CN108231627B - 热处理装置、热处理方法以及计算机存储介质 - Google Patents

热处理装置、热处理方法以及计算机存储介质 Download PDF

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Publication number
CN108231627B
CN108231627B CN201711404451.1A CN201711404451A CN108231627B CN 108231627 B CN108231627 B CN 108231627B CN 201711404451 A CN201711404451 A CN 201711404451A CN 108231627 B CN108231627 B CN 108231627B
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China
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temperature
hot plate
cover
heat treatment
wafer
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Chinese (zh)
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CN108231627A (zh
Inventor
碛本荣一
七种刚
脊古裕司
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0468—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H10P72/0474—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one lithography chamber
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Control Of Resistance Heating (AREA)
  • Resistance Heating (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CN201711404451.1A 2016-12-22 2017-12-22 热处理装置、热处理方法以及计算机存储介质 Active CN108231627B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-249127 2016-12-22
JP2016249127A JP6789096B2 (ja) 2016-12-22 2016-12-22 熱処理装置、熱処理方法及びコンピュータ記憶媒体

Publications (2)

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CN108231627A CN108231627A (zh) 2018-06-29
CN108231627B true CN108231627B (zh) 2023-07-14

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CN201711404451.1A Active CN108231627B (zh) 2016-12-22 2017-12-22 热处理装置、热处理方法以及计算机存储介质

Country Status (5)

Country Link
US (1) US11087983B2 (https=)
JP (1) JP6789096B2 (https=)
KR (1) KR102434669B1 (https=)
CN (1) CN108231627B (https=)
TW (1) TWI743267B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7093693B2 (ja) * 2018-07-13 2022-06-30 東京エレクトロン株式会社 熱処理装置及び基板滑り検出方法
CN109003925B (zh) * 2018-08-13 2020-08-25 常州瑞择微电子科技有限公司 用于半导体掩膜板的高精密平板加热装置
KR102225682B1 (ko) * 2018-09-28 2021-03-12 세메스 주식회사 기판의 열처리 방법
JP7269713B2 (ja) * 2018-10-09 2023-05-09 東京エレクトロン株式会社 基板冷却装置及び基板冷却方法
JP7129309B2 (ja) * 2018-10-16 2022-09-01 東京エレクトロン株式会社 基板処理装置、基板処理方法、及び記憶媒体
JP7186096B2 (ja) * 2019-01-09 2022-12-08 東京エレクトロン株式会社 熱板の冷却方法及び加熱処理装置
CN111537854B (zh) * 2020-05-14 2021-09-07 哈尔滨理工大学 一种可变温多功能样品室
CN111863670B (zh) * 2020-07-31 2025-06-03 芯米(厦门)半导体设备有限公司 一种晶圆热盘结构
JP2022038752A (ja) * 2020-08-27 2022-03-10 キヤノン株式会社 基板処理方法、基板保持装置、成形装置、及び物品の製造方法
JP2023177766A (ja) * 2022-06-03 2023-12-14 東京エレクトロン株式会社 基板処理装置および基板処理方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11329993A (ja) * 1998-05-15 1999-11-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP2005191265A (ja) * 2003-12-25 2005-07-14 Rkc Instrument Inc 制御装置
JP2006173185A (ja) * 2004-12-13 2006-06-29 Tokyo Electron Ltd 熱処理板の温度設定方法，熱処理板の温度設定装置，プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体
JP2007305728A (ja) * 2006-05-10 2007-11-22 Tokyo Electron Ltd 熱処理における温度安定化方法及びそのプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3525022B2 (ja) 1996-12-20 2004-05-10 大日本スクリーン製造株式会社 基板加熱装置
JP2001274064A (ja) 2000-03-27 2001-10-05 Tokyo Electron Ltd 加熱処理装置及び加熱処理方法
JP3825277B2 (ja) * 2001-05-25 2006-09-27 東京エレクトロン株式会社 加熱処理装置
DE102004055449B4 (de) * 2004-11-17 2008-10-23 Steag Hamatech Ag Verfahren und Vorrichtung zum thermischen Behandeln von Substraten
JP4530933B2 (ja) * 2005-07-21 2010-08-25 大日本スクリーン製造株式会社 基板熱処理装置
US7831135B2 (en) * 2007-09-04 2010-11-09 Sokudo Co., Ltd. Method and system for controlling bake plate temperature in a semiconductor processing chamber
JP2015184234A (ja) * 2014-03-26 2015-10-22 株式会社Ｓｃｒｅｅｎホールディングス 温度測定装置および温度測定方法
JP6539568B2 (ja) * 2015-11-04 2019-07-03 株式会社Ｓｃｒｅｅｎホールディングス 熱処理方法および熱処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11329993A (ja) * 1998-05-15 1999-11-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP2005191265A (ja) * 2003-12-25 2005-07-14 Rkc Instrument Inc 制御装置
JP2006173185A (ja) * 2004-12-13 2006-06-29 Tokyo Electron Ltd 熱処理板の温度設定方法，熱処理板の温度設定装置，プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体
JP2007305728A (ja) * 2006-05-10 2007-11-22 Tokyo Electron Ltd 熱処理における温度安定化方法及びそのプログラム

Also Published As

Publication number Publication date
US20180182611A1 (en) 2018-06-28
KR20180073477A (ko) 2018-07-02
CN108231627A (zh) 2018-06-29
KR102434669B1 (ko) 2022-08-22
JP2018107175A (ja) 2018-07-05
TWI743267B (zh) 2021-10-21
US11087983B2 (en) 2021-08-10
JP6789096B2 (ja) 2020-11-25
TW201837971A (zh) 2018-10-16

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