JP7137002B2 - 電子源、及び荷電粒子線装置 - Google Patents
電子源、及び荷電粒子線装置 Download PDFInfo
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- JP7137002B2 JP7137002B2 JP2021514730A JP2021514730A JP7137002B2 JP 7137002 B2 JP7137002 B2 JP 7137002B2 JP 2021514730 A JP2021514730 A JP 2021514730A JP 2021514730 A JP2021514730 A JP 2021514730A JP 7137002 B2 JP7137002 B2 JP 7137002B2
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- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 4
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
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- -1 CeB6 Substances 0.000 description 1
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/026—Shields
- H01J2237/0262—Shields electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06375—Arrangement of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/188—Differential pressure
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Description
201…従来のSE電子銃、202…SEチップ、203…サプレッサ、204…引出電極、205…酸化ジルコニウム、206…フィラメント、207…端子、208…碍子、209…絞り、210…碍子、301…遮蔽電極、302…円筒部、303…サプレッサ、310…碍子、311…空隙、312…下面、313…上面、501…サイドビーム、502…反射電子、503…反射電子、504…反射電子、505…反射電子、506…二次電子、507…表面、510…電位分布、511…接触点、517…表面、601…狭い経路、701…遮蔽電極、702…サプレッサ、703…遮蔽電極、704…サプレッサ、705…遮蔽電極、722…円筒部、723…円筒部、801…引出電極、802…開口、803…開口、804…反射電子、805…反射電子、810…サイドビーム、811…反射電子、812…サイドビーム、813…突出部、814…突出部、815…狭い経路、816…反射電子、817…反射電子、818…反射電子、819…反射電子、820…碍子、821…引出電極底部、822…ネック部、823…狭い経路、824…引出電極円筒部、830…半導電性碍子、831…半導電性被覆、840…支持部、841…フィードスルー。
Claims (14)
- チップと、前記チップの先端よりも後方に配置されたサプレッサと、底面と筒部から成り、前記チップと前記サプレッサを内包する引出電極と、前記サプレッサと前記引出電極を保持する碍子と、前記サプレッサと前記引出電極の筒部との間に設けられた導電性金属を持つ電子銃を備え、
前記導電性金属に前記チップよりも低い電圧を印加する、
ことを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置であって、
前記碍子の端面に段差をもたせ、前記碍子と前記引出電極の筒部との間に空隙を設けた、
ことを特徴とする荷電粒子線装置。 - 請求項2に記載の荷電粒子線装置であって、
前記導電性金属の一部を、前記空隙まで伸ばす、
ことを特徴とする荷電粒子線装置。 - 請求項3に記載の荷電粒子線装置であって、
前記導電性金属と前記サプレッサとを一体で構成する、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記導電性金属は筒構造をもち、前記筒構造は前記引出電極の筒部と同軸方向に伸びている、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記引出電極に少なくとも二つ以上の開口を設ける、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記引出電極の内側に少なくとも一つの突出部を設ける、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記引出電極と前記碍子の接触箇所の内径は、前記引出電極の筒部の内径よりも小さい、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記碍子を半導電性の材料で構成する、又は前記碍子の表面に半導電性、ないしは導電性の薄膜を設ける、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記チップの先端の曲率半径を0.5μmよりも大きくする、
ことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置であって、
前記チップが配置された真空室を、非蒸発ゲッターポンプで排気する、
ことを特徴とする荷電粒子線装置。 - チップと、前記チップの先端よりも後方に配置されたサプレッサと、前記サプレッサを保持する導電性の支持部と、底面と筒部から成り、前記チップと前記サプレッサを内包する引出電極と、前記支持部と前記引出電極を保持する碍子と、前記支持部と前記引出電極の筒部との間に設けられた導電性金属を持つ電子銃を備え、
前記導電性金属に前記チップよりも低い電圧を印加する、
ことを特徴とする荷電粒子線装置。 - 請求項12に記載の荷電粒子線装置であって、
前記碍子の端面に段差をもたせ、前記碍子と前記引出電極の筒部との間に空隙を設けた、
ことを特徴とする荷電粒子線装置。 - 請求項13に記載の荷電粒子線装置であって、
前記導電性金属の一部を、前記空隙まで伸ばす、
ことを特徴とする荷電粒子線装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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PCT/JP2019/016563 WO2020213109A1 (ja) | 2019-04-18 | 2019-04-18 | 電子源、及び荷電粒子線装置 |
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JPWO2020213109A1 JPWO2020213109A1 (ja) | 2020-10-22 |
JP7137002B2 true JP7137002B2 (ja) | 2022-09-13 |
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JP2021514730A Active JP7137002B2 (ja) | 2019-04-18 | 2019-04-18 | 電子源、及び荷電粒子線装置 |
Country Status (7)
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US (1) | US20220199349A1 (ja) |
JP (1) | JP7137002B2 (ja) |
KR (1) | KR102640728B1 (ja) |
CN (1) | CN113646864B (ja) |
DE (1) | DE112019006988T5 (ja) |
TW (1) | TWI724803B (ja) |
WO (1) | WO2020213109A1 (ja) |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2000294182A (ja) | 1999-04-05 | 2000-10-20 | Jeol Ltd | 電界放射電子銃 |
JP2000306535A (ja) | 1999-04-20 | 2000-11-02 | Nippon Telegr & Teleph Corp <Ntt> | 荷電粒子発生装置 |
JP2002313269A (ja) | 2001-04-10 | 2002-10-25 | Jeol Ltd | 電界放射型電子銃 |
JP2012033297A (ja) | 2010-07-29 | 2012-02-16 | Hitachi High-Technologies Corp | 電子銃 |
JP2017204342A (ja) | 2016-05-09 | 2017-11-16 | 松定プレシジョン株式会社 | 絶縁構造、荷電粒子銃及び荷電粒子線応用装置 |
Family Cites Families (17)
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JPS5439974Y2 (ja) * | 1973-08-22 | 1979-11-26 | ||
JPS5923416B2 (ja) * | 1979-11-30 | 1984-06-01 | 日本電子株式会社 | 電子銃 |
JPS5796450A (en) * | 1980-12-09 | 1982-06-15 | Toshiba Corp | Electron gun |
JPH01260742A (ja) * | 1988-04-11 | 1989-10-18 | Mitsubishi Electric Corp | 荷電ビーム銃 |
JP3264988B2 (ja) * | 1992-06-29 | 2002-03-11 | 東京エレクトロン株式会社 | イオン注入装置 |
JPH08171879A (ja) | 1994-12-16 | 1996-07-02 | Hitachi Ltd | ショットキーエミッション電子源の動作温度設定方法 |
US5834781A (en) * | 1996-02-14 | 1998-11-10 | Hitachi, Ltd. | Electron source and electron beam-emitting apparatus equipped with same |
JP2006216396A (ja) * | 2005-02-04 | 2006-08-17 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
WO2007095205A2 (en) * | 2006-02-14 | 2007-08-23 | Advanced Electron Beams, Inc. | Electron beam emitter |
WO2008102435A1 (ja) * | 2007-02-20 | 2008-08-28 | Advantest Corporation | 電子銃、電子ビーム露光装置及び露光方法 |
JP2010015818A (ja) * | 2008-07-03 | 2010-01-21 | Hitachi High-Technologies Corp | 電子源装置及びイオン装置 |
JP5063715B2 (ja) * | 2010-02-04 | 2012-10-31 | 株式会社日立ハイテクノロジーズ | 電子源,電子銃、それを用いた電子顕微鏡装置及び電子線描画装置 |
US9070527B2 (en) * | 2011-02-25 | 2015-06-30 | Param Corporation | Electron gun and electron beam device |
EP2779204A1 (en) * | 2013-03-15 | 2014-09-17 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron gun arrangement |
KR102427119B1 (ko) * | 2013-12-30 | 2022-07-29 | 에이에스엠엘 네델란즈 비.브이. | 캐소드 어레인지먼트, 전자총, 및 그런 전자총을 포함하는 리소그래피 시스템 |
US10297416B2 (en) * | 2014-10-20 | 2019-05-21 | Hitachi High-Technologies Corporation | Scanning electron microscope |
WO2019008738A1 (ja) * | 2017-07-07 | 2019-01-10 | 株式会社日立ハイテクノロジーズ | 電界放出型電子源および荷電粒子線装置 |
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2019
- 2019-04-18 KR KR1020217030924A patent/KR102640728B1/ko active IP Right Grant
- 2019-04-18 CN CN201980094952.5A patent/CN113646864B/zh active Active
- 2019-04-18 JP JP2021514730A patent/JP7137002B2/ja active Active
- 2019-04-18 US US17/601,421 patent/US20220199349A1/en active Granted
- 2019-04-18 WO PCT/JP2019/016563 patent/WO2020213109A1/ja active Application Filing
- 2019-04-18 DE DE112019006988.8T patent/DE112019006988T5/de active Pending
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2020
- 2020-02-27 TW TW109106488A patent/TWI724803B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000294182A (ja) | 1999-04-05 | 2000-10-20 | Jeol Ltd | 電界放射電子銃 |
JP2000306535A (ja) | 1999-04-20 | 2000-11-02 | Nippon Telegr & Teleph Corp <Ntt> | 荷電粒子発生装置 |
JP2002313269A (ja) | 2001-04-10 | 2002-10-25 | Jeol Ltd | 電界放射型電子銃 |
JP2012033297A (ja) | 2010-07-29 | 2012-02-16 | Hitachi High-Technologies Corp | 電子銃 |
JP2017204342A (ja) | 2016-05-09 | 2017-11-16 | 松定プレシジョン株式会社 | 絶縁構造、荷電粒子銃及び荷電粒子線応用装置 |
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WO2020213109A1 (ja) | 2020-10-22 |
CN113646864B (zh) | 2024-05-28 |
JPWO2020213109A1 (ja) | 2020-10-22 |
US20220199349A1 (en) | 2022-06-23 |
TW202040591A (zh) | 2020-11-01 |
KR20210129191A (ko) | 2021-10-27 |
DE112019006988T5 (de) | 2021-11-18 |
KR102640728B1 (ko) | 2024-02-27 |
TWI724803B (zh) | 2021-04-11 |
CN113646864A (zh) | 2021-11-12 |
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