CN1665131A - 接合基板、表面声波芯片以及表面声波器件 - Google Patents
接合基板、表面声波芯片以及表面声波器件 Download PDFInfo
- Publication number
- CN1665131A CN1665131A CN200510051298XA CN200510051298A CN1665131A CN 1665131 A CN1665131 A CN 1665131A CN 200510051298X A CN200510051298X A CN 200510051298XA CN 200510051298 A CN200510051298 A CN 200510051298A CN 1665131 A CN1665131 A CN 1665131A
- Authority
- CN
- China
- Prior art keywords
- substrate
- lithium tantalate
- acoustic wave
- bonded
- surface acoustic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 201
- 238000010897 surface acoustic wave method Methods 0.000 title claims description 21
- 229910052594 sapphire Inorganic materials 0.000 claims abstract description 35
- 239000010980 sapphire Substances 0.000 claims abstract description 35
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000011261 inert gas Substances 0.000 claims abstract description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 3
- 239000001301 oxygen Substances 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 3
- 239000000203 mixture Substances 0.000 claims description 17
- 238000005538 encapsulation Methods 0.000 claims description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 6
- 238000005520 cutting process Methods 0.000 claims description 4
- 239000002241 glass-ceramic Substances 0.000 claims description 2
- 238000006386 neutralization reaction Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 1
- 230000003213 activating effect Effects 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000008878 coupling Effects 0.000 description 7
- 238000010168 coupling process Methods 0.000 description 7
- 238000005859 coupling reaction Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 230000004913 activation Effects 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000008719 thickening Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000012797 qualification Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 238000006701 autoxidation reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229960002163 hydrogen peroxide Drugs 0.000 description 1
- OUUQCZGPVNCOIJ-UHFFFAOYSA-N hydroperoxyl Chemical compound O[O] OUUQCZGPVNCOIJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009940 knitting Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/25—Constructional features of resonators using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02574—Characteristics of substrate, e.g. cutting angles of combined substrates, multilayered substrates, piezoelectrical layers on not-piezoelectrical substrate
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/072—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by laminating or bonding of piezoelectric or electrostrictive bodies
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004058888 | 2004-03-03 | ||
JP2004058888A JP3929983B2 (ja) | 2004-03-03 | 2004-03-03 | 接合基板、弾性表面波素子および弾性表面波デバイス並びにその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1665131A true CN1665131A (zh) | 2005-09-07 |
CN100511996C CN100511996C (zh) | 2009-07-08 |
Family
ID=34909136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB200510051298XA Active CN100511996C (zh) | 2004-03-03 | 2005-03-03 | 接合基板、表面声波芯片以及表面声波器件 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7208859B2 (zh) |
JP (1) | JP3929983B2 (zh) |
KR (1) | KR100625719B1 (zh) |
CN (1) | CN100511996C (zh) |
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CN105164919A (zh) * | 2013-03-21 | 2015-12-16 | 日本碍子株式会社 | 弹性波元件用复合基板及弹性波元件 |
CN106411285A (zh) * | 2015-07-29 | 2017-02-15 | 太阳诱电株式会社 | 声波器件和模块 |
CN108140706A (zh) * | 2015-09-25 | 2018-06-08 | 三菱综合材料株式会社 | 带制冷器的发光模块及带制冷器的发光模块的制造方法 |
CN109690943A (zh) * | 2016-09-20 | 2019-04-26 | 日本碍子株式会社 | 复合基板及其制法以及电子器件 |
CN110495097A (zh) * | 2017-03-27 | 2019-11-22 | 住友电气工业株式会社 | 层状体和saw器件 |
CN110504941A (zh) * | 2018-05-17 | 2019-11-26 | 太阳诱电株式会社 | 声波谐振器、声波器件、滤波器以及复用器 |
CN112272920A (zh) * | 2018-06-22 | 2021-01-26 | 日本碍子株式会社 | 接合体及弹性波元件 |
CN112740551A (zh) * | 2018-09-25 | 2021-04-30 | 京瓷株式会社 | 复合基板、压电元件以及复合基板的制造方法 |
TWI752264B (zh) * | 2017-09-15 | 2022-01-11 | 日商日本碍子股份有限公司 | 彈性波元件及其製造方法 |
TWI762656B (zh) * | 2017-06-14 | 2022-05-01 | 日商日本製鋼所股份有限公司 | 接合基板、彈性表面波元件、彈性表面波元件裝置以及接合基板的製造方法 |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4587732B2 (ja) * | 2004-07-28 | 2010-11-24 | 京セラ株式会社 | 弾性表面波装置 |
JP4686342B2 (ja) * | 2005-11-30 | 2011-05-25 | 株式会社日立メディアエレクトロニクス | 弾性表面波装置及びこれを搭載した通信端末。 |
JP4316632B2 (ja) | 2007-04-16 | 2009-08-19 | 富士通メディアデバイス株式会社 | 弾性表面波装置及び分波器 |
EP2237417B1 (en) * | 2008-01-25 | 2013-07-31 | Murata Manufacturing Co. Ltd. | Elastic wave element and method for manufacturing the same |
JP2010068484A (ja) * | 2008-09-12 | 2010-03-25 | Shin-Etsu Chemical Co Ltd | 複合化された圧電基板 |
JP5180889B2 (ja) * | 2009-03-25 | 2013-04-10 | 日本碍子株式会社 | 複合基板、それを用いた弾性波デバイス及び複合基板の製法 |
JP5588836B2 (ja) * | 2010-11-12 | 2014-09-10 | 太陽誘電株式会社 | 弾性波デバイス |
WO2013018604A1 (ja) | 2011-07-29 | 2013-02-07 | 株式会社村田製作所 | 圧電デバイス、および、圧電デバイスの製造方法 |
JP5783252B2 (ja) * | 2011-07-29 | 2015-09-24 | 株式会社村田製作所 | 弾性波デバイスの製造方法 |
KR101636220B1 (ko) | 2012-07-12 | 2016-07-04 | 엔지케이 인슐레이터 엘티디 | 복합 기판, 압전 디바이스 및 복합 기판의 제법 |
CN103947110B (zh) * | 2012-11-14 | 2016-08-17 | 日本碍子株式会社 | 复合基板 |
WO2014077212A1 (ja) | 2012-11-14 | 2014-05-22 | 日本碍子株式会社 | 複合基板及びその製法 |
JP6061251B2 (ja) * | 2013-07-05 | 2017-01-18 | 株式会社豊田自動織機 | 半導体基板の製造方法 |
JP6470311B2 (ja) * | 2014-11-28 | 2019-02-13 | 京セラ株式会社 | Sawデバイスおよびsawデバイスの製造方法 |
CN108141193B (zh) | 2015-09-25 | 2021-10-08 | 京瓷株式会社 | 弹性波元件以及弹性波装置 |
JP6635794B2 (ja) * | 2016-01-12 | 2020-01-29 | 太陽誘電株式会社 | 弾性波デバイス及びその製造方法 |
JP6549054B2 (ja) * | 2016-02-02 | 2019-07-24 | 信越化学工業株式会社 | 複合基板および複合基板の製造方法 |
JP6998650B2 (ja) | 2016-08-10 | 2022-01-18 | 株式会社日本製鋼所 | 接合基板、弾性表面波素子、弾性表面波デバイスおよび接合基板の製造方法 |
TWI737811B (zh) * | 2016-11-25 | 2021-09-01 | 日商日本碍子股份有限公司 | 接合體 |
JP6668292B2 (ja) * | 2017-06-07 | 2020-03-18 | 日本碍子株式会社 | 圧電性材料基板の接合体、接合方法および弾性波素子 |
KR102434081B1 (ko) * | 2018-01-22 | 2022-08-18 | 엔지케이 인슐레이터 엘티디 | 압전성 재료 기판과 지지 기판의 접합체 및 그 제조 방법 |
US11595019B2 (en) | 2018-04-20 | 2023-02-28 | Taiyo Yuden Co., Ltd. | Acoustic wave resonator, filter, and multiplexer |
JP7152711B2 (ja) * | 2018-06-20 | 2022-10-13 | 日本電産マシンツール株式会社 | 接合基板の製造方法及び接合基板 |
CN112243568B (zh) * | 2018-06-22 | 2021-12-28 | 日本碍子株式会社 | 接合体及弹性波元件 |
JP7458700B2 (ja) * | 2018-09-07 | 2024-04-01 | 太陽誘電株式会社 | 弾性波共振器、フィルタおよびマルチプレクサ |
WO2020250491A1 (ja) * | 2019-06-11 | 2020-12-17 | 日本碍子株式会社 | 複合基板、弾性波素子および複合基板の製造方法 |
EP3985869A4 (en) * | 2019-06-11 | 2022-08-10 | NGK Insulators, Ltd. | COMPOSITE SUBSTRATE, ELASTIC WAVE ELEMENT AND PRODUCING METHOD FOR COMPOSITE SUBSTRATE |
CN110138356B (zh) * | 2019-06-28 | 2020-11-06 | 中国科学院上海微系统与信息技术研究所 | 一种高频声表面波谐振器及其制备方法 |
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US693810A (en) | 1901-04-09 | 1902-02-18 | George E Truax | Draw-bar for ore-cars. |
US4012120A (en) | 1975-05-14 | 1977-03-15 | Trw Inc. | Guided wave acousto-optic device |
JPS5930025A (ja) * | 1982-08-12 | 1984-02-17 | Matsushita Electric Ind Co Ltd | 光集積スペクトラム・アナライザ |
US5498920A (en) * | 1993-05-18 | 1996-03-12 | Sanyo Electric Co., Ltd. | Acoustic wave device and process for producing same |
JPH09199969A (ja) * | 1996-01-19 | 1997-07-31 | Murata Mfg Co Ltd | 薄膜体 |
US6127768A (en) | 1997-05-09 | 2000-10-03 | Kobe Steel Usa, Inc. | Surface acoustic wave and bulk acoustic wave devices using a Zn.sub.(1-X) Yx O piezoelectric layer device |
JP3880150B2 (ja) | 1997-06-02 | 2007-02-14 | 松下電器産業株式会社 | 弾性表面波素子 |
US5959388A (en) | 1997-10-27 | 1999-09-28 | Lucent Technologies Inc. | Magnetically tunable surface acoustic wave devices |
JP2004186868A (ja) * | 2002-12-02 | 2004-07-02 | Fujitsu Media Device Kk | 弾性表面波素子、それを有する送信フィルタ及び受信フィルタ、並びにそれらを有するデュプレクサ |
JP2004297359A (ja) * | 2003-03-26 | 2004-10-21 | Seiko Epson Corp | 表面弾性波素子、周波数フィルタ、発振器、電子回路、及び電子機器 |
JP3774782B2 (ja) * | 2003-05-14 | 2006-05-17 | 富士通メディアデバイス株式会社 | 弾性表面波素子の製造方法 |
-
2004
- 2004-03-03 JP JP2004058888A patent/JP3929983B2/ja not_active Expired - Lifetime
-
2005
- 2005-03-02 US US11/069,048 patent/US7208859B2/en active Active
- 2005-03-02 KR KR20050017198A patent/KR100625719B1/ko active IP Right Grant
- 2005-03-03 CN CNB200510051298XA patent/CN100511996C/zh active Active
Cited By (16)
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---|---|---|---|---|
CN105164919B (zh) * | 2013-03-21 | 2017-04-26 | 日本碍子株式会社 | 弹性波元件用复合基板及弹性波元件 |
CN105164919A (zh) * | 2013-03-21 | 2015-12-16 | 日本碍子株式会社 | 弹性波元件用复合基板及弹性波元件 |
CN106411285A (zh) * | 2015-07-29 | 2017-02-15 | 太阳诱电株式会社 | 声波器件和模块 |
CN106411285B (zh) * | 2015-07-29 | 2019-08-30 | 太阳诱电株式会社 | 声波器件和模块 |
CN108140706A (zh) * | 2015-09-25 | 2018-06-08 | 三菱综合材料株式会社 | 带制冷器的发光模块及带制冷器的发光模块的制造方法 |
CN109690943A (zh) * | 2016-09-20 | 2019-04-26 | 日本碍子株式会社 | 复合基板及其制法以及电子器件 |
CN109690943B (zh) * | 2016-09-20 | 2023-10-13 | 日本碍子株式会社 | 复合基板及其制法以及电子器件 |
CN110495097A (zh) * | 2017-03-27 | 2019-11-22 | 住友电气工业株式会社 | 层状体和saw器件 |
CN110495097B (zh) * | 2017-03-27 | 2024-01-30 | 住友电气工业株式会社 | 层状体和saw器件 |
TWI762656B (zh) * | 2017-06-14 | 2022-05-01 | 日商日本製鋼所股份有限公司 | 接合基板、彈性表面波元件、彈性表面波元件裝置以及接合基板的製造方法 |
US11632093B2 (en) | 2017-09-15 | 2023-04-18 | Ngk Insulators, Ltd. | Acoustic wave devices and a method of producing the same |
TWI752264B (zh) * | 2017-09-15 | 2022-01-11 | 日商日本碍子股份有限公司 | 彈性波元件及其製造方法 |
CN110504941B (zh) * | 2018-05-17 | 2023-09-22 | 太阳诱电株式会社 | 声波谐振器、声波器件、滤波器以及复用器 |
CN110504941A (zh) * | 2018-05-17 | 2019-11-26 | 太阳诱电株式会社 | 声波谐振器、声波器件、滤波器以及复用器 |
CN112272920A (zh) * | 2018-06-22 | 2021-01-26 | 日本碍子株式会社 | 接合体及弹性波元件 |
CN112740551A (zh) * | 2018-09-25 | 2021-04-30 | 京瓷株式会社 | 复合基板、压电元件以及复合基板的制造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR100625719B1 (ko) | 2006-09-20 |
US20050194864A1 (en) | 2005-09-08 |
CN100511996C (zh) | 2009-07-08 |
US7208859B2 (en) | 2007-04-24 |
JP2005252550A (ja) | 2005-09-15 |
KR20060043316A (ko) | 2006-05-15 |
JP3929983B2 (ja) | 2007-06-13 |
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