JPWO2024075547A1 - - Google Patents
Info
- Publication number
- JPWO2024075547A1 JPWO2024075547A1 JP2024555715A JP2024555715A JPWO2024075547A1 JP WO2024075547 A1 JPWO2024075547 A1 JP WO2024075547A1 JP 2024555715 A JP2024555715 A JP 2024555715A JP 2024555715 A JP2024555715 A JP 2024555715A JP WO2024075547 A1 JPWO2024075547 A1 JP WO2024075547A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022162054 | 2022-10-07 | ||
| PCT/JP2023/034499 WO2024075547A1 (ja) | 2022-10-07 | 2023-09-22 | Ｎｉ合金膜およびＮｉ合金膜形成用スパッタリングターゲット材 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024075547A1 true JPWO2024075547A1 (https=) | 2024-04-11 |
Family
ID=90608237
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024555715A Pending JPWO2024075547A1 (https=) | 2022-10-07 | 2023-09-22 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024075547A1 (https=) |
| KR (1) | KR20250053965A (https=) |
| CN (1) | CN119998475A (https=) |
| WO (1) | WO2024075547A1 (https=) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02163336A (ja) | 1988-12-15 | 1990-06-22 | Toshiba Corp | 耐粒界腐食Ｎｉ基合金および腐食試験方法 |
| JP3814822B2 (ja) | 2002-03-08 | 2006-08-30 | 三菱マテリアル株式会社 | 高温熱交換器用フィンおよびチューブ |
| JP5114995B2 (ja) * | 2006-11-30 | 2013-01-09 | 住友金属鉱山株式会社 | 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置 |
| JP5239630B2 (ja) * | 2008-08-26 | 2013-07-17 | 住友金属鉱山株式会社 | 吸収型多層膜ｎｄフィルター |
| JP2012219369A (ja) | 2011-04-14 | 2012-11-12 | Mmc Superalloy Corp | 皮膜形成処理装置用部材 |
| JP6652007B2 (ja) * | 2016-07-15 | 2020-02-19 | 三菱マテリアル株式会社 | Ｎｉ−Ｖ合金スパッタリングターゲット |
| JP2021075749A (ja) * | 2019-11-07 | 2021-05-20 | 三井金属鉱業株式会社 | スパッタリングターゲット |
| CN114318255B (zh) * | 2021-12-09 | 2022-09-16 | 贵研铂业股份有限公司 | 一种由易氧化金属镀膜保护制备的高致密NiV合金溅射靶材及其制备方法 |
-
2023
- 2023-09-22 JP JP2024555715A patent/JPWO2024075547A1/ja active Pending
- 2023-09-22 CN CN202380070409.8A patent/CN119998475A/zh active Pending
- 2023-09-22 WO PCT/JP2023/034499 patent/WO2024075547A1/ja not_active Ceased
- 2023-09-22 KR KR1020257010970A patent/KR20250053965A/ko active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN119998475A (zh) | 2025-05-13 |
| KR20250053965A (ko) | 2025-04-22 |
| WO2024075547A1 (ja) | 2024-04-11 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250618 |