CN109989005A - The arc ion plating of combination field and liner bias straight tube composite filter - Google Patents
The arc ion plating of combination field and liner bias straight tube composite filter Download PDFInfo
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- CN109989005A CN109989005A CN201711486578.2A CN201711486578A CN109989005A CN 109989005 A CN109989005 A CN 109989005A CN 201711486578 A CN201711486578 A CN 201711486578A CN 109989005 A CN109989005 A CN 109989005A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Engineering & Computer Science (AREA)
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- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Abstract
The arc ion plating of combination field and liner bias straight tube composite filter, belongs to technical field of material surface treatment, and the present invention is to solve the problems, such as that bulky grain is to the loss during the pollution of film and Plasma Transport in multi-stage magnetic field filter device.The inventive system comprises: grid bias power supply, arc ion plating target source and power supply, multi-stage magnetic field device and power supply, liner bias hose straightening device and grid bias power supply, movable coil device and power supply, sample stage, grid bias power supply kymographion and vacuum chamber；Film deposition: attachment device, activation system, to the indoor vacuum degree of vacuum less than 10‑4When Pa, it is passed through working gas, open plated film power supply, it is adjusted using energy of the grid bias power supply to arc-plasma, the bulky grain defect in arc-plasma is eliminated by liner bias hose straightening device and multi-stage magnetic field device and improves the efficiency of transmission in filter device, loss in a vacuum chamber is reduced, technological parameter is set, carries out film preparation.
Description
Technical field
The present invention relates to the arc ion platings of combination field and liner bias straight tube composite filter, belong at material surface
Manage technical field.
Background technique
During arc ion plating prepares film, since arc spot current density is up to 2.5 ~ 5 × 1010A/m2, cause
There is the liquid metal melted at the arc spot position of target material surface, under the action of local plasma pressure in droplets
Splash comes out, and is attached to film surface or inlays formation " bulky grain " (Macroparticles) defect (Boxman in the film
R L, Goldsmith S. Macroparticle contamination in cathodic arc coatings:
Generation, transport and control [J] Surf Coat Tech, 1992,52 (1): 39-50.).
In arc-plasma, since the movement velocity of electronics is far longer than the movement velocity of ion, big is reached in the unit time
The electron number on grain surface is greater than number of ions, makes bulky grain that elecrtonegativity be presented.It is the thin of micron or sub-micron relative to thickness rank
Film, size is in 0.1-10 microns of bulky grain defect just as PM2.5 is to the quality and property the pollution of air quality, to film
There can be serious harm.With thin-film material and thin film technique apply it is increasingly extensive, the solution of bulky grain defect problem with
The no bottleneck further developed as arc ions electroplating method seriously constrains its answering in thin-film material of new generation preparation
With.
Currently, in order to solve arc ions electroplating method using low melting point pure metal or multicomponent alloy material be also easy to produce greatly
Grain defect problem, it is main at present that bulky grain is filtered out using the method for Magnetic filter, as Chinese patent is used for material surface modifying
Plasma immersion and ion implantation device (publication number: CN1150180, publication date: on May 21st, 1997) in use 90 °
Magnetic filter is filtered the bulky grain of pulsed cathode arc, American scholar Anders et al. (Anders S, Anders A,
Dickinson M R, MacGill R A, Brown I G. S-shaped magnetic macroparticle filter
for cathodic arc deposition [J]. IEEE Trans Plasma Sci, 1997, 25(4): 670-
674.) and the Zhang Yujuan of He'nan University etc. (the filtered cathode arc plasma such as Zhang Yujuan, Wu Zhiguo, Zhang Weiwei prepares TiAlN thin film
Middle sedimentary condition to film texture influence China YouSe Acta Metallurgica Sinica 2004,14 (8): 1264-1268.) in article
Middle " S " magnetic filter that made is filtered the bulky grain of cathode arc, and there are also American scholar Anders et al. (Anders
A, MacGill R A. Twist filter for the removal of macroparticles from cathodic
Arc plasmas [J] Surf Coat Tech, 2000,133-134:96-100.) the Twist filter that proposes
Magnetic filter, the Dai Hua of Shanghai Communications University propose adjustable open type single channel and dual-channel electromagnetic coil filter (Dai Hua
Macroscopic particles removal technology research [D] in vacuum cathode arc ion plating layer;Shanghai Communications University, 2009), these methods
Although there is certain effect in terms of filtering and eliminating bulky grain, the efficiency of transmission loss of plasma is serious, makes ion stream
Density substantially reduces.Based on can filter on the basis of bulky grain can guarantee efficiency again, Chinese patent vacuum cathode arc straight tube mistake
The method that straight tube filtering is proposed in filter (publication number: CN1632905, publication date: on June 29th, 2005), but this is dropped again
Low filter effect.In short, relevant researcher is by comparing various Magnetic filter method (Anders A. Approaches
to rid cathodic arc plasmas of macro- and nanoparticles: a review [J]. Surf
Coat Tech, 1999,120-121319-330. and Takikawa H, Tanoue H. Review of cathodic
arc deposition for preparing droplet-free thin films [J]. IEEE Trans Plasma
Sci, 2007,35 (4): 992-999.) find arc ion plating plasma by keeping high transmission after magnetic filter
Efficiency and elimination bulky grain are very difficult to take into account, and drastically influence application of the technology in high-quality thin-film deposition.In addition in base
The electric field suppressing method that bias is used on body, when applying back bias voltage on matrix, electric field will generate row to electronegative bulky grain
Reprimand effect, and then reduce the generation of film surface bulky grain defect.German scholar Olbrich et al. (Olbrich W,
Fessmann J, Kampschulte G, Ebberink J. Improved control of TiN coating
properties using cathodic arc evaporation with a pulsed bias [J]. Surf Coat
Tech, 1991,49 (1-3): 258-262. and Fessmann J, Olbrich W, Kampschulte G, Ebberink
J. Cathodic arc deposition of TiN and Zr(C, N) at low substrate temperature
Using a pulsed bias voltage [J] Mat Sci Eng A, 1991,140:830-837.) use pulse
Bias replaces traditional Dc bias, forms a kind of new physical gas phase deposition technology --- pulsed bias arc ion plating
Technology not only greatly reduces the number of film surface bulky grain, also overcomes substrate temperature mistake caused by Traditional DC bias
High, the problems such as stress in thin films is larger.Woods Guoqiang of Dalian University of Technology et al. be (Lin Guoqiang pulsed bias arc ion plating
Process ba- sis studies [D] Dalian University of Technology, and 2008. and Huang Meidong, Lin Guoqiang, Dong Chuan, Sun Chao, it is inclined to hear immediately
Press Influencing Mechanism [J] Acta Metallurgica Sinica to arc ion plating film surface appearance, 2003,39 (5): 510-515.) needle
The mechanism of bulky grain defect reduction is caused to conduct in-depth analysis pulsed bias, by pulsed bias amplitude, frequency and arteries and veins
The adjustment of width and other processes parameter is rushed, the sheaths kinetic characteristic of arc-plasma can be improved, big for reducing film surface
Grain defect counts, improve the quality of film, are widely used in actual production, but cannot still completely eliminate bulky grain and lack
It falls into.Domestic scholars (Wei Yongqiang, Zong Xiaoya, Jiang Zhiqiang, Wen Zhenhua, Chen Liangji multi-stage magnetic field straight tube Magnetic filter and pulse
The compound arc ions electroplating method of bias, publication number: CN103276362A, publication date: on September 4th, 2013) propose it is more
Grade magnetic field straight tube Magnetic filter and the compound arc ions electroplating method of pulsed bias, big is eliminated by multi-stage magnetic field filter device
Grain defect and the efficiency of transmission for promoting plasma, but the pollution problem of inside pipe wall and the loss of inside pipe wall plasma do not have
It is well solved, later period correlation scholar (Wei Yongqiang, Zong Xiaoya, Hou Junxing, Liu Yuan, Liu Xueshen, Jiang Zhiqiang,
The multi-stage magnetic field arc ions electroplating method of pallid light liner bias straight tube is accorded with, publication number: CN105925940A, publication date:
On September 7th, 2016) pollution that proposes the multi-stage magnetic field arc ions electroplating method of liner bias straight tube to solve to inside pipe wall asks
Topic.There are also scholar using dual-layered baffle plate device (Zhao Y, Lin G, Xiao J, Lang W, Dong C, Gong J,
Sun C. Synthesis of titanium nitride thin films deposited by a new shielded
Arc ion plating [J] Appl Surf Sci, 2011,257 (13): 5694-5697.), have studied baffle spacing
To the affecting laws of film surface appearance, bulky grain elimination effect and deposition rate.There are also scholar (Zhang Tao, Hou Junda, Liu Zhi
State, the cathodic arc plasma source and its film preparation [J] China Surface Engineering of Zhang Yicong Magnetic filter, 2002,02):
11-15+20-12.) use for reference method (Bilek M M M, Yin Y, McKenzie D R, the Milne W I A of Bilek plate
M W I. Ion transport mechanisms in a filtered cathodic vacuum arc (FCVA)
system [C]. Proceedings of the Discharges and Electrical Insulation in
Vacuum, 1996 Proceedings ISDEIV, XVIIth International Symposium on, 1996:
962-966), apply positive bias on the bend pipe of 90 degree of bend pipe magnetic filters to improve the efficiency of transmission of plasma.
Summary of the invention
The invention aims to solve conventional arc ion electroplating method using high-melting-point target, low melting point pure metal or
Multicomponent alloy material and nonmetallic materials (such as graphite) are as target is also easy to produce bulky grain defect, flexure type Magnetic filter technology is drawn
Playing arc-plasma, transmission efficiency is low, target elements are asked using limitation, the uniform ablation of target, film deposition compact degree and defect
Topic, vacuum chamber space and deposition position limitation, workpiece shapes limitation and different target residues in multi-stage magnetic field device are secondary
The problems such as pollution of thin film composition caused by sputtering, in conjunction with multi-stage magnetic field filter method and liner bias hose straightening device own form
The compound action that constraint and biasing electric field attract eliminates the bulky grain defect contained in arc-plasma, while guaranteeing electric arc
Plasma, by liner bias hose straightening device and multi-stage magnetic field filter device, recycles movable coil with higher efficiency of transmission
The biography of the arc-plasma that device control is transmitted out from multi-stage magnetic field device and liner bias hose straightening device in a vacuum chamber
Defeated direction is realized to the control and regulation of the film deposition and thin film composition on any position substrate work-piece surface in vacuum chamber, is overcome
Film caused by deposition position limitation or base shape limit caused by being designed due to vacuum chamber space and target source layout deposits
Problem of non-uniform is thoroughly removed from the arc-plasma for transmitting in multi-stage magnetic field device and liner bias hose straightening device out
It is possible that remaining bulky grain defect, makes workpiece surface adjust ion energy in the case where applying back bias voltage, preparation is continuous, causes
Close high-quality thin-film, while realizing and target elements content addition in film is controlled, reduce the production cost using alloys target, mentioning
The efficiency of transmission of high arc-plasma, the deposition velocity for increasing film and to decrease or even eliminate bulky grain defect microcosmic to film
The adverse effect of structure, continuous compact deposits and service performance, proposes a kind of combination field and liner bias straight tube is compound
The arc ion plating of filtering.
Device used in the present invention includes grid bias power supply (1), arc power (2), arc ion plating target source (3), multistage magnetic
Field device (4), multi-stage magnetic field power supply (5), liner bias hose straightening device (6), liner grid bias power supply (7), movable coil device
(8), movable coil installation's power source (9), rheostat device (10), sample stage (11), grid bias power supply kymographion (12) and true
Empty room (13)；
In the device:
Substrate work-piece to be processed is placed on the sample stage (11) in vacuum chamber (13), multi-stage magnetic field device (4), liner bias straight tube
Mutually insulated between device (6), movable coil device (8) and vacuum chamber (13), workpiece are placed on sample stage (11), sample stage
(11) cathode output end of grid bias power supply (1) is connect, arc ion plating target source (3) is mounted on vacuum chamber (13), connects arc power (2)
Cathode output end, the magnetic fields at different levels of multi-stage magnetic field device (4) connect each output end of multi-stage magnetic field power supply (5), and positive and negative anodes connect
Method can be determined according to output magnetic direction, and liner bias hose straightening device (6) connects the anode output of liner grid bias power supply (7)
End, movable coil device (8) connect movable coil installation's power source (9) by the positive and negative anodes input terminal on flange port, rheostat dress
It sets (10) to connect with movable coil device (8), access opens power supply master control with the circuit of movable coil installation's power source (9)
Switch and external water-cooling circulating system；
Film deposition: it will be vacuumized in vacuum chamber (13), to the vacuum degree in vacuum chamber (13) less than 10-4When Pa, it is passed through work
Gas opens grid bias power supply (1) and grid bias power supply kymographion (12), grid bias power supply (1) can be to 0.01Pa~10Pa
Direct current, pulse, multiple-pulse, DC pulse be compound or bipolar pulse bias, the bias amplitude of output, pulse frequency and pulse
Width adjusting, the peak voltage that grid bias power supply (1) exports pulse is 0~1.2kV, and pulse frequency is 0Hz~80kHz, pulse
Width 1 ~ 90%, 0 ~ 400A of operating current, peak power output 200kW；
Arc power (2) is opened, and is cleaned by the spots moving of electric arc to the surface in arc ion plating target source (3), and adjusting needs
The technological parameter wanted, the current value of arc power (2) output are 10 ~ 300A, peak power output 12kW；
Multi-stage magnetic field device (4) are adjusted by multi-stage magnetic field power supply (5), keep arc-plasma in arc ion plating target source
(3) stablize and generate and elimination is filtered to bulky grain defect, guarantee the uniformity of target ablation, that improves target utilizes effect
Rate makes arc-plasma with higher efficiency of transmission by multi-stage magnetic field device (4), and multi-stage magnetic field device (4) uses surface
The red copper wire of insulation, according to determining the diameter and the number of turns of line by electric current and magnetic field strength, multi-stage magnetic field power supply (5) is to magnetic at different levels
Field independently powers, and after realizing that the Independent adjustable in magnetic fields at different levels, apparatus structure determine, passes through the defeated of multi-stage magnetic field power supply (5)
Out electric current come adjust multi-stage magnetic field device (4) output magnetic directions at different levels and intensity；
Liner bias hose straightening device (6) can cooperate the internal diameter of multi-stage magnetic field device (4) design straight tube, the internal diameter of straight tubeDIt is greater than
The outer diameter in arc ion plating target source (3), outer diameter are less than the internal diameter of multi-stage magnetic field device (4), living between multi-stage magnetic field device (4)
Dynamic insulation is assembled together, and liner bias hose straightening device (6) can dismantle in time cleaning and installation with apparent surface pollution level, avoids
The inside pipe wall pollution of multi-stage magnetic field device (4) and the problem of clearing up is difficult under linerless board status, and effectively avoids target more
Cause the pollution of thin film composition after changing to the secondary sputtering of multi-stage magnetic field device inner wall surface pollutant；Liner bias hose straightening device
(6) length of straight pipeHIt is identical with the length of multi-stage magnetic field device (4), liner bias is selected according to different targets and technological parameter
The allocation plan of hose straightening device (6) realizes the scavenging effect constrained using own form to bulky grain；
The material of multi-stage magnetic field device (4) and liner bias hose straightening device (6) selects 304 stainless steels of nonmagnetic, resistance to cleaning
Material, multi-stage magnetic field device (4) determine length, internal-and external diameter, thickness, magnetic field the number of turns according to the diameter of target, cooling, transmission range
And direction, liner bias hose straightening device (6) are true according to the outer diameter of multi-stage magnetic field device (4) internal diameter and arc ion plating target source (3)
Determine the outer diameter and inner diameter of straight tube, straight tube needs to select suitable thickness according to length and rigidity, processes according to actual design parameter
?；
It opens liner grid bias power supply (7), liner bias hose straightening device (6) keeps direct current, pulse, multiple-pulse, DC pulse multiple
It closes or bipolar pulse bias, wherein pulse, multiple-pulse or the adjustable pulse frequency of bipolar pulse biased type, pulse
Width and pulse pattern, the adjustment of output voltage guarantee that liner bias hose straightening device (6) attract bulky grain, to deposition from
Son is repelled, and loss of the arc-plasma in pipe in transmission process is reduced, and reduction even is eliminated in arc-plasma
Bulky grain defect, improve the efficiency of transmission of arc-plasma and the deposition velocity of film, the voltage of liner grid bias power supply (7)
Parameter is -200 ~+200V, is that direct current, pulse, multiple-pulse, DC pulse be compound or Bipolar pulse power, wherein pulse
The adjustable pulse frequency of type, pulse width and pulse pattern, during the deposition process to bulky grain defect generate periodically or
The continual and steady attraction of person greatly reduces the machine that bulky grain passes through multi-stage magnetic field device (4) and liner bias hose straightening device (6)
Rate；
It opens movable coil installation's power source (9), adjusts the input current of movable coil device (8), while realizing to magnetic direction
With the adjusting of magnetic field strength, the adjustings such as coil turn, coil-span, shape and the transmission path of movable coil device (8) are controlled
The arc-plasma come out from multi-stage magnetic field device (4) and liner bias hose straightening device (6) transmission is made, is filled using movable coil
The cooperation of shape and the magnetic field magnetic line layout, direction set, movable coil can also be adopted using 90 degree of classical flexure types
With straight line and bending, bending and Straight Combination (magnetic line of force of straight line portion and the magnetic line of force of bending part are tangent, intersect), straight line
With Straight Combination (magnetic line of force intersection of two sections of straight line portions), combination (three sections of intersections and the tangent group of straight line, circular arc and straight line
Close) and circular arc, straight line and circular arc the typical loop construction combination such as combination (tangent between three and intersection), circle therein
Arc and straight line portion are determined according to the needs of spatial position and transmission path, it is made to reach matrix with higher efficiency of transmission
Surface, caused by overcoming deposition position limitation caused by designing due to vacuum chamber space and target source layout or base shape limitation
Film deposits problem of non-uniform, carries out the fast deposition of film；The output resistance of standardsizing rheostat device (10) realizes active line
Positive bias variation on coil apparatus (8), the electric field that positive bias generates may be implemented straight to multi-stage magnetic field device (4) and liner bias
The attraction of electronics and remaining bulky grain in the arc-plasma that transmission comes out in pipe device (6), and then increase movable coil dress
The ion populations for setting the arc-plasma exported in (8) increase, and promote arc-plasma in movable coil device (8)
Efficiency of transmission eliminates remaining bulky grain defect；Movable coil device (8) selects low-resistance copper tube, the diameter of copper pipe, thickness
Degree and length are big according to the number of turns of movable coil device (8), coil channel diameter, coil shape, coil turn spacing, vacuum chamber
Small, arc-plasma transmission path and transmission range determine；The positive and negative anodes of movable coil installation's power source (9) are according to magnetic field
Intensity, direction and cooling system provide suitable electric current to movable coil device (8), and the input range of electric current is 0 ~ 2000A, protect
The stability and movable coil device (8) for demonstrate,proving entire vacuum system export suitable magnetic field, make arc-plasma according to activity
The path transmission of coil device (8) setting guarantees to reach matrix while removing remaining bulky grain with high efficiency of transmission
Surface avoids arc-plasma loss in vacuum chamber (13), realizes the fast deposition of film；
Arc ion plating target source (3), multi-stage magnetic field device (4) and movable coil device (8) use direct water-cooling mode, avoid work
Temperature during work increases problem, has external water cooling unit system to provide enough cooling water flows and cooling temperature, to guarantee
The normal operation of entire vacuum system.
According to the needs of film preparation, the change that relevant technological parameter carries out pure metal film, different element ratios is adjusted
It closes object ceramic membrane, function film and is prepared with the high-quality thin-film of nanometer multilayer or gradient-structure.
Advantages of the present invention: a. is lived using the cooperation of shape and the magnetic field magnetic line layout, direction of movable coil device
Moving winding can using 90 degree classical flexure types, can also using straight line and bending, be bent and Straight Combination (straight line portion
The magnetic line of force and the magnetic line of force of bending part are tangent, intersect), straight line and Straight Combination (magnetic line of force intersection of two sections of straight line portions),
The combination (three sections of intersections and tangent combination) and the combination of circular arc, straight line and circular arc of straight line, circular arc and straight line are (between three
Tangent and intersection) etc. typical loop construction combination, circular arc and straight line portion therein are according to spatial position and transmission path
It needs to be determined, realizes effective control to arc-plasma transmission path, to from multi-stage magnetic field device and liner bias
The further removing of remaining bulky grain defect in hose straightening device reduces damage of the arc-plasma in vacuum chamber transmission process
Consumption, by the guidance in movable coil magnetic field, further increases the efficiency of transmission of arc-plasma and the deposition velocity of film, gram
Clothes film due to caused by deposition position limitation caused by vacuum chamber space and the design of target source layout or base shape limitation is heavy
Product problem of non-uniform can realize the preparation of film in the optimum position of vacuum chamber, can also adjust and live by rheostat device
The series impedance of moving winding realizes the adjustment to movable coil itself positive bias parameter, realizes in arc-plasma
The attraction of electronics and remaining bulky grain, efficiency of transmission of the Lai Tisheng arc-plasma in movable coil eliminate the big of remnants
Grain defect increases the deposition velocity of film；B. multi-stage magnetic field filter device can guarantee electric arc in target by the constraint in magnetic field
The stable motion on material surface generates lasting arc-plasma, and makes arc-plasma by the magnetic line of force of multi-stage magnetic field
Both high efficiency of transmission in multi-stage magnetic field device, also change the motion path of arc-plasma and bulky grain defect to realize
Separation, be further reduced the bulky grain defect even being eliminated in arc-plasma；C. liner bias hose straightening device is by can
To apply direct current, pulse or the compound positive bias of DC pulse, bulky grain continue or is periodically effectively attracted, to heavy
Product ion continue or periodically repels, and can also be vibrated by the bipolar pulse of positive back bias voltage, reduces plasma
Loss in pipe in transmission process further increases the efficiency of transmission of arc-plasma and the deposition velocity of film；D. in
Lining bias hose straightening device determines the outer diameter of straight tube and interior according to the internal diameter of multi-stage magnetic field device and the outer diameter in arc ion plating target source
Diameter, straight tube need to select suitable thickness according to length and rigidity, and the motion path of bulky grain defect is limited by own form
To eliminate the bulky grain defect in arc-plasma, constraint elimination effect of the realization to bulky grain defect, liner bias straight tube
The problem of device is flexibly dismantled, and cleaning is convenient, avoids the inside pipe wall pollution cleaning of multi-stage magnetic field device under linerless board status, can
After effectively avoiding target from replacing, different targets cause thin film composition to the secondary sputtering of multi-stage magnetic field device wall polluting object
Pollution；E. pulsed bias power supply utilizes the suppression of electric field by adjusting pulse pattern, pulse amplitude, pulse width and pulse frequency
Repelling effect processed, which is realized, eliminate to remaining bulky grain defect and optimize to the adjusting of arc-plasma energy；F. made
The microstructure and properties of standby film can be adjusted by pulsed bias parameter, utilize the type, amplitude, arteries and veins of pulsed bias
It rushes width and frequency realizes the pinning effect that energetic ion grows film, improve the texture and stress shape of film growth
State improves bond strength, improves the service performance of film；G. by utilizing combination field and liner bias straight tube composite filter
Arc ion plating prepared by film, eliminate the bulky grain defect in film, reduce arc-plasma filtering fill
It sets with the loss in vacuum chamber, improves the service efficiency of arc-plasma, realize the quick preparation of film, and can guarantee
Film crystal tissue and microstructure are finer and close, are conducive to the service performance for further increasing film.
The arc ion plating of combination field and liner bias straight tube composite filter, which can singly cover or more set groups
It closes, and combines the multiple types combination of multi-stage magnetic field device (4), liner bias hose straightening device (6) and movable coil device (8),
To prepare pure metal film, the compound ceramic film of different element ratios, function film and there is nanometer multilayer or gradient knot
The film of structure can also cover using single set or mostly the device and combine using Traditional DC magnetron sputtering, pulsed magnetron sputtering, biography
Unite arc ion plating and pulsed cathode arc and Dc bias, pulsed bias or the compound biasing device of DC pulse, realize two kinds or
The compound of person two or more depositional modes carries out film deposition, prepares the compound pottery of pure metal film, different element ratios
Porcelain film, function film and the high-quality thin-film with nanometer multilayer or gradient-structure.
Detailed description of the invention
Fig. 1 is the scheme of erection of the arc ion plating of combination field of the present invention and liner bias straight tube composite filter；Fig. 2
It is 7 kinds of topology layouts of movable coil；Fig. 3 is the typical structure diagram of liner bias hose straightening device.
Specific embodiment
Specific embodiment 1: illustrating present embodiment below with reference to Fig. 1-3, present embodiment combination field and liner are inclined
The arc ion plating institute use device of straightening pipe composite filter includes grid bias power supply (1), arc power (2), arc ion plating target
Source (3), multi-stage magnetic field power supply (5), liner bias hose straightening device (6), liner grid bias power supply (7), is lived at multi-stage magnetic field device (4)
Moving-wire coil apparatus (8), movable coil installation's power source (9), rheostat device (10), sample stage (11), grid bias power supply waveform oscillography
Device (12) and vacuum chamber (13)；
In the device:
Substrate work-piece to be processed is placed on the sample stage (11) in vacuum chamber (13), multi-stage magnetic field device (4), liner bias straight tube
Mutually insulated between device (6), movable coil device (8) and vacuum chamber (13), workpiece are placed on sample stage (11), sample stage
(11) cathode output end of grid bias power supply (1) is connect, arc ion plating target source (3) is mounted on vacuum chamber (13), connects arc power (2)
Cathode output end, the magnetic fields at different levels of multi-stage magnetic field device (4) connect each output end of multi-stage magnetic field power supply (5), and positive and negative anodes connect
Method can be determined according to output magnetic direction, and liner bias hose straightening device (6) connects the anode output of liner grid bias power supply (7)
End, movable coil device (8) connect movable coil installation's power source (9) by the positive and negative anodes input terminal on flange port, open external
Water-cooling circulating system and power supply total control switch；
Film deposition: it will be vacuumized in vacuum chamber (13), to the vacuum degree in vacuum chamber (13) less than 10-4When Pa, it is passed through work
Gas opens grid bias power supply (1) and grid bias power supply kymographion (12), grid bias power supply (1) can be to 0.01Pa~10Pa
Direct current, pulse, multiple-pulse, DC pulse be compound or bipolar pulse bias, the bias amplitude of output, pulse frequency and pulse
Width adjusting, the peak voltage that grid bias power supply (1) exports pulse is 0~1.2kV, and pulse frequency is 0Hz~80kHz, pulse
Width 1 ~ 90%, 0 ~ 400A of operating current, peak power output 200kW；
Arc power (2) is opened, and is cleaned by the spots moving of electric arc to the surface in arc ion plating target source (3), and adjusting needs
The technological parameter wanted, the current value of arc power (2) output are 10 ~ 300A, peak power output 12kW；
Multi-stage magnetic field device (4) are adjusted by multi-stage magnetic field power supply (5), keep arc-plasma in arc ion plating target source
(3) stablize and generate and elimination is filtered to bulky grain defect, guarantee the uniformity of target ablation, that improves target utilizes effect
Rate makes arc-plasma with higher efficiency of transmission by multi-stage magnetic field device (4), and multi-stage magnetic field device (4) uses surface
The red copper wire of insulation, according to determining the diameter and the number of turns of line by electric current and magnetic field strength, multi-stage magnetic field power supply (5) is to magnetic at different levels
Field independently powers, and after realizing that the Independent adjustable in magnetic fields at different levels, apparatus structure determine, passes through the defeated of multi-stage magnetic field power supply (5)
Out electric current come adjust multi-stage magnetic field device (4) output magnetic directions at different levels and intensity；
Liner bias hose straightening device (6) can cooperate the internal diameter of multi-stage magnetic field device (4) design straight tube, the internal diameter of straight tubeDIt is greater than
The outer diameter in arc ion plating target source (3), outer diameter are less than the internal diameter of multi-stage magnetic field device (4), living between multi-stage magnetic field device (4)
Dynamic insulation is assembled together, and liner bias hose straightening device (6) can dismantle in time cleaning and installation with apparent surface pollution level, avoids
The inside pipe wall pollution of multi-stage magnetic field device (4) and the problem of clearing up is difficult under linerless board status, and effectively avoids target more
Cause the pollution of thin film composition after changing to the secondary sputtering of multi-stage magnetic field device (4) inner wall surface pollutant；Liner bias straight tube
The length of straight pipe of device (6)HIt is identical with the length of multi-stage magnetic field device (4), liner is selected according to different targets and technological parameter
The allocation plan of bias hose straightening device (6) realizes the scavenging effect (as shown in Figure 3) constrained using own form to bulky grain；
The material of multi-stage magnetic field device (4) and liner bias hose straightening device (6) selects 304 stainless steels of nonmagnetic, resistance to cleaning
Material, multi-stage magnetic field device (4) determine length, internal-and external diameter, thickness, magnetic field the number of turns according to the diameter of target, cooling, transmission range
And direction, liner bias hose straightening device (6) are true according to the outer diameter of multi-stage magnetic field device (4) internal diameter and arc ion plating target source (3)
Determine the outer diameter and inner diameter of straight tube, straight tube needs to select suitable thickness according to length and rigidity, processes according to actual design parameter
?；
It opens liner grid bias power supply (7), liner bias hose straightening device (6) keeps direct current, pulse, multiple-pulse, DC pulse multiple
It closes or bipolar pulse bias, wherein pulse, multiple-pulse or the adjustable pulse frequency of bipolar pulse biased type, pulse
Width and pulse pattern, the adjustment of output voltage guarantee that liner bias hose straightening device (6) attract bulky grain, to deposition from
Son is repelled, and loss of the arc-plasma in pipe in transmission process is reduced, and reduction even is eliminated in arc-plasma
Bulky grain defect, improve the efficiency of transmission of arc-plasma and the deposition velocity of film, the voltage of liner grid bias power supply (7)
Parameter is -200 ~+200V, is that direct current, pulse, multiple-pulse, DC pulse be compound or Bipolar pulse power, wherein pulse
The adjustable pulse frequency of type, pulse width and pulse pattern, during the deposition process to bulky grain defect generate periodically or
The continual and steady attraction of person greatly reduces the machine that bulky grain passes through multi-stage magnetic field device (4) and liner bias hose straightening device (6)
Rate；
It opens movable coil installation's power source (9), adjusts the input current of movable coil device (8), realize to magnetic direction and magnetic
The adjusting of field intensity, the adjustings such as coil turn, coil-span, shape and the transmission path of movable coil device (8) come control from
The arc-plasma that multi-stage magnetic field device (4) and liner bias hose straightening device (6) transmission come out, utilizes movable coil device
The cooperation (as shown in Figs. 1-2) of shape and magnetic field magnetic line layout, direction, movable coil can be using 90 degree of classical bendings
Type, can also be using straight line and bending, bending and the Straight Combination (magnetic line of force phase of the magnetic line of force of straight line portion and bending part
Cut, intersect), straight line and Straight Combination (magnetic line of force intersection of two sections of straight line portions), (three sections of the combination of straight line, circular arc and straight line
Intersection and tangent combination) and circular arc, straight line and circular arc the typical coil knot such as combination (tangent between three and intersection)
Structure combination, circular arc and straight line portion therein are determined according to the needs of spatial position and transmission path, make it with higher
Efficiency of transmission reaches matrix surface, overcomes deposition position limitation or base caused by designing due to vacuum chamber space and target source layout
Film caused by shape limits deposits problem of non-uniform, carries out the fast deposition of film；Rheostat device (10) adjusts output
Resistance, realizes the positive bias variation on movable coil device (8), and the electric field that positive bias generates may be implemented to multi-stage magnetic field device
(4) attraction of electronics and remaining bulky grain in the arc-plasma come out and is transmitted in liner bias hose straightening device (6), in turn
The ion populations for increasing the arc-plasma exported in movable coil device (8) increase, and promote arc-plasma in activity
Efficiency of transmission in coil device (8) eliminates remaining bulky grain defect；Movable coil device (8) selects low-resistance red copper
Pipe, the diameter of copper pipe, the number of turns of thickness and length foundation movable coil device (8), coil channel diameter, coil shape, coil
Turn-to-turn away from, vacuum chamber size, the transmission path of arc-plasma and transmission range determine；Movable coil installation's power source (9)
Positive and negative anodes provide suitable electric current, the input of electric current to movable coil device (8) according to magnetic field strength, direction and cooling system
Range is 0 ~ 2000A, guarantees that the stability of entire vacuum system and movable coil device (8) export suitable magnetic field, makes electric arc
The path transmission that plasma is set according to movable coil device (8), with high while guaranteeing to remove remaining bulky grain
Efficiency of transmission reaches matrix surface, avoids arc-plasma loss in vacuum chamber (13), realizes the fast deposition of film；
Arc ion plating target source (3), multi-stage magnetic field device (4) and movable coil device (8) use direct water-cooling mode, avoid work
Temperature during work increases problem, has external water cooling unit system to provide enough cooling water flows and cooling temperature, to guarantee
The normal operation of entire vacuum system.
The output waveform of grid bias power supply (1) is direct current, pulse, DC pulse is compound, multiple-pulse is compound or bipolarity arteries and veins
Punching.
Output direct current, pulse, the DC pulse of arc power (2) are compound or multiple-pulse is compound.
Arc ion plating target source (3) is using high-melting-point target, the pure metal of low melting point or multicomponent alloy material and nonmetallic
Single target, multiple targets or composition target can be used in material (such as graphite), carries out the change of pure metal film, different element ratios
Close object ceramic membrane, function film, multi-component multi-layer, superlattices, the high-quality thin-film with nanometer multilayer or gradient-structure.
It is one or more in nitrogen, acetylene, methane, silane or oxygen that working gas selects argon gas or working gas to select
Mixed gas, to prepare pure metal film, the compound ceramic film of different element ratio, function film, multi-component multi-layer, super
Lattice, the film with nanometer multilayer or gradient-structure.
The arc ion plating of combination field and liner bias straight tube composite filter, using movable coil device shape and
The cooperation of magnetic field magnetic line layout, direction, movable coil can also use straight line and curved using 90 degree classical flexure types
Bent, bending and Straight Combination (magnetic line of force of straight line portion and the magnetic line of force of bending part are tangent, intersect), straight line and Straight Combination
(magnetic line of force intersection of two sections of straight line portions), the combination (three sections of intersections and tangent combination) of straight line, circular arc and straight line and circle
The typical loop construction combinations such as the combination (tangent between three and intersection) of arc, straight line and circular arc, circular arc and straight line therein
Part is determined according to the needs of spatial position and transmission path, realizes effective control to arc-plasma transmission path
System, the further removing to remaining bulky grain defect from multi-stage magnetic field device and liner bias hose straightening device, reduce etc. from
Loss of the daughter in vacuum chamber transmission process further increases arc-plasma by the guidance in movable coil magnetic field
The deposition velocity of efficiency of transmission and film, overcome deposition position caused by being designed due to vacuum chamber space and target source layout limit or
Film caused by person's base shape limits deposits problem of non-uniform, can realize the preparation of film in the optimum position of vacuum chamber,
The series impedance of movable coil can also be adjusted by rheostat device, realized to movable coil itself positive bias parameter
Adjustment realizes that Lai Tisheng arc-plasma is in active line to the attraction of electronics and remaining bulky grain in arc-plasma
Efficiency of transmission in circle eliminates remaining bulky grain defect, increases the deposition velocity of film；Utilize multi-stage magnetic field filter device
Guarantee that electric arc generates lasting arc-plasma in the stable motion of target material surface by magnetically confined, and passes through multistage magnetic
The magnetic line of force of field makes high efficiency of transmission of the arc-plasma in multi-stage magnetic field device, also change arc-plasma and bulky grain
The motion path of defect is further reduced the bulky grain defect even being eliminated in arc-plasma come the separation both realized；
Apply direct current, pulse or the compound positive bias of DC pulse using liner bias hose straightening device, bulky grain continue or week
Effective attraction of phase property, effectively avoids bulky grain problem caused by low melting material, carries out the lasting or period to depositing ions
Property repulsion, can also be vibrated by the bipolar pulse of positive back bias voltage, reduce damage of the plasma in pipe in transmission process
Consumption, further increases the efficiency of transmission of arc-plasma and the deposition velocity of film, liner bias hose straightening device can pass through
Own form determines the outer diameter and inner diameter of straight tube according to the outer diameter of the internal diameter of multi-stage magnetic field device and arc ion plating target source, directly
Pipe needs to select suitable thickness according to length and rigidity, limits the motion path of bulky grain defect by own form to eliminate
Bulky grain defect in arc-plasma realizes the constraint elimination effect to bulky grain defect, reduces bulky grain and passes through liner
The probability on bias hose straightening device arrival deposited samples surface；Liner bias hose straightening device is flexibly dismantled, and cleaning is convenient, avoids nothing
The inside pipe wall of multi-stage magnetic field device pollutes the problem of cleaning under liner plate state, it is possible to prevente effectively from after target replacement, different targets
Cause the pollution of thin film composition to the secondary sputtering of multi-stage magnetic field device inner wall surface pollutant；Pulsed bias power supply by adjusting
Pulse pattern, pulse amplitude, pulse width and pulse frequency are realized using the inhibition repelling effect of electric field to remaining bulky grain
Defect eliminate and optimizes to the adjusting of arc-plasma energy, improves the section potential point of plasma near matrix
Cloth sufficiently attracts arc-plasma to workpiece motion s, realizes the fast deposition of film；The microstructure and property of prepared film
It can be adjusted by pulsed bias parameter, realize high energy using the type of pulsed bias, amplitude, pulse width and frequency
The pinning effect of ion pair film growth, improves the texture and stress state of film growth, improves bond strength, improves thin
The service performance of film；Also stablize metallic plasma lasting, that ionization level is high using the generation of arc ion plating (aip) simultaneously, has
Conducive to high ionization level ion in the chemosynthesis reaction of workpiece surface, compound ceramic film, the function of different element ratios are prepared
Energy film, multi-component multi-layer, superlattices and film or pure metal film with gradient-structure；By utilizing combination field and liner
Film prepared by the arc ion plating of bias straight tube composite filter eliminates the bulky grain defect in film, reduces electricity
Loss of the arc plasma in filter device and vacuum chamber avoids liner straight tube residue pair caused by different targets are replaced
The pollution of film improves the service efficiency of arc-plasma, realizes the quick preparation of film, is optimized using pulsed bias
The Energy distribution of arc-plasma, and can guarantee that film crystal tissue and microstructure are finer and close, be conducive to further
Improve the service performance of film.
Specific embodiment 2: present embodiment and embodiment one the difference is that, which can also be achieved separately
Outer function: can in conjunction with Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and pulsed cathode arc one kind
Or two or more method combinations, then apply Dc bias, pulsed bias, the compound bias of DC pulse or bipolarity on workpiece
Pulsed bias device carries out film deposition, thin to prepare pure metal film, the compound ceramic film of different element ratios, function
Film and high-quality thin-film with nanometer multilayer or gradient-structure.
Specific embodiment 3: present embodiment and embodiment two the difference is that, combination field is inclined with liner
The arc ion plating of straightening pipe composite filter connects, and opens arc power (2), opens multi-stage magnetic field power supply (5) and adjusts multistage magnetic
Field device (4) is opened liner grid bias power supply (7), and liner bias hose straightening device (6) keeps direct current positive bias, opens grid bias power supply
(1), movable coil installation's power source (9) are opened and adjusts movable coil device (8), the output resistance of standardsizing rheostat device (10),
Technical arrangement plan carries out film deposition, and preparing has the multilayered structure of different stress, microstructure and element ratio thin
Film, other are identical as embodiment two.
Specific embodiment 4: present embodiment and embodiment one the difference is that, combination field is inclined with liner
The arc ion plating of straightening pipe composite filter connects, and opens arc power (2), opens multi-stage magnetic field power supply (5) and adjusts multistage magnetic
Field device (4) is opened liner grid bias power supply (7), and liner bias hose straightening device (6) keeps direct current positive bias, opens grid bias power supply
(1), movable coil installation's power source (9) are opened and adjusts movable coil device (8), the output resistance of standardsizing rheostat device (10),
Technical arrangement plan carries out film deposition, and combines Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating
It is combined with one or two kinds of above method of pulsed cathode arc, then applies Dc bias, pulsed bias, direct current arteries and veins on workpiece
It rushes compound bias or bipolar pulse biasing device carries out film deposition, other are identical as embodiment two.
Specific embodiment 5: present embodiment and embodiment one the difference is that, can be used 2 sets or with
On arc ion plating target source (3), multi-stage magnetic field device (4), liner bias hose straightening device (6) and movable coil device (8) group
The combination field of conjunction and the arc ion plating of liner bias straight tube composite filter are carried out with various pure metal elements and polynary conjunction
Golden material is that the film of target deposits, and combines Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion plating and arteries and veins
One or two kinds of above method combination of cathode arc is rushed, then applies Dc bias, pulsed bias or DC pulse on workpiece
Compound biasing device carries out film deposition, and preparing has the multilayered structure of different stress, microstructure and element ratio thin
Film.
Claims (5)
1. the arc ion plating of combination field and liner bias straight tube composite filter, which is characterized in that the device includes bias
Power supply (1), arc power (2), arc ion plating target source (3), multi-stage magnetic field device (4), multi-stage magnetic field power supply (5), liner bias
Hose straightening device (6), liner grid bias power supply (7), movable coil device (8), movable coil installation's power source (9), rheostat device
(10) sample stage (11), grid bias power supply kymographion (12) and vacuum chamber (13)；
In the device:
Substrate work-piece to be processed is placed on the sample stage (11) in vacuum chamber (13), multi-stage magnetic field device (4), liner bias straight tube
Mutually insulated between device (6), movable coil device (8) and vacuum chamber (13), workpiece are placed on sample stage (11), sample stage
(11) cathode output end of grid bias power supply (1) is connect, arc ion plating target source (3) is mounted on vacuum chamber (13), connects arc power (2)
Cathode output end, the magnetic fields at different levels of multi-stage magnetic field device (4) connect each output end of multi-stage magnetic field power supply (5), and positive and negative anodes connect
Method is determined according to output magnetic direction, and liner bias hose straightening device (6) connects the cathode output end of liner grid bias power supply (7),
Movable coil device (8) connects movable coil installation's power source (9) by the positive and negative anodes input terminal on flange port, rheostat device
(10) it connects with movable coil device (8), access is opened power supply master control and opened with the circuit of movable coil installation's power source (9)
It closes and external water-cooling circulating system；
Film deposition: it will be vacuumized in vacuum chamber (13), to the vacuum degree in vacuum chamber (13) less than 10-4When Pa, it is passed through work
Gas opens grid bias power supply (1) and grid bias power supply kymographion (12) to 0.01Pa~10Pa, grid bias power supply (1) be direct current,
Pulse, multiple-pulse, DC pulse be compound or bipolar pulse bias, the bias amplitude of output, pulse frequency and pulse width
It adjusts, the peak voltage that grid bias power supply (1) exports pulse is 0~1.2kV, and pulse frequency is 0Hz~80kHz, pulse width 1
~ 90%, 0 ~ 400A of operating current, peak power output 200kW；
Arc power (2) is opened, and is cleaned by the spots moving of electric arc to the surface in arc ion plating target source (3), and adjusting needs
The technological parameter wanted, the current value of arc power (2) output are 10 ~ 300A, peak power output 12kW；
Multi-stage magnetic field device (4) are adjusted by multi-stage magnetic field power supply (5), keep arc-plasma in arc ion plating target source
(3) stablize and generate and elimination is filtered to bulky grain defect, arc-plasma is made to pass through multistage with higher efficiency of transmission
Magnetic field device (4), multi-stage magnetic field device (4) use the red copper wire of surface insulation, and foundation determines line by electric current and magnetic field strength
Diameter and the number of turns, multi-stage magnetic field power supply (5) independently power to magnetic fields at different levels, realize the Independent adjustable in magnetic fields at different levels, fill
After setting structure determination, the magnetic fields at different levels of multi-stage magnetic field device (4) output are adjusted by the output electric current of multi-stage magnetic field power supply (5)
Direction and intensity；
Liner bias hose straightening device (6) can cooperate the internal diameter of multi-stage magnetic field device (4) design straight tube, the internal diameter of straight tubeDIt is greater than
The outer diameter in arc ion plating target source (3), outer diameter are less than the internal diameter of multi-stage magnetic field device (4), living between multi-stage magnetic field device (4)
Dynamic insulation is assembled together, and liner bias hose straightening device (6) can dismantle in time cleaning and installation with apparent surface pollution level, avoids
The inside pipe wall pollution of multi-stage magnetic field device (4) and the problem of clearing up is difficult under linerless board status, and effectively avoids target more
Cause the pollution of thin film composition after changing to the secondary sputtering of multi-stage magnetic field device inner wall surface pollutant；Liner bias hose straightening device
(6) length of straight pipeHIt is identical with the length of multi-stage magnetic field device (4), liner bias is selected according to different targets and technological parameter
The allocation plan of hose straightening device (6) realizes the scavenging effect constrained using own form to bulky grain；
The material of multi-stage magnetic field device (4) and liner bias hose straightening device (6) selects 304 stainless steels of nonmagnetic, resistance to cleaning
Material, multi-stage magnetic field device (4) determine length, internal-and external diameter, thickness, magnetic field the number of turns according to the diameter of target, cooling, transmission range
And direction, liner bias hose straightening device (6) are true according to the outer diameter of multi-stage magnetic field device (4) internal diameter and arc ion plating target source (3)
Determine the outer diameter and inner diameter of straight tube, straight tube needs to select suitable thickness according to length and rigidity, processes according to actual design parameter
?；
The material of multi-stage magnetic field device (4) and liner bias hose straightening device (6) selects 304 stainless steels of nonmagnetic, resistance to cleaning
Material, multi-stage magnetic field device (4) determine length, internal-and external diameter, thickness, magnetic field the number of turns according to the diameter of target, cooling, transmission range
And direction, liner bias hose straightening device (6) determine outer diameter according to multi-stage magnetic field device (4) internal diameter, and suitable according to needing to select
Thickness and internal diameter topology layout, according to actual design parameter process；
It opens liner grid bias power supply (7), liner bias hose straightening device (6) keeps direct current, pulse, multiple-pulse, DC pulse multiple
Conjunction or bipolar pulse bias, wherein pulse, multiple-pulse or bipolar pulse biased type are by adjusting pulse frequency, pulse
Width and pulse pattern, the adjustment of output voltage guarantee that liner bias hose straightening device (6) attract bulky grain, to deposition from
Son is repelled, and loss of the arc-plasma in pipe in transmission process is reduced, and reduction even is eliminated in arc-plasma
Bulky grain defect, improve the efficiency of transmission of arc-plasma and the deposition velocity of film, the voltage of liner grid bias power supply (7)
Parameter is -200 ~+200V, is that direct current, pulse, multiple-pulse, DC pulse be compound or Bipolar pulse power, wherein pulse
The adjustable pulse frequency of type, pulse width and pulse pattern, during the deposition process to bulky grain defect generate periodically or
The continual and steady attraction of person greatly reduces the machine that bulky grain passes through multi-stage magnetic field device (4) and liner bias hose straightening device (6)
Rate；
It opens movable coil installation's power source (9), adjusts the input current of movable coil device (8), while realizing to magnetic direction
With the adjusting of magnetic field strength, the adjustings such as coil turn, coil-span, shape and the transmission path of movable coil device (8) are controlled
The arc-plasma come out from multi-stage magnetic field device (4) and liner bias hose straightening device (6) transmission is made, makes it with higher biography
Defeated efficiency reaches matrix surface, overcomes deposition position limitation or matrix caused by designing due to vacuum chamber space and target source layout
Film caused by shape limits deposits problem of non-uniform, carries out the fast deposition of film；The output of standardsizing rheostat device (10)
Resistance, realizes the positive bias variation on movable coil device (8), and the electric field that positive bias generates may be implemented to multi-stage magnetic field device
(4) attraction of electronics and remaining bulky grain in the arc-plasma come out and is transmitted in liner bias hose straightening device (6), in turn
The ion populations for increasing the arc-plasma exported in movable coil device (8) increase, and promote arc-plasma in activity
Efficiency of transmission in coil device (8) eliminates remaining bulky grain defect；Movable coil device (8) selects low-resistance red copper
Pipe, the diameter of copper pipe, the number of turns of thickness and length foundation movable coil device (8), coil channel diameter, coil shape, coil
Turn-to-turn away from, vacuum chamber size, the transmission path of arc-plasma and transmission range determine；Movable coil installation's power source (9)
Positive and negative anodes provide suitable electric current, the input of electric current to movable coil device (8) according to magnetic field strength, direction and cooling system
Range is 0 ~ 2000A, guarantees that the stability of entire vacuum system and movable coil device (8) export suitable magnetic field, utilizes work
The cooperation of shape and the magnetic field magnetic line layout, direction of moving-wire coil apparatus, movable coil can use 90 degree of classical flexure types,
Can also using straight line and bending, be bent and the Straight Combination (magnetic line of force of the straight line portion and magnetic line of force of bending part is tangent, phase
Hand over), straight line and Straight Combination (magnetic line of force intersection of two sections of straight line portions), straight line, circular arc and straight line combination (three sections of intersections and
Tangent combination) and circular arc, straight line and circular arc the typical loop construction combination such as combination (tangent between three and intersection),
Circular arc and straight line portion therein are determined according to the needs of spatial position and transmission path, make arc-plasma according to work
The path transmission of moving-wire coil apparatus (8) setting guarantees to reach base while removing remaining bulky grain with high efficiency of transmission
Body surface face avoids arc-plasma loss in vacuum chamber (13), realizes the fast deposition of film；
Arc ion plating target source (3), multi-stage magnetic field device (4) and movable coil device (8) use direct water-cooling mode, avoid work
Temperature during work increases problem, has external water cooling unit system to provide enough cooling water flows and cooling temperature, to guarantee
The normal operation of entire vacuum system.
2. the arc ion plating of combination field according to claim 1 and liner bias straight tube composite filter, feature
It is, institute's use device further includes grid bias power supply kymographion (12), the pulse voltage and electricity that display grid bias power supply (1) issues
Waveform is flowed, by adjusting the output waveform of grid bias power supply (1), to the electricity from combination field and liner bias straight tube composite filter
The plated film ion transmitted in arc ion plating is effectively attracted, and the deposition and control deposition targets of sample surfaces film are carried out
The ratio of element in the film realizes the adjusting of plasma energy and is possible to remaining bulky grain defect progress electric field row
Reprimand is removed.
3. the arc ion plating of combination field according to claim 1 and liner bias straight tube composite filter, feature
It is, which combines multi-stage magnetic field device (4), liner bias hose straightening device (6) and living using single set or more set combinations
The multiple types of moving-wire coil apparatus (8) combine, to prepare compound ceramic film, the function of pure metal film, different element ratios
It can film and the film with nanometer multilayer or gradient-structure.
4. the arc ion plating of combination field according to claim 1 and liner bias straight tube composite filter, feature
It is, using single set or cover the device more and combines using Traditional DC magnetron sputtering, pulsed magnetron sputtering, conventional arc ion
One or two kinds of above method of plating and pulsed cathode arc combines, then applies Dc bias, pulsed bias or straight on workpiece
The compound biasing device of pulse is flowed, realizes that the compound of two or more depositional mode carries out film deposition, it is pure to prepare
Compound ceramic film, function film and the film with nanometer multilayer or gradient-structure of metallic film, different element ratios.
5. the arc ion plating of combination field according to claim 1 and liner bias straight tube composite filter, feature
It is, working gas selects argon gas or working gas to select one or more in nitrogen, acetylene, methane, silane or oxygen mix
Close gas, come prepare pure metal film, the compound ceramic film of different element ratio, function film and have nanometer multilayer or
The film of gradient-structure.
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| CN201711486578.2A CN109989005A (en) | 2017-12-30 | 2017-12-30 | The arc ion plating of combination field and liner bias straight tube composite filter |
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|---|---|---|---|
| CN201711486578.2A CN109989005A (en) | 2017-12-30 | 2017-12-30 | The arc ion plating of combination field and liner bias straight tube composite filter |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114318247A (en) * | 2021-12-15 | 2022-04-12 | 苏州艾钛科纳米科技有限公司 | Vacuum deposition coating equipment and coating method for magnetic field guiding filtration |
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|---|---|---|---|---|
| CN103540900A (en) * | 2013-10-22 | 2014-01-29 | 中国科学院金属研究所 | Magnetic control arc ion plating composite depositing process and magnetic control arc ion plating composite depositing device |
| CN105088150A (en) * | 2015-09-10 | 2015-11-25 | 魏永强 | Multilevel magnetic field arc ion plating method with adjustable transmission directions |
| CN206069994U (en) * | 2016-06-12 | 2017-04-05 | 魏永强 | The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating |
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2017
- 2017-12-30 CN CN201711486578.2A patent/CN109989005A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103540900A (en) * | 2013-10-22 | 2014-01-29 | 中国科学院金属研究所 | Magnetic control arc ion plating composite depositing process and magnetic control arc ion plating composite depositing device |
| CN105088150A (en) * | 2015-09-10 | 2015-11-25 | 魏永强 | Multilevel magnetic field arc ion plating method with adjustable transmission directions |
| CN206069994U (en) * | 2016-06-12 | 2017-04-05 | 魏永强 | The liner positive bias hose straightening device of multi-stage magnetic field arc ion plating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114318247A (en) * | 2021-12-15 | 2022-04-12 | 苏州艾钛科纳米科技有限公司 | Vacuum deposition coating equipment and coating method for magnetic field guiding filtration |
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