CN113727971A - 化合物、产酸剂、组合物、固化物及图案以及固化物及图案的制造方法 - Google Patents

化合物、产酸剂、组合物、固化物及图案以及固化物及图案的制造方法 Download PDF

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Publication number
CN113727971A
CN113727971A CN202080030294.6A CN202080030294A CN113727971A CN 113727971 A CN113727971 A CN 113727971A CN 202080030294 A CN202080030294 A CN 202080030294A CN 113727971 A CN113727971 A CN 113727971A
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China
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group
substituted
compound
carbon atoms
unsubstituted
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CN202080030294.6A
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English (en)
Chinese (zh)
Inventor
松井依纯
中屋敷哲千
有吉智幸
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Adeka Corp
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Adeka Corp
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Publication of CN113727971A publication Critical patent/CN113727971A/zh
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN202080030294.6A 2019-09-10 2020-09-08 化合物、产酸剂、组合物、固化物及图案以及固化物及图案的制造方法 Pending CN113727971A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019164900 2019-09-10
JP2019-164900 2019-09-10
PCT/JP2020/033955 WO2021049489A1 (ja) 2019-09-10 2020-09-08 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法

Publications (1)

Publication Number Publication Date
CN113727971A true CN113727971A (zh) 2021-11-30

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Family Applications (1)

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CN202080030294.6A Pending CN113727971A (zh) 2019-09-10 2020-09-08 化合物、产酸剂、组合物、固化物及图案以及固化物及图案的制造方法

Country Status (5)

Country Link
JP (1) JP7631208B2 (https=)
KR (1) KR102873892B1 (https=)
CN (1) CN113727971A (https=)
TW (1) TWI902709B (https=)
WO (1) WO2021049489A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7824280B2 (ja) * 2021-04-22 2026-03-04 株式会社Adeka 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1751269A (zh) * 2003-02-19 2006-03-22 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
CN1989455A (zh) * 2004-07-20 2007-06-27 西巴特殊化学品控股有限公司 肟衍生物和它们作为潜伏酸的用途
JP2010164964A (ja) * 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
WO2013008652A1 (ja) * 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621A (zh) * 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
WO2015152153A1 (ja) * 2014-04-04 2015-10-08 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
WO2015175280A2 (en) * 2014-05-15 2015-11-19 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
WO2019117162A1 (ja) * 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
US8088868B2 (en) * 2006-12-19 2012-01-03 Bridgestone Corporation Polymers functionalized with protected oxime compounds
JP6605820B2 (ja) 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
KR20180101564A (ko) 2016-01-26 2018-09-12 가부시키가이샤 아데카 열산 발생제 및 이것을 사용한 레지스트 조성물
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
CN110806677A (zh) * 2018-08-06 2020-02-18 常州强力先端电子材料有限公司 光致抗蚀剂组合物、其图案形成方法及应用
CN111324009A (zh) * 2018-12-13 2020-06-23 常州强力先端电子材料有限公司 光固化组合物及其应用

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1751269A (zh) * 2003-02-19 2006-03-22 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
CN1989455A (zh) * 2004-07-20 2007-06-27 西巴特殊化学品控股有限公司 肟衍生物和它们作为潜伏酸的用途
JP2010164964A (ja) * 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
WO2013008652A1 (ja) * 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621A (zh) * 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
WO2015152153A1 (ja) * 2014-04-04 2015-10-08 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
WO2015175280A2 (en) * 2014-05-15 2015-11-19 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
WO2019117162A1 (ja) * 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
BJORN RAIMER 等: "Synthesis, Stability, and Photoreactivity of Diazirinyl‐Substituted N‐Heterocycles Based on Indole, Benzimidazole, and Imidazole", EUR. J. ORG. CHERN *
SHUAI WANG 等: "A Direct Copper-Promoted Three-Component Entry to Trifluoromethyl ketoximes", ORG. LETT. *
THOMAS WARTMANN 等: "L-Phototryptophan", EUR. J. ORG. CHERN *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用
CN119954696A (zh) * 2023-11-08 2025-05-09 湖北三峡实验室 光产酸剂

Also Published As

Publication number Publication date
JP7631208B2 (ja) 2025-02-18
KR20220061910A (ko) 2022-05-13
JPWO2021049489A1 (https=) 2021-03-18
TW202116731A (zh) 2021-05-01
KR102873892B1 (ko) 2025-10-17
WO2021049489A1 (ja) 2021-03-18
TWI902709B (zh) 2025-11-01

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