CN1839351A - 光掩模涂层 - Google Patents

光掩模涂层 Download PDF

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Publication number
CN1839351A
CN1839351A CNA2004800239943A CN200480023994A CN1839351A CN 1839351 A CN1839351 A CN 1839351A CN A2004800239943 A CNA2004800239943 A CN A2004800239943A CN 200480023994 A CN200480023994 A CN 200480023994A CN 1839351 A CN1839351 A CN 1839351A
Authority
CN
China
Prior art keywords
photomask
phosphine
phosphorus
acid esters
fluoridizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004800239943A
Other languages
English (en)
Chinese (zh)
Inventor
卢道隆
马克·J·佩莱里特
理查德·M·弗林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN1839351A publication Critical patent/CN1839351A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G03F1/78—Patterning of masks by imaging by charged particle beam [CPB], e.g. electron beam patterning of masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Plasma & Fusion (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
CNA2004800239943A 2003-08-21 2004-06-30 光掩模涂层 Pending CN1839351A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/645,020 US7189479B2 (en) 2003-08-21 2003-08-21 Phototool coating
US10/645,020 2003-08-21

Publications (1)

Publication Number Publication Date
CN1839351A true CN1839351A (zh) 2006-09-27

Family

ID=34194211

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004800239943A Pending CN1839351A (zh) 2003-08-21 2004-06-30 光掩模涂层

Country Status (6)

Country Link
US (2) US7189479B2 (enExample)
EP (1) EP1656588A2 (enExample)
JP (1) JP2007503016A (enExample)
KR (1) KR20060080182A (enExample)
CN (1) CN1839351A (enExample)
WO (1) WO2005024520A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429086A (zh) * 2015-04-03 2017-12-01 莫克斯泰克公司 疏水性膦酸酯和硅烷化学物质
CN111766656A (zh) * 2015-04-03 2020-10-13 莫克斯泰克公司 线栅起偏器的氧化和水分屏障层
CN114326304A (zh) * 2021-12-30 2022-04-12 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4718463B2 (ja) * 2003-08-21 2011-07-06 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体
US7717693B2 (en) * 2004-05-28 2010-05-18 Obducat Ab Modified metal mold for use in imprinting processes
US20090050143A1 (en) * 2006-03-24 2009-02-26 Boardman Larry D Medicinal formulation container with a treated metal surface
US8337959B2 (en) * 2006-11-28 2012-12-25 Nanonex Corporation Method and apparatus to apply surface release coating for imprint mold
US20090041986A1 (en) * 2007-06-21 2009-02-12 3M Innovative Properties Company Method of making hierarchical articles
US20090114618A1 (en) * 2007-06-21 2009-05-07 3M Innovative Properties Company Method of making hierarchical articles
US20080315459A1 (en) * 2007-06-21 2008-12-25 3M Innovative Properties Company Articles and methods for replication of microstructures and nanofeatures
US20100285227A1 (en) * 2007-12-31 2010-11-11 Yapel Robert A Method for applying a coatable material
US8663874B2 (en) * 2008-03-11 2014-03-04 3M Innovative Properties Company Hardcoat composition
US20110014391A1 (en) * 2008-03-26 2011-01-20 Yapel Robert A Methods of slide coating two or more fluids
EP2268416A1 (en) * 2008-03-26 2011-01-05 3M Innovative Properties Company Methods of slide coating fluids containing multi unit polymeric precursors
CN102015122A (zh) * 2008-03-26 2011-04-13 3M创新有限公司 坡流涂布两种或更多种流体的方法
MX2011006673A (es) * 2008-12-18 2011-07-20 3M Innovative Properties Co Metodo para poner en contacto formaciones que contienen hidrocarburos con posiciones de fosfatos y fosfonatos fluorados.
CN102597116B (zh) 2009-07-21 2013-12-11 3M创新有限公司 可固化组合物、涂覆底片的方法、以及被涂覆的底片
WO2011034847A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
US8420281B2 (en) 2009-09-16 2013-04-16 3M Innovative Properties Company Epoxy-functionalized perfluoropolyether polyurethanes
WO2011034845A1 (en) 2009-09-16 2011-03-24 3M Innovative Properties Company Fluorinated coating and phototools made therewith
JP5617239B2 (ja) * 2009-12-25 2014-11-05 富士通株式会社 保護膜付きレジストパターン形成用部材とその製造方法、及びレジストパターンの製造方法
US8747092B2 (en) 2010-01-22 2014-06-10 Nanonex Corporation Fast nanoimprinting apparatus using deformale mold
WO2014145360A1 (en) 2013-03-15 2014-09-18 Nanonex Corporation Imprint lithography system and method for manufacturing
US10108086B2 (en) 2013-03-15 2018-10-23 Nanonex Corporation System and methods of mold/substrate separation for imprint lithography
US9995864B2 (en) 2015-04-03 2018-06-12 Moxtek, Inc. Wire grid polarizer with silane protective coating
US10534120B2 (en) 2015-04-03 2020-01-14 Moxtek, Inc. Wire grid polarizer with protected wires
KR102138960B1 (ko) 2016-01-27 2020-07-28 주식회사 엘지화학 필름 마스크, 이의 제조방법, 이를 이용한 패턴 형성 방법 및 이를 이용하여 형성된 패턴
WO2017131497A1 (ko) * 2016-01-27 2017-08-03 주식회사 엘지화학 필름 마스크, 이의 제조방법 및 이를 이용한 패턴 형성 방법
JP6725097B2 (ja) 2016-01-27 2020-07-15 エルジー・ケム・リミテッド フィルムマスク、その製造方法、これを用いたパターンの形成方法およびこれを用いて形成されたパターン
JP7365086B1 (ja) 2023-04-04 2023-10-19 株式会社ハーベス パーフルオロポリエーテル基含有ホスホネート化合物、表面処理剤、及び該表面処理剤で処理された物品

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492374A (en) 1963-06-14 1970-01-27 Du Pont Polyfluoropolyoxa-alkyl phosphates
US3306855A (en) 1966-03-24 1967-02-28 Du Pont Corrosion and rust inhibited poly (hexafluoropropylene oxide) oil compositions
US3810874A (en) 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
JPS5950444A (ja) 1982-09-16 1984-03-23 Tokyo Ohka Kogyo Co Ltd 微細加工用ホトマスク
US4514489A (en) 1983-09-01 1985-04-30 Motorola, Inc. Photolithography process
JPH071390B2 (ja) 1985-08-19 1995-01-11 富士写真フイルム株式会社 複数の感光性平版印刷版の保管方法
JPH01268696A (ja) 1988-04-19 1989-10-26 Daikin Ind Ltd 含フッ素リン酸エステル及びその製法並びに含フッ素防錆剤
JP2582893B2 (ja) 1989-03-31 1997-02-19 日立マクセル株式会社 有機電解液電池
US5032279A (en) 1989-09-21 1991-07-16 Occidental Chemical Corporation Separation of fluids using polyimidesiloxane membrane
CA2039667C (en) 1990-04-07 2001-10-02 Tetsuya Masutani Leather treatment composition and process for treating leather
JPH0473652A (ja) 1990-07-13 1992-03-09 Sumitomo Metal Mining Co Ltd 露光方法
JP3020320B2 (ja) 1991-07-23 2000-03-15 信越化学工業株式会社 リソグラフィ−用ペリクル
JP3009010B2 (ja) 1992-05-08 2000-02-14 東洋紡績株式会社 感光性樹脂積層体
IT1256721B (it) 1992-12-16 1995-12-15 Ausimont Spa Processo per impartire oleo- ed idro-repellenza alla superficie di materiali ceramici porosi
IT1270654B (it) 1994-10-13 1997-05-07 Ausimont Spa Processo per impartire oleo- ed idro-repellenza a fibre tessili, pelle cuoio e simili
US5550277A (en) 1995-01-19 1996-08-27 Paciorek; Kazimiera J. L. Perfluoroalkyl and perfluoroalkylether substituted aromatic phosphates, phosphonates and related compositions
US5851674A (en) 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
JPH1180594A (ja) 1997-08-29 1999-03-26 Toagosei Co Ltd 被覆用樹脂組成物およびこれを被覆してなるフォトマスク
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
AU2230599A (en) 1998-01-27 1999-08-09 Minnesota Mining And Manufacturing Company Fluorochemical benzotriazoles
US6184187B1 (en) 1998-04-07 2001-02-06 E. I. Dupont De Nemours And Company Phosphorus compounds and their use as corrosion inhibitors for perfluoropolyethers
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
US6177357B1 (en) 1999-04-30 2001-01-23 3M Innovative Properties Company Method for making flexible circuits
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6824882B2 (en) * 2002-05-31 2004-11-30 3M Innovative Properties Company Fluorinated phosphonic acids
US6762013B2 (en) * 2002-10-04 2004-07-13 Eastman Kodak Company Thermally developable materials containing fluorochemical conductive layers
JP4718463B2 (ja) * 2003-08-21 2011-07-06 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロポリエーテルアミド連結ホスホネート、ホスフェートおよびそれらの誘導体

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107429086A (zh) * 2015-04-03 2017-12-01 莫克斯泰克公司 疏水性膦酸酯和硅烷化学物质
CN111766656A (zh) * 2015-04-03 2020-10-13 莫克斯泰克公司 线栅起偏器的氧化和水分屏障层
CN114326304A (zh) * 2021-12-30 2022-04-12 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶
CN114326304B (zh) * 2021-12-30 2024-08-20 苏州瑞红电子化学品有限公司 一种耐刻蚀的正性光刻胶

Also Published As

Publication number Publication date
US20070128557A1 (en) 2007-06-07
JP2007503016A (ja) 2007-02-15
US20050042553A1 (en) 2005-02-24
US7189479B2 (en) 2007-03-13
KR20060080182A (ko) 2006-07-07
WO2005024520A2 (en) 2005-03-17
WO2005024520A3 (en) 2005-09-09
EP1656588A2 (en) 2006-05-17

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