JP4685115B2 - 電子ビーム露光方法 - Google Patents
電子ビーム露光方法 Download PDFInfo
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- JP4685115B2 JP4685115B2 JP2007557258A JP2007557258A JP4685115B2 JP 4685115 B2 JP4685115 B2 JP 4685115B2 JP 2007557258 A JP2007557258 A JP 2007557258A JP 2007557258 A JP2007557258 A JP 2007557258A JP 4685115 B2 JP4685115 B2 JP 4685115B2
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- 238000010894 electron beam technology Methods 0.000 title claims description 64
- 238000000034 method Methods 0.000 title claims description 21
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- 238000000859 sublimation Methods 0.000 description 18
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- 229910052799 carbon Inorganic materials 0.000 description 13
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- 238000010586 diagram Methods 0.000 description 10
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
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- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
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- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
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- 238000007493 shaping process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/063—Geometrical arrangement of electrodes for beam-forming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
Description
(電子ビーム露光装置の構成)
図1に、本実施形態に係る電子ビーム露光装置の構成図を示す。
(電子銃の構成)
図2に、電子銃101の構成図を示す。本実施形態において、電子銃101は熱電界放射型を使用する。電子銃101は、電子源20と、引き出し電極21と、引き出し電極21の下方に配置される加速電極25と、電子源20の両側に配されたカーボン製の電子源加熱用発熱体22と、電子源20と電子源加熱用発熱体22とを支持する支持具23と、支持具23を支持して囲んでいるサプレッサー電極24とを有している。電子源は、例えば単結晶のLaB6またはCeB6を用いる。
(引き出し電極の構成)
次に、本実施形態で使用する引き出し電極21の構成について図4を参照して説明する。
(電子源の構成)
次に、本実施形態で使用する電子源20の構成について説明する。
(電子源の表面に電子放出を制限する領域を形成する方法)
次に、上記の電子放出を制限する領域を電子源20に形成する方法について説明する。
(露光方法)
次に、本実施形態の電子銃を使用した露光装置の露光方法について説明する。
(効果)
以上説明したように、本実施形態では、引き出し電極21の電子放出面20aに対向する部分を球状凹面にしている。これにより、引き出し電極21と電子放出面20aとの間の電位分布を球面状にすることができ、電子放出面近傍の電位を極めて大きくすることができる。従って、熱電界放射型の電子銃を使用して低温で動作させても、電子ビームの輝度を大きくすることが可能となる。
Claims (1)
- 電子を放出する電子源と、前記電子源の電子放出面と対向して配置され前記電子を加速する加速電極と、前記電子放出面と前記加速電極との間に配置され、前記電子放出面に向かって光軸上に中心を持つ球状の凹部を有し、当該電子放出面から電子を引き出す引き出し電極と、前記電子放出面の前記引き出し電極と反対側に配置され、前記電子源の側面からの電子放出を抑制するサプレッサー電極と、を有する電子銃を備えた電子ビーム露光装置を用いた電子ビーム露光方法において、
所定の時間の間、前記引き出し電極の電位が前記電子源の先端部の電位よりも低くなるように電圧を印加し、電子源全体に通常の使用電圧値よりも絶対値の大きな電圧を印加した後、
前記電子源電圧を通常の使用電圧値に戻し、
その後、前記引き出し電極の電位が前記電子源の先端部の電位よりも高くなるように電圧を印加して露光を行うことを特徴とする電子ビーム露光方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/053101 WO2008102435A1 (ja) | 2007-02-20 | 2007-02-20 | 電子銃、電子ビーム露光装置及び露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2008102435A1 JPWO2008102435A1 (ja) | 2010-05-27 |
JP4685115B2 true JP4685115B2 (ja) | 2011-05-18 |
Family
ID=39709721
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007557258A Active JP4685115B2 (ja) | 2007-02-20 | 2007-02-20 | 電子ビーム露光方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080211376A1 (ja) |
JP (1) | JP4685115B2 (ja) |
DE (1) | DE112007000045T5 (ja) |
TW (1) | TW200849306A (ja) |
WO (1) | WO2008102435A1 (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007055154A1 (ja) * | 2005-11-08 | 2007-05-18 | Advantest Corporation | 電子銃、電子ビーム露光装置及び露光方法 |
JP2008041289A (ja) * | 2006-08-02 | 2008-02-21 | Hitachi High-Technologies Corp | 電界放出型電子銃およびそれを用いた電子線応用装置 |
EP2264738B1 (en) * | 2009-06-18 | 2017-12-06 | Carl Zeiss NTS Ltd. | Electron gun used in a particle beam device |
JP2011192456A (ja) * | 2010-03-12 | 2011-09-29 | Horon:Kk | 荷電粒子線装置 |
TWI410757B (zh) * | 2010-06-18 | 2013-10-01 | Univ Nat Taiwan | An electron beam exposure apparatus, an electron beam generating apparatus, and an exposure method |
EP2444990B1 (en) * | 2010-10-19 | 2014-06-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Simplified particle emitter and method of operating thereof |
US8581481B1 (en) * | 2011-02-25 | 2013-11-12 | Applied Physics Technologies, Inc. | Pre-aligned thermionic emission assembly |
EP2779201A1 (en) * | 2013-03-15 | 2014-09-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | High brightness electron gun, system using the same, and method of operating the same |
US10133181B2 (en) | 2015-08-14 | 2018-11-20 | Kla-Tencor Corporation | Electron source |
FR3048846B1 (fr) * | 2016-03-08 | 2018-04-13 | Pantechnik | Dispositif de modulation de l'intensite d'un faisceau de particules d'une source de particules chargees |
US10096447B1 (en) * | 2017-08-02 | 2018-10-09 | Kla-Tencor Corporation | Electron beam apparatus with high resolutions |
CN110400731A (zh) * | 2018-04-24 | 2019-11-01 | 大连纳晶科技有限公司 | 空心阴极旁热式六硼化镧电子束枪 |
DE102018123100A1 (de) | 2018-09-20 | 2020-03-26 | Thales Deutschland GmbH Electron Devices | Elektronenkanone |
WO2020065703A1 (ja) * | 2018-09-25 | 2020-04-02 | 株式会社日立ハイテクノロジーズ | 熱電界放出電子源および電子ビーム応用装置 |
JP7137002B2 (ja) * | 2019-04-18 | 2022-09-13 | 株式会社日立ハイテク | 電子源、及び荷電粒子線装置 |
US11417492B2 (en) | 2019-09-26 | 2022-08-16 | Kla Corporation | Light modulated electron source |
US11562879B2 (en) * | 2020-09-15 | 2023-01-24 | Nuflare Technology, Inc. | Low-blur electrostatic transfer lens for multi-beam electron gun |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0630159U (ja) * | 1992-09-16 | 1994-04-19 | 株式会社堤製作所 | 表面処理用電極 |
JPH06139983A (ja) * | 1992-10-28 | 1994-05-20 | Nikon Corp | 荷電粒子線装置 |
JP2001325910A (ja) * | 2000-05-16 | 2001-11-22 | Denki Kagaku Kogyo Kk | 電子銃とその使用方法 |
JP2003016987A (ja) * | 2001-06-26 | 2003-01-17 | Hitachi Ltd | ショットキー電子銃及び電子線装置 |
JP2005190758A (ja) * | 2003-12-25 | 2005-07-14 | Denki Kagaku Kogyo Kk | 電子源 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2546326Y2 (ja) * | 1990-12-28 | 1997-08-27 | 日本電子株式会社 | 電子線装置 |
JPH0831332A (ja) * | 1994-07-13 | 1996-02-02 | Hitachi Ltd | カラー陰極線管 |
JPH08184699A (ja) | 1994-12-28 | 1996-07-16 | Hitachi Medical Corp | 高エネルギ電子加速器用電子銃 |
-
2007
- 2007-02-20 JP JP2007557258A patent/JP4685115B2/ja active Active
- 2007-02-20 WO PCT/JP2007/053101 patent/WO2008102435A1/ja active Application Filing
- 2007-02-20 DE DE112007000045T patent/DE112007000045T5/de not_active Ceased
-
2008
- 2008-02-19 TW TW097105718A patent/TW200849306A/zh unknown
- 2008-03-07 US US12/075,067 patent/US20080211376A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0630159U (ja) * | 1992-09-16 | 1994-04-19 | 株式会社堤製作所 | 表面処理用電極 |
JPH06139983A (ja) * | 1992-10-28 | 1994-05-20 | Nikon Corp | 荷電粒子線装置 |
JP2001325910A (ja) * | 2000-05-16 | 2001-11-22 | Denki Kagaku Kogyo Kk | 電子銃とその使用方法 |
JP2003016987A (ja) * | 2001-06-26 | 2003-01-17 | Hitachi Ltd | ショットキー電子銃及び電子線装置 |
JP2005190758A (ja) * | 2003-12-25 | 2005-07-14 | Denki Kagaku Kogyo Kk | 電子源 |
Also Published As
Publication number | Publication date |
---|---|
DE112007000045T5 (de) | 2010-04-22 |
WO2008102435A1 (ja) | 2008-08-28 |
TW200849306A (en) | 2008-12-16 |
US20080211376A1 (en) | 2008-09-04 |
JPWO2008102435A1 (ja) | 2010-05-27 |
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