CN119586004A - 振动装置及振动装置的制造方法 - Google Patents
振动装置及振动装置的制造方法 Download PDFInfo
- Publication number
- CN119586004A CN119586004A CN202380058332.2A CN202380058332A CN119586004A CN 119586004 A CN119586004 A CN 119586004A CN 202380058332 A CN202380058332 A CN 202380058332A CN 119586004 A CN119586004 A CN 119586004A
- Authority
- CN
- China
- Prior art keywords
- vibration
- substrate
- layer
- frame
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/19—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator consisting of quartz
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders or supports
- H03H9/058—Holders or supports for surface acoustic wave devices
- H03H9/059—Holders or supports for surface acoustic wave devices consisting of mounting pads or bumps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders or supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1014—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device
- H03H9/1021—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a frame built on a substrate and a cap, the frame having no mechanical contact with the BAW device the BAW device being of the cantilever type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders or supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/1035—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by two sealing substrates sandwiching the piezoelectric layer of the BAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/022—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the cantilever type
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/032580 WO2024047745A1 (ja) | 2022-08-30 | 2022-08-30 | 振動デバイス |
| JPPCT/JP2022/032580 | 2022-08-30 | ||
| PCT/JP2023/028524 WO2024048201A1 (ja) | 2022-08-30 | 2023-08-04 | 振動デバイス及び振動デバイスの製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN119586004A true CN119586004A (zh) | 2025-03-07 |
Family
ID=90098925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380058332.2A Pending CN119586004A (zh) | 2022-08-30 | 2023-08-04 | 振动装置及振动装置的制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20260074672A1 (https=) |
| JP (1) | JP7723846B2 (https=) |
| CN (1) | CN119586004A (https=) |
| TW (1) | TWI876487B (https=) |
| WO (2) | WO2024047745A1 (https=) |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7104129B2 (en) * | 2004-02-02 | 2006-09-12 | Invensense Inc. | Vertically integrated MEMS structure with electronics in a hermetically sealed cavity |
| JPWO2006001125A1 (ja) * | 2004-06-25 | 2008-04-17 | 株式会社村田製作所 | 圧電デバイス |
| JP2006237406A (ja) | 2005-02-25 | 2006-09-07 | Toshiba Corp | 樹脂封止型電子部品装置 |
| JP2006339701A (ja) * | 2005-05-31 | 2006-12-14 | Kyocera Kinseki Corp | 圧電振動子 |
| JP2008060382A (ja) * | 2006-08-31 | 2008-03-13 | Matsushita Electric Ind Co Ltd | 電子部品及びその製造方法 |
| JP5119866B2 (ja) | 2007-03-22 | 2013-01-16 | セイコーエプソン株式会社 | 水晶デバイス及びその封止方法 |
| JP4893602B2 (ja) * | 2007-11-26 | 2012-03-07 | 株式会社大真空 | 圧電振動デバイスおよび圧電振動デバイスの気密封止方法 |
| JP2010246001A (ja) * | 2009-04-09 | 2010-10-28 | Seiko Epson Corp | 電子部品及びその製造方法 |
| JP2012191446A (ja) * | 2011-03-10 | 2012-10-04 | Seiko Instruments Inc | 電子デバイス及び電子デバイスの製造方法 |
| JP2013162030A (ja) * | 2012-02-07 | 2013-08-19 | Seiko Epson Corp | 電子デバイス、及び電子機器 |
| JP5984487B2 (ja) * | 2012-04-27 | 2016-09-06 | 京セラクリスタルデバイス株式会社 | 水晶デバイス |
| KR20140118792A (ko) * | 2013-03-29 | 2014-10-08 | 세이코 엡슨 가부시키가이샤 | 진동 소자, 진동자, 발진기, 전자 기기, 센서, 및 이동체 |
| JP6295611B2 (ja) * | 2013-11-05 | 2018-03-20 | セイコーエプソン株式会社 | 振動子、発振器、電子機器、および移動体 |
| WO2015162958A1 (ja) * | 2014-04-24 | 2015-10-29 | 株式会社村田製作所 | 水晶振動装置及びその製造方法 |
| JP2017060054A (ja) * | 2015-09-17 | 2017-03-23 | エスアイアイ・クリスタルテクノロジー株式会社 | 圧電振動片及び圧電振動子 |
| WO2019044490A1 (ja) * | 2017-09-01 | 2019-03-07 | 株式会社村田製作所 | 圧電振動子 |
| JP7543899B2 (ja) * | 2020-12-23 | 2024-09-03 | 株式会社大真空 | 圧電振動デバイス |
| US11990889B2 (en) * | 2020-12-28 | 2024-05-21 | Win Semiconductors Corp. | Bulk acoustic wave resonator and formation method thereof |
-
2022
- 2022-08-30 WO PCT/JP2022/032580 patent/WO2024047745A1/ja not_active Ceased
-
2023
- 2023-08-04 WO PCT/JP2023/028524 patent/WO2024048201A1/ja not_active Ceased
- 2023-08-04 JP JP2024544068A patent/JP7723846B2/ja active Active
- 2023-08-04 CN CN202380058332.2A patent/CN119586004A/zh active Pending
- 2023-08-04 US US19/106,556 patent/US20260074672A1/en active Pending
- 2023-08-23 TW TW112131696A patent/TWI876487B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JP7723846B2 (ja) | 2025-08-14 |
| WO2024047745A1 (ja) | 2024-03-07 |
| WO2024048201A1 (ja) | 2024-03-07 |
| US20260074672A1 (en) | 2026-03-12 |
| TW202425530A (zh) | 2024-06-16 |
| TWI876487B (zh) | 2025-03-11 |
| JPWO2024048201A1 (https=) | 2024-03-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |