TWI902709B - 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 - Google Patents

化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法

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Publication number
TWI902709B
TWI902709B TW109130991A TW109130991A TWI902709B TW I902709 B TWI902709 B TW I902709B TW 109130991 A TW109130991 A TW 109130991A TW 109130991 A TW109130991 A TW 109130991A TW I902709 B TWI902709 B TW I902709B
Authority
TW
Taiwan
Prior art keywords
group
compound
acid
carbon atoms
unsubstituted
Prior art date
Application number
TW109130991A
Other languages
English (en)
Chinese (zh)
Other versions
TW202116731A (zh
Inventor
松井依純
中屋敷哲千
有吉智幸
Original Assignee
日商艾迪科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 日商艾迪科股份有限公司 filed Critical 日商艾迪科股份有限公司
Publication of TW202116731A publication Critical patent/TW202116731A/zh
Application granted granted Critical
Publication of TWI902709B publication Critical patent/TWI902709B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
    • C07D209/04—Indoles; Hydrogenated indoles
    • C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
    • C07D209/14—Radicals substituted by nitrogen atoms, not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/10—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a carbon chain containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW109130991A 2019-09-10 2020-09-09 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法 TWI902709B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019164900 2019-09-10
JP2019-164900 2019-09-10

Publications (2)

Publication Number Publication Date
TW202116731A TW202116731A (zh) 2021-05-01
TWI902709B true TWI902709B (zh) 2025-11-01

Family

ID=74866154

Family Applications (1)

Application Number Title Priority Date Filing Date
TW109130991A TWI902709B (zh) 2019-09-10 2020-09-09 化合物、酸產生劑、組合物、硬化物及圖案、以及硬化物及圖案之製造方法

Country Status (5)

Country Link
JP (1) JP7631208B2 (https=)
KR (1) KR102873892B1 (https=)
CN (1) CN113727971A (https=)
TW (1) TWI902709B (https=)
WO (1) WO2021049489A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7824280B2 (ja) * 2021-04-22 2026-03-04 株式会社Adeka 化合物、酸発生剤、組成物、硬化物、硬化物の製造方法、パターン及びパターンの製造方法
KR20250162509A (ko) * 2023-03-23 2025-11-18 가부시키가이샤 아데카 화합물, 조성물, 경화물 및 패턴
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200428147A (en) * 2003-02-19 2004-12-16 Ciba Sc Holding Ag Halogenated oxime derivatives and the use thereof as latent acids
TW201546046A (zh) * 2014-04-04 2015-12-16 Adeka Corp 肟酯化合物及含該化合物之光聚合起始劑

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Publication number Priority date Publication date Assignee Title
CN1751269A (zh) * 2003-02-19 2006-03-22 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
WO2006008250A2 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
US8088868B2 (en) * 2006-12-19 2012-01-03 Bridgestone Corporation Polymers functionalized with protected oxime compounds
JP2010164964A (ja) * 2008-12-19 2010-07-29 Fujifilm Corp 感光性組成物、カラーフィルタ、および液晶表示装置
WO2013008652A1 (ja) * 2011-07-08 2013-01-17 新日鉄住金化学株式会社 光重合開始剤、感光性組成物及び硬化物
CN103389621B (zh) * 2013-07-26 2016-03-16 常州强力先端电子材料有限公司 一种磺酸肟酯类光产酸剂
US10030083B2 (en) * 2014-05-15 2018-07-24 Bridgestone Corporation Polymers functionalized with protected oxime compounds containing a cyano group
JP6605820B2 (ja) 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
KR20180101564A (ko) 2016-01-26 2018-09-12 가부시키가이샤 아데카 열산 발생제 및 이것을 사용한 레지스트 조성물
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
WO2019117162A1 (ja) * 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物
CN110806677A (zh) * 2018-08-06 2020-02-18 常州强力先端电子材料有限公司 光致抗蚀剂组合物、其图案形成方法及应用
CN111324009A (zh) * 2018-12-13 2020-06-23 常州强力先端电子材料有限公司 光固化组合物及其应用

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200428147A (en) * 2003-02-19 2004-12-16 Ciba Sc Holding Ag Halogenated oxime derivatives and the use thereof as latent acids
TW201546046A (zh) * 2014-04-04 2015-12-16 Adeka Corp 肟酯化合物及含該化合物之光聚合起始劑

Also Published As

Publication number Publication date
JP7631208B2 (ja) 2025-02-18
KR20220061910A (ko) 2022-05-13
JPWO2021049489A1 (https=) 2021-03-18
TW202116731A (zh) 2021-05-01
KR102873892B1 (ko) 2025-10-17
CN113727971A (zh) 2021-11-30
WO2021049489A1 (ja) 2021-03-18

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