CN119998475A - Ni合金膜及Ni合金膜形成用溅射靶材 - Google Patents

Ni合金膜及Ni合金膜形成用溅射靶材 Download PDF

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Publication number
CN119998475A
CN119998475A CN202380070409.8A CN202380070409A CN119998475A CN 119998475 A CN119998475 A CN 119998475A CN 202380070409 A CN202380070409 A CN 202380070409A CN 119998475 A CN119998475 A CN 119998475A
Authority
CN
China
Prior art keywords
alloy film
film
atomic
alloy
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380070409.8A
Other languages
English (en)
Chinese (zh)
Inventor
村田英夫
加藤萌美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bomeilicheng Co ltd
Original Assignee
Bomeilicheng Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bomeilicheng Co ltd filed Critical Bomeilicheng Co ltd
Publication of CN119998475A publication Critical patent/CN119998475A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
CN202380070409.8A 2022-10-07 2023-09-22 Ni合金膜及Ni合金膜形成用溅射靶材 Pending CN119998475A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022162054 2022-10-07
JP2022-162054 2022-10-07
PCT/JP2023/034499 WO2024075547A1 (ja) 2022-10-07 2023-09-22 Ｎｉ合金膜およびＮｉ合金膜形成用スパッタリングターゲット材

Publications (1)

Publication Number Publication Date
CN119998475A true CN119998475A (zh) 2025-05-13

Family

ID=90608237

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380070409.8A Pending CN119998475A (zh) 2022-10-07 2023-09-22 Ni合金膜及Ni合金膜形成用溅射靶材

Country Status (4)

Country Link
JP (1) JPWO2024075547A1 (https=)
KR (1) KR20250053965A (https=)
CN (1) CN119998475A (https=)
WO (1) WO2024075547A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02163336A (ja) 1988-12-15 1990-06-22 Toshiba Corp 耐粒界腐食Ｎｉ基合金および腐食試験方法
JP3814822B2 (ja) 2002-03-08 2006-08-30 三菱マテリアル株式会社 高温熱交換器用フィンおよびチューブ
JP5114995B2 (ja) * 2006-11-30 2013-01-09 住友金属鉱山株式会社 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置
JP5239630B2 (ja) * 2008-08-26 2013-07-17 住友金属鉱山株式会社 吸収型多層膜ｎｄフィルター
JP2012219369A (ja) 2011-04-14 2012-11-12 Mmc Superalloy Corp 皮膜形成処理装置用部材
JP6652007B2 (ja) * 2016-07-15 2020-02-19 三菱マテリアル株式会社 Ｎｉ−Ｖ合金スパッタリングターゲット
JP2021075749A (ja) * 2019-11-07 2021-05-20 三井金属鉱業株式会社 スパッタリングターゲット
CN114318255B (zh) * 2021-12-09 2022-09-16 贵研铂业股份有限公司 一种由易氧化金属镀膜保护制备的高致密NiV合金溅射靶材及其制备方法

Also Published As

Publication number Publication date
JPWO2024075547A1 (https=) 2024-04-11
KR20250053965A (ko) 2025-04-22
WO2024075547A1 (ja) 2024-04-11

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