JP4309287B2 - エチレンジアミン塩を再利用するn−[2−アミノエチル]アミノアルキルアルコキシシランの製造方法 - Google Patents
エチレンジアミン塩を再利用するn−[2−アミノエチル]アミノアルキルアルコキシシランの製造方法 Download PDFInfo
- Publication number
- JP4309287B2 JP4309287B2 JP2003567907A JP2003567907A JP4309287B2 JP 4309287 B2 JP4309287 B2 JP 4309287B2 JP 2003567907 A JP2003567907 A JP 2003567907A JP 2003567907 A JP2003567907 A JP 2003567907A JP 4309287 B2 JP4309287 B2 JP 4309287B2
- Authority
- JP
- Japan
- Prior art keywords
- ethylenediamine
- phase
- reactor
- aminoethyl
- salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/073,444 US6452033B1 (en) | 2002-02-11 | 2002-02-11 | Method of making N-[2-aminoethyl] aminoalkylalkoxysilanes with ethyenediamine salt recycle |
| PCT/US2003/001296 WO2003068780A1 (en) | 2002-02-11 | 2003-01-16 | Method of making n- [2-aminoethyl] aminoalkylalkoxysilanes with ethylene diamine salt recycle |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005517707A JP2005517707A (ja) | 2005-06-16 |
| JP2005517707A5 JP2005517707A5 (enExample) | 2005-12-22 |
| JP4309287B2 true JP4309287B2 (ja) | 2009-08-05 |
Family
ID=22113713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003567907A Expired - Fee Related JP4309287B2 (ja) | 2002-02-11 | 2003-01-16 | エチレンジアミン塩を再利用するn−[2−アミノエチル]アミノアルキルアルコキシシランの製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6452033B1 (enExample) |
| EP (1) | EP1476450B1 (enExample) |
| JP (1) | JP4309287B2 (enExample) |
| KR (1) | KR100893688B1 (enExample) |
| CN (1) | CN1267440C (enExample) |
| AT (1) | ATE459629T1 (enExample) |
| AU (1) | AU2003207577A1 (enExample) |
| DE (1) | DE60331526D1 (enExample) |
| WO (1) | WO2003068780A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100413555C (zh) * | 2003-02-10 | 2008-08-27 | 严晓东 | 含β-氨乙基-γ-氨丙基基团的有机硅烷偶联剂的生产废料的回收处理方法 |
| DE102007037193A1 (de) | 2007-08-07 | 2009-02-12 | Wacker Chemie Ag | Verfahren zur Herstellung von Aminoorganosilanen |
| DE102009000500A1 (de) * | 2009-01-30 | 2010-08-05 | Wacker Chemie Ag | Verfahren zur Herstellung von Bis- und Tris(silylorgano)aminen |
| DE102009026755A1 (de) * | 2009-06-04 | 2010-12-09 | Wacker Chemie Ag | Verfahren zur Herstellung von Aminoorganosilanen |
| DE102015225879A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Tris-(alkylalkoxysilyl)amin-reiche Zusammensetzungen, deren Herstellung und deren Verwendung |
| DE102015225883A1 (de) | 2015-12-18 | 2017-06-22 | Evonik Degussa Gmbh | Bis(alkylalkoxysilyl)amin-reiche Zusammensetzungen, ein Verfahren zur deren Herstellung und deren Verwendung |
| DE102016215260A1 (de) | 2016-08-16 | 2018-02-22 | Evonik Degussa Gmbh | Verwendung einer (Alkylalkoxysily)amin-, Bis-(alkylalkoxysilyl)amin und/oder Tris-(alkylalkoxysilyl)amin-enthaltenden Zusammensetzung |
| WO2018033199A1 (de) | 2016-08-16 | 2018-02-22 | Wacker Chemie Ag | Verfahren zur herstellung von sekundären aminoorganosiliciumverbindungen |
| JP7077966B2 (ja) * | 2019-01-07 | 2022-05-31 | 信越化学工業株式会社 | アミノ基含有有機ケイ素化合物の製造方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB889001A (en) | 1959-07-17 | 1962-02-07 | Midland Silicones Ltd | Aminated organosilicon compounds |
| US3146250A (en) | 1961-10-11 | 1964-08-25 | Dow Corning | Nitrogen-containing cyclic silanes, their preparation and hydrolysis |
| US4064155A (en) * | 1975-12-22 | 1977-12-20 | Dow Corning Corporation | Preparation of silylamine hydrochlorides |
| JPS56104891A (en) | 1980-01-28 | 1981-08-20 | Toray Ind Inc | Preparation of (n-aminoethyl)aminoalkylsilane |
| US4448694A (en) * | 1981-09-04 | 1984-05-15 | Dow Corning Corporation | Metal extraction from solution and immobilized chelating agents used therefor |
| US4546996A (en) | 1984-06-18 | 1985-10-15 | J. I. Case Company | Multi-surface stabilizer pad assembly |
| US4526996A (en) * | 1984-06-19 | 1985-07-02 | Union Carbide Corporation | Process for the preparation of N-substituted aminoalkylsilanes |
| JPH053177A (ja) * | 1991-06-25 | 1993-01-08 | Sony Corp | ドライエツチング方法 |
| JP2687787B2 (ja) * | 1991-10-02 | 1997-12-08 | ソニー株式会社 | ドライエッチング方法 |
| JP2785622B2 (ja) | 1992-10-26 | 1998-08-13 | 信越化学工業株式会社 | 3−[n−(2−アミノエチル)]アミノプロピルアルコキシシランの製造方法及びその製造装置 |
| JP3761918B2 (ja) * | 1994-09-13 | 2006-03-29 | 株式会社東芝 | 半導体装置の製造方法 |
| EP0702017B1 (de) * | 1994-09-14 | 2001-11-14 | Degussa AG | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
| JP2842284B2 (ja) * | 1995-02-14 | 1998-12-24 | 日本電気株式会社 | 半導体装置の製造方法 |
| US6165910A (en) * | 1997-12-29 | 2000-12-26 | Lam Research Corporation | Self-aligned contacts for semiconductor device |
-
2002
- 2002-02-11 US US10/073,444 patent/US6452033B1/en not_active Expired - Lifetime
-
2003
- 2003-01-16 AU AU2003207577A patent/AU2003207577A1/en not_active Abandoned
- 2003-01-16 DE DE60331526T patent/DE60331526D1/de not_active Expired - Lifetime
- 2003-01-16 KR KR1020047012330A patent/KR100893688B1/ko not_active Expired - Fee Related
- 2003-01-16 WO PCT/US2003/001296 patent/WO2003068780A1/en not_active Ceased
- 2003-01-16 JP JP2003567907A patent/JP4309287B2/ja not_active Expired - Fee Related
- 2003-01-16 AT AT03705792T patent/ATE459629T1/de not_active IP Right Cessation
- 2003-01-16 EP EP03705792A patent/EP1476450B1/en not_active Expired - Lifetime
- 2003-01-16 CN CNB038036223A patent/CN1267440C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR20040097125A (ko) | 2004-11-17 |
| US6452033B1 (en) | 2002-09-17 |
| JP2005517707A (ja) | 2005-06-16 |
| CN1267440C (zh) | 2006-08-02 |
| CN1630660A (zh) | 2005-06-22 |
| WO2003068780A1 (en) | 2003-08-21 |
| AU2003207577A1 (en) | 2003-09-04 |
| DE60331526D1 (de) | 2010-04-15 |
| EP1476450A1 (en) | 2004-11-17 |
| ATE459629T1 (de) | 2010-03-15 |
| KR100893688B1 (ko) | 2009-04-17 |
| EP1476450A4 (en) | 2008-02-13 |
| EP1476450B1 (en) | 2010-03-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4380660A (en) | Producing alkoxysilanes and alkoxy-oximinosilanes | |
| JP2558284B2 (ja) | アルコキシシランの製造方法 | |
| JP4309287B2 (ja) | エチレンジアミン塩を再利用するn−[2−アミノエチル]アミノアルキルアルコキシシランの製造方法 | |
| CN113444121B (zh) | 一种脱除二甲基二氯硅烷中乙基二氯硅烷杂质的方法 | |
| US20110282088A1 (en) | Process for preparing bis- and tris(silylorgano)amines | |
| JP4934096B2 (ja) | 再循環された塩化水素を用いたクロロメタンの製造方法 | |
| US8314263B2 (en) | Method for producing amino-organosilanes | |
| US20120165564A1 (en) | Method for preparing purified aminosilane | |
| US7417160B2 (en) | Method for the production of silicon compounds carrying amino groups | |
| US8981138B2 (en) | Method for producing aminoorganosilanes | |
| US20090253925A1 (en) | Method for the continuous production of silicon compounds bearing amino groups | |
| JP3935439B2 (ja) | アルキルアミンの連続製法 | |
| US12060376B2 (en) | Process for reducing the content of boron compounds in halosilane-containing compositions | |
| KR100573784B1 (ko) | 고순도 알킬알콕시실란의 제조방법 | |
| KR100521614B1 (ko) | 3-[n-(2-아미노에틸)]아미노프로필알콕시실란의 제조방법 | |
| KR100634025B1 (ko) | 아미노알콕시실란의 제조방법 | |
| JPS5931782A (ja) | ハロシラン類を同時アルコキシル化し得られる生成物を分離する方法 | |
| JPH06211878A (ja) | 3−[n−(2−アミノエチル)]アミノプロピルアルコキシシランの連続的製造方法及びその製造装置 | |
| JP6531656B2 (ja) | 含窒素オルガノキシシラン化合物の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050830 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080902 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081201 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081226 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090318 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090414 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090507 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120515 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130515 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130515 Year of fee payment: 4 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |