CN113678224B - 电子枪装置 - Google Patents

电子枪装置 Download PDF

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Publication number
CN113678224B
CN113678224B CN202080017998.XA CN202080017998A CN113678224B CN 113678224 B CN113678224 B CN 113678224B CN 202080017998 A CN202080017998 A CN 202080017998A CN 113678224 B CN113678224 B CN 113678224B
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CN
China
Prior art keywords
liquid
electron
electron gun
liquid metal
container
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Active
Application number
CN202080017998.XA
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English (en)
Chinese (zh)
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CN113678224A (zh
Inventor
安田洋
大飨义久
柴冈达哉
村田英一
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PARAM CORP
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PARAM CORP
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Publication date
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Publication of CN113678224A publication Critical patent/CN113678224A/zh
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/485—Construction of the gun or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/04—Liquid electrodes, e.g. liquid cathode
    • H01J1/05—Liquid electrodes, e.g. liquid cathode characterised by material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/04—Liquid electrodes, e.g. liquid cathode
    • H01J1/06—Containers for liquid-pool electrodes; Arrangement or mounting thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/04—Liquid electrodes, e.g. liquid cathode
    • H01J1/10—Cooling, heating, circulating, filtering, or controlling level of liquid in a liquid-pool electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/06—Cathodes
    • H01J35/064—Details of the emitter, e.g. material or structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3104—Welding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H01J9/042—Manufacture, activation of the emissive part

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
CN202080017998.XA 2019-07-23 2020-07-13 电子枪装置 Active CN113678224B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019135618 2019-07-23
JP2019-135618 2019-07-23
PCT/JP2020/027255 WO2021015039A1 (ja) 2019-07-23 2020-07-13 電子銃装置

Publications (2)

Publication Number Publication Date
CN113678224A CN113678224A (zh) 2021-11-19
CN113678224B true CN113678224B (zh) 2025-01-28

Family

ID=74193454

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080017998.XA Active CN113678224B (zh) 2019-07-23 2020-07-13 电子枪装置

Country Status (6)

Country Link
US (1) US11295925B2 (https=)
EP (1) EP3923313B1 (https=)
JP (1) JP7445993B2 (https=)
KR (1) KR102425178B1 (https=)
CN (1) CN113678224B (https=)
WO (1) WO2021015039A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7573601B2 (ja) * 2020-04-21 2024-10-25 デンカ株式会社 電子源及びその製造方法、並びにエミッター及びこれを備える装置
TWI773093B (zh) * 2021-01-19 2022-08-01 京元電子股份有限公司 滴定模組、測試設備及滴定接觸角之量測方法
CN119993802A (zh) * 2022-02-18 2025-05-13 西湖大学 一种电子发射装置以及电子装置
US12340969B2 (en) 2022-03-18 2025-06-24 Kla Corporation Electron gun and electron microscope
CN115148561A (zh) * 2022-07-08 2022-10-04 西湖大学 一种电子发射装置以及电子装置
CN116083860A (zh) * 2022-11-15 2023-05-09 福建兆元光电有限公司 一种黄金颗粒自动预熔方法
US20250125114A1 (en) * 2023-10-11 2025-04-17 Fei Company Dry electron source environment
CN117943494B (zh) * 2024-03-22 2024-06-18 常州富丽康精密机械有限公司 一种具有力反馈功能的冷轧丝杠生产用轧制设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025421A (ja) * 2000-07-10 2002-01-25 Matsushita Electric Ind Co Ltd 電子銃及びその製造方法、及びその電子銃を用いたカラー受像管、カラー受像システム
CN103392216A (zh) * 2011-02-25 2013-11-13 株式会社Param 电子枪及电子束装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1574611A (en) * 1976-04-13 1980-09-10 Atomic Energy Authority Uk Ion sources
JPS5838905A (ja) * 1981-09-02 1983-03-07 Toppan Printing Co Ltd 固体撮像素子用色分解フイルタ
JPS5838905B2 (ja) * 1981-09-03 1983-08-26 日本電子株式会社 金属イオン源
JPS5846542A (ja) * 1981-09-11 1983-03-18 Nippon Telegr & Teleph Corp <Ntt> 電界放出型液体金属アルミニウムイオン銃及びその製造方法
JPS62140340A (ja) * 1985-12-14 1987-06-23 Denki Kagaku Kogyo Kk 電界放射型イオン源
EP0204297B1 (en) * 1985-06-04 1991-01-23 Denki Kagaku Kogyo Kabushiki Kaisha Charged particle emission source structure
JPH02195640A (ja) * 1989-01-23 1990-08-02 Toshiba Corp 電子銃による加熱装置および同位体分離装置
JP2688261B2 (ja) * 1989-10-25 1997-12-08 電気化学工業株式会社 電界放出型イオン源
JPH03272500A (ja) * 1990-03-22 1991-12-04 Toshiba Corp 電子銃
JPH05205680A (ja) * 1992-01-27 1993-08-13 Hitachi Ltd 電気流体力学的イオン源、それを用いたフッ素イオンの放出方法、二次イオン質量分析装置、それを用いた質量分析方法、加工装置及びそれを用いた加工方法
CN101630623B (zh) * 2003-05-09 2012-02-22 株式会社荏原制作所 基于带电粒子束的检查装置及采用了该检查装置的器件制造方法
JP4685115B2 (ja) * 2007-02-20 2011-05-18 株式会社アドバンテスト 電子ビーム露光方法
JP5595199B2 (ja) 2010-09-23 2014-09-24 株式会社ニューフレアテクノロジー 電子銃および電子銃を用いた電子ビーム描画装置
JP2017201609A (ja) * 2016-05-06 2017-11-09 株式会社Ｐａｒａｍ 電子銃

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002025421A (ja) * 2000-07-10 2002-01-25 Matsushita Electric Ind Co Ltd 電子銃及びその製造方法、及びその電子銃を用いたカラー受像管、カラー受像システム
CN103392216A (zh) * 2011-02-25 2013-11-13 株式会社Param 电子枪及电子束装置

Also Published As

Publication number Publication date
KR20210114535A (ko) 2021-09-23
KR102425178B1 (ko) 2022-07-27
US11295925B2 (en) 2022-04-05
CN113678224A (zh) 2021-11-19
JPWO2021015039A1 (https=) 2021-01-28
JP7445993B2 (ja) 2024-03-08
WO2021015039A1 (ja) 2021-01-28
US20220051866A1 (en) 2022-02-17
EP3923313B1 (en) 2023-09-27
EP3923313A1 (en) 2021-12-15
EP3923313A4 (en) 2022-05-18

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