CN115943071B - 用于叠加制造技术的含有巯基官能化聚有机硅氧烷的可辐射固化组合物 - Google Patents

用于叠加制造技术的含有巯基官能化聚有机硅氧烷的可辐射固化组合物 Download PDF

Info

Publication number
CN115943071B
CN115943071B CN202080014298.5A CN202080014298A CN115943071B CN 115943071 B CN115943071 B CN 115943071B CN 202080014298 A CN202080014298 A CN 202080014298A CN 115943071 B CN115943071 B CN 115943071B
Authority
CN
China
Prior art keywords
component
mercapto
radiation curable
dye
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202080014298.5A
Other languages
English (en)
Chinese (zh)
Other versions
CN115943071A (zh
Inventor
亨宁·霍夫曼
皮特·U·奥斯瓦尔德
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shuwanuo Intellectual Property Co
Original Assignee
Shuwanuo Intellectual Property Co
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shuwanuo Intellectual Property Co, 3M Innovative Properties Co filed Critical Shuwanuo Intellectual Property Co
Publication of CN115943071A publication Critical patent/CN115943071A/zh
Application granted granted Critical
Publication of CN115943071B publication Critical patent/CN115943071B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2083/00—Use of polymers having silicon, with or without sulfur, nitrogen, oxygen, or carbon only, in the main chain, as moulding material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0005—Condition, form or state of moulded material or of the material to be shaped containing compounding ingredients
    • B29K2105/0032—Pigments, colouring agents or opacifiyng agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0037—Other properties
    • B29K2995/007—Hardness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
    • B29K2995/0037—Other properties
    • B29K2995/0077—Yield strength; Tensile strength
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/26—Sealing devices, e.g. packaging for pistons or pipe joints
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/721—Vibration dampening equipment, e.g. shock absorbers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/753—Medical equipment; Accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2031/00—Other particular articles
    • B29L2031/768—Protective equipment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Dental Preparations (AREA)
CN202080014298.5A 2019-02-18 2020-02-17 用于叠加制造技术的含有巯基官能化聚有机硅氧烷的可辐射固化组合物 Active CN115943071B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19157710.5 2019-02-18
EP19157710 2019-02-18
PCT/IB2020/051309 WO2020170114A1 (en) 2019-02-18 2020-02-17 Radiation-curable composition containing mercapto-functional polyorganosiloxanes for additive-manufacturing technology

Publications (2)

Publication Number Publication Date
CN115943071A CN115943071A (zh) 2023-04-07
CN115943071B true CN115943071B (zh) 2024-09-20

Family

ID=65493893

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080014298.5A Active CN115943071B (zh) 2019-02-18 2020-02-17 用于叠加制造技术的含有巯基官能化聚有机硅氧烷的可辐射固化组合物

Country Status (5)

Country Link
US (1) US12071544B2 (https=)
EP (1) EP3927550B1 (https=)
JP (1) JP2022520476A (https=)
CN (1) CN115943071B (https=)
WO (1) WO2020170114A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020250129A1 (en) 2019-06-12 2020-12-17 3M Innovative Properties Company Process of taking a dental impression with a radiation-curable composition containing mercapto-functional polyorganosiloxanes and vqm resins
GB202014743D0 (en) * 2020-09-18 2020-11-04 Univ London Queen Mary Photocurable silicone compositions and methods
JP2023082381A (ja) * 2021-12-02 2023-06-14 ローム・アンド・ハース・エレクトロニック・マテリアルズ・コリア・リミテッド 硬化性シリコーン組成物及びその硬化物
CN118922474A (zh) * 2022-03-25 2024-11-08 株式会社华尔卡 糊料
US20240249457A1 (en) * 2023-01-20 2024-07-25 Idomoo Ltd System and method to generating video by text

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101490136A (zh) * 2006-09-29 2009-07-22 德意志戴斯达纺织品及染料两合公司 有色的有机聚硅氧烷
CN102208567A (zh) * 2011-04-18 2011-10-05 电子科技大学 一种柔性发光器件用基板及其制备方法
CN105683258A (zh) * 2013-11-11 2016-06-15 道康宁公司 紫外可固化有机硅组合物、其固化产物及使用它们的方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4035453A (en) 1974-05-28 1977-07-12 Wacker-Chemie Gmbh Dental impression materials
US5124212A (en) * 1983-10-26 1992-06-23 Dow Corning Corporation Articles prepared from fast ultraviolet radiation curing silicone composition
DE3443221A1 (de) 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
US4657959A (en) 1985-11-15 1987-04-14 Minnesota Mining And Manufacturing Company Hydrophilic silicones
ATE66807T1 (de) 1986-02-06 1991-09-15 Dentsply Gmbh Zahnabdruckmaterial.
US4782101A (en) 1986-11-19 1988-11-01 Manufacturers Hanover Trust Company Prevention of outgassing in polyvinylsiloxane elastomers by the use of finely divided platinum black
DE3837569A1 (de) 1988-11-04 1990-05-10 Espe Stiftung Mit sichtbarem licht aushaertbare dentalmassen
JPH0374463A (ja) 1989-08-17 1991-03-29 Toshiba Silicone Co Ltd 光ファイバー一次被覆用紫外線硬化型シリコーン組成物
DE69120919T2 (de) 1990-12-28 1997-02-20 Dow Corning Verfahren zur Sichtbarmachung der Härtung einer UV-härtbaren Zusammensetzung durch eine Farbänderung
US5254655A (en) * 1992-02-05 1993-10-19 Hercules Incorporated Organosilicon polymers, and dyes, exhibiting nonlinear optical response
US5281240A (en) * 1992-09-21 1994-01-25 Dow Corning Corporation Method of coloring hair with water soluble acid dyes
DE4433139A1 (de) 1994-09-16 1996-03-21 Thera Ges Fuer Patente Hydrophilierte Zahnabdruckmassen
US6730156B1 (en) 1999-10-28 2004-05-04 3M Innovative Properties Company Clustered particle dental fillers
JP2004020936A (ja) * 2002-06-17 2004-01-22 Mitsubishi Electric Corp 感光記録材料
US20040170923A1 (en) 2003-02-27 2004-09-02 3D Systems, Inc. Colored stereolithographic resins
US20050027032A1 (en) 2003-07-18 2005-02-03 Hare Robert V. Polyorganosiloxane dental impression materials
US8192673B2 (en) 2003-10-22 2012-06-05 University Of Kansas Resin systems for dental restorative materials
JP4788863B2 (ja) * 2004-06-18 2011-10-05 シーメット株式会社 光学的立体造形用樹脂組成物及び光学的立体造形方法
DE102005062027A1 (de) * 2005-12-22 2007-06-28 Basf Ag Wässrige Dispersionen von Polymeren, die einen Fluoreszenzfarbstoff enthalten, Verfahren zu ihrer Herstellung und ihre Verwendung zum Markieren von Materialien
US20100304338A1 (en) 2007-09-19 2010-12-02 The Regents Of The University Of Colorado Polymer impression materials
JP2010242032A (ja) * 2009-04-09 2010-10-28 Dainippon Printing Co Ltd 耐光性を向上した着色材組成物
JP5587519B1 (ja) * 2013-05-08 2014-09-10 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 画像表示装置用のダム材組成物、及びそれを用いた画像表示装置
GB201318898D0 (en) 2013-10-25 2013-12-11 Fripp Design Ltd Method and apparatus for additive manufacturing
CN103666064B (zh) * 2013-11-25 2016-03-23 铜陵方正塑业科技有限公司 一种紫外光固化速干防水油墨及其制备方法
FR3014688B1 (fr) 2013-12-12 2016-12-16 Laboratoires Inneov S N C Composition a base d'acide gras polyinsature et de carotenoide destinee a une administration par voie orale pour ameliorer la qualite de la chevelure
US10130560B2 (en) 2014-03-20 2018-11-20 The Regents Of The University Of Michigan Bioactive “smart” dental composite materials
JP2016011266A (ja) * 2014-06-27 2016-01-21 川研ファインケミカル株式会社 油性化粧料組成物
JP6646047B2 (ja) * 2014-09-17 2020-02-14 ダウ シリコーンズ コーポレーション 光硬化性シリコーン組成物を用いた３ｄプリンティングの方法
DE102014222685A1 (de) 2014-11-06 2016-05-12 Wacker Chemie Ag Verfahren zur Herstellung von Siliconelastomerteilen
DE102014116402A1 (de) * 2014-11-11 2016-05-12 Voco Gmbh Verwendung radikalisch härtbarer Zusammensetzungen in generativen Fertigungsverfahren
CN107459871B (zh) 2016-07-11 2018-05-25 珠海赛纳打印科技股份有限公司 3d喷墨打印用光固化透明墨水及其制备方法
US11299430B2 (en) * 2016-11-30 2022-04-12 Hrl Laboratories, Llc Formulations with active functional additives for 3D printing of preceramic polymers, and methods of 3D-printing the formulations
JP2020528940A (ja) * 2017-06-09 2020-10-01 ダウ シリコーンズ コーポレーション Ｕｖ硬化性シリコーン端子封止剤
EP3749717A1 (en) 2018-02-05 2020-12-16 3M Innovative Properties Company Radiation-curable composition containing mercapto-functional polyorganosiloxanes for additive-manufacturing technology
CN113891917B (zh) * 2019-03-20 2023-07-28 斯派克塑胶股份公司 硅氧烷增材制造组合物
JP7249845B2 (ja) * 2019-03-28 2023-03-31 株式会社カネカ 粉粒体の製造方法および粉粒体

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101490136A (zh) * 2006-09-29 2009-07-22 德意志戴斯达纺织品及染料两合公司 有色的有机聚硅氧烷
CN102208567A (zh) * 2011-04-18 2011-10-05 电子科技大学 一种柔性发光器件用基板及其制备方法
CN105683258A (zh) * 2013-11-11 2016-06-15 道康宁公司 紫外可固化有机硅组合物、其固化产物及使用它们的方法

Also Published As

Publication number Publication date
EP3927550B1 (en) 2023-03-29
JP2022520476A (ja) 2022-03-30
WO2020170114A1 (en) 2020-08-27
US20220112377A1 (en) 2022-04-14
EP3927550A1 (en) 2021-12-29
US12071544B2 (en) 2024-08-27
CN115943071A (zh) 2023-04-07

Similar Documents

Publication Publication Date Title
CN115943071B (zh) 用于叠加制造技术的含有巯基官能化聚有机硅氧烷的可辐射固化组合物
CN111684018B (zh) 用于叠加制造技术的包含巯基官能化聚有机硅氧烷的可辐射固化组合物
CN112154171B (zh) 用增材制造技术处理可辐射固化的硫醇基组合物的方法
US8466210B2 (en) Dental composition containing a surfactant and an F-containing compound, process of production and use thereof
US8980973B2 (en) Siloxane compounds containing composition, method of production and use thereof
EP2072029B1 (en) Dental Composition containing a Surfactant and an F-containing compound, Process of Production and Use thereof
JP6341938B2 (ja) 安定化歯科用印象組成物、部品キット、及びそれらの使用
KR101674067B1 (ko) 우수한 스캐닝 성능 및 기계적 물성을 갖는 치과용 인상재 조성물 및 그를 포함하는 치과용 인상재
US12296032B2 (en) Process of taking a dental impression with a radiation-curable composition containing mercapto-functional polyorganosiloxanes and VQM resins
US20190110960A1 (en) Hardenable dental impression composition comprising a polymeric filler particles and use thereof
CN115109185B (zh) 喷墨活性能量射线固化性组合物、三维物体制造方法和三维物体制造设备

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
TA01 Transfer of patent application right
TA01 Transfer of patent application right

Effective date of registration: 20240403

Address after: U.S.A.

Applicant after: Shuwanuo Intellectual Property Co.

Country or region after: U.S.A.

Address before: American Minnesota

Applicant before: 3M INNOVATIVE PROPERTIES Co.

Country or region before: U.S.A.

GR01 Patent grant
GR01 Patent grant