JP7631208B2 - 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 - Google Patents

化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 Download PDF

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JP7631208B2
JP7631208B2 JP2021545549A JP2021545549A JP7631208B2 JP 7631208 B2 JP7631208 B2 JP 7631208B2 JP 2021545549 A JP2021545549 A JP 2021545549A JP 2021545549 A JP2021545549 A JP 2021545549A JP 7631208 B2 JP7631208 B2 JP 7631208B2
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JPWO2021049489A1 (https=
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依純 松井
哲千 中屋敷
智幸 有吉
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Adeka Corp
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Adeka Corp
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2021545549A 2019-09-10 2020-09-08 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法 Active JP7631208B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019164900 2019-09-10
JP2019164900 2019-09-10
PCT/JP2020/033955 WO2021049489A1 (ja) 2019-09-10 2020-09-08 化合物、酸発生剤、組成物、硬化物及びパターン、並びに硬化物及びパターンの製造方法

Publications (2)

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JPWO2021049489A1 JPWO2021049489A1 (https=) 2021-03-18
JP7631208B2 true JP7631208B2 (ja) 2025-02-18

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Country Status (5)

Country Link
JP (1) JP7631208B2 (https=)
KR (1) KR102873892B1 (https=)
CN (1) CN113727971A (https=)
TW (1) TWI902709B (https=)
WO (1) WO2021049489A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7824280B2 (ja) * 2021-04-22 2026-03-04 株式会社Adeka 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用

Citations (10)

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JP2006517950A (ja) 2003-02-19 2006-08-03 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ハロゲン化オキシム誘導体及び潜在的酸としてのそれらの使用
JP2008506749A (ja) 2004-07-20 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド オキシム誘導体および潜在酸としてのそれらの使用
US20080146745A1 (en) 2006-12-19 2008-06-19 Steven Luo Polymers functionalized with protected oxime compounds
JP2010164964A (ja) 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
WO2013008652A1 (ja) 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621A (zh) 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
WO2015152153A1 (ja) 2014-04-04 2015-10-08 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
WO2015175280A2 (en) 2014-05-15 2015-11-19 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
CN107163169A (zh) 2017-05-25 2017-09-15 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
WO2019117162A1 (ja) 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物

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* Cited by examiner, † Cited by third party
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CN1751269A (zh) * 2003-02-19 2006-03-22 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
JP6605820B2 (ja) 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
KR20180101564A (ko) 2016-01-26 2018-09-12 가부시키가이샤 아데카 열산 발생제 및 이것을 사용한 레지스트 조성물
CN110806677A (zh) * 2018-08-06 2020-02-18 常州强力先端电子材料有限公司 光致抗蚀剂组合物、其图案形成方法及应用
CN111324009A (zh) * 2018-12-13 2020-06-23 常州强力先端电子材料有限公司 光固化组合物及其应用

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006517950A (ja) 2003-02-19 2006-08-03 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド ハロゲン化オキシム誘導体及び潜在的酸としてのそれらの使用
JP2008506749A (ja) 2004-07-20 2008-03-06 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド オキシム誘導体および潜在酸としてのそれらの使用
US20080146745A1 (en) 2006-12-19 2008-06-19 Steven Luo Polymers functionalized with protected oxime compounds
JP2010164964A (ja) 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
WO2013008652A1 (ja) 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621A (zh) 2013-07-26 2013-11-13 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
WO2015152153A1 (ja) 2014-04-04 2015-10-08 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
WO2015175280A2 (en) 2014-05-15 2015-11-19 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
CN107163169A (zh) 2017-05-25 2017-09-15 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
WO2019117162A1 (ja) 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物

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RAIMER, B. et al.，Synthesis, Stability, and Photoreactivity of Diazirinyl-Substituted N-Heterocycles Based on Indole, Benzimidazole, and Imidazole，European Journal of Organic Chemistry，2014年，2014(25)，pp. 5509-5520，DOI: 10.1002/ejoc.201402354
WANG, S. et al.，A Direct Copper-Promoted Three-Component Entry to Trifluoromethylketoximes，Organic Letters，2014年，16(6)，pp. 1606-1609，DOI: 10.1021/ol500203m
WARTMANN, T. et al.，L-Phototryptophan，European Journal of Organic Chemistry，2013年，2013(9)，pp. 1649-1652, S6-S7，DOI: 10.1002/ejoc.201201726

Also Published As

Publication number Publication date
KR20220061910A (ko) 2022-05-13
JPWO2021049489A1 (https=) 2021-03-18
TW202116731A (zh) 2021-05-01
KR102873892B1 (ko) 2025-10-17
CN113727971A (zh) 2021-11-30
WO2021049489A1 (ja) 2021-03-18
TWI902709B (zh) 2025-11-01

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