KR20250036900A - 규소 산화물 겔 분산액, 투명 저굴절률 필름, 및 규소 산화물 겔 분산액의 제조 방법 - Google Patents

규소 산화물 겔 분산액, 투명 저굴절률 필름, 및 규소 산화물 겔 분산액의 제조 방법 Download PDF

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Publication number
KR20250036900A
KR20250036900A KR1020257004767A KR20257004767A KR20250036900A KR 20250036900 A KR20250036900 A KR 20250036900A KR 1020257004767 A KR1020257004767 A KR 1020257004767A KR 20257004767 A KR20257004767 A KR 20257004767A KR 20250036900 A KR20250036900 A KR 20250036900A
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KR
South Korea
Prior art keywords
silicon oxide
gel
dispersion
oxide gel
solvent
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Pending
Application number
KR1020257004767A
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English (en)
Korean (ko)
Inventor
요시유키 시오타니
요헤이 오쿠보
도모유키 야오
료타 이즈츠
다이스케 핫토리
료타 모리시마
게이스케 사토
Original Assignee
가부시키가이샤 닛폰 쇼쿠바이
닛토덴코 가부시키가이샤
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Publication of KR20250036900A publication Critical patent/KR20250036900A/ko
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
KR1020257004767A 2022-09-12 2023-09-12 규소 산화물 겔 분산액, 투명 저굴절률 필름, 및 규소 산화물 겔 분산액의 제조 방법 Pending KR20250036900A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022144579 2022-09-12
JPJP-P-2022-144579 2022-09-12
PCT/JP2023/033175 WO2024058165A1 (ja) 2022-09-12 2023-09-12 ケイ素酸化物ゲル分散液、透明低屈折率フィルム、及び、ケイ素酸化物ゲル分散液の製造方法

Publications (1)

Publication Number Publication Date
KR20250036900A true KR20250036900A (ko) 2025-03-14

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Family Applications (1)

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KR1020257004767A Pending KR20250036900A (ko) 2022-09-12 2023-09-12 규소 산화물 겔 분산액, 투명 저굴절률 필름, 및 규소 산화물 겔 분산액의 제조 방법

Country Status (4)

Country Link
JP (1) JPWO2024058165A1 (https=)
KR (1) KR20250036900A (https=)
CN (1) CN119856081A (https=)
WO (1) WO2024058165A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025178131A1 (ja) * 2024-02-22 2025-08-28 日東電工株式会社 分散液の製造方法、分散液、低屈折率層、光学部材、光学装置、低屈折率層の製造方法、光学部材の製造方法、及び光学装置の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006151800A (ja) 2004-11-05 2006-06-15 Pentax Corp シリカエアロゲル膜の製造方法
WO2017051831A1 (ja) 2015-09-24 2017-03-30 日東電工株式会社 低屈折率膜製造用ゲル、低屈折率膜製造用ゲルの製造方法、低屈折率膜製造用塗料、低屈折率膜製造用塗料の製造方法、積層フィルムの製造方法および画像表示装置の製造方法
JP2017132674A (ja) 2016-01-29 2017-08-03 日東電工株式会社 ゲル粉砕物含有液、およびゲル粉砕物含有液の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017057116A (ja) * 2015-09-16 2017-03-23 日東電工株式会社 ゾル液およびその製造方法、積層フィルムの製造方法、積層フイルム、光学部材、並びに画像表示装置
JP6758809B2 (ja) * 2015-09-29 2020-09-23 日東電工株式会社 多孔体ゲル含有液の製造方法、多孔体ゲル含有液、高空隙層の製造方法、高空隙率多孔体の製造方法、および積層フィルムロールの製造方法
WO2018142813A1 (ja) * 2017-01-31 2018-08-09 日東電工株式会社 低屈折率層含有粘接着シート、低屈折率層含有粘接着シートの製造方法、および光学デバイス
JP6580101B2 (ja) * 2017-09-29 2019-09-25 日東電工株式会社 空隙層、積層体、空隙層の製造方法、光学部材および光学装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006151800A (ja) 2004-11-05 2006-06-15 Pentax Corp シリカエアロゲル膜の製造方法
WO2017051831A1 (ja) 2015-09-24 2017-03-30 日東電工株式会社 低屈折率膜製造用ゲル、低屈折率膜製造用ゲルの製造方法、低屈折率膜製造用塗料、低屈折率膜製造用塗料の製造方法、積層フィルムの製造方法および画像表示装置の製造方法
JP2017132674A (ja) 2016-01-29 2017-08-03 日東電工株式会社 ゲル粉砕物含有液、およびゲル粉砕物含有液の製造方法

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WO2024058165A1 (ja) 2024-03-21
JPWO2024058165A1 (https=) 2024-03-21
CN119856081A (zh) 2025-04-18

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Patent event date: 20250213

Patent event code: PA01051R01D

Comment text: International Patent Application

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