CN1267440C - 利用乙二胺盐循环过程制备n－[2－氨乙基]氨烷基烷氧基硅烷的方法 - Google Patents

利用乙二胺盐循环过程制备n－[2－氨乙基]氨烷基烷氧基硅烷的方法 Download PDF

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Publication number
CN1267440C
CN1267440C CNB038036223A CN03803622A CN1267440C CN 1267440 C CN1267440 C CN 1267440C CN B038036223 A CNB038036223 A CN B038036223A CN 03803622 A CN03803622 A CN 03803622A CN 1267440 C CN1267440 C CN 1267440C
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China
Prior art keywords
ethylenediamine
phase
aminoethyl
aminoalkylalkoxysilane
reactor
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Expired - Fee Related
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CNB038036223A
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English (en)
Chinese (zh)
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CN1630660A (zh
Inventor
威廉·C·马奇
霍华德·班科
史蒂文·H·维尔
布赖恩·C·麦克唐纳
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Dow Silicones Corp
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Dow Corning Corp
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Publication of CN1630660A publication Critical patent/CN1630660A/zh
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
    • C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
CNB038036223A 2002-02-11 2003-01-16 利用乙二胺盐循环过程制备n－[2－氨乙基]氨烷基烷氧基硅烷的方法 Expired - Fee Related CN1267440C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/073,444 2002-02-11
US10/073,444 US6452033B1 (en) 2002-02-11 2002-02-11 Method of making N-[2-aminoethyl] aminoalkylalkoxysilanes with ethyenediamine salt recycle

Publications (2)

Publication Number Publication Date
CN1630660A CN1630660A (zh) 2005-06-22
CN1267440C true CN1267440C (zh) 2006-08-02

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CNB038036223A Expired - Fee Related CN1267440C (zh) 2002-02-11 2003-01-16 利用乙二胺盐循环过程制备n－[2－氨乙基]氨烷基烷氧基硅烷的方法

Country Status (9)

Country Link
US (1) US6452033B1 (enExample)
EP (1) EP1476450B1 (enExample)
JP (1) JP4309287B2 (enExample)
KR (1) KR100893688B1 (enExample)
CN (1) CN1267440C (enExample)
AT (1) ATE459629T1 (enExample)
AU (1) AU2003207577A1 (enExample)
DE (1) DE60331526D1 (enExample)
WO (1) WO2003068780A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100413555C (zh) * 2003-02-10 2008-08-27 严晓东 含β-氨乙基-γ-氨丙基基团的有机硅烷偶联剂的生产废料的回收处理方法
DE102007037193A1 (de) * 2007-08-07 2009-02-12 Wacker Chemie Ag Verfahren zur Herstellung von Aminoorganosilanen
DE102009000500A1 (de) * 2009-01-30 2010-08-05 Wacker Chemie Ag Verfahren zur Herstellung von Bis- und Tris(silylorgano)aminen
DE102009026755A1 (de) 2009-06-04 2010-12-09 Wacker Chemie Ag Verfahren zur Herstellung von Aminoorganosilanen
DE102015225883A1 (de) 2015-12-18 2017-06-22 Evonik Degussa Gmbh Bis(alkylalkoxysilyl)amin-reiche Zusammensetzungen, ein Verfahren zur deren Herstellung und deren Verwendung
DE102015225879A1 (de) 2015-12-18 2017-06-22 Evonik Degussa Gmbh Tris-(alkylalkoxysilyl)amin-reiche Zusammensetzungen, deren Herstellung und deren Verwendung
WO2018033199A1 (de) 2016-08-16 2018-02-22 Wacker Chemie Ag Verfahren zur herstellung von sekundären aminoorganosiliciumverbindungen
DE102016215260A1 (de) 2016-08-16 2018-02-22 Evonik Degussa Gmbh Verwendung einer (Alkylalkoxysily)amin-, Bis-(alkylalkoxysilyl)amin und/oder Tris-(alkylalkoxysilyl)amin-enthaltenden Zusammensetzung
JP7077966B2 (ja) * 2019-01-07 2022-05-31 信越化学工業株式会社 アミノ基含有有機ケイ素化合物の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB889001A (en) 1959-07-17 1962-02-07 Midland Silicones Ltd Aminated organosilicon compounds
US3146250A (en) 1961-10-11 1964-08-25 Dow Corning Nitrogen-containing cyclic silanes, their preparation and hydrolysis
US4064155A (en) * 1975-12-22 1977-12-20 Dow Corning Corporation Preparation of silylamine hydrochlorides
JPS56104891A (en) 1980-01-28 1981-08-20 Toray Ind Inc Preparation of (n-aminoethyl)aminoalkylsilane
US4448694A (en) * 1981-09-04 1984-05-15 Dow Corning Corporation Metal extraction from solution and immobilized chelating agents used therefor
US4546996A (en) 1984-06-18 1985-10-15 J. I. Case Company Multi-surface stabilizer pad assembly
US4526996A (en) * 1984-06-19 1985-07-02 Union Carbide Corporation Process for the preparation of N-substituted aminoalkylsilanes
JPH053177A (ja) * 1991-06-25 1993-01-08 Sony Corp ドライエツチング方法
JP2687787B2 (ja) * 1991-10-02 1997-12-08 ソニー株式会社 ドライエッチング方法
JP2785622B2 (ja) 1992-10-26 1998-08-13 信越化学工業株式会社 ３−［ｎ−（２−アミノエチル）］アミノプロピルアルコキシシランの製造方法及びその製造装置
JP3761918B2 (ja) * 1994-09-13 2006-03-29 株式会社東芝 半導体装置の製造方法
EP0702017B1 (de) * 1994-09-14 2001-11-14 Degussa AG Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen
JP2842284B2 (ja) * 1995-02-14 1998-12-24 日本電気株式会社 半導体装置の製造方法
US6165910A (en) * 1997-12-29 2000-12-26 Lam Research Corporation Self-aligned contacts for semiconductor device

Also Published As

Publication number Publication date
AU2003207577A1 (en) 2003-09-04
DE60331526D1 (de) 2010-04-15
EP1476450A1 (en) 2004-11-17
KR100893688B1 (ko) 2009-04-17
KR20040097125A (ko) 2004-11-17
CN1630660A (zh) 2005-06-22
ATE459629T1 (de) 2010-03-15
US6452033B1 (en) 2002-09-17
JP4309287B2 (ja) 2009-08-05
EP1476450B1 (en) 2010-03-03
JP2005517707A (ja) 2005-06-16
EP1476450A4 (en) 2008-02-13
WO2003068780A1 (en) 2003-08-21

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