CN118973989A - 具有碘原子的环状化合物 - Google Patents

具有碘原子的环状化合物 Download PDF

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Publication number
CN118973989A
CN118973989A CN202380032674.7A CN202380032674A CN118973989A CN 118973989 A CN118973989 A CN 118973989A CN 202380032674 A CN202380032674 A CN 202380032674A CN 118973989 A CN118973989 A CN 118973989A
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compound
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substituent
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松本正裕
饭沼雅崇
大松祯
佐藤隆
越后雅敏
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Mitsubishi Gas Chemical Co Inc
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Mitsubishi Gas Chemical Co Inc
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    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • C07C29/00Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/62Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by introduction of halogen; by substitution of halogen atoms by other halogen atoms
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    • C07C43/20Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
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    • C07C45/67Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/70Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form
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    • C07C67/333Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
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    • C07C69/76Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring
    • C07C69/94Esters of carboxylic acids having a carboxyl group bound to a carbon atom of a six-membered aromatic ring of polycyclic hydroxy carboxylic acids, the hydroxy groups and the carboxyl groups of which are bound to carbon atoms of six-membered aromatic rings
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    • C07D309/08Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D309/10Oxygen atoms
    • GPHYSICS
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    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Indole Compounds (AREA)
CN202380032674.7A 2022-04-08 2023-04-10 具有碘原子的环状化合物 Pending CN118973989A (zh)

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JP2022064331 2022-04-08
JP2022-064331 2022-04-08
PCT/JP2023/015256 WO2023195546A1 (ja) 2022-04-08 2023-04-10 ヨウ素原子を有する環状化合物

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JP (1) JPWO2023195546A1 (https=)
KR (1) KR20250004735A (https=)
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JPWO2024214321A1 (https=) * 2023-04-10 2024-10-17
WO2025079648A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 化合物、組成物、樹脂組成物、膜形成用組成物、リソグラフィー用膜形成用組成物、レジスト膜形成用組成物
WO2025079646A1 (ja) * 2023-10-11 2025-04-17 三菱瓦斯化学株式会社 有機ハロゲン化合物の製造方法、化合物、酸発生剤、塩基発生剤、クエンチャー、重合体、組成物及びレジストパターン形成方法
JPWO2025182419A1 (https=) * 2024-02-29 2025-09-04

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FR2892412B1 (fr) * 2005-10-26 2008-05-16 Galderma Res & Dev Composes biaromatiques modulateurs des ppars
KR101614524B1 (ko) * 2013-09-30 2016-04-21 주식회사 엘지화학 중합성 액정 화합물, 이를 포함하는 액정 조성물 및 광학 필름
WO2015152128A1 (ja) * 2014-03-31 2015-10-08 長瀬産業株式会社 アミノ酸前駆体、アミノ酸およびその製造方法、ならびに該アミノ酸を用いたpet診断用トレーサー
CN112639020A (zh) 2018-08-24 2021-04-09 三菱瓦斯化学株式会社 化合物、包含其的组合物、以及抗蚀图案的形成方法和绝缘膜的形成方法
WO2021157551A1 (ja) * 2020-02-06 2021-08-12 三菱瓦斯化学株式会社 リソグラフィー用組成物及びパターン形成方法
WO2021230300A1 (ja) * 2020-05-15 2021-11-18 三菱瓦斯化学株式会社 化合物、(共)重合体、組成物、レジストパターン形成方法、並びに化合物及び(共)重合体の製造方法
JP7789494B2 (ja) * 2020-06-01 2025-12-22 住友化学株式会社 化合物、樹脂、レジスト組成物及びレジストパターンの製造方法
TWI849314B (zh) 2020-06-01 2024-07-21 日商住友化學股份有限公司 化合物、樹脂、抗蝕劑組成物及抗蝕劑圖案的製造方法
JP2022135974A (ja) * 2021-03-04 2022-09-15 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
JP2022141598A (ja) * 2021-03-15 2022-09-29 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法
JP7848028B2 (ja) * 2021-04-15 2026-04-20 住友化学株式会社 カルボン酸塩、カルボン酸発生剤、レジスト組成物及びレジストパターンの製造方法

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US20250250216A1 (en) 2025-08-07
WO2023195546A1 (ja) 2023-10-12

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