CN111565856B - 分散板和包括该分散板的涂布装置 - Google Patents

分散板和包括该分散板的涂布装置 Download PDF

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Publication number
CN111565856B
CN111565856B CN201980007640.6A CN201980007640A CN111565856B CN 111565856 B CN111565856 B CN 111565856B CN 201980007640 A CN201980007640 A CN 201980007640A CN 111565856 B CN111565856 B CN 111565856B
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dispersion plate
region
chamber
spout
diameter
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Chinese (zh)
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CN111565856A (zh
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申铉真
蒋晶琦
林艺勳
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LG Chem Ltd
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LG Chem Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • B01J19/006—Baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/16—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by suspending the powder material in a gas, e.g. in fluidised beds or as a falling curtain
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/44—Fluidisation grids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B01J2219/00763—Baffles

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Nozzles (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Glanulating (AREA)
CN201980007640.6A 2018-08-24 2019-08-22 分散板和包括该分散板的涂布装置 Active CN111565856B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2018-0099107 2018-08-24
KR1020180099107A KR102329735B1 (ko) 2018-08-24 2018-08-24 코팅기
PCT/KR2019/010676 WO2020040559A1 (ko) 2018-08-24 2019-08-22 분산판 및 이를 포함하는 코팅 장치

Publications (2)

Publication Number Publication Date
CN111565856A CN111565856A (zh) 2020-08-21
CN111565856B true CN111565856B (zh) 2022-05-24

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Country Link
US (1) US12042776B2 (enExample)
EP (1) EP3730218B1 (enExample)
JP (1) JP7117384B2 (enExample)
KR (1) KR102329735B1 (enExample)
CN (1) CN111565856B (enExample)
WO (1) WO2020040559A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB202016253D0 (en) * 2020-10-13 2020-11-25 Ucl Business Plc Particle processing

Citations (1)

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Publication number Priority date Publication date Assignee Title
KR101149825B1 (ko) * 2011-03-11 2012-05-24 주식회사 영일이엔지 균일한 유동층 분포를 가지는 유동층코팅건조기용 다공판

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JP2595072Y2 (ja) * 1992-02-28 1999-05-24 株式会社大川原製作所 流動層処理装置における多孔板ユニット
US5328720A (en) * 1992-10-23 1994-07-12 Carbon Implants, Inc. Coating-fluidizing gas supply system and method for flat bottom coater
FI96867C (fi) * 1993-12-27 1996-09-10 Borealis Polymers Oy Leijupetireaktori
US5891401A (en) * 1997-02-05 1999-04-06 Kinetics Technology International Corporation Porous tuyere for fluid bed apparatus
US5904119A (en) * 1997-06-26 1999-05-18 Brifer International Ltd. Furnace apparatus for fluidized bed processes
CN2351188Y (zh) * 1997-10-15 1999-12-01 天津市远昌化工技术开发有限责任公司 新型流化造粒炉
US6126753A (en) * 1998-05-13 2000-10-03 Tokyo Electron Limited Single-substrate-processing CVD apparatus and method
KR100510880B1 (ko) * 1998-12-18 2006-01-27 삼성엔지니어링 주식회사 분산 노즐 및 이를 이용한 유동층 반응기
US7429407B2 (en) * 1998-12-30 2008-09-30 Aeromatic Fielder Ag Process for coating small bodies, including tablets
US6247657B1 (en) * 1999-05-28 2001-06-19 Delphi Technologies, Inc. Power gun spray nozzle and method
JP2003529926A (ja) * 2000-03-30 2003-10-07 東京エレクトロン株式会社 プラズマ処理システム内への調整可能なガス注入のための方法及び装置
EP1282470B1 (en) * 2000-05-16 2008-08-20 Regents Of The University Of Minnesota High mass throughput particle generation using multiple nozzle spraying
KR100431863B1 (ko) * 2000-11-16 2004-05-20 주식회사 포스코 유동층 환원로의 분산판 크리닝장치
KR100362684B1 (ko) * 2000-12-20 2002-11-29 주식회사 포스코 유동층반응로의 분산판 차압조절장치
JP4053379B2 (ja) * 2002-09-04 2008-02-27 株式会社パウレック 流動層装置
CN2649171Y (zh) * 2003-02-26 2004-10-20 浙江大学 流化床反应装置
CN2708992Y (zh) * 2004-07-15 2005-07-13 云南驰宏锌锗股份有限公司 一种经济环保型沸腾炉空气分布板
KR101309334B1 (ko) 2004-08-02 2013-09-16 비코 인스트루먼츠 인코포레이티드 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터
AT503349B1 (de) * 2005-12-23 2008-09-15 Siemens Vai Metals Tech Gmbh Verteilerboden
KR100847199B1 (ko) * 2006-01-31 2008-07-17 주식회사 엘지화학 열전달 성능이 향상된 반응기, 이 반응기를 이용한 산화물 제조방법, 및 평행류의 열매체 유속 증가 방법
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KR101149825B1 (ko) * 2011-03-11 2012-05-24 주식회사 영일이엔지 균일한 유동층 분포를 가지는 유동층코팅건조기용 다공판

Also Published As

Publication number Publication date
KR20200022898A (ko) 2020-03-04
KR102329735B1 (ko) 2021-11-22
US12042776B2 (en) 2024-07-23
JP7117384B2 (ja) 2022-08-12
WO2020040559A1 (ko) 2020-02-27
EP3730218B1 (en) 2025-07-02
US20210060513A1 (en) 2021-03-04
EP3730218A4 (en) 2021-04-07
EP3730218A1 (en) 2020-10-28
JP2021509357A (ja) 2021-03-25
CN111565856A (zh) 2020-08-21

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