CN119856081A - 硅氧化物凝胶分散液、透明低折射率膜及硅氧化物凝胶分散液的制造方法 - Google Patents

硅氧化物凝胶分散液、透明低折射率膜及硅氧化物凝胶分散液的制造方法 Download PDF

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Publication number
CN119856081A
CN119856081A CN202380064989.XA CN202380064989A CN119856081A CN 119856081 A CN119856081 A CN 119856081A CN 202380064989 A CN202380064989 A CN 202380064989A CN 119856081 A CN119856081 A CN 119856081A
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CN
China
Prior art keywords
silicon oxide
gel
dispersion
oxide gel
solvent
Prior art date
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Pending
Application number
CN202380064989.XA
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English (en)
Chinese (zh)
Inventor
盐谷佳之
大久保洋平
八尾朋侑
井筒了太
服部大辅
森岛谅太
佐藤启介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Shokubai Co Ltd
Nitto Denko Corp
Original Assignee
Nippon Shokubai Co Ltd
Nitto Denko Corp
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Publication date
Application filed by Nippon Shokubai Co Ltd, Nitto Denko Corp filed Critical Nippon Shokubai Co Ltd
Publication of CN119856081A publication Critical patent/CN119856081A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
CN202380064989.XA 2022-09-12 2023-09-12 硅氧化物凝胶分散液、透明低折射率膜及硅氧化物凝胶分散液的制造方法 Pending CN119856081A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022144579 2022-09-12
JP2022-144579 2022-09-12
PCT/JP2023/033175 WO2024058165A1 (ja) 2022-09-12 2023-09-12 ケイ素酸化物ゲル分散液、透明低屈折率フィルム、及び、ケイ素酸化物ゲル分散液の製造方法

Publications (1)

Publication Number Publication Date
CN119856081A true CN119856081A (zh) 2025-04-18

Family

ID=90275086

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380064989.XA Pending CN119856081A (zh) 2022-09-12 2023-09-12 硅氧化物凝胶分散液、透明低折射率膜及硅氧化物凝胶分散液的制造方法

Country Status (4)

Country Link
JP (1) JPWO2024058165A1 (https=)
KR (1) KR20250036900A (https=)
CN (1) CN119856081A (https=)
WO (1) WO2024058165A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025178131A1 (ja) * 2024-02-22 2025-08-28 日東電工株式会社 分散液の製造方法、分散液、低屈折率層、光学部材、光学装置、低屈折率層の製造方法、光学部材の製造方法、及び光学装置の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5047488B2 (ja) 2004-11-05 2012-10-10 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜の製造方法
JP2017057116A (ja) * 2015-09-16 2017-03-23 日東電工株式会社 ゾル液およびその製造方法、積層フィルムの製造方法、積層フイルム、光学部材、並びに画像表示装置
JP2017061604A (ja) 2015-09-24 2017-03-30 日東電工株式会社 低屈折率膜製造用ゲル、低屈折率膜製造用ゲルの製造方法、低屈折率膜製造用塗料、低屈折率膜製造用塗料の製造方法、積層フィルムの製造方法および画像表示装置の製造方法
JP6758809B2 (ja) * 2015-09-29 2020-09-23 日東電工株式会社 多孔体ゲル含有液の製造方法、多孔体ゲル含有液、高空隙層の製造方法、高空隙率多孔体の製造方法、および積層フィルムロールの製造方法
JP2017132674A (ja) 2016-01-29 2017-08-03 日東電工株式会社 ゲル粉砕物含有液、およびゲル粉砕物含有液の製造方法
WO2018142813A1 (ja) * 2017-01-31 2018-08-09 日東電工株式会社 低屈折率層含有粘接着シート、低屈折率層含有粘接着シートの製造方法、および光学デバイス
JP6580101B2 (ja) * 2017-09-29 2019-09-25 日東電工株式会社 空隙層、積層体、空隙層の製造方法、光学部材および光学装置

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KR20250036900A (ko) 2025-03-14
WO2024058165A1 (ja) 2024-03-21
JPWO2024058165A1 (https=) 2024-03-21

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