CN112135790A - 氢回收系统和氢回收方法 - Google Patents

氢回收系统和氢回收方法 Download PDF

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Publication number
CN112135790A
CN112135790A CN201980029047.1A CN201980029047A CN112135790A CN 112135790 A CN112135790 A CN 112135790A CN 201980029047 A CN201980029047 A CN 201980029047A CN 112135790 A CN112135790 A CN 112135790A
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hydrogen
discharge space
exhaust gas
hydrogen recovery
ammonia
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Chinese (zh)
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神原信志
早川幸男
三浦友规
池田达也
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National University Corp Donghai National University
Sawafuji Electric Co Ltd
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National University Corp Donghai National University
Sawafuji Electric Co Ltd
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116146453A (zh) * 2023-01-05 2023-05-23 西安交通大学 一种具有超高增压比的自驱动氢气增压系统及操作方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021004154A (ja) * 2019-06-27 2021-01-14 国立大学法人岐阜大学 水素製造装置及び水素製造方法
JP2022045188A (ja) * 2020-09-08 2022-03-18 キオクシア株式会社 ガス回収装置、半導体製造システムおよびガス回収方法
CN116412406A (zh) * 2021-12-31 2023-07-11 隆基绿能科技股份有限公司 尾气处理系统和尾气处理方法
WO2024044165A1 (en) * 2022-08-24 2024-02-29 Lam Research Corporation A plasma processing system with a gas recycling system
US20240175126A1 (en) * 2022-11-28 2024-05-30 Applied Materials, Inc. Gas recycling systems, substrate processing systems, and related apparatus and methods for semiconductor manufacturing
CN116854034B (zh) * 2023-07-19 2025-04-25 西安理工大学 板-孔dbd等离子体协同质子交换膜氨气制氢的装置
JP7602682B1 (ja) 2024-04-09 2024-12-18 株式会社三井E&S 水素ガス製造装置、水素ガス供給装置、燃料電池システム、移動体、及び水素ガス製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005313108A (ja) * 2004-04-30 2005-11-10 Canon Inc 誘電体
CN101679028A (zh) * 2006-10-20 2010-03-24 特洛斯创新责任有限公司 采用等离子体系统生产分子氢的方法及系统
CN102179169A (zh) * 2011-03-15 2011-09-14 浙江大学 吸附与等离子体选择催化还原脱除氮氧化物的方法
CN104661955A (zh) * 2012-10-02 2015-05-27 国立大学法人岐阜大学 氢生成装置及设置有氢生成装置的燃料电池系统
CN105939772A (zh) * 2014-01-30 2016-09-14 巨石材料公司 等离子体和氢气过程与联合循环动力装置和蒸汽重整器的集成
JP6241803B1 (ja) * 2017-01-30 2017-12-06 国立大学法人岐阜大学 水素生成装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11285613A (ja) * 1998-04-03 1999-10-19 Mitsubishi Research Institute Inc 水素透過膜ポンプシステム
US7037484B1 (en) * 2002-06-21 2006-05-02 University Of Central Florida Research Foundation, Inc. Plasma reactor for cracking ammonia and hydrogen-rich gases to hydrogen
US20050214181A1 (en) 2004-03-26 2005-09-29 Canon Kabushiki Kaisha Dielectric, gas treatment apparatus using the same, and plasma generator
JP2007307514A (ja) 2006-05-22 2007-11-29 Sharp Corp 気体浄化装置
GB0618016D0 (en) * 2006-09-13 2006-10-18 Boc Group Plc Method of recycling hydrogen
US8220440B2 (en) 2006-10-20 2012-07-17 Tetros Innovations, Llc Methods and systems for producing fuel for an internal combustion engine using a low-temperature plasma system
US20080131360A1 (en) 2006-10-20 2008-06-05 Charles Terrel Adams Methods and systems of producing molecular hydrogen using a plasma system at various pressures
US20080138676A1 (en) 2006-10-20 2008-06-12 Charles Terrel Adams Methods and systems of producing molecular hydrogen using a plasma system in combination with a membrane separation system
US7946258B2 (en) 2006-10-20 2011-05-24 Tetros Innovations, Llc Method and apparatus to produce enriched hydrogen with a plasma system for an internal combustion engine
US20080131744A1 (en) 2006-10-20 2008-06-05 Charles Terrel Adams Methods and systems of producing molecular hydrogen using a low-temperature plasma system
US8211276B2 (en) 2006-10-20 2012-07-03 Tetros Innovations, Llc Methods and systems of producing fuel for an internal combustion engine using a plasma system at various pressures
JP2011084422A (ja) * 2009-10-14 2011-04-28 Shin-Etsu Chemical Co Ltd 水素ガス回収システムおよび水素ガスの分離回収方法
JP2014214060A (ja) 2013-04-26 2014-11-17 日本パイオニクス株式会社 水素の回収方法及びそれを用いた水素の再利用方法
US20140322124A1 (en) 2013-04-26 2014-10-30 Japan Pionics Co., Ltd. Method of processing discharge gas discharged from production process of gallium nitride compound semiconductor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005313108A (ja) * 2004-04-30 2005-11-10 Canon Inc 誘電体
CN101679028A (zh) * 2006-10-20 2010-03-24 特洛斯创新责任有限公司 采用等离子体系统生产分子氢的方法及系统
CN102179169A (zh) * 2011-03-15 2011-09-14 浙江大学 吸附与等离子体选择催化还原脱除氮氧化物的方法
CN104661955A (zh) * 2012-10-02 2015-05-27 国立大学法人岐阜大学 氢生成装置及设置有氢生成装置的燃料电池系统
CN105939772A (zh) * 2014-01-30 2016-09-14 巨石材料公司 等离子体和氢气过程与联合循环动力装置和蒸汽重整器的集成
JP6241803B1 (ja) * 2017-01-30 2017-12-06 国立大学法人岐阜大学 水素生成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116146453A (zh) * 2023-01-05 2023-05-23 西安交通大学 一种具有超高增压比的自驱动氢气增压系统及操作方法

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