CN1732562A - 电子零件装置 - Google Patents
电子零件装置 Download PDFInfo
- Publication number
- CN1732562A CN1732562A CNA2003801073508A CN200380107350A CN1732562A CN 1732562 A CN1732562 A CN 1732562A CN A2003801073508 A CNA2003801073508 A CN A2003801073508A CN 200380107350 A CN200380107350 A CN 200380107350A CN 1732562 A CN1732562 A CN 1732562A
- Authority
- CN
- China
- Prior art keywords
- component
- accessory device
- ether
- electronic accessory
- epoxy resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims abstract description 90
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 74
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 67
- 239000004065 semiconductor Substances 0.000 claims abstract description 60
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 56
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims abstract description 49
- 239000007788 liquid Substances 0.000 claims abstract description 46
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 45
- 239000011737 fluorine Substances 0.000 claims abstract description 45
- -1 fluorine aromatic diamine compound Chemical class 0.000 claims abstract description 41
- 239000004593 Epoxy Substances 0.000 claims abstract description 34
- 229920005989 resin Polymers 0.000 claims abstract description 30
- 239000011347 resin Substances 0.000 claims abstract description 30
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 25
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 23
- 238000004382 potting Methods 0.000 claims abstract description 23
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims description 65
- 150000001875 compounds Chemical class 0.000 claims description 48
- 125000001153 fluoro group Chemical group F* 0.000 claims description 27
- 150000004984 aromatic diamines Chemical class 0.000 claims description 25
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 18
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical group OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 claims description 18
- 238000011049 filling Methods 0.000 claims description 15
- 239000011256 inorganic filler Substances 0.000 claims description 15
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 15
- 125000000962 organic group Chemical group 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 12
- 150000002118 epoxides Chemical group 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- YSUQLAYJZDEMOT-UHFFFAOYSA-N 2-(butoxymethyl)oxirane Chemical compound CCCCOCC1CO1 YSUQLAYJZDEMOT-UHFFFAOYSA-N 0.000 claims description 4
- JPZRPCNEISCANI-UHFFFAOYSA-N 4-(4-aminophenyl)-3-(trifluoromethyl)aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F JPZRPCNEISCANI-UHFFFAOYSA-N 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 4
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 claims description 3
- WNISWKAEAPQCJQ-UHFFFAOYSA-N 2-[(2-nonylphenoxy)methyl]oxirane Chemical compound CCCCCCCCCC1=CC=CC=C1OCC1OC1 WNISWKAEAPQCJQ-UHFFFAOYSA-N 0.000 claims description 3
- CUFXMPWHOWYNSO-UHFFFAOYSA-N 2-[(4-methylphenoxy)methyl]oxirane Chemical compound C1=CC(C)=CC=C1OCC1OC1 CUFXMPWHOWYNSO-UHFFFAOYSA-N 0.000 claims description 3
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 claims description 3
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 claims description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 3
- QYYZXEPEVBXNNA-QGZVFWFLSA-N (1R)-2-acetyl-N-[4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)phenyl]-5-methylsulfonyl-1,3-dihydroisoindole-1-carboxamide Chemical compound C(C)(=O)N1[C@H](C2=CC=C(C=C2C1)S(=O)(=O)C)C(=O)NC1=CC=C(C=C1)C(C(F)(F)F)(C(F)(F)F)O QYYZXEPEVBXNNA-QGZVFWFLSA-N 0.000 claims description 2
- 238000010276 construction Methods 0.000 claims description 2
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 239000000047 product Substances 0.000 description 50
- 239000003822 epoxy resin Substances 0.000 description 33
- 239000002585 base Substances 0.000 description 20
- 229910000679 solder Inorganic materials 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 230000004907 flux Effects 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 230000008439 repair process Effects 0.000 description 11
- 230000008961 swelling Effects 0.000 description 11
- 238000012360 testing method Methods 0.000 description 11
- 230000007547 defect Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 239000003960 organic solvent Substances 0.000 description 9
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 8
- 125000001931 aliphatic group Chemical group 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004033 plastic Substances 0.000 description 5
- 229920003023 plastic Polymers 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 238000007614 solvation Methods 0.000 description 5
- 229960000834 vinyl ether Drugs 0.000 description 5
- DLYDGDHLODCOQF-UHFFFAOYSA-N 1-ethenoxyethenylcyclohexane Chemical compound C=COC(=C)C1CCCCC1 DLYDGDHLODCOQF-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229920000742 Cotton Polymers 0.000 description 4
- YVNRUPSDZZZUQJ-UHFFFAOYSA-N [O].NC1=CC=CC=C1 Chemical compound [O].NC1=CC=CC=C1 YVNRUPSDZZZUQJ-UHFFFAOYSA-N 0.000 description 4
- 239000001361 adipic acid Substances 0.000 description 4
- 235000011037 adipic acid Nutrition 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- JTINZFQXZLCHNS-UHFFFAOYSA-N 2,2-bis(oxiran-2-ylmethoxymethyl)butan-1-ol Chemical compound C1OC1COCC(CO)(CC)COCC1CO1 JTINZFQXZLCHNS-UHFFFAOYSA-N 0.000 description 2
- IVIDDMGBRCPGLJ-UHFFFAOYSA-N 2,3-bis(oxiran-2-ylmethoxy)propan-1-ol Chemical compound C1OC1COC(CO)COCC1CO1 IVIDDMGBRCPGLJ-UHFFFAOYSA-N 0.000 description 2
- HXVNBWAKAOHACI-UHFFFAOYSA-N 2,4-dimethyl-3-pentanone Chemical compound CC(C)C(=O)C(C)C HXVNBWAKAOHACI-UHFFFAOYSA-N 0.000 description 2
- PSYGHMBJXWRQFD-UHFFFAOYSA-N 2-(2-sulfanylacetyl)oxyethyl 2-sulfanylacetate Chemical compound SCC(=O)OCCOC(=O)CS PSYGHMBJXWRQFD-UHFFFAOYSA-N 0.000 description 2
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 2
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 2
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- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 2
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- 125000003944 tolyl group Chemical group 0.000 description 2
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- NHXVNEDMKGDNPR-UHFFFAOYSA-N zinc;pentane-2,4-dione Chemical compound [Zn+2].CC(=O)[CH-]C(C)=O.CC(=O)[CH-]C(C)=O NHXVNEDMKGDNPR-UHFFFAOYSA-N 0.000 description 2
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Images
Classifications
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- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H—ELECTRICITY
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
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- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
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Abstract
Description
实施例 | ||||||||
1 | 2 | 3 | 4 | 5 | 6 | |||
液体环氧树脂 | a | 0.825 | 0.825 | 0.825 | 0.825 | 0.825 | 0.825 | |
b | 0.625 | 0.625 | 0.625 | 0.625 | 0.625 | 0.625 | ||
固化剂 | a | - | - | - | - | - | - | |
b | 0.88 | 0.88 | 0.88 | 0.88 | 0.22 | 0.66 | ||
N,N,N′,N′-四取代的含氟芳族二胺化合物 | 1.55 | 0.78 | 2.85 | 1.55 | 1.55 | 1.55 | ||
羧酸乙烯基醚加成产物 | a | 0.19 | 0.16 | 0.26 | 0.02 | 0.08 | 0.31 | |
b | - | - | - | - | - | - | ||
预聚物 | a | - | - | - | - | - | - | |
b | - | - | - | - | - | - | ||
无机填料 | - | - | - | - | - | - |
实施例 | ||||||
7 | 8 | 9 | 10 | 11 | 12 |
液体环氧树脂 | a | 0.825 | 0.825 | 0.825 | 0.825 | 0.825 | 0.825 | |
b | 0.625 | 0.625 | 0.625 | 0.625 | 0.625 | 0.625 | ||
固化剂 | a | - | 0.64 | - | - | - | - | |
b | 0.88 | - | 0.88 | 0.88 | 0.88 | 0.88 | ||
N,N,N′,N′-四取代的含氟芳族二胺化合物 | 1.55 | 1.39 | 1.55 | 1.55 | 0.78 | 2.85 | ||
羧酸乙烯基醚加成产物 | a | 0.70 | 0.17 | 0.19 | - | - | - | |
b | - | - | - | 0.19 | 0.16 | 0.26 | ||
预聚物 | a | - | - | - | - | - | - | |
b | - | - | - | - | - | - | ||
无机填料 | - | - | 4.07 | 4.07 | - | - |
实施例 | |||
13 | 14 | ||
液体环氧树脂 | a | 0.413 | 0.825 |
b | 0.625 | - | |
固化剂 | a | - | - |
b | - | - | |
N,N,N′,N′-四取代的含氟芳族二胺化合物 | 1.394 | 1.553 | |
羧酸乙烯基醚加成产物 | a | 0.17 | 0.24 |
b | - | - | |
预聚物 | a | 1.053 | - |
b | - | 1.505 | |
无机填料 | - | - |
比较例 | ||||
1 | 2 | 3 | ||
液体环氧树脂 | a | 0.825 | 0.825 | 0.825 |
b | 0.625 | 0.625 | - | |
固化剂 | a | - | - | - |
b | 0.88 | 0.88 | - | |
N,N,N′,N′-四取代的含氟芳族二胺化合物 | 1.55 | 1.55 | 1.553 | |
羧酸乙烯基醚加成产物 | a | - | - | - |
b | - | - | - | |
预聚物 | a | - | - | - |
b | - | - | 1.505 | |
无机填料 | - | 2.33 | - |
实施例 | ||||||
1 | 2 | 3 | 4 | 5 | 6 | |
粘度(在25℃下)(dPa·s) | 52 | 55 | 52 | 53 | 54 | 48 |
连通性缺陷百分比(%) | 0 | 0 | 0 | 0 | 0 | 0 |
空隙 | ○ | ○ | ○ | ○ | ○ | ○ |
电路连接测试 | ○ | ○ | ○ | ○ | ○ | ○ |
修复能力(22℃) | ○ | ○ | ○ | ○ | ○ | ○ |
实施例 | ||||||
7 | 8 | 9 | 10 | 11 | 12 | |
粘度(在25℃下)(dPa·s) | 44 | 120 | 250 | 280 | 64 | 59 |
连通性缺陷百分比(%) | 0 | 0 | 0 | 0 | 0 | 0 |
空隙 | ○ | ○ | ○ | ○ | ○ | ○ |
电路连接测试 | ○ | ○ | ○ | ○ | ○ | ○ |
修复能力(22℃) | ○ | ○ | ○ | ○ | ○ | ○ |
实施例 | ||
13 | 14 | |
粘度(在25℃下)(dPa·s) | 75 | 68 |
连通性缺陷百分比(%) | 0 | 0 |
空隙 | ○ | ○ |
电路连接测试 | ○ | ○ |
修复能力(22℃) | ○ | ○ |
比较例 | |||
1 | 2 | 3 | |
粘度(在25℃下)(dPa·s) | 51 | 180 | 71 |
连通性缺陷百分比(%) | 100 | 100 | 100 |
空隙 | ○ | ○ | ○ |
电路连接测试 | 不能测试 | 不能测试 | 不能测试 |
修复能力(22℃) | ○ | ○ | ○ |
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002374735A JP3971995B2 (ja) | 2002-12-25 | 2002-12-25 | 電子部品装置 |
JP374735/2002 | 2002-12-25 |
Publications (2)
Publication Number | Publication Date |
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CN1732562A true CN1732562A (zh) | 2006-02-08 |
CN100376023C CN100376023C (zh) | 2008-03-19 |
Family
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CNB2003801073508A Expired - Fee Related CN100376023C (zh) | 2002-12-25 | 2003-12-24 | 电子零件装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7352069B2 (zh) |
JP (1) | JP3971995B2 (zh) |
CN (1) | CN100376023C (zh) |
WO (1) | WO2004059721A1 (zh) |
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JP2005350647A (ja) * | 2004-05-11 | 2005-12-22 | Nitto Denko Corp | 液状エポキシ樹脂組成物 |
-
2002
- 2002-12-25 JP JP2002374735A patent/JP3971995B2/ja not_active Expired - Fee Related
-
2003
- 2003-12-24 US US10/540,863 patent/US7352069B2/en not_active Expired - Fee Related
- 2003-12-24 WO PCT/JP2003/016632 patent/WO2004059721A1/ja active Application Filing
- 2003-12-24 CN CNB2003801073508A patent/CN100376023C/zh not_active Expired - Fee Related
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CN103154070A (zh) * | 2010-10-18 | 2013-06-12 | 三菱化学株式会社 | 三维集成电路用层间填充材料组合物、涂布液、以及三维集成电路的制造方法 |
CN107735906A (zh) * | 2015-06-18 | 2018-02-23 | 三菱电机株式会社 | 导体连接装置 |
CN107735906B (zh) * | 2015-06-18 | 2020-10-13 | 三菱电机株式会社 | 导体连接装置 |
Also Published As
Publication number | Publication date |
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JP2004207483A (ja) | 2004-07-22 |
WO2004059721A1 (ja) | 2004-07-15 |
JP3971995B2 (ja) | 2007-09-05 |
US20060103028A1 (en) | 2006-05-18 |
CN100376023C (zh) | 2008-03-19 |
US7352069B2 (en) | 2008-04-01 |
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