JPWO2024058165A1 - - Google Patents

Info

Publication number
JPWO2024058165A1
JPWO2024058165A1 JP2024546975A JP2024546975A JPWO2024058165A1 JP WO2024058165 A1 JPWO2024058165 A1 JP WO2024058165A1 JP 2024546975 A JP2024546975 A JP 2024546975A JP 2024546975 A JP2024546975 A JP 2024546975A JP WO2024058165 A1 JPWO2024058165 A1 JP WO2024058165A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024546975A
Other languages
Japanese (ja)
Other versions
JPWO2024058165A5 (https=
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024058165A1 publication Critical patent/JPWO2024058165A1/ja
Publication of JPWO2024058165A5 publication Critical patent/JPWO2024058165A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/145—Preparation of hydroorganosols, organosols or dispersions in an organic medium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/02—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20—Diluents or solvents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
JP2024546975A 2022-09-12 2023-09-12 Pending JPWO2024058165A1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022144579 2022-09-12
PCT/JP2023/033175 WO2024058165A1 (ja) 2022-09-12 2023-09-12 ケイ素酸化物ゲル分散液、透明低屈折率フィルム、及び、ケイ素酸化物ゲル分散液の製造方法

Publications (2)

Publication Number Publication Date
JPWO2024058165A1 true JPWO2024058165A1 (https=) 2024-03-21
JPWO2024058165A5 JPWO2024058165A5 (https=) 2025-04-17

Family

ID=90275086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024546975A Pending JPWO2024058165A1 (https=) 2022-09-12 2023-09-12

Country Status (4)

Country Link
JP (1) JPWO2024058165A1 (https=)
KR (1) KR20250036900A (https=)
CN (1) CN119856081A (https=)
WO (1) WO2024058165A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025178131A1 (ja) * 2024-02-22 2025-08-28 日東電工株式会社 分散液の製造方法、分散液、低屈折率層、光学部材、光学装置、低屈折率層の製造方法、光学部材の製造方法、及び光学装置の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017057116A (ja) * 2015-09-16 2017-03-23 日東電工株式会社 ゾル液およびその製造方法、積層フィルムの製造方法、積層フイルム、光学部材、並びに画像表示装置
WO2017057331A1 (ja) * 2015-09-29 2017-04-06 日東電工株式会社 多孔体ゲル含有液の製造方法、多孔体ゲル含有液、高空隙層の製造方法、高空隙率多孔体の製造方法、および積層フィルムロールの製造方法
WO2018142813A1 (ja) * 2017-01-31 2018-08-09 日東電工株式会社 低屈折率層含有粘接着シート、低屈折率層含有粘接着シートの製造方法、および光学デバイス
WO2019065803A1 (ja) * 2017-09-29 2019-04-04 日東電工株式会社 空隙層、積層体、空隙層の製造方法、光学部材および光学装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5047488B2 (ja) 2004-11-05 2012-10-10 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜の製造方法
JP2017061604A (ja) 2015-09-24 2017-03-30 日東電工株式会社 低屈折率膜製造用ゲル、低屈折率膜製造用ゲルの製造方法、低屈折率膜製造用塗料、低屈折率膜製造用塗料の製造方法、積層フィルムの製造方法および画像表示装置の製造方法
JP2017132674A (ja) 2016-01-29 2017-08-03 日東電工株式会社 ゲル粉砕物含有液、およびゲル粉砕物含有液の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017057116A (ja) * 2015-09-16 2017-03-23 日東電工株式会社 ゾル液およびその製造方法、積層フィルムの製造方法、積層フイルム、光学部材、並びに画像表示装置
WO2017057331A1 (ja) * 2015-09-29 2017-04-06 日東電工株式会社 多孔体ゲル含有液の製造方法、多孔体ゲル含有液、高空隙層の製造方法、高空隙率多孔体の製造方法、および積層フィルムロールの製造方法
WO2018142813A1 (ja) * 2017-01-31 2018-08-09 日東電工株式会社 低屈折率層含有粘接着シート、低屈折率層含有粘接着シートの製造方法、および光学デバイス
WO2019065803A1 (ja) * 2017-09-29 2019-04-04 日東電工株式会社 空隙層、積層体、空隙層の製造方法、光学部材および光学装置

Also Published As

Publication number Publication date
KR20250036900A (ko) 2025-03-14
WO2024058165A1 (ja) 2024-03-21
CN119856081A (zh) 2025-04-18

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