CN1771282A - 高分子材料的表面的电离方法 - Google Patents

高分子材料的表面的电离方法 Download PDF

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Publication number
CN1771282A
CN1771282A CNA038264293A CN03826429A CN1771282A CN 1771282 A CN1771282 A CN 1771282A CN A038264293 A CNA038264293 A CN A038264293A CN 03826429 A CN03826429 A CN 03826429A CN 1771282 A CN1771282 A CN 1771282A
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CN
China
Prior art keywords
chamber
polymer
target compound
main chamber
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA038264293A
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English (en)
Chinese (zh)
Inventor
金乙玟
林德九
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jin Yimen
Lin Dejiu
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Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CN1771282A publication Critical patent/CN1771282A/zh
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/16Chemical modification with polymerisable compounds
    • C08J7/18Chemical modification with polymerisable compounds using wave energy or particle radiation

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
CNA038264293A 2003-05-09 2003-08-18 高分子材料的表面的电离方法 Pending CN1771282A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2003-0029393A KR100500040B1 (ko) 2003-05-09 2003-05-09 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법
KR1020030029393 2003-05-09

Publications (1)

Publication Number Publication Date
CN1771282A true CN1771282A (zh) 2006-05-10

Family

ID=36383816

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA038264293A Pending CN1771282A (zh) 2003-05-09 2003-08-18 高分子材料的表面的电离方法

Country Status (7)

Country Link
US (1) US20060042745A1 (enExample)
EP (1) EP1629029A4 (enExample)
JP (1) JP2006514149A (enExample)
KR (1) KR100500040B1 (enExample)
CN (1) CN1771282A (enExample)
AU (1) AU2003256107A1 (enExample)
WO (1) WO2004104074A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202009001530U1 (de) * 2009-02-06 2009-04-09 Sura Co. Strahlenschutzvorrichtung für Mobiltelefone
FR2942801B1 (fr) * 2009-03-05 2012-03-23 Quertech Ingenierie Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement
FR2964972B1 (fr) * 2010-09-20 2014-07-11 Valeo Vision Materiau a base de polyamide(s) traite en surface
FR2964971B1 (fr) * 2010-09-20 2014-07-11 Valeo Vision Materiau a base de polymere(s) traite en surface
FR2969078B1 (fr) 2010-12-15 2013-04-12 Valeo Systemes Dessuyage Organe d'essuyage en materiau a base d'elastomere(s) sur-reticule
FR2969079B1 (fr) 2010-12-15 2013-04-12 Valeo Systemes Dessuyage Procede de fabrication d'une jumelle d'organes d'essuyage
CN103370363B (zh) 2010-12-15 2016-02-10 法雷奥系统公司 风挡擦拭器刮片处理方法
FR2975308B1 (fr) 2011-05-16 2015-06-26 Valeo Systemes Dessuyage Dispositif d'etancheite pour le traitement sous vide d'une surface d'un objet
FR2976536B1 (fr) 2011-06-15 2014-09-12 Valeo Systemes Dessuyage Procede de traitement d'un organe d'essuyage

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5133757A (en) * 1990-07-31 1992-07-28 Spire Corporation Ion implantation of plastic orthopaedic implants
KR960000481B1 (ko) * 1992-06-23 1996-01-08 주식회사고진공산업 플라스틱에 전자파 방해 차단용 금속 피막 형성방법
US5868897A (en) * 1996-07-31 1999-02-09 Toyo Technologies, Inc. Device and method for processing a plasma to alter the surface of a substrate using neutrals
US5993678A (en) * 1996-07-31 1999-11-30 Toyo Technologies Inc. Device and method for processing a plasma to alter the surface of a substrate
JPH1180947A (ja) * 1997-09-01 1999-03-26 Anelva Corp イオン化スパッタ装置
KR100347971B1 (ko) * 2000-03-06 2002-08-09 한국전력공사 낮은 에너지 이온빔조사에 의한 폴리머 표면의 전기 전도성 및 기계적 물성향상 장치
EP1279955B2 (en) * 2001-07-24 2010-03-03 Services Petroliers Schlumberger Helium ionization detector

Also Published As

Publication number Publication date
KR100500040B1 (ko) 2005-07-18
US20060042745A1 (en) 2006-03-02
WO2004104074A1 (en) 2004-12-02
EP1629029A1 (en) 2006-03-01
JP2006514149A (ja) 2006-04-27
EP1629029A4 (en) 2006-06-07
AU2003256107A1 (en) 2004-12-13
KR20030071656A (ko) 2003-09-06

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: JIN YIMIN; APPLICANT

Free format text: FORMER OWNER: JIN YIMIN

Effective date: 20060623

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20060623

Address after: Gyeonggi Do, South Korea

Applicant after: Jin Yimen

Co-applicant after: Lin Dejiu

Address before: Gyeonggi Do, South Korea

Applicant before: Jin Yimen

C12 Rejection of a patent application after its publication
RJ01 Rejection of invention patent application after publication

Open date: 20060510