KR20250053965A - Ni 합금막 및 Ni 합금막 형성용 스퍼터링 타겟재 - Google Patents

Ni 합금막 및 Ni 합금막 형성용 스퍼터링 타겟재 Download PDF

Info

Publication number
KR20250053965A
KR20250053965A KR1020257010970A KR20257010970A KR20250053965A KR 20250053965 A KR20250053965 A KR 20250053965A KR 1020257010970 A KR1020257010970 A KR 1020257010970A KR 20257010970 A KR20257010970 A KR 20257010970A KR 20250053965 A KR20250053965 A KR 20250053965A
Authority
KR
South Korea
Prior art keywords
alloy film
atomic
target material
sputtering target
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257010970A
Other languages
English (en)
Korean (ko)
Inventor
히데오 무라타
모에미 카토
Original Assignee
가부시키가이샤 프로테리아루
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 프로테리아루 filed Critical 가부시키가이샤 프로테리아루
Publication of KR20250053965A publication Critical patent/KR20250053965A/ko
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
KR1020257010970A 2022-10-07 2023-09-22 Ni 합금막 및 Ni 합금막 형성용 스퍼터링 타겟재 Pending KR20250053965A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022162054 2022-10-07
JPJP-P-2022-162054 2022-10-07
PCT/JP2023/034499 WO2024075547A1 (ja) 2022-10-07 2023-09-22 Ｎｉ合金膜およびＮｉ合金膜形成用スパッタリングターゲット材

Publications (1)

Publication Number Publication Date
KR20250053965A true KR20250053965A (ko) 2025-04-22

Family

ID=90608237

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257010970A Pending KR20250053965A (ko) 2022-10-07 2023-09-22 Ni 합금막 및 Ni 합금막 형성용 스퍼터링 타겟재

Country Status (4)

Country Link
JP (1) JPWO2024075547A1 (https=)
KR (1) KR20250053965A (https=)
CN (1) CN119998475A (https=)
WO (1) WO2024075547A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02163336A (ja) 1988-12-15 1990-06-22 Toshiba Corp 耐粒界腐食Ｎｉ基合金および腐食試験方法
JP3814822B2 (ja) 2002-03-08 2006-08-30 三菱マテリアル株式会社 高温熱交換器用フィンおよびチューブ
JP2012219369A (ja) 2011-04-14 2012-11-12 Mmc Superalloy Corp 皮膜形成処理装置用部材

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5114995B2 (ja) * 2006-11-30 2013-01-09 住友金属鉱山株式会社 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置
JP5239630B2 (ja) * 2008-08-26 2013-07-17 住友金属鉱山株式会社 吸収型多層膜ｎｄフィルター
JP6652007B2 (ja) * 2016-07-15 2020-02-19 三菱マテリアル株式会社 Ｎｉ−Ｖ合金スパッタリングターゲット
JP2021075749A (ja) * 2019-11-07 2021-05-20 三井金属鉱業株式会社 スパッタリングターゲット
CN114318255B (zh) * 2021-12-09 2022-09-16 贵研铂业股份有限公司 一种由易氧化金属镀膜保护制备的高致密NiV合金溅射靶材及其制备方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02163336A (ja) 1988-12-15 1990-06-22 Toshiba Corp 耐粒界腐食Ｎｉ基合金および腐食試験方法
JP3814822B2 (ja) 2002-03-08 2006-08-30 三菱マテリアル株式会社 高温熱交換器用フィンおよびチューブ
JP2012219369A (ja) 2011-04-14 2012-11-12 Mmc Superalloy Corp 皮膜形成処理装置用部材

Also Published As

Publication number Publication date
JPWO2024075547A1 (https=) 2024-04-11
CN119998475A (zh) 2025-05-13
WO2024075547A1 (ja) 2024-04-11

Similar Documents

Publication Publication Date Title
KR100568392B1 (ko) 은 합금 스퍼터링 타겟 및 그의 제조 방법
JP5203908B2 (ja) Ｎｉ−Ｍｏ系合金スパッタリングターゲット板
CN110129649A (zh) 一种高熵合金涂层粉末及纳米晶高熵合金涂层的制备方法
JP2010053445A (ja) フラットパネルディスプレイ用配線膜形成用スパッタリングターゲット
WO2013038983A1 (ja) 高純度銅マンガン合金スパッタリングターゲット
WO2021046927A1 (zh) 一种含微量稀土元素的镍铼合金旋转管状靶材及制备方法
JP2017532443A (ja) 薄膜部品の金属被覆、その製造方法及びスパッタリングターゲット
CN111455329B (zh) 一种铝钛硼靶材及其粉末固相合金化烧结方法
Ersun et al. The influence of Al addition and aluminizing process on oxidation performance of arc melted CoCrFeNi alloy
ZHANG et al. Mechanism of high temperature oxidation of Inconel 625 superalloy with various solution and ageing heat treatment processes
CN111663070B (zh) 一种耐高温氧化的AlCoCrFeNiSiY高熵合金及其制备方法
CN115261806B (zh) 一种镍铝合金溅射靶材及其热等静压制备方法
KR20250053965A (ko) Ni 합금막 및 Ni 합금막 형성용 스퍼터링 타겟재
CN114293155A (zh) 一种银钯铜合金靶材的制备方法
JP6380837B2 (ja) 被覆層形成用スパッタリングターゲット材およびその製造方法
TWI923358B (zh) 合金薄膜及濺鍍靶
WO2025197626A1 (ja) 合金薄膜およびスパッタリングターゲット
JP2007084928A (ja) 銅合金製バッキングプレートおよび該銅合金の製造方法
CN116334563A (zh) 溅射靶及制造溅射靶的方法
CN104746000A (zh) 一种非晶合金表面处理的方法
JP4042714B2 (ja) 金属抵抗体材料、スパッタリングターゲットおよび抵抗薄膜
JP2000100755A (ja) 半導体装置のバリア膜形成用Ｔｉ−Ａｌ合金スパッタリングターゲット
TWI905909B (zh) 濺鍍靶
JP2021075749A (ja) スパッタリングターゲット
CN118256793A (zh) 一种Mo-Ti-Cr-Si系难熔中熵合金及其制备方法

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20250403

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination
PG1501 Laying open of application