CN1771282A - 高分子材料的表面的电离方法 - Google Patents
高分子材料的表面的电离方法 Download PDFInfo
- Publication number
- CN1771282A CN1771282A CNA038264293A CN03826429A CN1771282A CN 1771282 A CN1771282 A CN 1771282A CN A038264293 A CNA038264293 A CN A038264293A CN 03826429 A CN03826429 A CN 03826429A CN 1771282 A CN1771282 A CN 1771282A
- Authority
- CN
- China
- Prior art keywords
- chamber
- polymer
- target compound
- main chamber
- ion beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2003-0029393A KR100500040B1 (ko) | 2003-05-09 | 2003-05-09 | 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법 |
| KR1020030029393 | 2003-05-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1771282A true CN1771282A (zh) | 2006-05-10 |
Family
ID=36383816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA038264293A Pending CN1771282A (zh) | 2003-05-09 | 2003-08-18 | 高分子材料的表面的电离方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20060042745A1 (enExample) |
| EP (1) | EP1629029A4 (enExample) |
| JP (1) | JP2006514149A (enExample) |
| KR (1) | KR100500040B1 (enExample) |
| CN (1) | CN1771282A (enExample) |
| AU (1) | AU2003256107A1 (enExample) |
| WO (1) | WO2004104074A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202009001530U1 (de) * | 2009-02-06 | 2009-04-09 | Sura Co. | Strahlenschutzvorrichtung für Mobiltelefone |
| FR2942801B1 (fr) * | 2009-03-05 | 2012-03-23 | Quertech Ingenierie | Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement |
| FR2964972B1 (fr) * | 2010-09-20 | 2014-07-11 | Valeo Vision | Materiau a base de polyamide(s) traite en surface |
| FR2964971B1 (fr) * | 2010-09-20 | 2014-07-11 | Valeo Vision | Materiau a base de polymere(s) traite en surface |
| FR2969078B1 (fr) | 2010-12-15 | 2013-04-12 | Valeo Systemes Dessuyage | Organe d'essuyage en materiau a base d'elastomere(s) sur-reticule |
| FR2969079B1 (fr) | 2010-12-15 | 2013-04-12 | Valeo Systemes Dessuyage | Procede de fabrication d'une jumelle d'organes d'essuyage |
| CN103370363B (zh) | 2010-12-15 | 2016-02-10 | 法雷奥系统公司 | 风挡擦拭器刮片处理方法 |
| FR2975308B1 (fr) | 2011-05-16 | 2015-06-26 | Valeo Systemes Dessuyage | Dispositif d'etancheite pour le traitement sous vide d'une surface d'un objet |
| FR2976536B1 (fr) | 2011-06-15 | 2014-09-12 | Valeo Systemes Dessuyage | Procede de traitement d'un organe d'essuyage |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5133757A (en) * | 1990-07-31 | 1992-07-28 | Spire Corporation | Ion implantation of plastic orthopaedic implants |
| KR960000481B1 (ko) * | 1992-06-23 | 1996-01-08 | 주식회사고진공산업 | 플라스틱에 전자파 방해 차단용 금속 피막 형성방법 |
| US5868897A (en) * | 1996-07-31 | 1999-02-09 | Toyo Technologies, Inc. | Device and method for processing a plasma to alter the surface of a substrate using neutrals |
| US5993678A (en) * | 1996-07-31 | 1999-11-30 | Toyo Technologies Inc. | Device and method for processing a plasma to alter the surface of a substrate |
| JPH1180947A (ja) * | 1997-09-01 | 1999-03-26 | Anelva Corp | イオン化スパッタ装置 |
| KR100347971B1 (ko) * | 2000-03-06 | 2002-08-09 | 한국전력공사 | 낮은 에너지 이온빔조사에 의한 폴리머 표면의 전기 전도성 및 기계적 물성향상 장치 |
| EP1279955B2 (en) * | 2001-07-24 | 2010-03-03 | Services Petroliers Schlumberger | Helium ionization detector |
-
2003
- 2003-05-09 KR KR10-2003-0029393A patent/KR100500040B1/ko not_active Expired - Fee Related
- 2003-08-18 US US10/522,369 patent/US20060042745A1/en not_active Abandoned
- 2003-08-18 CN CNA038264293A patent/CN1771282A/zh active Pending
- 2003-08-18 WO PCT/KR2003/001659 patent/WO2004104074A1/en not_active Ceased
- 2003-08-18 JP JP2004572150A patent/JP2006514149A/ja active Pending
- 2003-08-18 EP EP03817017A patent/EP1629029A4/en not_active Withdrawn
- 2003-08-18 AU AU2003256107A patent/AU2003256107A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR100500040B1 (ko) | 2005-07-18 |
| US20060042745A1 (en) | 2006-03-02 |
| WO2004104074A1 (en) | 2004-12-02 |
| EP1629029A1 (en) | 2006-03-01 |
| JP2006514149A (ja) | 2006-04-27 |
| EP1629029A4 (en) | 2006-06-07 |
| AU2003256107A1 (en) | 2004-12-13 |
| KR20030071656A (ko) | 2003-09-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6715461B2 (ja) | 表面改質成型体の製造方法、及び該表面改質成型体を用いた複合体の製造方法 | |
| JP4243548B2 (ja) | 被覆を硬化させる方法及び装置 | |
| JP2718957B2 (ja) | 結晶性熱可塑性樹脂成形品の静電塗装方法並びに塗装プラスチックス成形品 | |
| KR100816312B1 (ko) | 이온 주입 방법 및 이온 주입 장치 | |
| CN1771282A (zh) | 高分子材料的表面的电离方法 | |
| KR100443655B1 (ko) | 저온상압 플라즈마를 사용하는 고분자 수지계 성형품의표면처리방법 | |
| KR101474090B1 (ko) | 성형체, 그 제조 방법, 전자 디바이스용 부재 및 전자 디바이스 | |
| CN104674168B (zh) | 一种聚合物高分子材料等离子体表面改性工艺 | |
| CN1257995C (zh) | 在聚合物基底上沉积io或ito薄膜的方法 | |
| Saboohi et al. | Promiscuous hydrogen in polymerising plasmas | |
| CN1259173A (zh) | 在材料表面进行等离子体聚合反应 | |
| JP3474176B2 (ja) | 低エネルギーイオンビーム照射によるポリマー表面の電気伝導性及び機械的物性の向上方法とその装置 | |
| CN101044603A (zh) | 等离子体cvd装置 | |
| WO2015129675A1 (ja) | 誘電体基材表面の金属化方法及び金属膜付き誘電体基材 | |
| CN100544941C (zh) | 高分子成型产品表面处理装置 | |
| CN1802723A (zh) | 用于膨胀热等离子体的电感耦合的系统和方法 | |
| KR20000036440A (ko) | 3차원적인 이온주입에 의한 도전영역 형성방법 | |
| KR100415977B1 (ko) | Ecr을 이용한 도전성 고분자수지의 제조방법 | |
| KR20170011175A (ko) | 이온빔 조사에 의한 고경도 폴리머 및 그 제조 방법 | |
| Vogelsang et al. | Deposition of thin films from amino group containing precursors with an atmospheric pressure microplasma jet | |
| KR900004944B1 (ko) | 전자파 차폐용 열가소성 수지 조성물 | |
| KR100302870B1 (ko) | 이온빔에 의한 고분자 필름 표면의 금속 증착방법 | |
| CN1890175A (zh) | 衍生富勒烯的制造装置及制造方法 | |
| JPH0261499B2 (enExample) | ||
| WO2017153747A1 (en) | Barrier coated substrates |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: JIN YIMIN; APPLICANT Free format text: FORMER OWNER: JIN YIMIN Effective date: 20060623 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20060623 Address after: Gyeonggi Do, South Korea Applicant after: Jin Yimen Co-applicant after: Lin Dejiu Address before: Gyeonggi Do, South Korea Applicant before: Jin Yimen |
|
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20060510 |