CN115038959B - 荧光x射线分析装置、判断方法和判断程序 - Google Patents

荧光x射线分析装置、判断方法和判断程序 Download PDF

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Publication number
CN115038959B
CN115038959B CN202180007827.3A CN202180007827A CN115038959B CN 115038959 B CN115038959 B CN 115038959B CN 202180007827 A CN202180007827 A CN 202180007827A CN 115038959 B CN115038959 B CN 115038959B
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fluorescent
rays
sample
intensity
ray
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CN115038959A (zh
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原真也
山田康治郎
山本悦久
本间寿
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Rigaku Corp
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Rigaku Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202180007827.3A 2020-06-19 2021-04-05 荧光x射线分析装置、判断方法和判断程序 Active CN115038959B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020105825A JP6990460B2 (ja) 2020-06-19 2020-06-19 蛍光ｘ線分析装置、判定方法及び判定プログラム
JP2020-105825 2020-06-19
PCT/JP2021/014468 WO2021256054A1 (ja) 2020-06-19 2021-04-05 蛍光ｘ線分析装置、判定方法及び判定プログラム

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CN115038959A CN115038959A (zh) 2022-09-09
CN115038959B true CN115038959B (zh) 2023-09-26

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JP (1) JP6990460B2 (ja)
CN (1) CN115038959B (ja)
WO (1) WO2021256054A1 (ja)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537394A (en) * 1976-07-09 1978-01-23 Nippon X Ray Kk Xxray fluorescence analyzer
JPH08184573A (ja) * 1994-12-27 1996-07-16 Rigaku Ind Co Ｘ線分析におけるマスク径の判別方法
JPH08285798A (ja) * 1995-04-17 1996-11-01 Rigaku Ind Co Ｘ線分析装置
JPH1048161A (ja) * 1996-07-31 1998-02-20 Shimadzu Corp Ｘ線分析装置
JP2000121583A (ja) * 1998-10-15 2000-04-28 Rigaku Industrial Co 蛍光ｘ線分析における試料マスク径の判別方法および蛍光ｘ線分析装置
CN1739023A (zh) * 2003-03-27 2006-02-22 理学电机工业株式会社 荧光x射线分析装置
JP2008203245A (ja) * 2007-01-23 2008-09-04 Sii Nanotechnology Inc Ｘ線分析装置及びｘ線分析方法
CN103575757A (zh) * 2012-08-10 2014-02-12 日本株式会社日立高新技术科学 荧光x射线分析方法和荧光x射线分析装置
JP2015094643A (ja) * 2013-11-12 2015-05-18 株式会社島津製作所 蛍光ｘ線分析装置
CN105259196A (zh) * 2014-07-08 2016-01-20 日本株式会社日立高新技术科学 X射线分析用试样板以及荧光x射线分析装置
CN110088603A (zh) * 2016-12-01 2019-08-02 株式会社理学 荧光x射线分析装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3270829B2 (ja) * 1997-10-06 2002-04-02 理学電機工業株式会社 蛍光ｘ線分析装置
JP2000346816A (ja) 1999-06-08 2000-12-15 Shimadzu Corp Ｘ線分析装置
JP5251330B2 (ja) * 2008-07-23 2013-07-31 株式会社島津製作所 Ｘ線分析装置
WO2016187471A1 (en) 2015-05-20 2016-11-24 Tribogenics, Inc. X-ray fluorescence device calibration

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS537394A (en) * 1976-07-09 1978-01-23 Nippon X Ray Kk Xxray fluorescence analyzer
JPH08184573A (ja) * 1994-12-27 1996-07-16 Rigaku Ind Co Ｘ線分析におけるマスク径の判別方法
JPH08285798A (ja) * 1995-04-17 1996-11-01 Rigaku Ind Co Ｘ線分析装置
JPH1048161A (ja) * 1996-07-31 1998-02-20 Shimadzu Corp Ｘ線分析装置
JP2000121583A (ja) * 1998-10-15 2000-04-28 Rigaku Industrial Co 蛍光ｘ線分析における試料マスク径の判別方法および蛍光ｘ線分析装置
CN101520423A (zh) * 2003-03-27 2009-09-02 株式会社理学 荧光x射线分析装置
CN1739023A (zh) * 2003-03-27 2006-02-22 理学电机工业株式会社 荧光x射线分析装置
CN101520422A (zh) * 2003-03-27 2009-09-02 株式会社理学 荧光x射线分析装置
JP2008203245A (ja) * 2007-01-23 2008-09-04 Sii Nanotechnology Inc Ｘ線分析装置及びｘ線分析方法
CN103575757A (zh) * 2012-08-10 2014-02-12 日本株式会社日立高新技术科学 荧光x射线分析方法和荧光x射线分析装置
JP2015094643A (ja) * 2013-11-12 2015-05-18 株式会社島津製作所 蛍光ｘ線分析装置
CN105259196A (zh) * 2014-07-08 2016-01-20 日本株式会社日立高新技术科学 X射线分析用试样板以及荧光x射线分析装置
CN110088603A (zh) * 2016-12-01 2019-08-02 株式会社理学 荧光x射线分析装置

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CN115038959A (zh) 2022-09-09
JP6990460B2 (ja) 2022-01-12
WO2021256054A1 (ja) 2021-12-23
JP2022000616A (ja) 2022-01-04

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