CN1225754C - 薄膜电容器的制造方法 - Google Patents

薄膜电容器的制造方法 Download PDF

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Publication number
CN1225754C
CN1225754C CNB021085153A CN02108515A CN1225754C CN 1225754 C CN1225754 C CN 1225754C CN B021085153 A CNB021085153 A CN B021085153A CN 02108515 A CN02108515 A CN 02108515A CN 1225754 C CN1225754 C CN 1225754C
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CN
China
Prior art keywords
crystal grain
film
thin dielectric
principal crystal
dielectric film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB021085153A
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English (en)
Chinese (zh)
Other versions
CN1378223A (zh
Inventor
北川均
佐佐木真
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Publication of CN1378223A publication Critical patent/CN1378223A/zh
Application granted granted Critical
Publication of CN1225754C publication Critical patent/CN1225754C/zh
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
    • H10D1/684—Capacitors having no potential barriers having dielectrics comprising perovskite structures the dielectrics comprising multiple layers, e.g. comprising buffer layers, seed layers or gradient layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/212—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only capacitors

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  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Semiconductor Integrated Circuits (AREA)
CNB021085153A 2001-03-27 2002-03-27 薄膜电容器的制造方法 Expired - Fee Related CN1225754C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001089528 2001-03-27
JP2001089528A JP2002289462A (ja) 2001-03-27 2001-03-27 薄膜キャパシタの製造方法とその薄膜キャパシタを備えた温度補償用薄膜コンデンサ及び電子機器と電子回路

Publications (2)

Publication Number Publication Date
CN1378223A CN1378223A (zh) 2002-11-06
CN1225754C true CN1225754C (zh) 2005-11-02

Family

ID=18944446

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB021085153A Expired - Fee Related CN1225754C (zh) 2001-03-27 2002-03-27 薄膜电容器的制造方法

Country Status (4)

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US (2) US6605515B2 (enExample)
EP (1) EP1246232A3 (enExample)
JP (1) JP2002289462A (enExample)
CN (1) CN1225754C (enExample)

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US6606515B1 (en) * 1996-09-13 2003-08-12 Scimed Life Systems, Inc. Guide wire insertion and re-insertion tools and methods of use
US7518284B2 (en) 2000-11-02 2009-04-14 Danfoss A/S Dielectric composite and a method of manufacturing a dielectric composite
US8181338B2 (en) 2000-11-02 2012-05-22 Danfoss A/S Method of making a multilayer composite
US7548015B2 (en) * 2000-11-02 2009-06-16 Danfoss A/S Multilayer composite and a method of making such
ES2299614T3 (es) 2001-12-21 2008-06-01 Danfoss A/S Estructura de dispositivo dielectrico de accionamiento o deteccion y metodo para fabricar el mismo.
JP4166013B2 (ja) * 2001-12-26 2008-10-15 富士通株式会社 薄膜キャパシタ製造方法
CN100530931C (zh) * 2002-09-20 2009-08-19 丹福斯有限公司 弹性体致动器及制造致动器的方法
US20040061990A1 (en) * 2002-09-26 2004-04-01 Dougherty T. Kirk Temperature-compensated ferroelectric capacitor device, and its fabrication
ATE440319T1 (de) * 2002-12-12 2009-09-15 Danfoss As Berührungssensorelement und sensorgruppe
ES2309502T3 (es) 2003-02-24 2008-12-16 Danfoss A/S Vendaje de compresion elastico electroactivo.
US20040190225A1 (en) * 2003-03-28 2004-09-30 Nippon Paint Co., Ltd. Silicon-containing compound, sintered body of silicon-containing compound, and producing method thereof, and completely solid type capacitor element using same
JP4523299B2 (ja) * 2003-10-31 2010-08-11 学校法人早稲田大学 薄膜コンデンサの製造方法
JP2005252069A (ja) * 2004-03-05 2005-09-15 Tdk Corp 電子デバイス及びその製造方法
JP4370217B2 (ja) * 2004-07-29 2009-11-25 Ｔｄｋ株式会社 積層セラミックコンデンサ
US9572258B2 (en) 2004-12-30 2017-02-14 Intel Corporation Method of forming a substrate core with embedded capacitor and structures formed thereby
US7288459B2 (en) * 2005-03-31 2007-10-30 Intel Corporation Organic substrates with integral thin-film capacitors, methods of making same, and systems containing same
US7372126B2 (en) * 2005-03-31 2008-05-13 Intel Corporation Organic substrates with embedded thin-film capacitors, methods of making same, and systems containing same
US7880371B2 (en) 2006-11-03 2011-02-01 Danfoss A/S Dielectric composite and a method of manufacturing a dielectric composite
US7732999B2 (en) * 2006-11-03 2010-06-08 Danfoss A/S Direct acting capacitive transducer
US7902564B2 (en) * 2006-12-22 2011-03-08 Koninklijke Philips Electronics N.V. Multi-grain luminescent ceramics for light emitting devices
KR101405078B1 (ko) * 2006-12-25 2014-06-10 도쿠리츠교세이호징 붓시쯔 자이료 겐큐키코 유전체 소자와 그 제조 방법
US7804678B2 (en) * 2007-04-25 2010-09-28 Industrial Technology Research Institute Capacitor devices
US8047073B2 (en) * 2007-05-14 2011-11-01 Samsung Sdi Co., Ltd. Capacitive liquid level detector for direct methanol fuel cell systems
US8101495B2 (en) 2008-03-13 2012-01-24 Infineon Technologies Ag MIM capacitors in semiconductor components
JP5332989B2 (ja) * 2009-07-10 2013-11-06 ソニー株式会社 液体タンクおよび燃料電池
US8692442B2 (en) 2012-02-14 2014-04-08 Danfoss Polypower A/S Polymer transducer and a connector for a transducer
US8891222B2 (en) 2012-02-14 2014-11-18 Danfoss A/S Capacitive transducer and a method for manufacturing a transducer
US10748986B2 (en) 2017-11-21 2020-08-18 Taiwan Semiconductor Manufacturing Co., Ltd. Structure and formation method of semiconductor device with capacitors
EP3796383A4 (en) * 2019-07-26 2021-03-31 Shenzhen Goodix Technology Co., Ltd. CAPACITY DEVICE AND ASSOCIATED MANUFACTURING PROCESS
US11869725B2 (en) * 2021-11-30 2024-01-09 Texas Instruments Incorporated Multi-stacked capacitor

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60124303A (ja) 1983-12-08 1985-07-03 沖電気工業株式会社 マイクロ波用誘電体セラミックス
US6002578A (en) * 1986-08-22 1999-12-14 Canon Kabushiki Kaisha Ceramic substrate, circuit substrate and electronic circuit substrate by use thereof and method for preparing ceramic substrate
JPS63110618A (ja) 1986-10-28 1988-05-16 沖電気工業株式会社 積層型マイクロ波用誘電体磁器組成物
JPH0648666B2 (ja) * 1987-09-29 1994-06-22 三菱マテリアル株式会社 積層セラミックコンデンサ及びその製法
JPH03252160A (ja) * 1990-02-28 1991-11-11 Nec Corp コンデンサ、コンデンサネットワーク及び抵抗―コンデンサネットワーク
DE69624042T2 (de) 1995-06-16 2003-06-05 At&T Ipm Corp., Coral Gables TiO2 dotiertes, Ta2O5 enthaltendes dielektrisches Material und dieses enthaltende Bauteile
JPH09293629A (ja) * 1996-04-26 1997-11-11 Mitsubishi Materials Corp 薄膜コンデンサ
US5978207A (en) * 1996-10-30 1999-11-02 The Research Foundation Of The State University Of New York Thin film capacitor
US6251816B1 (en) * 1998-12-31 2001-06-26 Mra Laboratories, Inc. Capacitor and dielectric ceramic powder based upon a barium borate and zinc silicate dual-component sintering flux
WO2001031687A2 (en) * 1999-10-27 2001-05-03 The Penn State Research Foundation Pyrochlore thin films and process for making

Also Published As

Publication number Publication date
US6605515B2 (en) 2003-08-12
US6747334B2 (en) 2004-06-08
US20030008470A1 (en) 2003-01-09
JP2002289462A (ja) 2002-10-04
US20030213960A1 (en) 2003-11-20
EP1246232A3 (en) 2006-06-07
CN1378223A (zh) 2002-11-06
EP1246232A2 (en) 2002-10-02

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