CN120167015A - 含钼的材料 - Google Patents
含钼的材料 Download PDFInfo
- Publication number
- CN120167015A CN120167015A CN202480004504.2A CN202480004504A CN120167015A CN 120167015 A CN120167015 A CN 120167015A CN 202480004504 A CN202480004504 A CN 202480004504A CN 120167015 A CN120167015 A CN 120167015A
- Authority
- CN
- China
- Prior art keywords
- molybdenum
- content
- grain
- less
- containing material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/04—Alloys based on tungsten or molybdenum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023-176718 | 2023-10-12 | ||
| JP2023176718 | 2023-10-12 | ||
| PCT/JP2024/035428 WO2025079494A1 (ja) | 2023-10-12 | 2024-10-03 | モリブデンを含む材料 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN120167015A true CN120167015A (zh) | 2025-06-17 |
Family
ID=95395329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202480004504.2A Pending CN120167015A (zh) | 2023-10-12 | 2024-10-03 | 含钼的材料 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2025079494A1 (https=) |
| KR (1) | KR20250065695A (https=) |
| CN (1) | CN120167015A (https=) |
| WO (1) | WO2025079494A1 (https=) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0224901A (ja) | 1988-07-12 | 1990-01-26 | Stanley Electric Co Ltd | 自動車用照明灯 |
| JP4566367B2 (ja) | 2000-09-04 | 2010-10-20 | 日鉱金属株式会社 | パーティクル発生の少ないスパッタリングターゲット |
| JP4475398B2 (ja) | 2003-09-16 | 2010-06-09 | 日本新金属株式会社 | パーティクル発生のきわめて少ない高純度金属Mo薄膜の形成を可能とするスパッタリング用高純度高密度金属Mo焼結ターゲットの製造方法 |
| US20060042728A1 (en) * | 2004-08-31 | 2006-03-02 | Brad Lemon | Molybdenum sputtering targets |
| JP5160660B2 (ja) | 2011-03-25 | 2013-03-13 | 株式会社アライドマテリアル | モリブデン材 |
| JP6602550B2 (ja) | 2014-04-28 | 2019-11-06 | 株式会社アライドマテリアル | スパッタリングターゲット用材料 |
| AT15903U1 (de) * | 2017-09-29 | 2018-08-15 | Plansee Se | Molybdän-Sinterteil |
| JP7043132B2 (ja) | 2018-03-30 | 2022-03-29 | 株式会社吉野工業所 | 毛染め用具 |
| JP7684414B2 (ja) * | 2021-10-13 | 2025-05-27 | 株式会社アライドマテリアル | モリブデン粉末 |
-
2024
- 2024-10-03 KR KR1020257011799A patent/KR20250065695A/ko active Pending
- 2024-10-03 CN CN202480004504.2A patent/CN120167015A/zh active Pending
- 2024-10-03 JP JP2025512101A patent/JPWO2025079494A1/ja active Pending
- 2024-10-03 WO PCT/JP2024/035428 patent/WO2025079494A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20250065695A (ko) | 2025-05-13 |
| WO2025079494A1 (ja) | 2025-04-17 |
| JPWO2025079494A1 (https=) | 2025-04-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109778126B (zh) | 一种高致密超细晶大尺寸钼靶材的制备方法 | |
| TWI477628B (zh) | Metal sputtering target material | |
| KR101201577B1 (ko) | 향상된 조직 균일성을 가진 내화 금속판 | |
| KR20140073571A (ko) | 스퍼터링 타겟 및 그 제조 방법 | |
| US20160254128A1 (en) | Sputtering target and process for producing it | |
| WO2013038668A1 (ja) | Mo-Wターゲット及びその製造方法 | |
| TWI715466B (zh) | 鉬合金靶材及其製造方法 | |
| CN103459657B (zh) | 高纯度Ni溅射靶及其制造方法 | |
| JP7359836B2 (ja) | 酸化物焼結体、スパッタリングターゲット及びスパッタリングターゲットの製造方法 | |
| JP7108606B2 (ja) | スパッタリングターゲット | |
| US20150122642A1 (en) | Sputtering target and method for producing the same | |
| KR102198726B1 (ko) | 스퍼터링 타깃용 재료 | |
| CN120167015A (zh) | 含钼的材料 | |
| KR20230017181A (ko) | 금속-Si 계 분말, 그 제조 방법, 그리고 금속-Si 계 소결체, 스퍼터링 타깃 및 금속-Si 계 박막의 제조 방법 | |
| TW201704493A (zh) | 鉭濺鍍靶及其製造方法 | |
| US12173398B2 (en) | Cr—Si sintered body, sputtering target, and method for producing thin film | |
| TWI876285B (zh) | 鉻燒結體及其製造方法、濺射靶以及帶鉻膜的基板的製造方法 | |
| EP4570943A1 (en) | Molybdenum sputtering target, method for producing same, and method for producing sputtering film using molybdenum sputtering target | |
| KR20240088695A (ko) | 스퍼터링 타깃, 그 제조 방법, 및 스퍼터링 타깃을 사용한 스퍼터링막의 제조 방법 | |
| WO2025129000A1 (en) | Refractory metal plates | |
| CN118591653A (zh) | 金属溅射靶及其制造方法、以及金属材料及其制造方法 | |
| JP2019183277A (ja) | Cu−Ga合金スパッタリングターゲット | |
| JP2004232046A (ja) | 高純度ルテニウムスパッタリングターゲットとその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |