KR100500040B1 - 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법 - Google Patents

전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법 Download PDF

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Publication number
KR100500040B1
KR100500040B1 KR10-2003-0029393A KR20030029393A KR100500040B1 KR 100500040 B1 KR100500040 B1 KR 100500040B1 KR 20030029393 A KR20030029393 A KR 20030029393A KR 100500040 B1 KR100500040 B1 KR 100500040B1
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KR
South Korea
Prior art keywords
product
chamber
main chamber
ion
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR10-2003-0029393A
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English (en)
Korean (ko)
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KR20030071656A (ko
Inventor
김을문
임덕구
Original Assignee
주식회사 케이핍
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Priority to KR10-2003-0029393A priority Critical patent/KR100500040B1/ko
Application filed by 주식회사 케이핍 filed Critical 주식회사 케이핍
Priority to PCT/KR2003/001659 priority patent/WO2004104074A1/en
Priority to JP2004572150A priority patent/JP2006514149A/ja
Priority to US10/522,369 priority patent/US20060042745A1/en
Priority to EP03817017A priority patent/EP1629029A4/en
Priority to CNA038264293A priority patent/CN1771282A/zh
Priority to AU2003256107A priority patent/AU2003256107A1/en
Publication of KR20030071656A publication Critical patent/KR20030071656A/ko
Application granted granted Critical
Publication of KR100500040B1 publication Critical patent/KR100500040B1/ko
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
KR10-2003-0029393A 2003-05-09 2003-05-09 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법 Expired - Fee Related KR100500040B1 (ko)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR10-2003-0029393A KR100500040B1 (ko) 2003-05-09 2003-05-09 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법
JP2004572150A JP2006514149A (ja) 2003-05-09 2003-08-18 高分子材料表面のイオン化方法
US10/522,369 US20060042745A1 (en) 2003-05-09 2003-08-18 Ionization method of surface of high molecular materials
EP03817017A EP1629029A4 (en) 2003-05-09 2003-08-18 METHOD FOR IONIZING THE SURFACE OF HIGHLY MOLECULAR MATERIALS
PCT/KR2003/001659 WO2004104074A1 (en) 2003-05-09 2003-08-18 An ionization method of surface of high molecular materials
CNA038264293A CN1771282A (zh) 2003-05-09 2003-08-18 高分子材料的表面的电离方法
AU2003256107A AU2003256107A1 (en) 2003-05-09 2003-08-18 An ionization method of surface of high molecular materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2003-0029393A KR100500040B1 (ko) 2003-05-09 2003-05-09 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법

Publications (2)

Publication Number Publication Date
KR20030071656A KR20030071656A (ko) 2003-09-06
KR100500040B1 true KR100500040B1 (ko) 2005-07-18

Family

ID=36383816

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-0029393A Expired - Fee Related KR100500040B1 (ko) 2003-05-09 2003-05-09 전자파 차단, 대전방지, 표면경화를 위한 고분자재료성형품의 표면 이온화 방법

Country Status (7)

Country Link
US (1) US20060042745A1 (enExample)
EP (1) EP1629029A4 (enExample)
JP (1) JP2006514149A (enExample)
KR (1) KR100500040B1 (enExample)
CN (1) CN1771282A (enExample)
AU (1) AU2003256107A1 (enExample)
WO (1) WO2004104074A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202009001530U1 (de) * 2009-02-06 2009-04-09 Sura Co. Strahlenschutzvorrichtung für Mobiltelefone
FR2942801B1 (fr) * 2009-03-05 2012-03-23 Quertech Ingenierie Procede de traitement d'une piece en elastomere par des ions multi-energies he+ et he2+ pour diminuer le frottement
FR2964972B1 (fr) * 2010-09-20 2014-07-11 Valeo Vision Materiau a base de polyamide(s) traite en surface
FR2964971B1 (fr) * 2010-09-20 2014-07-11 Valeo Vision Materiau a base de polymere(s) traite en surface
FR2969078B1 (fr) 2010-12-15 2013-04-12 Valeo Systemes Dessuyage Organe d'essuyage en materiau a base d'elastomere(s) sur-reticule
FR2969079B1 (fr) 2010-12-15 2013-04-12 Valeo Systemes Dessuyage Procede de fabrication d'une jumelle d'organes d'essuyage
CN103370363B (zh) 2010-12-15 2016-02-10 法雷奥系统公司 风挡擦拭器刮片处理方法
FR2975308B1 (fr) 2011-05-16 2015-06-26 Valeo Systemes Dessuyage Dispositif d'etancheite pour le traitement sous vide d'une surface d'un objet
FR2976536B1 (fr) 2011-06-15 2014-09-12 Valeo Systemes Dessuyage Procede de traitement d'un organe d'essuyage

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5133757A (en) * 1990-07-31 1992-07-28 Spire Corporation Ion implantation of plastic orthopaedic implants
KR960000481B1 (ko) * 1992-06-23 1996-01-08 주식회사고진공산업 플라스틱에 전자파 방해 차단용 금속 피막 형성방법
US5868897A (en) * 1996-07-31 1999-02-09 Toyo Technologies, Inc. Device and method for processing a plasma to alter the surface of a substrate using neutrals
US5993678A (en) * 1996-07-31 1999-11-30 Toyo Technologies Inc. Device and method for processing a plasma to alter the surface of a substrate
JPH1180947A (ja) * 1997-09-01 1999-03-26 Anelva Corp イオン化スパッタ装置
KR100347971B1 (ko) * 2000-03-06 2002-08-09 한국전력공사 낮은 에너지 이온빔조사에 의한 폴리머 표면의 전기 전도성 및 기계적 물성향상 장치
EP1279955B2 (en) * 2001-07-24 2010-03-03 Services Petroliers Schlumberger Helium ionization detector

Also Published As

Publication number Publication date
US20060042745A1 (en) 2006-03-02
WO2004104074A1 (en) 2004-12-02
EP1629029A1 (en) 2006-03-01
JP2006514149A (ja) 2006-04-27
EP1629029A4 (en) 2006-06-07
CN1771282A (zh) 2006-05-10
AU2003256107A1 (en) 2004-12-13
KR20030071656A (ko) 2003-09-06

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