KR102425178B1 - 전자총장치 - Google Patents
전자총장치 Download PDFInfo
- Publication number
- KR102425178B1 KR102425178B1 KR1020217027088A KR20217027088A KR102425178B1 KR 102425178 B1 KR102425178 B1 KR 102425178B1 KR 1020217027088 A KR1020217027088 A KR 1020217027088A KR 20217027088 A KR20217027088 A KR 20217027088A KR 102425178 B1 KR102425178 B1 KR 102425178B1
- Authority
- KR
- South Korea
- Prior art keywords
- liquid
- electron
- cover tube
- electron gun
- tube container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/485—Construction of the gun or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/04—Liquid electrodes, e.g. liquid cathode
- H01J1/05—Liquid electrodes, e.g. liquid cathode characterised by material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/04—Liquid electrodes, e.g. liquid cathode
- H01J1/10—Cooling, heating, circulating, filtering, or controlling level of liquid in a liquid-pool electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/06—Cathodes
- H01J35/064—Details of the emitter, e.g. material or structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/04—Liquid electrodes, e.g. liquid cathode
- H01J1/06—Containers for liquid-pool electrodes; Arrangement or mounting thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3104—Welding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
- H01J9/042—Manufacture, activation of the emissive part
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2019-135618 | 2019-07-23 | ||
| JP2019135618 | 2019-07-23 | ||
| PCT/JP2020/027255 WO2021015039A1 (ja) | 2019-07-23 | 2020-07-13 | 電子銃装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20210114535A KR20210114535A (ko) | 2021-09-23 |
| KR102425178B1 true KR102425178B1 (ko) | 2022-07-27 |
Family
ID=74193454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020217027088A Active KR102425178B1 (ko) | 2019-07-23 | 2020-07-13 | 전자총장치 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11295925B2 (https=) |
| EP (1) | EP3923313B1 (https=) |
| JP (1) | JP7445993B2 (https=) |
| KR (1) | KR102425178B1 (https=) |
| CN (1) | CN113678224B (https=) |
| WO (1) | WO2021015039A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7573601B2 (ja) * | 2020-04-21 | 2024-10-25 | デンカ株式会社 | 電子源及びその製造方法、並びにエミッター及びこれを備える装置 |
| TWI773093B (zh) * | 2021-01-19 | 2022-08-01 | 京元電子股份有限公司 | 滴定模組、測試設備及滴定接觸角之量測方法 |
| CN119993802A (zh) * | 2022-02-18 | 2025-05-13 | 西湖大学 | 一种电子发射装置以及电子装置 |
| US12340969B2 (en) | 2022-03-18 | 2025-06-24 | Kla Corporation | Electron gun and electron microscope |
| CN115148561A (zh) * | 2022-07-08 | 2022-10-04 | 西湖大学 | 一种电子发射装置以及电子装置 |
| CN116083860A (zh) * | 2022-11-15 | 2023-05-09 | 福建兆元光电有限公司 | 一种黄金颗粒自动预熔方法 |
| US20250125114A1 (en) * | 2023-10-11 | 2025-04-17 | Fei Company | Dry electron source environment |
| CN117943494B (zh) * | 2024-03-22 | 2024-06-18 | 常州富丽康精密机械有限公司 | 一种具有力反馈功能的冷轧丝杠生产用轧制设备 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016157695A (ja) | 2003-05-09 | 2016-09-01 | 株式会社荏原製作所 | 電子線装置 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1574611A (en) * | 1976-04-13 | 1980-09-10 | Atomic Energy Authority Uk | Ion sources |
| JPS5838905A (ja) * | 1981-09-02 | 1983-03-07 | Toppan Printing Co Ltd | 固体撮像素子用色分解フイルタ |
| JPS5838905B2 (ja) * | 1981-09-03 | 1983-08-26 | 日本電子株式会社 | 金属イオン源 |
| JPS5846542A (ja) * | 1981-09-11 | 1983-03-18 | Nippon Telegr & Teleph Corp <Ntt> | 電界放出型液体金属アルミニウムイオン銃及びその製造方法 |
| JPS62140340A (ja) * | 1985-12-14 | 1987-06-23 | Denki Kagaku Kogyo Kk | 電界放射型イオン源 |
| EP0204297B1 (en) * | 1985-06-04 | 1991-01-23 | Denki Kagaku Kogyo Kabushiki Kaisha | Charged particle emission source structure |
| JPH02195640A (ja) * | 1989-01-23 | 1990-08-02 | Toshiba Corp | 電子銃による加熱装置および同位体分離装置 |
| JP2688261B2 (ja) * | 1989-10-25 | 1997-12-08 | 電気化学工業株式会社 | 電界放出型イオン源 |
| JPH03272500A (ja) * | 1990-03-22 | 1991-12-04 | Toshiba Corp | 電子銃 |
| JPH05205680A (ja) * | 1992-01-27 | 1993-08-13 | Hitachi Ltd | 電気流体力学的イオン源、それを用いたフッ素イオンの放出方法、二次イオン質量分析装置、それを用いた質量分析方法、加工装置及びそれを用いた加工方法 |
| JP2002025421A (ja) * | 2000-07-10 | 2002-01-25 | Matsushita Electric Ind Co Ltd | 電子銃及びその製造方法、及びその電子銃を用いたカラー受像管、カラー受像システム |
| JP4685115B2 (ja) * | 2007-02-20 | 2011-05-18 | 株式会社アドバンテスト | 電子ビーム露光方法 |
| JP5595199B2 (ja) | 2010-09-23 | 2014-09-24 | 株式会社ニューフレアテクノロジー | 電子銃および電子銃を用いた電子ビーム描画装置 |
| EP2680294B1 (en) * | 2011-02-25 | 2015-09-09 | Param Corporation | Electron gun and electron beam device |
| JP2017201609A (ja) * | 2016-05-06 | 2017-11-09 | 株式会社Param | 電子銃 |
-
2020
- 2020-07-13 WO PCT/JP2020/027255 patent/WO2021015039A1/ja not_active Ceased
- 2020-07-13 CN CN202080017998.XA patent/CN113678224B/zh active Active
- 2020-07-13 JP JP2021533955A patent/JP7445993B2/ja active Active
- 2020-07-13 KR KR1020217027088A patent/KR102425178B1/ko active Active
- 2020-07-13 US US17/434,833 patent/US11295925B2/en active Active
- 2020-07-13 EP EP20843228.6A patent/EP3923313B1/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016157695A (ja) | 2003-05-09 | 2016-09-01 | 株式会社荏原製作所 | 電子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20210114535A (ko) | 2021-09-23 |
| CN113678224B (zh) | 2025-01-28 |
| US11295925B2 (en) | 2022-04-05 |
| CN113678224A (zh) | 2021-11-19 |
| JPWO2021015039A1 (https=) | 2021-01-28 |
| JP7445993B2 (ja) | 2024-03-08 |
| WO2021015039A1 (ja) | 2021-01-28 |
| US20220051866A1 (en) | 2022-02-17 |
| EP3923313B1 (en) | 2023-09-27 |
| EP3923313A1 (en) | 2021-12-15 |
| EP3923313A4 (en) | 2022-05-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| A302 | Request for accelerated examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PA0302 | Request for accelerated examination |
St.27 status event code: A-1-2-D10-D17-exm-PA0302 St.27 status event code: A-1-2-D10-D16-exm-PA0302 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| U11 | Full renewal or maintenance fee paid |
Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE) Year of fee payment: 4 |