JP7117384B2 - 分散板及びこれを含むコーティング装置 - Google Patents

分散板及びこれを含むコーティング装置 Download PDF

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JP7117384B2
JP7117384B2 JP2020537194A JP2020537194A JP7117384B2 JP 7117384 B2 JP7117384 B2 JP 7117384B2 JP 2020537194 A JP2020537194 A JP 2020537194A JP 2020537194 A JP2020537194 A JP 2020537194A JP 7117384 B2 JP7117384 B2 JP 7117384B2
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JP2021509357A5 (enExample
JP2021509357A (ja
Inventor
シン、ヒョン－チン
チャン、チョン－キ
イム、イェ－フン
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LG Chem Ltd
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LG Chem Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • B01J19/006—Baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/006—Coating of the granules without description of the process or the device by which the granules are obtained
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2/00—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic
    • B01J2/16—Processes or devices for granulating materials, e.g. fertilisers in general; Rendering particulate materials free flowing in general, e.g. making them hydrophobic by suspending the powder material in a gas, e.g. in fluidised beds or as a falling curtain
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/44—Fluidisation grids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00761—Details of the reactor
    • B01J2219/00763—Baffles

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Nozzles (AREA)
  • Glanulating (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
JP2020537194A 2018-08-24 2019-08-22 分散板及びこれを含むコーティング装置 Active JP7117384B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2018-0099107 2018-08-24
KR1020180099107A KR102329735B1 (ko) 2018-08-24 2018-08-24 코팅기
PCT/KR2019/010676 WO2020040559A1 (ko) 2018-08-24 2019-08-22 분산판 및 이를 포함하는 코팅 장치

Publications (3)

Publication Number Publication Date
JP2021509357A JP2021509357A (ja) 2021-03-25
JP2021509357A5 JP2021509357A5 (enExample) 2021-05-06
JP7117384B2 true JP7117384B2 (ja) 2022-08-12

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JP2020537194A Active JP7117384B2 (ja) 2018-08-24 2019-08-22 分散板及びこれを含むコーティング装置

Country Status (6)

Country Link
US (1) US12042776B2 (enExample)
EP (1) EP3730218B1 (enExample)
JP (1) JP7117384B2 (enExample)
KR (1) KR102329735B1 (enExample)
CN (1) CN111565856B (enExample)
WO (1) WO2020040559A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB202016253D0 (en) * 2020-10-13 2020-11-25 Ucl Business Plc Particle processing

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060021574A1 (en) 2004-08-02 2006-02-02 Veeco Instruments Inc. Multi-gas distribution injector for chemical vapor deposition reactors
US20080035608A1 (en) 2006-08-14 2008-02-14 Thomas Owain P Surface processing apparatus
JP2015531315A (ja) 2012-10-12 2015-11-02 スプレイング システムズ カンパニー 流動層コーティング装置

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JP2595072Y2 (ja) * 1992-02-28 1999-05-24 株式会社大川原製作所 流動層処理装置における多孔板ユニット
US5328720A (en) * 1992-10-23 1994-07-12 Carbon Implants, Inc. Coating-fluidizing gas supply system and method for flat bottom coater
FI96867C (fi) * 1993-12-27 1996-09-10 Borealis Polymers Oy Leijupetireaktori
US5891401A (en) * 1997-02-05 1999-04-06 Kinetics Technology International Corporation Porous tuyere for fluid bed apparatus
US5904119A (en) * 1997-06-26 1999-05-18 Brifer International Ltd. Furnace apparatus for fluidized bed processes
CN2351188Y (zh) * 1997-10-15 1999-12-01 天津市远昌化工技术开发有限责任公司 新型流化造粒炉
US6126753A (en) * 1998-05-13 2000-10-03 Tokyo Electron Limited Single-substrate-processing CVD apparatus and method
KR100510880B1 (ko) * 1998-12-18 2006-01-27 삼성엔지니어링 주식회사 분산 노즐 및 이를 이용한 유동층 반응기
US7429407B2 (en) * 1998-12-30 2008-09-30 Aeromatic Fielder Ag Process for coating small bodies, including tablets
US6247657B1 (en) * 1999-05-28 2001-06-19 Delphi Technologies, Inc. Power gun spray nozzle and method
JP2003529926A (ja) * 2000-03-30 2003-10-07 東京エレクトロン株式会社 プラズマ処理システム内への調整可能なガス注入のための方法及び装置
EP1282470B1 (en) * 2000-05-16 2008-08-20 Regents Of The University Of Minnesota High mass throughput particle generation using multiple nozzle spraying
KR100431863B1 (ko) * 2000-11-16 2004-05-20 주식회사 포스코 유동층 환원로의 분산판 크리닝장치
KR100362684B1 (ko) * 2000-12-20 2002-11-29 주식회사 포스코 유동층반응로의 분산판 차압조절장치
JP4053379B2 (ja) * 2002-09-04 2008-02-27 株式会社パウレック 流動層装置
CN2649171Y (zh) * 2003-02-26 2004-10-20 浙江大学 流化床反应装置
CN2708992Y (zh) * 2004-07-15 2005-07-13 云南驰宏锌锗股份有限公司 一种经济环保型沸腾炉空气分布板
AT503349B1 (de) * 2005-12-23 2008-09-15 Siemens Vai Metals Tech Gmbh Verteilerboden
KR100847199B1 (ko) * 2006-01-31 2008-07-17 주식회사 엘지화학 열전달 성능이 향상된 반응기, 이 반응기를 이용한 산화물 제조방법, 및 평행류의 열매체 유속 증가 방법
CN101061988A (zh) * 2006-04-28 2007-10-31 邹龙贵 流化床包衣机
FI120661B (fi) * 2008-06-11 2010-01-15 Yit Teollisuus Ja Verkkopalvel Leijupetikattilan petimateriaalin ohjaussuppilo, leijupetikattila, menetelmä leijupetikattilassa, sisäsuppilo ja sen käyttö
KR101134001B1 (ko) 2008-12-31 2012-04-05 제일모직주식회사 사구역을 최소화하기 위한 유동층 반응기용 송풍구형 분산판
KR101149825B1 (ko) * 2011-03-11 2012-05-24 주식회사 영일이엔지 균일한 유동층 분포를 가지는 유동층코팅건조기용 다공판
US9427512B2 (en) * 2012-06-08 2016-08-30 Pall Corporation Filter device
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CN207012954U (zh) * 2017-07-19 2018-02-16 南通科恩化工技术有限公司 一种气体分布器及有机硅流化床

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060021574A1 (en) 2004-08-02 2006-02-02 Veeco Instruments Inc. Multi-gas distribution injector for chemical vapor deposition reactors
US20080035608A1 (en) 2006-08-14 2008-02-14 Thomas Owain P Surface processing apparatus
EP1889946A2 (en) 2006-08-14 2008-02-20 Oxford Instruments Plasma Technology Limited Surface Processing Apparatus
JP2015531315A (ja) 2012-10-12 2015-11-02 スプレイング システムズ カンパニー 流動層コーティング装置

Also Published As

Publication number Publication date
KR20200022898A (ko) 2020-03-04
KR102329735B1 (ko) 2021-11-22
US12042776B2 (en) 2024-07-23
WO2020040559A1 (ko) 2020-02-27
EP3730218B1 (en) 2025-07-02
CN111565856B (zh) 2022-05-24
US20210060513A1 (en) 2021-03-04
EP3730218A4 (en) 2021-04-07
EP3730218A1 (en) 2020-10-28
JP2021509357A (ja) 2021-03-25
CN111565856A (zh) 2020-08-21

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