CN1280182C - 烧结的多晶氮化镓 - Google Patents
烧结的多晶氮化镓 Download PDFInfo
- Publication number
- CN1280182C CN1280182C CNB028218302A CN02821830A CN1280182C CN 1280182 C CN1280182 C CN 1280182C CN B028218302 A CNB028218302 A CN B028218302A CN 02821830 A CN02821830 A CN 02821830A CN 1280182 C CN1280182 C CN 1280182C
- Authority
- CN
- China
- Prior art keywords
- gan
- container
- sintered polycrystalline
- pressure
- smooth surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- B01J3/062—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies characterised by the composition of the materials to be processed
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/065—Composition of the material produced
- B01J2203/0665—Gallium nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/0675—Structural or physico-chemical features of the materials processed
- B01J2203/0685—Crystal sintering
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Ceramic Products (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/001,575 | 2001-11-02 | ||
| US10/001,575 US6861130B2 (en) | 2001-11-02 | 2001-11-02 | Sintered polycrystalline gallium nitride and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1582256A CN1582256A (zh) | 2005-02-16 |
| CN1280182C true CN1280182C (zh) | 2006-10-18 |
Family
ID=21696764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB028218302A Expired - Fee Related CN1280182C (zh) | 2001-11-02 | 2002-10-30 | 烧结的多晶氮化镓 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6861130B2 (enExample) |
| EP (1) | EP1444165A2 (enExample) |
| JP (1) | JP4349907B2 (enExample) |
| KR (1) | KR100903251B1 (enExample) |
| CN (1) | CN1280182C (enExample) |
| AU (1) | AU2002363469A1 (enExample) |
| PL (1) | PL368506A1 (enExample) |
| WO (1) | WO2003041138A2 (enExample) |
| ZA (1) | ZA200403783B (enExample) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1292494C (zh) * | 2000-04-26 | 2006-12-27 | 奥斯兰姆奥普托半导体有限责任公司 | 发光半导体元件及其制造方法 |
| DE10051465A1 (de) * | 2000-10-17 | 2002-05-02 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines Halbleiterbauelements auf GaN-Basis |
| EP1277241B1 (de) * | 2000-04-26 | 2017-12-13 | OSRAM Opto Semiconductors GmbH | Lumineszenzdiodenchip auf der basis von gan |
| TWI289944B (en) * | 2000-05-26 | 2007-11-11 | Osram Opto Semiconductors Gmbh | Light-emitting-diode-element with a light-emitting-diode-chip |
| US7125453B2 (en) * | 2002-01-31 | 2006-10-24 | General Electric Company | High temperature high pressure capsule for processing materials in supercritical fluids |
| US7063741B2 (en) * | 2002-03-27 | 2006-06-20 | General Electric Company | High pressure high temperature growth of crystalline group III metal nitrides |
| WO2005095682A1 (ja) * | 2004-03-31 | 2005-10-13 | Ngk Insulators, Ltd. | 窒化ガリウム単結晶の育成方法および窒化ガリウム単結晶 |
| KR100843394B1 (ko) * | 2004-04-27 | 2008-07-03 | 아리조나 보드 오브 리전트스, 아리조나주의 아리조나 주립대 대행법인 | 고 발광성 도프된 금속 질화물 분말을 합성하는 방법 |
| WO2006010075A1 (en) * | 2004-07-09 | 2006-01-26 | Cornell Research Foundation, Inc. | Method of making group iii nitrides |
| US20080193363A1 (en) * | 2004-08-20 | 2008-08-14 | Mitsubishi Chemical Corporation | Metal Nitrides and Process for Production Thereof |
| US7558631B2 (en) * | 2004-12-21 | 2009-07-07 | Ebr Systems, Inc. | Leadless tissue stimulation systems and methods |
| US8858708B1 (en) | 2005-01-03 | 2014-10-14 | The United States Of America As Represented By The Secretary Of The Air Force | Polycrystalline III-nitrides |
| US7704324B2 (en) * | 2005-01-25 | 2010-04-27 | General Electric Company | Apparatus for processing materials in supercritical fluids and methods thereof |
| US7942970B2 (en) * | 2005-12-20 | 2011-05-17 | Momentive Performance Materials Inc. | Apparatus for making crystalline composition |
| US7935382B2 (en) * | 2005-12-20 | 2011-05-03 | Momentive Performance Materials, Inc. | Method for making crystalline composition |
| US8039412B2 (en) * | 2005-12-20 | 2011-10-18 | Momentive Performance Materials Inc. | Crystalline composition, device, and associated method |
| US9157167B1 (en) | 2008-06-05 | 2015-10-13 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
| US8871024B2 (en) | 2008-06-05 | 2014-10-28 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
| US8097081B2 (en) * | 2008-06-05 | 2012-01-17 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
| US20090301388A1 (en) * | 2008-06-05 | 2009-12-10 | Soraa Inc. | Capsule for high pressure processing and method of use for supercritical fluids |
| US8303710B2 (en) * | 2008-06-18 | 2012-11-06 | Soraa, Inc. | High pressure apparatus and method for nitride crystal growth |
| US20100006873A1 (en) * | 2008-06-25 | 2010-01-14 | Soraa, Inc. | HIGHLY POLARIZED WHITE LIGHT SOURCE BY COMBINING BLUE LED ON SEMIPOLAR OR NONPOLAR GaN WITH YELLOW LED ON SEMIPOLAR OR NONPOLAR GaN |
| US20090320745A1 (en) * | 2008-06-25 | 2009-12-31 | Soraa, Inc. | Heater device and method for high pressure processing of crystalline materials |
| US20100003492A1 (en) * | 2008-07-07 | 2010-01-07 | Soraa, Inc. | High quality large area bulk non-polar or semipolar gallium based substrates and methods |
| WO2011044554A1 (en) | 2009-10-09 | 2011-04-14 | Soraa, Inc. | Method for synthesis of high quality large area bulk gallium based crystals |
| US9404197B2 (en) | 2008-07-07 | 2016-08-02 | Soraa, Inc. | Large area, low-defect gallium-containing nitride crystals, method of making, and method of use |
| JP2011530194A (ja) | 2008-08-04 | 2011-12-15 | ソラア インコーポレーテッド | 物質および蛍光体を含んだ非分極性あるいは半極性のガリウムを用いた白色灯デバイス |
| US8284810B1 (en) | 2008-08-04 | 2012-10-09 | Soraa, Inc. | Solid state laser device using a selected crystal orientation in non-polar or semi-polar GaN containing materials and methods |
| US8021481B2 (en) * | 2008-08-07 | 2011-09-20 | Soraa, Inc. | Process and apparatus for large-scale manufacturing of bulk monocrystalline gallium-containing nitride |
| US8979999B2 (en) * | 2008-08-07 | 2015-03-17 | Soraa, Inc. | Process for large-scale ammonothermal manufacturing of gallium nitride boules |
| US8323405B2 (en) * | 2008-08-07 | 2012-12-04 | Soraa, Inc. | Process and apparatus for growing a crystalline gallium-containing nitride using an azide mineralizer |
| US10036099B2 (en) | 2008-08-07 | 2018-07-31 | Slt Technologies, Inc. | Process for large-scale ammonothermal manufacturing of gallium nitride boules |
| US8430958B2 (en) * | 2008-08-07 | 2013-04-30 | Soraa, Inc. | Apparatus and method for seed crystal utilization in large-scale manufacturing of gallium nitride |
| US20100031873A1 (en) * | 2008-08-07 | 2010-02-11 | Soraa, Inc. | Basket process and apparatus for crystalline gallium-containing nitride |
| US8148801B2 (en) | 2008-08-25 | 2012-04-03 | Soraa, Inc. | Nitride crystal with removable surface layer and methods of manufacture |
| US7976630B2 (en) | 2008-09-11 | 2011-07-12 | Soraa, Inc. | Large-area seed for ammonothermal growth of bulk gallium nitride and method of manufacture |
| US8354679B1 (en) | 2008-10-02 | 2013-01-15 | Soraa, Inc. | Microcavity light emitting diode method of manufacture |
| US20100295088A1 (en) * | 2008-10-02 | 2010-11-25 | Soraa, Inc. | Textured-surface light emitting diode and method of manufacture |
| US8455894B1 (en) | 2008-10-17 | 2013-06-04 | Soraa, Inc. | Photonic-crystal light emitting diode and method of manufacture |
| US9589792B2 (en) | 2012-11-26 | 2017-03-07 | Soraa, Inc. | High quality group-III metal nitride crystals, methods of making, and methods of use |
| USRE47114E1 (en) | 2008-12-12 | 2018-11-06 | Slt Technologies, Inc. | Polycrystalline group III metal nitride with getter and method of making |
| US9543392B1 (en) | 2008-12-12 | 2017-01-10 | Soraa, Inc. | Transparent group III metal nitride and method of manufacture |
| US8987156B2 (en) | 2008-12-12 | 2015-03-24 | Soraa, Inc. | Polycrystalline group III metal nitride with getter and method of making |
| US8461071B2 (en) * | 2008-12-12 | 2013-06-11 | Soraa, Inc. | Polycrystalline group III metal nitride with getter and method of making |
| US8878230B2 (en) * | 2010-03-11 | 2014-11-04 | Soraa, Inc. | Semi-insulating group III metal nitride and method of manufacture |
| US20110100291A1 (en) * | 2009-01-29 | 2011-05-05 | Soraa, Inc. | Plant and method for large-scale ammonothermal manufacturing of gallium nitride boules |
| US8299473B1 (en) | 2009-04-07 | 2012-10-30 | Soraa, Inc. | Polarized white light devices using non-polar or semipolar gallium containing materials and transparent phosphors |
| US8306081B1 (en) | 2009-05-27 | 2012-11-06 | Soraa, Inc. | High indium containing InGaN substrates for long wavelength optical devices |
| US9250044B1 (en) | 2009-05-29 | 2016-02-02 | Soraa Laser Diode, Inc. | Gallium and nitrogen containing laser diode dazzling devices and methods of use |
| US8509275B1 (en) | 2009-05-29 | 2013-08-13 | Soraa, Inc. | Gallium nitride based laser dazzling device and method |
| US9800017B1 (en) | 2009-05-29 | 2017-10-24 | Soraa Laser Diode, Inc. | Laser device and method for a vehicle |
| US8435347B2 (en) | 2009-09-29 | 2013-05-07 | Soraa, Inc. | High pressure apparatus with stackable rings |
| US9564320B2 (en) | 2010-06-18 | 2017-02-07 | Soraa, Inc. | Large area nitride crystal and method for making it |
| US8729559B2 (en) | 2010-10-13 | 2014-05-20 | Soraa, Inc. | Method of making bulk InGaN substrates and devices thereon |
| TWI501939B (zh) | 2010-12-20 | 2015-10-01 | Tosoh Corp | 氮化鎵燒結體或氮化鎵成形體及此等之製造方法 |
| US8786053B2 (en) | 2011-01-24 | 2014-07-22 | Soraa, Inc. | Gallium-nitride-on-handle substrate materials and devices and method of manufacture |
| US8492185B1 (en) | 2011-07-14 | 2013-07-23 | Soraa, Inc. | Large area nonpolar or semipolar gallium and nitrogen containing substrate and resulting devices |
| US9694158B2 (en) | 2011-10-21 | 2017-07-04 | Ahmad Mohamad Slim | Torque for incrementally advancing a catheter during right heart catheterization |
| US10029955B1 (en) | 2011-10-24 | 2018-07-24 | Slt Technologies, Inc. | Capsule for high pressure, high temperature processing of materials and methods of use |
| KR102101597B1 (ko) | 2011-10-28 | 2020-04-17 | 미쯔비시 케미컬 주식회사 | 질화물 결정의 제조 방법 및 질화물 결정 |
| EP2772570A4 (en) * | 2011-10-28 | 2015-03-04 | Mitsubishi Chem Corp | METHOD FOR PRODUCING A NITRIDE CRYSTAL AND NITRIDE CRYSTAL |
| US8482104B2 (en) | 2012-01-09 | 2013-07-09 | Soraa, Inc. | Method for growth of indium-containing nitride films |
| US10145026B2 (en) | 2012-06-04 | 2018-12-04 | Slt Technologies, Inc. | Process for large-scale ammonothermal manufacturing of semipolar gallium nitride boules |
| US9275912B1 (en) | 2012-08-30 | 2016-03-01 | Soraa, Inc. | Method for quantification of extended defects in gallium-containing nitride crystals |
| US9299555B1 (en) | 2012-09-28 | 2016-03-29 | Soraa, Inc. | Ultrapure mineralizers and methods for nitride crystal growth |
| US20180072570A1 (en) | 2015-03-30 | 2018-03-15 | Tosoh Corporation | Gallium nitride-based sintered compact and method for manufacturing same |
| US11437774B2 (en) | 2015-08-19 | 2022-09-06 | Kyocera Sld Laser, Inc. | High-luminous flux laser-based white light source |
| US10174438B2 (en) | 2017-03-30 | 2019-01-08 | Slt Technologies, Inc. | Apparatus for high pressure reaction |
| EP3865466A4 (en) * | 2018-10-10 | 2022-05-25 | Tosoh Corporation | GALLIUM NITRIDE BASED SINTERED BODY AND METHOD FOR PRODUCTION THEREOF |
| JP7500941B2 (ja) * | 2018-10-26 | 2024-06-18 | 東ソー株式会社 | 窒化ガリウム系焼結体及びその製造方法 |
| US11239637B2 (en) | 2018-12-21 | 2022-02-01 | Kyocera Sld Laser, Inc. | Fiber delivered laser induced white light system |
| US11421843B2 (en) | 2018-12-21 | 2022-08-23 | Kyocera Sld Laser, Inc. | Fiber-delivered laser-induced dynamic light system |
| US11466384B2 (en) | 2019-01-08 | 2022-10-11 | Slt Technologies, Inc. | Method of forming a high quality group-III metal nitride boule or wafer using a patterned substrate |
| US12152742B2 (en) | 2019-01-18 | 2024-11-26 | Kyocera Sld Laser, Inc. | Laser-based light guide-coupled wide-spectrum light system |
| US12000552B2 (en) | 2019-01-18 | 2024-06-04 | Kyocera Sld Laser, Inc. | Laser-based fiber-coupled white light system for a vehicle |
| EP4104201A1 (en) | 2020-02-11 | 2022-12-21 | SLT Technologies, Inc. | Improved group iii nitride substrate, method of making, and method of use |
| US11721549B2 (en) | 2020-02-11 | 2023-08-08 | Slt Technologies, Inc. | Large area group III nitride crystals and substrates, methods of making, and methods of use |
| US12091771B2 (en) | 2020-02-11 | 2024-09-17 | Slt Technologies, Inc. | Large area group III nitride crystals and substrates, methods of making, and methods of use |
| JP7483669B2 (ja) | 2020-11-02 | 2024-05-15 | エスエルティー テクノロジーズ インコーポレイテッド | 窒化物結晶成長のための超高純度鉱化剤及び改良された方法 |
| WO2025211136A1 (ja) * | 2024-04-01 | 2025-10-09 | 東ソー株式会社 | 窒化ガリウム焼結体及びその製造方法 |
| JP7726434B1 (ja) * | 2024-04-01 | 2025-08-20 | 東ソー株式会社 | 窒化ガリウム焼結体及びその製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3829556A (en) * | 1972-03-24 | 1974-08-13 | Bell Telephone Labor Inc | Growth of gallium nitride crystals |
| US4146379A (en) * | 1977-08-24 | 1979-03-27 | University Of Southern California | Process for densifying polycrystalline articles |
| WO1998011017A1 (en) * | 1996-09-10 | 1998-03-19 | The Regents Of The University Of California | Process for rapid solid-state formation of refractory nitrides |
| US6096282A (en) | 1996-09-10 | 2000-08-01 | The Regents Of The University Of California | Instantaneous synthesis of refractory nitrides from solid precursors |
| US6270569B1 (en) | 1997-06-11 | 2001-08-07 | Hitachi Cable Ltd. | Method of fabricating nitride crystal, mixture, liquid phase growth method, nitride crystal, nitride crystal powders, and vapor phase growth method |
| US6177057B1 (en) * | 1999-02-09 | 2001-01-23 | The United States Of America As Represented By The Secretary Of The Navy | Process for preparing bulk cubic gallium nitride |
| US6113985A (en) | 1999-04-27 | 2000-09-05 | The United States Of America As Represented By Secretary Of The Air Force | Process for the manufacture of group III nitride targets for use in sputtering and similar equipment |
-
2001
- 2001-11-02 US US10/001,575 patent/US6861130B2/en not_active Expired - Lifetime
-
2002
- 2002-10-30 AU AU2002363469A patent/AU2002363469A1/en not_active Abandoned
- 2002-10-30 CN CNB028218302A patent/CN1280182C/zh not_active Expired - Fee Related
- 2002-10-30 PL PL02368506A patent/PL368506A1/xx not_active Application Discontinuation
- 2002-10-30 KR KR1020047006467A patent/KR100903251B1/ko not_active Expired - Fee Related
- 2002-10-30 WO PCT/US2002/034792 patent/WO2003041138A2/en not_active Ceased
- 2002-10-30 JP JP2003543080A patent/JP4349907B2/ja not_active Expired - Fee Related
- 2002-10-30 EP EP02799172A patent/EP1444165A2/en not_active Ceased
-
2004
- 2004-05-17 ZA ZA200403783A patent/ZA200403783B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| PL368506A1 (en) | 2005-04-04 |
| KR20040053234A (ko) | 2004-06-23 |
| JP2005508822A (ja) | 2005-04-07 |
| JP4349907B2 (ja) | 2009-10-21 |
| ZA200403783B (en) | 2005-11-21 |
| WO2003041138A3 (en) | 2004-02-19 |
| AU2002363469A1 (en) | 2003-05-19 |
| WO2003041138A2 (en) | 2003-05-15 |
| US6861130B2 (en) | 2005-03-01 |
| CN1582256A (zh) | 2005-02-16 |
| KR100903251B1 (ko) | 2009-06-17 |
| EP1444165A2 (en) | 2004-08-11 |
| US20030086856A1 (en) | 2003-05-08 |
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Effective date of registration: 20170327 Address after: California, USA Patentee after: SORAA, Inc. Address before: American New York Patentee before: MOMENTIVE PERFORMANCE MATERIALS Inc. Effective date of registration: 20170327 Address after: American New York Patentee after: MOMENTIVE PERFORMANCE MATERIALS Inc. Address before: American New York Patentee before: General Electric Co. |
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Effective date of registration: 20180319 Address after: California, USA Patentee after: SLT technology Co. Address before: California, USA Patentee before: SORAA, Inc. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20061018 Termination date: 20211030 |