CN1142944C - 光敏引发剂配制剂 - Google Patents

光敏引发剂配制剂 Download PDF

Info

Publication number
CN1142944C
CN1142944C CNB008146926A CN00814692A CN1142944C CN 1142944 C CN1142944 C CN 1142944C CN B008146926 A CNB008146926 A CN B008146926A CN 00814692 A CN00814692 A CN 00814692A CN 1142944 C CN1142944 C CN 1142944C
Authority
CN
China
Prior art keywords
alkyl
aqueous
phenyl
photoinitiator
bis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB008146926A
Other languages
English (en)
Chinese (zh)
Other versions
CN1382161A (zh
Inventor
M���Ƶ�
M·科尔勒
B·M·艾布利
M·霍尔勒
̹��
E·埃克斯坦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
BASF SE
IGM Group BV
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1382161A publication Critical patent/CN1382161A/zh
Application granted granted Critical
Publication of CN1142944C publication Critical patent/CN1142944C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Colloid Chemistry (AREA)
CNB008146926A 1999-10-20 2000-10-12 光敏引发剂配制剂 Expired - Lifetime CN1142944C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99810953 1999-10-20
EP99810953.2 1999-10-20

Publications (2)

Publication Number Publication Date
CN1382161A CN1382161A (zh) 2002-11-27
CN1142944C true CN1142944C (zh) 2004-03-24

Family

ID=8243093

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB008146926A Expired - Lifetime CN1142944C (zh) 1999-10-20 2000-10-12 光敏引发剂配制剂

Country Status (17)

Country Link
US (1) US6803392B1 (enExample)
EP (1) EP1230276B1 (enExample)
JP (1) JP4966462B2 (enExample)
KR (1) KR100722179B1 (enExample)
CN (1) CN1142944C (enExample)
AT (1) ATE312850T1 (enExample)
AU (1) AU774305B2 (enExample)
BR (1) BR0014919B1 (enExample)
CA (1) CA2383059C (enExample)
CZ (1) CZ297808B6 (enExample)
DE (1) DE60024867T2 (enExample)
DK (1) DK1230276T3 (enExample)
ES (1) ES2253267T3 (enExample)
MX (1) MXPA02002793A (enExample)
SK (1) SK286855B6 (enExample)
WO (1) WO2001029093A1 (enExample)
ZA (1) ZA200203076B (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6737216B2 (en) * 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
GB0416285D0 (en) * 2004-07-21 2004-08-25 Ciba Spec Chem Water Treat Ltd Method of treating polymers
ATE532217T1 (de) 2005-08-12 2011-11-15 Cambrios Technologies Corp Verfahren zur herstellung von transparente leiter auf nanodrahtbasis
AT502764B1 (de) * 2005-09-12 2010-11-15 Semperit Ag Holding Mischung und verfahren zur herstellung eines vernetzten elastomers sowie vorrichtung zur herstellung eines tauchartikels
US8018568B2 (en) 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
TWI426531B (zh) 2006-10-12 2014-02-11 坎畢歐科技公司 以奈米線為主之透明導體及其應用
JP5101862B2 (ja) * 2006-10-31 2012-12-19 スリーエム イノベイティブ プロパティズ カンパニー シート形成性単量体組成物、熱伝導性シート及びその製法
GB2448521B (en) * 2007-04-18 2012-01-18 Piotr Koneczny Paint conservation-restoration composition and method
CN103777417B (zh) 2007-04-20 2017-01-18 凯姆控股有限公司 复合透明导体及其形成方法
US8697194B2 (en) * 2008-04-10 2014-04-15 Xerox Corporation Curable overcoat compositions
DE102008041338A1 (de) * 2008-08-19 2010-02-25 Evonik Röhm Gmbh Einfärbeprozess für Poly(meth)acrylate mit Flüssigfarben auf Wasserbasis und Flüssigfarben auf Wasserbasis
BRPI1006180A2 (pt) 2009-01-14 2019-09-24 Basf Se mistura líquida homogênea, processa para a preparação da mistura líquida homogênea, composição fotopolimerizável, e, uso da mistura líquida homogênea
JP5441574B2 (ja) 2009-09-08 2014-03-12 富士フイルム株式会社 水性インク組成物、インクセット、およびインクジェット画像形成方法
US20110138753A1 (en) * 2009-12-11 2011-06-16 International Paper Company Container with Repulpable Moisture Resistant Barrier
JP5664841B2 (ja) * 2010-01-22 2015-02-04 セイコーエプソン株式会社 光硬化型インク組成物およびインクジェット記録方法
WO2011106438A1 (en) 2010-02-24 2011-09-01 Cambrios Technologies Corporation Nanowire-based transparent conductors and methods of patterning same
JP5557566B2 (ja) * 2010-03-19 2014-07-23 富士フイルム株式会社 紫外線硬化型水性インク組成物、インクセット、およびインクジェット画像形成方法
US9365980B2 (en) 2010-11-05 2016-06-14 International Paper Company Packaging material having moisture barrier and methods for preparing same
US9358576B2 (en) 2010-11-05 2016-06-07 International Paper Company Packaging material having moisture barrier and methods for preparing same
PL2723576T3 (pl) * 2011-06-21 2018-01-31 Basf Se Drukowanie siatek dyfrakcyjnych na papierze i kartonie
TWI501030B (zh) * 2012-06-12 2015-09-21 Cheil Ind Inc 光可固化型組成物、包含該組成物之保護層及包含該組成物之封裝裝置
JP6163726B2 (ja) * 2012-09-28 2017-07-19 株式会社リコー 非水系光重合性組成物、インクジェットインク、及びインクカートリッジ
CN104592298B (zh) * 2014-12-31 2016-07-06 湖北固润科技股份有限公司 一种酰基膦高效光引发剂及其制备方法
US10761425B2 (en) 2015-11-23 2020-09-01 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. Particulate photoinitiators and uses thereof
US10287400B2 (en) 2016-04-14 2019-05-14 Momentive Performance Materials Inc. Curable silicone composition and applications and uses thereof
US20170321060A1 (en) 2016-05-06 2017-11-09 Momentive Performance Materials Inc. Antifog coating composition
US10035911B2 (en) 2016-05-19 2018-07-31 Momentive Performance Materials Inc. Curable, dual cure, one part silicone composition
US10385210B2 (en) 2017-06-20 2019-08-20 Momentive Performance Materials Inc. Curable silicone composition and applications and uses thereof
GB201807653D0 (en) * 2018-05-11 2018-06-27 Fujifilm Speciality Ink Systems Ltd A printing ink
CN115190897B (zh) * 2020-07-27 2024-02-23 株式会社Lg化学 用于超吸收性聚合物膜的制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0073750B1 (en) 1981-02-27 1989-07-05 Monocure Pty. Limited Aqueous polymerizable compositions
DE3203096A1 (de) * 1982-01-30 1983-08-04 Merck Patent Gmbh, 6100 Darmstadt Verwendung von hydroxyalkylphenonen als initiatoren fuer die strahlungshaertung waessriger prepolymerdispersionen
JPS6015405A (ja) * 1983-07-07 1985-01-26 Wako Pure Chem Ind Ltd アゾ系重合開始剤捏和体
DE3512179A1 (de) * 1985-04-03 1986-12-04 Merck Patent Gmbh, 6100 Darmstadt Fotoinitiatoren fuer die fotopolymerisation in waessrigen systemen
DE3815622A1 (de) * 1988-05-07 1989-11-16 Merck Patent Gmbh Fotoinitiator-dispersionen
IT1228982B (it) 1989-03-07 1991-07-11 Lamberti Flli Spa Dispersioni acquose di fotoiniziatori e loro impiego.
US5196142A (en) 1989-03-17 1993-03-23 Ciba-Geigy Corporation Aqueous antioxidant emulsions
JPH02305804A (ja) * 1989-05-22 1990-12-19 Shin Etsu Chem Co Ltd 塩化ビニル系重合体の製造方法
US5080994A (en) * 1989-10-23 1992-01-14 Xerox Corporation Processes for the preparation of particles
DE59106333D1 (de) 1990-01-24 1995-10-05 Ciba Geigy Ag Wässrige Emulsionen, enthaltend Antioxidantien.
ES2075671T3 (es) 1991-04-24 1995-10-01 Ciba Geigy Ag Dispersiones acuosas, fluidas de inhibidores de corrosion a base de acidos policarboxilicos.
US6361925B1 (en) 1996-03-04 2002-03-26 Ciba Specialty Chemicals Corporation Photoinitiator mixtures and compositions with alkylphenylbisacylphosphine oxides
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
EP1002024B1 (en) 1997-08-05 2004-04-14 Sericol Limited An ink jet ink
GB2360283B (en) 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides

Also Published As

Publication number Publication date
CA2383059A1 (en) 2001-04-26
BR0014919B1 (pt) 2010-08-24
CA2383059C (en) 2009-04-28
SK5242002A3 (en) 2002-10-08
KR20020040902A (ko) 2002-05-30
KR100722179B1 (ko) 2007-05-29
DK1230276T3 (da) 2006-03-20
CN1382161A (zh) 2002-11-27
US6803392B1 (en) 2004-10-12
JP2003512484A (ja) 2003-04-02
SK286855B6 (sk) 2009-06-05
WO2001029093A1 (en) 2001-04-26
BR0014919A (pt) 2002-06-18
EP1230276A1 (en) 2002-08-14
ATE312850T1 (de) 2005-12-15
DE60024867D1 (de) 2006-01-19
AU774305B2 (en) 2004-06-24
ES2253267T3 (es) 2006-06-01
CZ20021360A3 (cs) 2002-07-17
MXPA02002793A (es) 2002-07-22
AU1137001A (en) 2001-04-30
CZ297808B6 (cs) 2007-04-04
ZA200203076B (en) 2003-01-29
EP1230276B1 (en) 2005-12-14
JP4966462B2 (ja) 2012-07-04
DE60024867T2 (de) 2006-06-29

Similar Documents

Publication Publication Date Title
CN1142944C (zh) 光敏引发剂配制剂
CN1198831C (zh) 有机金属单酰基烷基膦化合物
CN1649905A (zh) 可引入的光敏引发剂
CN1086399C (zh) 由α-氨基苯乙酮光致生成胺
CN1162450C (zh) 新型氧化膦光引发体系及浅色可固化组合物
CN1545643A (zh) 红移单-和双-酰基氧化膦和硫化膦及其作为光引发剂的应用
CN1157359C (zh) 非挥发性苯基乙醛酸酯
CN1708488A (zh) 光引发剂的贮存稳定性的改善
CN1668648A (zh) 新的双官能团光引发剂
CN1211439C (zh) 采用表面活性的光致引发剂的涂料的制备方法
CN1914560A (zh) 功能化学引发剂
CN1214035C (zh) 表面活性的光敏引发剂
CN1849343A (zh) 通过多相聚合技术制备的光稳定剂水基浓缩产品形式
CN1241950C (zh) 聚合性组合物
CN1788045A (zh) 光固化且稳定的涂层
CN1656127A (zh) 硫醇化合物、光聚合引发剂组合物和光敏组合物
CN1299812A (zh) 肟酯光引发剂
CN1720245A (zh) 带有杂芳基的肟酯光引发剂
CN1784429A (zh) 新的三功能光敏引发剂
CN1481392A (zh) 表面活性光引发剂
CN1582267A (zh) 新的双官能光引发剂
CN1235984C (zh) 双重固化树脂中的氟化光引发剂
CN101031620A (zh) 嘧啶并[5,4－g]蝶啶作为遮光组分在滤色器着色剂组合物中的应用
CN1330106A (zh) 可交联的树脂组合物
CN1798793A (zh) 新颖的表面活性聚硅氧烷光引发剂

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: Basel, Switzerland

Patentee after: BASF Ag AG

Address before: Basel, Switzerland

Patentee before: BASF Special Chemicals Holding Co.,Ltd.

Address after: Basel, Switzerland

Patentee after: CIBA HOLDING Inc.

Address before: Basel, Switzerland

Patentee before: Ciba Specialty Chemicals Holding Inc.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20180308

Address after: Wahl Holland

Patentee after: IGM Group B.V.

Address before: Rhine, Ludwigshafen, Germany

Patentee before: BASF SE

Effective date of registration: 20180308

Address after: Rhine, Ludwigshafen, Germany

Patentee after: BASF SE

Address before: Basel, Switzerland

Patentee before: BASF Ag AG

Effective date of registration: 20180308

Address after: Basel, Switzerland

Patentee after: BASF Special Chemicals Holding Co.,Ltd.

Address before: Basel, Switzerland

Patentee before: CIBA HOLDING Inc.

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20040324