CN109634064B - 曝光装置以及物品制造方法 - Google Patents

曝光装置以及物品制造方法 Download PDF

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Publication number
CN109634064B
CN109634064B CN201811127037.5A CN201811127037A CN109634064B CN 109634064 B CN109634064 B CN 109634064B CN 201811127037 A CN201811127037 A CN 201811127037A CN 109634064 B CN109634064 B CN 109634064B
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CN
China
Prior art keywords
temperature
adjustment mechanism
lens barrel
exposure apparatus
temperature adjustment
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CN201811127037.5A
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English (en)
Chinese (zh)
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CN109634064A (zh
Inventor
安永大辅
西川原朋史
浅田克己
柴田雄吾
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Canon Inc
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Canon Inc
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Publication of CN109634064A publication Critical patent/CN109634064A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
CN201811127037.5A 2017-10-06 2018-09-27 曝光装置以及物品制造方法 Active CN109634064B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017196423A JP7016661B2 (ja) 2017-10-06 2017-10-06 露光装置および物品の製造方法
JP2017-196423 2017-10-06

Publications (2)

Publication Number Publication Date
CN109634064A CN109634064A (zh) 2019-04-16
CN109634064B true CN109634064B (zh) 2022-05-17

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ID=66066293

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CN201811127037.5A Active CN109634064B (zh) 2017-10-06 2018-09-27 曝光装置以及物品制造方法

Country Status (3)

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JP (1) JP7016661B2 (ja)
KR (1) KR102393140B1 (ja)
CN (1) CN109634064B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021015141A (ja) * 2019-07-10 2021-02-12 キヤノン株式会社 光学装置、投影光学系、露光装置、および、物品の製造方法
JP7427461B2 (ja) * 2020-02-06 2024-02-05 キヤノン株式会社 露光装置、及び物品の製造方法
JP7366789B2 (ja) * 2020-02-12 2023-10-23 キヤノン株式会社 光学装置、露光装置、及び物品の製造方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5883704A (en) * 1995-08-07 1999-03-16 Nikon Corporation Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
CN102549503A (zh) * 2009-09-30 2012-07-04 卡尔蔡司Smt有限责任公司 用于euv光刻的投射曝光设备中的光学布置
CN103299249A (zh) * 2007-10-09 2013-09-11 卡尔蔡司Smt有限责任公司 用于控制光学元件的温度的装置
JP2016161923A (ja) * 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4474871B2 (ja) 2003-03-19 2010-06-09 株式会社ニコン 露光装置
JP2009192569A (ja) 2008-02-12 2009-08-27 Canon Inc 露光装置およびデバイス製造方法
JP5517847B2 (ja) 2010-09-08 2014-06-11 キヤノン株式会社 露光装置、及びそれを用いたデバイスの製造方法
JP2014078572A (ja) 2012-10-09 2014-05-01 Nikon Corp 光学素子調整装置、光学装置、並びに露光方法及び装置
JP2015050353A (ja) 2013-09-02 2015-03-16 キヤノン株式会社 光学装置、投影光学系、露光装置、並びに物品の製造方法
JP2016143869A (ja) 2015-02-05 2016-08-08 キヤノン株式会社 露光装置、および物品の製造方法
JP6866131B2 (ja) 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5883704A (en) * 1995-08-07 1999-03-16 Nikon Corporation Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system
CN103299249A (zh) * 2007-10-09 2013-09-11 卡尔蔡司Smt有限责任公司 用于控制光学元件的温度的装置
CN102549503A (zh) * 2009-09-30 2012-07-04 卡尔蔡司Smt有限责任公司 用于euv光刻的投射曝光设备中的光学布置
JP2016161923A (ja) * 2015-03-05 2016-09-05 キヤノン株式会社 露光装置及び物品の製造方法

Also Published As

Publication number Publication date
KR102393140B1 (ko) 2022-05-02
CN109634064A (zh) 2019-04-16
JP2019070724A (ja) 2019-05-09
KR20190039873A (ko) 2019-04-16
JP7016661B2 (ja) 2022-02-07

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