CN115667436A - 涂料消光用表面处理含水硅酸及其制备方法 - Google Patents

涂料消光用表面处理含水硅酸及其制备方法 Download PDF

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Publication number
CN115667436A
CN115667436A CN202180035864.5A CN202180035864A CN115667436A CN 115667436 A CN115667436 A CN 115667436A CN 202180035864 A CN202180035864 A CN 202180035864A CN 115667436 A CN115667436 A CN 115667436A
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China
Prior art keywords
silicic acid
hydrous silicic
group
treated
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180035864.5A
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English (en)
Chinese (zh)
Inventor
古城大祐
中上英纪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Silica Corp
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Tosoh Silica Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Silica Corp filed Critical Tosoh Silica Corp
Publication of CN115667436A publication Critical patent/CN115667436A/zh
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/42Gloss-reducing agents
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C3/00Treatment in general of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties
    • C09C3/12Treatment with organosilicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • C09D7/62Additives non-macromolecular inorganic modified by treatment with other compounds

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Paints Or Removers (AREA)
CN202180035864.5A 2020-06-03 2021-05-21 涂料消光用表面处理含水硅酸及其制备方法 Pending CN115667436A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020096610 2020-06-03
JP2020-096610 2020-06-03
PCT/JP2021/019277 WO2021246191A1 (ja) 2020-06-03 2021-05-21 塗料艶消し用表面処理含水ケイ酸及びその製造方法

Publications (1)

Publication Number Publication Date
CN115667436A true CN115667436A (zh) 2023-01-31

Family

ID=78830968

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180035864.5A Pending CN115667436A (zh) 2020-06-03 2021-05-21 涂料消光用表面处理含水硅酸及其制备方法

Country Status (4)

Country Link
JP (1) JP7439257B2 (https=)
KR (1) KR102747609B1 (https=)
CN (1) CN115667436A (https=)
WO (1) WO2021246191A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU103233B1 (en) 2023-12-21 2025-06-24 Aphaia Ip Ag Treatment of obesity and related conditions by circadian administration of enterokine-stimulating compositions
WO2025119939A1 (en) 2023-12-03 2025-06-12 Aphaia Pharma Ag Treatment of obesity and related conditions by circadian administration of enterokine-stimulating compositions

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04202008A (ja) * 1990-11-29 1992-07-22 Moon Star Co 水系ポリウレタン用フロスト剤およびその製造方法
JPH08245835A (ja) * 1995-03-10 1996-09-24 Nec Corp シリカ粒子を含む樹脂組成物およびシリカ粒子の表面 処理方法
DE10048616A1 (de) * 2000-09-30 2002-04-11 Degussa Dotierte Fällungskieselsäure
DE10241273A1 (de) * 2002-09-06 2004-03-18 Degussa Ag Effiziente Mattierungsmittel basierend auf Fällungskieselsäuren
JP5046482B2 (ja) * 2003-12-26 2012-10-10 富士フイルム株式会社 無機酸化物微粒子分散物の製造方法、無機酸化物微粒子分散物、コーティング組成物、光学フィルム、反射防止フィルム、偏光板、及び液晶表示装置
DK2099873T3 (en) 2006-12-07 2016-01-25 Grace Gmbh & Co Kg Matting Agent
US20140072815A1 (en) * 2012-09-12 2014-03-13 Ppg Industries Ohio, Inc. Curable film-forming compositions demonstrating burnish resistance and low gloss
JP6407988B2 (ja) * 2013-06-26 2018-10-17 モメンティブ パフォーマンス マテリアルズ ゲーエムベーハー 光硬化性コーティング組成物およびその使用

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Publication number Publication date
WO2021246191A1 (ja) 2021-12-09
JP7439257B2 (ja) 2024-02-27
JPWO2021246191A1 (https=) 2021-12-09
KR102747609B1 (ko) 2024-12-31
KR20230019113A (ko) 2023-02-07

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Country or region after: Japan

Address after: Yamaguchi Japan

Applicant after: TOSOH SILICA Corp.

Address before: Tokyo, Japan

Applicant before: TOSOH SILICA Corp.

Country or region before: Japan