CN1677132A - 防反射膜、及具有该防反射膜的光学元件和光学系统 - Google Patents

防反射膜、及具有该防反射膜的光学元件和光学系统 Download PDF

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Publication number
CN1677132A
CN1677132A CNA2005100625070A CN200510062507A CN1677132A CN 1677132 A CN1677132 A CN 1677132A CN A2005100625070 A CNA2005100625070 A CN A2005100625070A CN 200510062507 A CN200510062507 A CN 200510062507A CN 1677132 A CN1677132 A CN 1677132A
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CN
China
Prior art keywords
optical
layer
approximately
antireflection film
light
Prior art date
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Pending
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CNA2005100625070A
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English (en)
Chinese (zh)
Inventor
田中一政
村田刚
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Nikon Corp
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Nikon Corp
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Application filed by Nikon Corp filed Critical Nikon Corp
Publication of CN1677132A publication Critical patent/CN1677132A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Glass (AREA)
CNA2005100625070A 2004-03-30 2005-03-30 防反射膜、及具有该防反射膜的光学元件和光学系统 Pending CN1677132A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004099131A JP4433390B2 (ja) 2004-03-30 2004-03-30 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系
JP2004099131 2004-03-30

Publications (1)

Publication Number Publication Date
CN1677132A true CN1677132A (zh) 2005-10-05

Family

ID=34909437

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005100625070A Pending CN1677132A (zh) 2004-03-30 2005-03-30 防反射膜、及具有该防反射膜的光学元件和光学系统

Country Status (6)

Country Link
US (1) US7256948B2 (https=)
EP (1) EP1584954B1 (https=)
JP (1) JP4433390B2 (https=)
CN (1) CN1677132A (https=)
AT (1) ATE521909T1 (https=)
TW (1) TWI375048B (https=)

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JP4984231B2 (ja) * 2007-03-22 2012-07-25 株式会社ニコン ズームレンズ、光学機器、および結像方法
JP5213424B2 (ja) * 2007-12-10 2013-06-19 キヤノン株式会社 光学系及びそれを有する光学機器
US8199404B2 (en) 2007-12-27 2012-06-12 Pentax Ricoh Imaging Company, Ltd. Anti-reflection coating, optical member, exchange lens unit and imaging device
JP5777682B2 (ja) * 2008-08-29 2015-09-09 キヤノン株式会社 光学素子及びその製造方法、光学系、光学機器
JP5218902B2 (ja) * 2008-09-10 2013-06-26 株式会社ニコン 広角レンズおよび撮像装置
CN102193175B (zh) 2010-03-08 2016-01-20 株式会社尼康 变焦镜头系统和光学设备
US8830592B2 (en) * 2010-06-23 2014-09-09 Nikon Corporation Zoom lens, imaging apparatus, and method for manufacturing zoom lens
JP5338860B2 (ja) * 2011-06-27 2013-11-13 株式会社ニコン 光学系、この光学系を有する光学機器、及び、光学系の製造方法
US9625689B2 (en) 2010-09-17 2017-04-18 Nikon Corporation Optical system, optical apparatus equipped therewith, and method for manufacturing optical system
JP5338861B2 (ja) * 2011-06-27 2013-11-13 株式会社ニコン 光学系、この光学系を有する光学機器、及び、光学系の製造方法
JP5614214B2 (ja) * 2010-10-01 2014-10-29 リコーイメージング株式会社 反射防止膜及び反射防止膜を有する光学部材
JP5936444B2 (ja) 2011-07-26 2016-06-22 キヤノン株式会社 光学素子、それを用いた光学系および光学機器
JP5662982B2 (ja) 2011-10-28 2015-02-04 Hoya株式会社 反射防止膜および光学素子
JP5871012B2 (ja) * 2011-12-28 2016-03-01 株式会社ニコン 接眼レンズ、これを備えたファインダー光学系及び光学機器、並びに接眼レンズの製造方法
JP5885595B2 (ja) 2012-06-12 2016-03-15 キヤノン株式会社 反射防止膜、および、それを有する光学素子、光学系、光学機器
US20150192763A1 (en) * 2014-01-06 2015-07-09 Flir Systems, Inc. Coatings for use with long wavelength detection, optical system including the same, and associated methods
JP6991706B2 (ja) * 2016-11-30 2022-02-03 キヤノン株式会社 光学素子およびそれを有する光学系
WO2018134028A1 (en) 2017-01-17 2018-07-26 Philips Lighting Holding B.V. Adjustable spot light position generation
CN116755213A (zh) 2020-08-03 2023-09-15 大立光电股份有限公司 光学镜头、取像装置及电子装置
US12560804B2 (en) 2020-10-23 2026-02-24 Essilor International Transmission optical system with limited ghost image visibility, system and method for evaluating ghost image visibility of a transmission optical system
US12481086B2 (en) * 2021-08-03 2025-11-25 Largan Precision Co., Ltd. Optical lens assembly and optical module

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JP4284006B2 (ja) 2001-04-10 2009-06-24 富士フイルム株式会社 反射防止フィルム、偏光板および画像表示装置
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JP2005114881A (ja) 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
EP1584954B1 (en) 2011-08-24
JP2005284040A (ja) 2005-10-13
US7256948B2 (en) 2007-08-14
US20050225878A1 (en) 2005-10-13
TW200538753A (en) 2005-12-01
ATE521909T1 (de) 2011-09-15
EP1584954A2 (en) 2005-10-12
JP4433390B2 (ja) 2010-03-17
EP1584954A3 (en) 2005-12-14
TWI375048B (en) 2012-10-21

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