.8 | 70.7 | 62.5 | 61.3 | 29.3 | 32.7 | 28.2 |
E10(mJ/cm2) | 122.5 | 88.6 | 180.6 | 203.7 | 246.8 | 116.4 | 184.9 | 103.9 |
组分 | 2.1 | 2.2 | 2.3 | 2.4 | 2.5 | 2.6 | 2.7 | 2.8 | 2.9 | 2.10 | 2.11 | 2.12 |
UVC 1500 | 39.26 | 35.05 | 26.63 | 16.17 | 14.11 | 11.97 | 9.87 | 7.19 | 14.42 | 17.78 | 21.54 | 19.57 |
Ebecryl 3700 | 26.01 | 23.22 | 17.64 | 10.71 | 9.35 | 7.93 | 6.54 | 4.76 | 9.55 | 11.78 | 8.33 | 9.55 |
Grilonit F713 | 28.01 | 25.01 | 19.00 | 11.54 | 10.07 | 8.54 | 7.04 | 5.13 | 5.14 | 0.00 | 0.00 | 0.00 |
Irgacure 184 | 1.85 | 1.84 | 1.83 | 1.75 | 1.72 | 1.68 | 1.76 | 0.78 | 1.47 | 1.36 | 1.28 | 1.47 |
CPI-6976 | 4.87 | 4.87 | 4.88 | 4.83 | 4.75 | 4.88 | 4.78 | 2.15 | 4.41 | 4.08 | 3.84 | 4.41 |
Nanopox XP 22/0540 | 0 | 10 | 30 | 55 | 60 | 65 | 70 | 80 | 65 | 65 | 65 | 65 |
填料% | 0 | 6 | 18 | 33 | 36 | 39 | 42 | 48 | 39 | 39 | 39 | 39 |
杨氏模量Mpa | 841 | 1096 | 1655 | 2225 | 2666 | 2652 | 2739 | Nd | 1930 | nd | 2850 | 2864 |
屈服伸长率% | 18,9 | 16,9 | 5.4 | 3.7 | 3,6 | 3,8 | 2,4 | Nd | 1,0 | nd | 0,4 | 0,2 |
抗张强度Mpa | 26 | 38 | 34 | 51 | 59 | 60 | 59 | Nd | 30 | nd | 7 | 5 |
断裂伸长率% | 35,7 | 30,6 | 19.6 | 3.7 | 3,8 | 3,8 | 3,4 | brittle | 1,9 | brittle | 0,4 | 0,2 |
杨氏模量Mpa** | 1450 | 2000 | 3000 | 4000 | 4800 | 5100 | 5200 | Nd | ||||
抗张强度Mpa** | 31 | 40 | 36 | 54 | 62 | 63 | 62 | Nd | ||||
断裂伸长率%** | 25 | 20 | 13 | 2.6 | 2.7 | 2.3 | 1.7 | Brittle | ||||
Ec(mJ/cm2) | 10.9 | 10.11 | 14.27 | 11.59 | 19.55 | 13.35 | 15.48 | 11.59 | 10.51 | 12.35 | 17.07 | |
Dp(密耳) | 5.6 | 4.99 | 5.27 | 3.56 | 4.41 | 3.48 | 3.73 | 3.56 | 4.06 | 4.16 | 4.02 | |
E5(mJ/cm2) | 26.6 | 27.5 | 36.8 | 47.2 | 60.8 | 56.1 | 59.1 | 47.2 | 36.0 | 41.1 | 59.2 | |
E10(mJ/cm2) | 65 | 75.1 | 95.1 | 192 | 189.0 | 235.7 | 225.8 | 192.2 | 123.5 | 137.1 | 205.3 |
组分 | 3.1 | 3.2 | 3.3 | 3.4 | 3.5 | 3.6 | 3.7 | 3.8 | 3.9 | 3.10 | 3.11 |
UVC 1500 | 0 | 0 | 0 | 0 | 0 | 5.86 | 5.28 | 4.66 | 6.35 | 7.38 | 4.65 |
Epon 825 | 37.80 | 34.13 | 29.42 | 25.64 | 22.28 | 19.40 | 17.46 | 15.41 | 12.70 | 7.38 | 0.00 |
UVR6000 | 9.98 | 9.01 | 7.77 | 6.77 | 5.88 | 7.27 | 6.54 | 5.77 | 10.16 | 12.71 | 7.45 |
SR399 | 4.84 | 4.37 | 3.76 | 3.28 | 2.85 | 5.16 | 4.64 | 4.10 | 6.10 | 7.09 | 4.47 |
SR9003 | 2.42 | 2.18 | 1.88 | 1.64 | 1.43 | ||||||
Epicion N-740 | 6.10 | 5.49 | 4.84 | ||||||||
Silwet 7600 | 0.12 | 0.11 | 0.09 | 0.08 | 0.07 | 0.09 | 0.08 | 0.07 | 0.10 | 0.12 | 0.07 |
BYK A501 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 |
Irgacure 184 | 1.81 | 1.91 | 3.01 | 3.28 | 3.21 | 2.35 | 2.11 | 2.23 | 1.52 | 1.77 | 1.12 |
CPI-6976 | 3.02 | 3.28 | 4.05 | 4.31 | 4.28 | 3.75 | 3.38 | 3.35 | 3.05 | 3.54 | 2.23 |
Nanopox XP 22/0316 | 40 | 45 | 50 | 55 | 60 | 50 | 55 | 60 | |||
Nanopox XP 22/0531 | 60 | 60 | 80 | ||||||||
填料% | 20 | 22.5 | 25 | 27.5 | 30 | 25 | 27.5 | 30 | 30 | 30 | 40 |
杨氏模量Mpa | 1038 | 3095 | 2820 | 3319 | 1692 | 1447 | 1646 | Nd | 3672 | 2651 | 2851 |
屈服伸长率% | 0.9 | 0.6 | 2 | 0.5 | 0.4 | 1 | 0.9 | Nd | 0.8 | 0.7 | 0.4 |
抗张强度Mpa | 11 | 23 | 52 | 14 | 6 | 13 | 16 | Nd | 34 | 8 | 8 |
断裂伸长率% | 1.1 | 0.6 | 2 | 0.5 | 0.6 | 1 | 1 | brittle | 1 | 0.7 | 0.4 |
Ec(mJ/cm2) | 13.20 | 3.08 | 0.52 | 2.71 | 5.07 | 8.29 | 7.40 | 10.06 | 8.86 | 19.85 | 11.49 |
Dp(密耳) | 5.33 | 3.56 | 1.78 | 2.68 | 2.96 | 3.88 | 4.09 | 5.00 | 4.13 | 4.62 | 3.76 |
E5(mJ/cm2) | 33.7 | 12.5 | 8.7 | 17.5 | 27.5 | 30.1 | 25.1 | 27.3 | 29.8 | 58.6 | 43.4 |
E10(mJ/cm2) | 86.2 | 51.0 | 144.2 | 113.5 | 148.9 | 109.2 | 85.2 | 74.2 | 100 | 173 | 163.7 |
组分 | 4.1 | 4.2 | 4.3 | 4.4 | 4.5 | 4.6 |
UVC 1500 | 27.42 | 27.42 | 27.42 | 27.42 | 27.42 | 27.42 |
1,4-丁二醇二缩水甘油醚(Heloxy 67) | 10.26 | 10.26 | 10.26 | 10.26 | 10.26 | 10.26 |
DPHA | 2.84 | 3.70 | 4.59 | |||
SR-295 | 4.59 | 3.73 | 2.84 | 4.59 | 7.43 | |
SR-351 | 2.84 | 7.43 | ||||
对甲氧基苯酚 | 0.02 | 0.02 | 0.02 | 0.02 | 0.02 | 0.02 |
乙烯基三甲氧基硅烷 | 0.71 | 0.71 | 0.71 | 0.71 | 0.71 | 0.71 |
Irgacure 184 | 0.59 | 0.59 | 0.59 | 0.59 | 0.59 | 0.59 |
CPI-6976 | 3.56 | 3.56 | 3.56 | 3.56 | 3.56 | 3.56 |
Nanopox XP 22/0543 | 50.00 | 50.00 | 50.00 | 50.00 | 50.00 | 50.00 |
填料% | 25 | 25 | 25 | 25 | 25 | 25 |
杨氏模量Mpa | 2993 | 3176 | 3084 | 2922 | 2975 | 2631 |
屈服伸长率% | 2,6 | 3,6 | 3,5 | 3,5 | 2,9 | 3,8 |
抗张强度Mpa | 66 | 81 | 75 | 71 | 67 | 65 |
断裂伸长率% | 2,6 | 3,6 | 3,5 | 3,5 | 2,9 | 3,8 |
Ec(mJ/cm2) | 6.48 | 5.88 | 6.07 | 6.34 | 7.1 | 5.95 |
Dp(密耳) | 5.97 | 5.63 | 5.75 | 5.48 | 6.05 | 5.06 |
E5(mJ/cm2) | 15 | 14.3 | 14.5 | 15.8 | 16.2 | 16 |
E10(mJ/cm2) | 34.6 | 34.7 | 34.6 | 39.3 | 37.1 | 42.9 |
组分 | 2.6 | 1.8 | 5.1 | 5.2 | 5.3 | 5.4 | 5.5 | 5.6 | 5.7 | 5.8 |
UVC 1500 | 11.97 | 11.97 | 10.79 | 9.22 | 6.06 | 2.91 | 0.00 | 21.48 | 15.55 | 21.48 |
Grilonit F713 | 8.54 | 8.54 | 8.82 | 8.82 | 8.82 | 8.82 | 8.82 | |||
1,4-丁二醇二缩水甘油醚 | 10.26 | 10.26 | 10.26 | |||||||
UVR-6000 | 1.58 | 3.15 | 6.30 | 9.45 | 12.37 | |||||
OXT-211 | 5.94 | 11.87 | ||||||||
OXT-212 | 5.94 | |||||||||
DPHA | 7.93 | 8.19 | 8.19 | 8.19 | 8.19 | 8.19 | 2.84 | 2.84 | 2.84 | |
SR-351 | 4.59 | 4.59 | 4.59 | |||||||
ebecryl 3700 | 7.93 | |||||||||
对甲氧基苯酚 | 0.02 | 0.02 | 0.02 | |||||||
乙烯基三甲氧基硅烷 | 0.71 | 0.71 | 0.71 | |||||||
Irgacure 184 | 1.68 | 1.68 | 0.95 | 0.95 | 0.95 | 0.95 | 0.95 | 0.59 | 0.59 | 0.59 |
CPI-6976 | 4.88 | 4.88 | 2.52 | 2.52 | 2.52 | 2.52 | 2.52 | 3.56 | 3.56 | 3.56 |
Nanopox XP 22/0540 | 65.00 | 65.00 | 67.15 | 67.15 | 67.15 | 67.15 | 67.15 | 50.00 | 50.00 | 50.00 |
填料% | 39 | 39 | 40.29 | 40.29 | 40.29 | 40.29 | 40.29 | 30 | 30 | 30 |
杨氏模量Mpa | 2652 | 2556 | 2213 | 2100 | 2074 | 1761 | 1727 | 3005 | 3367 | 3195 |
屈服伸长率% | 3,8 | 4 | 8,3 | 3,8 | 2,9 | 3 | 3,2 | 3,2 | 3,2 | 3,2 |
抗张强度Mpa | 60 | 62 | 57 | 33 | 30 | 28 | 26 | 59 | 63 | 59 |
断裂伸长率% | 3,8 | 4,2 | 8,3 | 3,8 | 3 | 3 | 3,2 | 3,2 | 3,6 | 4,1 |
Ec(mJ/cm2) | 13.35 | 5.77 | 6.02 | 14.6 | 13.49 | 12.2 | 16.58 | 13.75 | 13.47 | 16.13 |
Dp(密耳) | 3.48 | 2.88 | 3.31 | 6.18 | 5.72 | 5.47 | 6.18 | 5.2 | 4.85 | 5.64 |
E5(mJ/cm2) | 56.1 | 32.7 | 27.3 | 32.8 | 32.3 | 30.4 | 37.3 | 35.9 | 37.8 | 39.2 |
E10(mJ/cm2) | 235.7 | 184.9 | 225.9 | 73.7 | 77.4 | 75.8 | 83.7 | 93.9 | 106 | 95.1 |
组分 | 5.2 | 6.1 | 6.2 | 6.3 | 6.4 | 6.5 |
UVC 1500 | 9.22 | 8.90 | 8.90 | 8.90 | 8.90 | 8.90 |
Triton X-100 | 0.32 | |||||
Airvol 305 | 0.32 | |||||
Pluronic L35 | 0.32 | |||||
Pluronic 10R-5 | 0.32 | |||||
Igapol AL CO-630 | 0.32 | |||||
UVR-6000 | 3.15 | 3.15 | 3.15 | 3.15 | 3.15 | 3.15 |
DPHA | 8.19 | 8.19 | 8.19 | 8.19 | 8.19 | 8.19 |
Grilonit F713 | 8.82 | 8.82 | 8.82 | 8.82 | 8.82 | 8.82 |
Irgacure 184 | 0.95 | 0.95 | 0.95 | 0.95 | 0.95 | 0.95 |
CPI-6976 | 2.52 | 2.52 | 2.52 | 2.52 | 2.52 | 2.52 |
Nanopox XP 22/0540 | 67.15 | 67.15 | 67.15 | 67.15 | 67.15 | 67.15 |
填料% | 40.29 | 40.29 | 40.29 | 40.29 | 40.29 | 40.29 |
杨氏模量Mpa | 2100 | 3743 | 3363 | 3871 | 3853 | 3734 |
屈服伸长率% | 3,8 | 1,6 | 1,3 | 1,1 | 1,2 | 1,8 |
抗张强度Mpa | 33 | 44 | 41 | 53 | 58 | 49 |
断裂伸长率% | 3,8 | 1,7 | 1,5 | 2,1 | 2,2 | 1,9 |
Ec(mJ/cm2) | 14.6 | 8.08 | 14.8 | 10.58 | 8.08 | 14.99 |
Dp(密耳) | 6.18 | 4.48 | 5.41 | 5.27 | 4.48 | 5.77 |
E5(mJ/cm2) | 32.8 | 24.7 | 37.3 | 27.3 | 24.7 | 35.7 |
E10(mJ/cm2) | 73.7 | 75.3 | 94 | 70.5 | 75.3 | 84.9 |
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US60/526,151 | 2003-12-02 | ||
PCT/NL2004/000778 WO2005045525A1 (en) | 2003-11-06 | 2004-11-05 | Curable compositions and rapid prototyping process using the same |
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Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1989007620A1 (en) * | 1988-02-19 | 1989-08-24 | Asahi Denka Kogyo K.K. | Resin composition for optical modeling |
JPH09268205A (ja) * | 1996-03-29 | 1997-10-14 | Asahi Denka Kogyo Kk | 光学的立体造形用樹脂組成物および光学的立体造形法 |
JP3626275B2 (ja) * | 1996-04-09 | 2005-03-02 | Jsr株式会社 | 光硬化性樹脂組成物 |
JP3626302B2 (ja) * | 1996-12-10 | 2005-03-09 | Jsr株式会社 | 光硬化性樹脂組成物 |
AU744727B2 (en) * | 1997-07-21 | 2002-02-28 | Vantico Ag | Sedimentation stabilized radiation-curable filled compositions |
JP4017236B2 (ja) * | 1998-02-24 | 2007-12-05 | Jsr株式会社 | 光硬化性液状樹脂組成物 |
JP4017238B2 (ja) * | 1998-02-24 | 2007-12-05 | Jsr株式会社 | 光硬化性液状樹脂組成物 |
US6136497A (en) * | 1998-03-30 | 2000-10-24 | Vantico, Inc. | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
JP4350832B2 (ja) * | 1999-04-19 | 2009-10-21 | Jsr株式会社 | 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物 |
DE10150256A1 (de) * | 2001-10-11 | 2003-07-10 | Envision Technologies Gmbh I I | Verfahren und Vorrichtung zum Herstellen von dreidimensionalen Objekten |
KR20120086737A (ko) * | 2002-05-03 | 2012-08-03 | 디에스엠 아이피 어셋츠 비.브이. | 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 |
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US20050040562A1 (en) * | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
-
2004
- 2004-11-05 WO PCT/NL2004/000778 patent/WO2005045525A1/en active Application Filing
- 2004-11-05 CN CN2004800326621A patent/CN1879058B/zh active Active
- 2004-11-05 EP EP04800170.5A patent/EP1680713B1/en active Active
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WO2005045525A1 (en) | 2005-05-19 |
EP1680713A1 (en) | 2006-07-19 |
CN1879058B (zh) | 2012-05-23 |
KR20060108660A (ko) | 2006-10-18 |
EP1680713B1 (en) | 2015-09-23 |
HK1099372A1 (en) | 2007-08-10 |
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