CN1610767A - 在真空条件下处理物体的多腔室装置、对该装置抽真空的方法及其抽真空系统 - Google Patents
在真空条件下处理物体的多腔室装置、对该装置抽真空的方法及其抽真空系统 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01C—ROTARY-PISTON OR OSCILLATING-PISTON MACHINES OR ENGINES
- F01C21/00—Component parts, details or accessories not provided for in groups F01C1/00 - F01C20/00
- F01C21/10—Outer members for co-operation with rotary pistons; Casings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/30—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
- F04C18/34—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
- F04C18/344—Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the inner member
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D25/00—Pumping installations or systems
- F04D25/16—Combinations of two or more pumps ; Producing two or more separate gas flows
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C2220/00—Application
- F04C2220/10—Vacuum
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Abstract
本发明涉及一种在真空条件下处理物体的多腔室装置(1),它具有一个连接到所述腔室(2、3、4)上的抽真空系统(5);为降低抽真空的费用,建议抽真空系统(5)由一个具有多个级(11、12、13)的预真空泵组成,每一个级的都配置有一个入口(14、15、16),并且每一个入口都连接到腔室(2、3、4)中的一个上。
Description
技术领域
本发明涉及一种用于在真空条件下处理物体的多腔室装置,它具有一个连接到所述腔室上的抽真空系统。此外,本发明还涉及一种对这样的装置抽真空的方法以及一种抽真空系统。
背景技术
上述类型的多腔室装置是众所周知的。它们用于排气、基质涂覆(比如金属化)或腐蚀。这类已知的方法如化学汽相沉积(CVD)或物理汽相沉积(PVD)过程。这样一种装置通常有一个过程腔室,该过程腔室前置有一个或多个带有闸门功能的前腔室。这些闸门在输入或输出基质期间被打开,这样,腔室与腔室之间会出现不同的且很高的压力波动。
在一个配备有两个腔室的多腔室装置中已知,为了在关闭所属的闸门后能够尽可能快地将两腔室中的每一个抽成真空,使用了两个分开的真空泵。
发明内容
本发明的任务是,在上文所述类型或与之类似类型的多腔室装置中降低用于抽真空系统的费用。
根据本发明,该任务是通过权利要求所述的特征来实现的。
通过使每一个级都配备有一个入口,并且每一个入口又都连接到所述腔室中的一个上的方式,仅需要一个真空泵,用来在不同的腔室中尽可能快地产生所需压力并将其保持(它们可以是差不多相同的或者也可能是不同的压力)。不再需要多个各自配备一个驱动马达的泵。另外,安装费用(无论是机械的还是电气的)也就降下来了。优选的是,各泵级平行运行,这样它们具有两个相互独立的真空泵的功能。
典型的预真空泵是油封的回转分配阀式真空泵,如在DE-U-90 07544中所已知的那些。
附图说明
下面将借助在图1至4中示意描述的实施例对本发明的其他优点和细节进行说明。
附图中:
图1为一种具有3个腔室和一个3级预真空泵的多腔室装置;
图2为一种具有2个真空腔室和一个2级预真空泵的多腔室装置;
图3为一种如图2所示的具有一个附加高真空泵的多腔室装置;
图4为一个两级预真空泵的剖视图。
具体实施方式
在所有这些图中,都用数字1来表示多腔室装置,各个腔室则用2、3和4来表示,抽真空系统用5表示。在腔室2至4中,涉及到一个过程腔室2,该过程腔室配备有另外的腔室3、4(图1)或只有腔室4(图2和3),它们比如可以具有闸门的功能。图中示出隙缝式闸门,分别用6、7和8来表示。抽真空系统5被设计成多级预真空泵。
在图1所示的实施例中,具有3个腔室2、3和4。相应地,预真空泵5具有3个级11、12和13,各级分别具有一个入口14、15和16,入口14、15和16的每一个分别经一根连接管17、18和19连接到腔室2、3和4中的一个上。各泵级11、12、13的出口20、21、22在泵5内汇集到一根共同的出口管中,这样,泵5仅具有一个出口23。如果各泵级11、12、13具有不同的抽吸能力,那么较合适的是,将具有最大抽吸能力的级连接到过程腔室2上,这样在那里便能尽可能快地获得足够低的压力。
在图2所示的实施例中,仅仅具有两个腔室2和4以及相应的两个泵级11、13。在连接管17和19中有阀24和25,用于将腔室2、4的一个或两个在对它们通风时与抽真空系统5分开。
在图3所示的实施例中,在连接管17中有一个涡轮分子式真空泵26和一个在压力一侧的阀27。这种高真空泵的特征是,较之预真空泵它具有更高的抽吸效率和更低的终端压力,但却需要一个预真空泵,该预真空泵在图示状态下构成泵级11。这种实施形式对在过程腔室2中进行的方法来说是适宜的,因为那里要尽可能快地获得较低的压力(比如10-2mbar)。而且,预真空泵也获得约1mbar到5×10-2mbar的最终压力;而通过采用高真空泵也能相当快地得到更低的压力。
图4示出一个商用两级预真空泵5的局部剖视图,该预真空泵5被加以改进以用在一个多腔室装置中。它具有一个外壳28,该外壳有一个油槽29。在外壳28中有自身的泵31,它是一种具有两个级11和13的回转分配阀式真空泵。它包括3个盘32、33、34,它们之间配置有泵环35、36。泵环35、36构成汲取腔37、38,其中各有一个偏心配置的转子41或42,它们具有各自的滑板43或44。转子42与图中未示出的一个驱动电机的轴45相耦合。此外,转子41、42的轴承端在盘33的区域中相互连接。转子41、42的直径相同,但它们的长度不同。通过这样的方式,对于两个泵级11、13来说,便能得到不同的抽吸能力。在将所示的泵用作带有串联的泵级11、13的两级真空泵时,长度长的那一级组成抽吸侧泵级,而短的一级组成压力侧泵级。
图示的泵5改进为使得泵级11、13可以平行地运行。作为泵级11的入口14,采用普通的配备有一个吸入接管阀46的入口。图中未详细示出的泵级11的出口不再与泵级13相连,而是汇入毡帽47之下。泵级13配备有一个单独的吸入接管48,它构成了入口16。吸入接管48经从外壳28伸出的管段49与汲取腔37相连。图中未示出的该泵级13的出口同样汇入毡帽47之下。毡帽47具有稳流和粗分离油的功能。根据技术水平也必须同时具有其他被连接到出口23的分离器。
Claims (14)
1.一种在真空条件下处理物体的多腔室装置(1),它具有一个连接到所述腔室(2、3、4)上的抽真空系统(5),其特征为:抽真空系统(5)由一个具有多个级(11、12、13)的预真空泵组成,每一个级都配有一个入口(14、15、16),并且每一个入口都连接到所述腔室(2、3、4)中的一个上。
2.如权利要求1所述的装置,其特征为:所述预真空泵(5)的各泵级(11、12、13)平行配置。
3.如权利要求1或2所述装置,其特征为:所述腔室(2、3、4)的数目和预真空泵(5)的泵级(11、12、13)的数目相等。
4.如权利要求1、2或3所述的装置,其特征为:所述多腔室装置(1)由一个过程腔室(2)和至少一个与该过程腔室(2)连接的前腔室(3、4)组成;所述预真空泵(5)的各泵级(11、12、13)具有不同的抽吸能力,并且具有最大抽吸能力的级连接到过程腔室(2)上。
5.如权利要求4所述的装置,其特征为:在位于过程腔室(2)和所属泵级(11)的入口(14)之间的连接管中有一个高真空泵(26),优选地为一个涡轮分子式真空泵。
6.一种用于运行在真空条件下处理物体的多腔室装置(1)的方法,在该方法中,借助一个抽真空系统(5)在腔室(2、3、4)中产生所需的低压,其特征为:为了产生低压,使用一个具有多个级(11、12、13)的预真空泵(5),其各泵级分别配备有一个连接到所述腔室(2、3、4)之一的入口(14、15、16),并且平行地运行所述各泵级。
7.如权利要求6所述的方法,其特征为:用泵级(11、12、13)将所述腔室(2、3、4)抽真空,所述各泵级具有不同的抽吸能力。
8.如权利要求7所述的方法,其特征为:借助一个泵级(11)将所述过程腔室(2)抽真空,该泵级具有最大的抽吸能力。
9.如权利要求7或8所述的方法,其特征为:借助一个高真空泵(26)将所述过程腔室(2)抽真空,并且由所述泵级(2、3、4)之一产生该高真空泵所需要的预真空压力。
10.一种用于多腔室装置(1)的抽真空系统(5),其特征为:该系统(5)设计成多级预真空泵(5),每一级具有一个入口(14、15、16),并且每一个入口用来连接多腔室装置(1)的一个腔室。
11.如权利要求10所述的抽真空系统(5),其特征为:所述泵(5)的各级(11、12、13)平行配置。
12.如权利要求10或11所述的抽真空系统(5),其特征为:所述系统(5)由一个高真空泵(26)组成,并且预真空泵(5)的级(11、12、13)之一用于产生该高真空泵(26)所需的预真空。
13.如权利要求10、11或12所述的抽真空系统(5),其特征为:各出口(20、21、22)汇集在预真空泵(5)的一个外壳(28)中,并且配置有一个共同的油分离器(47)。
14.如权利要求10至13之一所述的抽真空系统(5),其特征为:所述预真空泵(5)是一个回转分配阀式真空泵。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE10150015.7 | 2001-10-11 | ||
DE10150015A DE10150015A1 (de) | 2001-10-11 | 2001-10-11 | Mehrkammeranlage zur Behandlung von Gegenständen unter Vakuum, Verfahren zur Evakuierung dieser Anlage und Evakuierungssystem dafür |
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CN1610767A true CN1610767A (zh) | 2005-04-27 |
CN100379894C CN100379894C (zh) | 2008-04-09 |
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CNB028198158A Expired - Fee Related CN100379894C (zh) | 2001-10-11 | 2002-09-28 | 在真空条件下处理物体的多腔室装置、对该装置抽真空的方法及其抽真空系统 |
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US (1) | US7156922B2 (zh) |
EP (1) | EP1434896B1 (zh) |
JP (1) | JP2005505697A (zh) |
KR (1) | KR100884115B1 (zh) |
CN (1) | CN100379894C (zh) |
CA (1) | CA2462934C (zh) |
DE (2) | DE10150015A1 (zh) |
HK (1) | HK1075070A1 (zh) |
WO (1) | WO2003033761A2 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101660135B (zh) * | 2009-09-22 | 2011-05-25 | 菏泽天宇科技开发有限责任公司 | 一种柔性带材真空溅射预抽空处理设备 |
CN102393468A (zh) * | 2011-08-28 | 2012-03-28 | 大连齐维科技发展有限公司 | 多级差分抽超高真空样品传递机构 |
CN103119413A (zh) * | 2010-08-04 | 2013-05-22 | 英福康有限责任公司 | 渗漏检测装置 |
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DE10150015A1 (de) * | 2001-10-11 | 2003-04-17 | Leybold Vakuum Gmbh | Mehrkammeranlage zur Behandlung von Gegenständen unter Vakuum, Verfahren zur Evakuierung dieser Anlage und Evakuierungssystem dafür |
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JP4218756B2 (ja) * | 2003-10-17 | 2009-02-04 | 株式会社荏原製作所 | 真空排気装置 |
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KR100706243B1 (ko) * | 2005-02-22 | 2007-04-11 | 삼성전자주식회사 | 질화 텅스텐 증착 장치 및 증착 방법 |
JP5808454B1 (ja) | 2014-04-25 | 2015-11-10 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体 |
WO2015197138A1 (fr) * | 2014-06-27 | 2015-12-30 | Ateliers Busch Sa | Méthode de pompage dans un système de pompes à vide et système de pompes à vide |
JP6725389B2 (ja) * | 2016-09-28 | 2020-07-15 | キオクシア株式会社 | 半導体製造装置 |
DE202018000285U1 (de) * | 2018-01-18 | 2019-04-23 | Leybold Gmbh | Vakuumpumpen-System |
DE102018105142A1 (de) * | 2018-03-06 | 2019-09-12 | Schwäbische Hüttenwerke Automotive GmbH | Dichtelement Vakuumpumpe |
CN111550403A (zh) * | 2020-05-14 | 2020-08-18 | 天津市百利溢通电泵有限公司 | 一种具有预紧弹簧的多级型五滑片式潜油电泵 |
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-
2001
- 2001-10-11 DE DE10150015A patent/DE10150015A1/de not_active Ceased
-
2002
- 2002-09-28 EP EP02777255A patent/EP1434896B1/de not_active Expired - Lifetime
- 2002-09-28 CA CA2462934A patent/CA2462934C/en not_active Expired - Fee Related
- 2002-09-28 WO PCT/EP2002/010918 patent/WO2003033761A2/de active Application Filing
- 2002-09-28 CN CNB028198158A patent/CN100379894C/zh not_active Expired - Fee Related
- 2002-09-28 US US10/492,033 patent/US7156922B2/en not_active Expired - Fee Related
- 2002-09-28 DE DE50214779T patent/DE50214779D1/de not_active Expired - Lifetime
- 2002-09-28 JP JP2003536479A patent/JP2005505697A/ja not_active Ceased
- 2002-09-28 KR KR1020047005255A patent/KR100884115B1/ko not_active IP Right Cessation
-
2005
- 2005-08-22 HK HK05107334A patent/HK1075070A1/xx unknown
Cited By (7)
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CN101660135B (zh) * | 2009-09-22 | 2011-05-25 | 菏泽天宇科技开发有限责任公司 | 一种柔性带材真空溅射预抽空处理设备 |
CN103119413A (zh) * | 2010-08-04 | 2013-05-22 | 英福康有限责任公司 | 渗漏检测装置 |
CN103119413B (zh) * | 2010-08-04 | 2015-05-27 | 英福康有限责任公司 | 渗漏检测装置 |
CN102393468A (zh) * | 2011-08-28 | 2012-03-28 | 大连齐维科技发展有限公司 | 多级差分抽超高真空样品传递机构 |
CN105840500A (zh) * | 2015-04-02 | 2016-08-10 | 熵零股份有限公司 | 一种三缸共轴流体机构 |
CN111441029A (zh) * | 2020-04-22 | 2020-07-24 | 山西大学 | 用于实验制备超冷原子与分子的超高真空获取系统及方法 |
CN111441029B (zh) * | 2020-04-22 | 2021-05-11 | 山西大学 | 用于实验制备超冷原子与分子的超高真空获取系统及方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1434896B1 (de) | 2010-11-17 |
EP1434896A2 (de) | 2004-07-07 |
KR20050031064A (ko) | 2005-04-01 |
KR100884115B1 (ko) | 2009-02-17 |
CN100379894C (zh) | 2008-04-09 |
WO2003033761A2 (de) | 2003-04-24 |
CA2462934A1 (en) | 2003-04-24 |
CA2462934C (en) | 2010-05-25 |
WO2003033761A3 (de) | 2003-09-12 |
DE10150015A1 (de) | 2003-04-17 |
JP2005505697A (ja) | 2005-02-24 |
DE50214779D1 (de) | 2010-12-30 |
US7156922B2 (en) | 2007-01-02 |
HK1075070A1 (en) | 2005-12-02 |
US20050000436A1 (en) | 2005-01-06 |
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